公开(公告)号：US07276691B2

公开(公告)日：2007-10-02

申请号：US10525311

申请日：2003-08-20

申请人： Toshio Kodama ,  Masakatsu Hasuda ,  Toshiaki Fujii ,  Kouji Iwasaki ,  Yasuhiko Sugiyama ,  Yasuyuki Takagi

发明人： Toshio Kodama ,  Masakatsu Hasuda ,  Toshiaki Fujii ,  Kouji Iwasaki ,  Yasuhiko Sugiyama ,  Yasuyuki Takagi

IPC分类号： H01J37/30

CPC分类号： G01N1/32 ,  H01J37/3056

摘要： There is provided a liquid metal ion beam irradiation device for irradiating a specific portion of a sample 6 with a prescribed liquid metal ion beam so as to form a cross section, and a gaseous ion beam irradiation device 7 for scanning a prescribed region (observation region) of the cross section using a gaseous ion beam focused to a prescribed diameter and removing a damaged layer on the prescribed region.

摘要翻译： 提供了一种液体金属离子束照射装置，用于用规定的液体金属离子束照射特定部分的样品6以形成横截面;以及气体离子束照射装置7，用于扫描规定区域（观察区域 ）使用聚焦到规定直径的气体离子束并去除规定区域上的损伤层。

公开(公告)号：US20060163497A1

公开(公告)日：2006-07-27

申请号：US10525311

申请日：2003-08-20

申请人： Toshio Kodama ,  Masakatsu Hasuda ,  Toshiaki Fujii ,  Kouji Iwasaki ,  Yasuhiko Sugiyama ,  Yasuyuki Takagi

发明人： Toshio Kodama ,  Masakatsu Hasuda ,  Toshiaki Fujii ,  Kouji Iwasaki ,  Yasuhiko Sugiyama ,  Yasuyuki Takagi

IPC分类号： H01J37/08

CPC分类号： G01N1/32 ,  H01J37/3056

摘要： There is provided a liquid metal ion beam irradiation device for irradiating a specific portion of a sample 6 with a prescribed liquid metal ion beam 80 as to form a cross section, and a gaseous ion beam irradiation device 7 for scanning a prescribed region (observation region) of the cross section using a gaseous ion beam focused to a prescribed diameter and removing a damaged layer on the prescribed region.

摘要翻译： 提供了一种液体金属离子束照射装置，用于用规定的液体金属离子束80照射样品6的特定部分以形成横截面;以及气体离子束照射装置7，用于扫描规定区域（观察区域 ）使用聚焦到规定直径的气体离子束并去除规定区域上的损伤层。

公开(公告)号：US06838685B1

公开(公告)日：2005-01-04

申请号：US10629217

申请日：2003-07-29

申请人： Toshio Kodama ,  Masakatsu Hasuda ,  Toshiaki Fujii ,  Kouji Iwasaki ,  Yasuhiko Sugiyama ,  Yasuyuki Takagi

发明人： Toshio Kodama ,  Masakatsu Hasuda ,  Toshiaki Fujii ,  Kouji Iwasaki ,  Yasuhiko Sugiyama ,  Yasuyuki Takagi

IPC分类号： G01N1/28 ,  G01N1/32 ,  H01J37/26 ,  H01J37/305 ,  H01J37/31 ,  H01J37/317

CPC分类号： H01J37/3056 ,  G01N1/32 ,  H01J2237/2007 ,  H01J2237/20214 ,  H01J2237/31745 ,  H01J2237/31749

摘要： An ion beam processing device has a sample holder for fixing a sample on which a section has been formed by irradiation of a specified focused ion beam from a surface side, and gas ion beam irradiation device for irradiating a gas ion beam to a region of the sample fixing using the holder member that contains the section to remove a damage layer on the section. The gas ion beam from the gas ion beam irradiation device irradiates the section from a rear surface side of the sample at a specified incident angle.

公开(公告)号：US20050236587A1

公开(公告)日：2005-10-27

申请号：US10520982

申请日：2003-07-09

申请人： Toshio Kodama ,  Masakatsu Hasuda ,  Toshiaki Fujii ,  Kouji Iwasaki ,  Yasuhiko Sugiyama ,  Yasuyuki Takagi

发明人： Toshio Kodama ,  Masakatsu Hasuda ,  Toshiaki Fujii ,  Kouji Iwasaki ,  Yasuhiko Sugiyama ,  Yasuyuki Takagi

IPC分类号： G01N1/32 ,  G01N1/28 ,  G01N1/34 ,  G21K5/08 ,  H01J37/20 ,  H01J37/30 ,  H01J37/305 ,  H01L21/302 ,  G21K5/10

CPC分类号： H01J37/3056 ,  G01N1/32 ,  H01J2237/31745 ,  H01J2237/31749

摘要： An apparatus has a holder member (21) which holds a sample (3), and a removing beam source (13) which irradiates an inert ion beam onto a cross section (4) of the sample (3) held by a holder member (21) and removes a fracture layer on the cross section (4). Then, the removing beam source (13) is disposed on the holding end side of the sample (3) with respect to the normal L of the cross section (4) so that the irradiating direction of the inert ion beam is tilted at the tilt angle θ to the normal L with respect to the cross section (4).

摘要翻译： 一种装置具有保持样品（3）的保持器构件（21）和将惰性离子束照射到由保持器构件保持的样品（3）的横截面（4）上的去除束源（13） 21）并且去除横截面（4）上的断裂层。 然后，移除光束源（13）相对于截面（4）的法线L配置在样品（3）的保持端侧，使得惰性离子束的照射方向倾斜 相对于横截面（4）的角度θ相对于法线L。

公开(公告)号：US07297944B2

公开(公告)日：2007-11-20

申请号：US10520982

申请日：2003-07-09

申请人： Toshio Kodama ,  Masakatsu Hasuda ,  Toshiaki Fuji ,  Kouji Iwasaki ,  Yasuhiko Sugiyama ,  Yasuyuki Takagi

发明人： Toshio Kodama ,  Masakatsu Hasuda ,  Toshiaki Fuji ,  Kouji Iwasaki ,  Yasuhiko Sugiyama ,  Yasuyuki Takagi

IPC分类号： H01J37/30 ,  H01J37/317 ,  G01N1/28 ,  H01J37/20

CPC分类号： H01J37/3056 ,  G01N1/32 ,  H01J2237/31745 ,  H01J2237/31749

摘要： An apparatus has a holder member (21) which holds a sample (3), and a removing beam source (13) which irradiates an inert ion beam onto a cross section (4) of the sample (3) held by a holder member (21) and removes a fracture layer on the cross section (4). Then, the removing beam source (13) is disposed on the holding end side of the sample (3) with respect to the normal L of the cross section (4) so that the irradiating direction of the inert ion beam is tilted at the tilt angle θ to the normal L with respect to the cross section (4).

摘要翻译： 一种装置具有保持样品（3）的保持器构件（21）和将惰性离子束照射到由保持器构件保持的样品（3）的横截面（4）上的去除束源（13） 21）并且去除横截面（4）上的断裂层。 然后，移除光束源（13）相对于截面（4）的法线L配置在样品（3）的保持端侧，使得惰性离子束的照射方向倾斜 相对于横截面（4）的角度θ相对于法线L。

公开(公告)号：US20100176296A1

公开(公告)日：2010-07-15

申请号：US12733089

申请日：2008-08-06

申请人： Takashi Kaito ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

发明人： Takashi Kaito ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

IPC分类号： H01J37/30 ,  H01J27/02 ,  H01J37/08 ,  H01J37/26

CPC分类号： H01J37/3056 ,  G01N1/286 ,  G01N1/32 ,  G03F1/74 ,  G03F1/84 ,  H01J37/08 ,  H01J37/3005 ,  H01J2237/0805 ,  H01J2237/0807 ,  H01J2237/31745

摘要： A composite focused ion beam device includes a first ion beam irradiation system 10 including a liquid metal ion source for generating a first ion, and a second ion beam irradiation system 20 including a gas field ion source for generating a second ion, and a beam diameter of the second ion beam 20A emitted from the second ion beam irradiation system 20 is less than that of the first ion beam 10A emitted from the first ion beam irradiation system 10.

摘要翻译： 复合聚焦离子束装置包括：第一离子束照射系统10，其包括用于产生第一离子的液态金属离子源;以及第二离子束照射系统20，其包括用于产生第二离子的气体场离子源， 从第二离子束照射系统20发射的第二离子束20A的距离小于从第一离子束照射系统10发射的第一离子束10A的离子束。

公开(公告)号：US08269194B2

公开(公告)日：2012-09-18

申请号：US12733089

申请日：2008-08-06

申请人： Takashi Kaito ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

发明人： Takashi Kaito ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

IPC分类号： H01J49/00

CPC分类号： H01J37/3056 ,  G01N1/286 ,  G01N1/32 ,  G03F1/74 ,  G03F1/84 ,  H01J37/08 ,  H01J37/3005 ,  H01J2237/0805 ,  H01J2237/0807 ,  H01J2237/31745

摘要： A composite focused ion beam device has a sample stage for supporting a sample, a first ion beam irradiation system that irradiates a first ion beam for processing the sample, and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a liquid metal ion source that generates first ions for forming the first ion beam. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. The first ion beam irradiated by the first ion beam irradiation system has a first beam diameter and the second ion beam irradiated by the second ion beam irradiation system has a second beam diameter smaller than the first beam diameter. The first and second ion beam irradiation systems are disposed relative to the sample stage so that axes of the first and second ion beams are orthogonal to a tilt axis of the sample stage.

摘要翻译： 复合聚焦离子束装置具有用于支撑样品的样品台，照射用于处理样品的第一离子束的第一离子束照射系统和照射第二离子束以用于处理或观察样品的第二离子束照射系统 样品。 第一离子束照射系统具有产生用于形成第一离子束的第一离子的液态金属离子源。 第二离子束照射系统具有产生用于形成第二离子束的第二离子的气体场离子源。 由第一离子束照射系统照射的第一离子束具有第一光束直径，并且由第二离子束照射系统照射的第二离子束具有小于第一光束直径的第二光束直径。 第一和第二离子束照射系统相对于样品台设置，使得第一和第二离子束的轴线垂直于样品台的倾斜轴。

公开(公告)号：US06489612B1

公开(公告)日：2002-12-03

申请号：US09701606

申请日：2001-01-30

申请人： Toshio Kodama ,  Yasuhiko Sugiyama ,  Toshiaki Fujii

发明人： Toshio Kodama ,  Yasuhiko Sugiyama ,  Toshiaki Fujii

IPC分类号： H01J3728

CPC分类号： G01N23/2258 ,  G01B15/02 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/2814 ,  H01J2237/30466

摘要： A thin film is etched by irradiating charged particles to a surface of the thin film. An etching time of the thin film is measured by observing a change in intensity of secondary charged particles emitted by etched portions of the thin film. A thickness of the thin film is calculated in accordance with the measured etching time.

摘要翻译： 通过将带电粒子照射到薄膜的表面来蚀刻薄膜。 通过观察由薄膜的蚀刻部分发射的二次带电粒子的强度变化来测量薄膜的蚀刻时间。 根据测量的蚀刻时间计算薄膜的厚度。

公开(公告)号：US08274063B2

公开(公告)日：2012-09-25

申请号：US12733091

申请日：2008-08-06

申请人： Takashi Kaito ,  Yoshitomo Nakagawa ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

发明人： Takashi Kaito ,  Yoshitomo Nakagawa ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

IPC分类号： H01J49/00

CPC分类号： H01J37/08 ,  G01N1/04 ,  G01N1/06 ,  H01J37/3005 ,  H01J37/3056 ,  H01J2237/0807 ,  H01J2237/0817 ,  H01J2237/31745

摘要： A composite focused ion beam device has a first ion beam irradiation system that irradiates a first ion beam for processing a sample and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a plasma type gas ion source that generates first ions for forming the first ion beam, each of the first ions having a first mass. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. Each of the second ions has a second mass smaller than that of the first mass.

摘要翻译： 复合聚焦离子束装置具有照射用于处理样品的第一离子束的第一离子束照射系统和照射第二离子束用于处理或观察样品的第二离子束照射系统。 第一离子束照射系统具有产生用于形成第一离子束的第一离子的等离子体型气体离子源，每个第一离子具有第一质量。 第二离子束照射系统具有产生用于形成第二离子束的第二离子的气体场离子源。 每个第二离子具有比第一质量小的第二质量。

公开(公告)号：US5438197A

公开(公告)日：1995-08-01

申请号：US272545

申请日：1994-07-11

申请人： Toshiaki Fujii ,  Yasuhiko Sugiyama

发明人： Toshiaki Fujii ,  Yasuhiko Sugiyama

IPC分类号： G01Q90/00 ,  H01J37/244 ,  H01J37/30 ,  H01J37/28

CPC分类号： H01J37/244 ,  H01J37/3005 ,  H01J2237/2448

摘要： A focussed ion-beam apparatus, to realize the simultaneous observation of both the brighter area and the darker area on the sample, which are generated because of the difference in the generation efficiency of the secondary charged particle due to the ion-beam irradiation. According to the result in the comparison of the output signal from the secondary charged particle detector with the reference voltage, to optimize the signal above as the input signal for the image display. To realize the simultaneous observation of both the brighter area and the darker area of the sample.

摘要翻译： 一种聚焦离子束装置，用于实现由于离子束照射引起的二次带电粒子的产生效率的差异而产生的样品上较亮区域和较暗区域的同时观察。 根据将二次带电粒子检测器的输出信号与参考电压进行比较的结果，优化上述作为图像显示输入信号的信号。 实现同时观察样品的较亮区域和较暗区域。