公开(公告)号：US06703667B2

公开(公告)日：2004-03-09

申请号：US10303024

申请日：2002-11-25

申请人： Koichiro Ishibashi ,  Shuji Ikeda ,  Harumi Wakimoto ,  Kenichi Kuroda

发明人： Koichiro Ishibashi ,  Shuji Ikeda ,  Harumi Wakimoto ,  Kenichi Kuroda

IPC分类号： H01L2976

CPC分类号： H01L27/092

摘要： The metal layers embedded into the contact holes of various kinds in shape are used as the lines and are employed as the lines for controlling the substrate bias. The first-layer metal line layers are made thin so as to be also employed as the lines for controlling the substrate bias. Moreover, the second-layer metal line layers are employed as the copper line layers. Thereby, a semiconductor integrated circuit which allows a high-speed and low-power operation is provided with a small area and without increasing the number of the masks.

公开(公告)号：US06686108B2

公开(公告)日：2004-02-03

申请号：US09964341

申请日：2001-09-28

申请人： Osamu Inoue ,  Norio Hasegawa ,  Shuji Ikeda

发明人： Osamu Inoue ,  Norio Hasegawa ,  Shuji Ikeda

IPC分类号： G03F900

CPC分类号： G03F1/32 ,  G03F1/36 ,  G03F7/70125 ,  Y10S430/146

摘要： On the occasion of the aligning process to transfer a predetermined pattern to a semiconductor wafer by irradiating a photoresist on the semiconductor wafer with an aligning laser beam of the modified lighting via a photomask MK, the photomask MK allocating, to provide periodicity, the main apertures to transfer the predetermined pattern as the apertures formed by removing a part of the half-tone film on the mask substrate and the auxiliary apertures not resolved on the semiconductor wafer as the apertures formed by removing a part of the half-tone film is used to improve the resolution of the pattern.

摘要翻译： 在通过经由光掩模MK照射经修改的照明的定向激光束在半导体晶片上照射光致抗蚀剂以将预定图案转印到半导体晶片的对准处理的情况下，光掩模MK分配以提供周期性的主孔 通过去除掩模基板上的半色调膜的一部分而形成的孔，并且通过将半色调膜的一部分形成的孔用于 提高模式的分辨率。

公开(公告)号：US06677649B2

公开(公告)日：2004-01-13

申请号：US09565535

申请日：2000-05-05

申请人： Kenichi Osada ,  Masataka Minami ,  Shuji Ikeda ,  Koichiro Ishibashi

发明人： Kenichi Osada ,  Masataka Minami ,  Shuji Ikeda ,  Koichiro Ishibashi

IPC分类号： H01L2976

CPC分类号： H01L27/1104 ,  G11C11/412 ,  G11C11/417 ,  H01L27/11 ,  H01L29/4916 ,  H01L29/783 ,  Y10S257/904

摘要： Prior known static random access memory (SRAM) cells are required that a diffusion layer be bent into a key-like shape in order to make electrical contact with a substrate with a P-type well region formed therein, which would result in a decrease in asymmetry leading to occurrence of a problem as to the difficulty in micro-patterning. To avoid this problem, the P-type well region in which an inverter making up an SRAM cell is formed is subdivided into two portions, which are disposed on the opposite sides of an N-type well region NW1 and are formed so that a diffusion layer forming a transistor has no curvature while causing the layout direction to run in a direction parallel to well boundary lines and bit lines. At intermediate locations of an array, regions for use in supplying power to the substrate are formed in parallel to word lines in such a manner that one regions is provided per group of thirty two memory cell rows or sixty four cell rows.

摘要翻译： 现有的已知的静态随机存取存储器（SRAM）单元需要将扩散层弯曲成键状形状，以便与其中形成有P型阱区的衬底进行电接触，这将导致 不对称性导致了微图案化困难的问题的发生。 为了避免这个问题，构成SRAM单元的逆变器的P型阱区被细分成两部分，它们设置在N型阱区NW1的相对侧上，并形成为扩散 形成晶体管的层没有曲率，同时使得布局方向在平行于阱边界线和位线的方向上运行。 在阵列的中间位置处，以与字线平行的方式形成用于向基板供电的区域，以每组三十二个存储单元行或六十四个单元行提供一个区域。

公开(公告)号：US06569742B1

公开(公告)日：2003-05-27

申请号：US09471321

申请日：1999-12-23

申请人： Yasuhiro Taniguchi ,  Shoji Shukuri ,  Kenichi Kuroda ,  Shuji Ikeda ,  Takashi Hashimoto

发明人： Yasuhiro Taniguchi ,  Shoji Shukuri ,  Kenichi Kuroda ,  Shuji Ikeda ,  Takashi Hashimoto

IPC分类号： H01L21336

CPC分类号： H01L27/0922 ,  H01L21/26513 ,  H01L21/823418 ,  H01L21/823468 ,  H01L21/823814 ,  H01L21/823835 ,  H01L21/823857 ,  H01L21/823864 ,  H01L27/105 ,  H01L27/10814 ,  H01L27/10894 ,  H01L27/11546 ,  H01L29/1083 ,  H01L29/665 ,  H01L29/7833 ,  H01L29/7835 ,  Y10S438/981

摘要： A MISFET capable of a high speed operation includes a metal silicide layer in a high concentration region aligned with a gate side wall layer on a self-alignment basis. A MISFET which can be driven at a high voltage includes an LDD portion having a width greater than the width of the side wall layer, a high concentration region in contact with the LDD portion and a metal silicide layer in the high concentration region.

摘要翻译： 能够进行高速运转的MISFET包括在自对准的基础上与栅极侧壁层对准的高浓度区域的金属硅化物层。 可以以高电压驱动的MISFET包括具有大于侧壁层的宽度的宽度的LDD部分，与LDD部分接触的高浓度区域和高浓度区域中的金属硅化物层。

公开(公告)号：US06562695B1

公开(公告)日：2003-05-13

申请号：US09889018

申请日：2001-07-10

申请人： Norio Suzuki ,  Hiroyuki Ichizoe ,  Masayuki Kojima ,  Keiji Okamoto ,  Shinichi Horibe ,  Kozo Watanabe ,  Yasuko Yoshida ,  Shuji Ikeda ,  Akira Takamatsu ,  Norio Ishitsuka ,  Atsushi Ogishima ,  Maki Shimoda

发明人： Norio Suzuki ,  Hiroyuki Ichizoe ,  Masayuki Kojima ,  Keiji Okamoto ,  Shinichi Horibe ,  Kozo Watanabe ,  Yasuko Yoshida ,  Shuji Ikeda ,  Akira Takamatsu ,  Norio Ishitsuka ,  Atsushi Ogishima ,  Maki Shimoda

IPC分类号： H01L2176

CPC分类号： H01L21/76229 ,  H01L21/76224 ,  H01L21/76232 ,  H01L27/10852 ,  H01L28/91

摘要： Grooves are defined in a substrate having device isolation regions by dry etching using silicon nitride films and side wall spacers as masks. Thereafter, the side wall spacers lying on side walls of the silicon nitride films are removed and the substrate is subjected to thermal oxidation, whereby the surface of the substrate at a peripheral portion of each active region is subjected to so-called round processing so as to have a sectional shape having a convex rounded shape.

摘要翻译： 通过使用氮化硅膜和侧壁间隔物作为掩模的干蚀刻将沟槽限定在具有器件隔离区的衬底中。 此后，除去位于氮化硅膜侧壁上的侧壁隔离物，并对衬底进行热氧化，由此在每个有源区的周边部分的衬底表面进行所谓的圆形处理，以便 具有凸形圆形的截面形状。

公开(公告)号：US06512245B2

公开(公告)日：2003-01-28

申请号：US09859045

申请日：2001-05-17

申请人： Shuji Ikeda ,  Satoshi Meguro ,  Kyoichiro Asayama ,  Eri Fujita ,  Koichiro Ishibashi ,  Toshiro Aoto ,  Sadayuki Morita ,  Atsuyoshi Koike ,  Masayuki Kojima ,  Yasuo Kiguchi ,  Kazuyuki Suko ,  Fumiyuki Kanai ,  Naotaka Hashimoto ,  Toshiaki Yamanaka

发明人： Shuji Ikeda ,  Satoshi Meguro ,  Kyoichiro Asayama ,  Eri Fujita ,  Koichiro Ishibashi ,  Toshiro Aoto ,  Sadayuki Morita ,  Atsuyoshi Koike ,  Masayuki Kojima ,  Yasuo Kiguchi ,  Kazuyuki Suko ,  Fumiyuki Kanai ,  Naotaka Hashimoto ,  Toshiaki Yamanaka

IPC分类号： H01L2972

CPC分类号： H01L27/11 ,  H01L27/1104 ,  Y10S257/903 ,  Y10S257/904

摘要： A static random access memory comprising memory cells each composed of transfer MISFETs controlled by word lines and of a flip-flop circuit made of driver MISFETs and load MISFETs. The top of the load MISFETs is covered with supply voltage lines so that capacitor elements of a stacked structure are formed between the gate electrodes of the load MISFETs and the supply voltage lines.

摘要翻译： 一种静态随机存取存储器，包括由字线控制的转移MISFET和由驱动器MISFET和负载MISFET构成的触发电路组成的存储单元。 负载MISFET的顶部覆盖有电源电压线，使得层叠结构的电容器元件形成在负载MISFET的栅电极和电源电压线之间。

公开(公告)号：US06245611B1

公开(公告)日：2001-06-12

申请号：US09434385

申请日：1999-11-05

申请人： Naotaka Hashimoto ,  Yutaka Hoshino ,  Shuji Ikeda

发明人： Naotaka Hashimoto ,  Yutaka Hoshino ,  Shuji Ikeda

IPC分类号： H01L218244

CPC分类号： H01L27/11 ,  G11C11/4125 ,  H01L23/5222 ,  H01L27/0207 ,  H01L27/1104 ,  H01L27/1112 ,  H01L2924/0002 ,  Y10S257/903 ,  H01L2924/00

摘要： In a complete CMOS SRAM having a memory cell composed of six MISFETs formed over a substrate, a capacitor element having a stack structure is formed of a lower electrode covering the memory cell, an upper electrode, and a capacitor insulating film (dielectric film) interposed between the lower electrode and the upper electrode. One electrode (the lower electrode) of the capacitor element is connected to one storage node of a flip-flop circuit, and the other electrode (the upper electrode) is connected to the other storage node. As a result, the storage node capacitance of the memory cell of the SRAM is increased to improve the soft error resistance.

摘要翻译： 在具有由衬底上形成的六个MISFET构成的存储单元的完整CMOS SRAM中，具有堆叠结构的电容器元件由覆盖存储单元的下电极，上电极和插入了电容器绝缘膜（电介质膜）的电极形成 在下电极和上电极之间。 电容器元件的一个电极（下电极）连接到触发器电路的一个存储节点，另一个电极（上电极）连接到另一个存储节点。 结果，SRAM的存储单元的存储节点电容增加，以提高软错误电阻。

公开(公告)号：US5731219A

公开(公告)日：1998-03-24

申请号：US458616

申请日：1995-06-02

申请人： Shuji Ikeda ,  Satoshi Meguro ,  Soichiro Hashiba ,  Isamu Kuramoto ,  Atsuyoshi Koike ,  Katsuro Sasaki ,  Koichiro Ishibashi ,  Toshiaki Yamanaka ,  Naotaka Hashimoto ,  Nobuyuki Moriwaki ,  Shigeru Takahashi ,  Atsushi Hiraishi ,  Yutaka Kobayashi ,  Seigou Yukutake

发明人： Shuji Ikeda ,  Satoshi Meguro ,  Soichiro Hashiba ,  Isamu Kuramoto ,  Atsuyoshi Koike ,  Katsuro Sasaki ,  Koichiro Ishibashi ,  Toshiaki Yamanaka ,  Naotaka Hashimoto ,  Nobuyuki Moriwaki ,  Shigeru Takahashi ,  Atsushi Hiraishi ,  Yutaka Kobayashi ,  Seigou Yukutake

IPC分类号： H01L27/11 ,  H01L21/70

CPC分类号： H01L27/11 ,  H01L27/1104 ,  Y10S257/903 ,  Y10S257/904

摘要： Herein disclosed is a semiconductor integrated circuit device comprising an SRAM having its memory cell composed of transfer MISFETs to be controlled through word lines and drive MISFETs, and a method of forming this device. The gate electrodes of the drive MISFETs and of the transfer MISFETs of the memory cell, and the word lines, are individually formed of different conductive layers. The two transfer MISFETs of the memory cell have their individual gate electrodes connected with two respective word lines spaced from each other and extended in an identical direction. The source line is formed of a conductive layer identical to that of the word line. An oxidation resisting film is formed on the gate electrodes of the drive MISFETs so as to reduce stress caused by oxidization of edge portions of these gate electrodes, and to reduce a resulting leakage current. A thickness of an oxide film formed on gate electrodes of the transfer MISFETs and word lines is thicker than an oxide film formed on gate electrodes of the drive MISFETs, so that data line pads can be formed in self-alignment with the oxide film and side wall spacers on the gate electrodes of the transfer MISFETs.

摘要翻译： 这里公开了一种半导体集成电路器件，其特征在于包括SRAM，其SRAM具有通过字线和驱动MISFET来控制的转移MISFET构成的存储单元，以及形成该器件的方法。 驱动MISFET的栅电极和存储单元的转移MISFET以及字线分别由不同的导电层形成。 存储器单元的两个转移MISFET的各自的栅极电极与彼此间隔开并沿相同方向延伸的两个相应字线连接。 源极线由与字线的导电层相同的导电层形成。 在驱动MISFET的栅电极上形成抗氧化膜，以减少由这些栅电极的边缘部分的氧化引起的应力，并减少产生的漏电流。 形成在转移MISFET和字线的栅电极上的氧化膜的厚度比形成在驱动MISFET的栅电极上的氧化膜厚，使得数据线焊盘可以形成为与氧化膜和侧面自对准 传输MISFET的栅电极上的壁间隔物。

公开(公告)号：US5656836A

公开(公告)日：1997-08-12

申请号：US460129

申请日：1995-06-02

申请人： Shuji Ikeda ,  Satoshi Meguro ,  Soichiro Hashiba ,  Isamu Kuramoto ,  Atsuyoshi Koike ,  Katsuro Sasaki ,  Koichiro Ishibashi ,  Toshiaki Yamanaka ,  Naotaka Hashimoto ,  Nobuyuki Moriwaki ,  Shigeru Takahashi ,  Atsushi Hiraishi ,  Yutaka Kobayashi ,  Seigou Yukutake

发明人： Shuji Ikeda ,  Satoshi Meguro ,  Soichiro Hashiba ,  Isamu Kuramoto ,  Atsuyoshi Koike ,  Katsuro Sasaki ,  Koichiro Ishibashi ,  Toshiaki Yamanaka ,  Naotaka Hashimoto ,  Nobuyuki Moriwaki ,  Shigeru Takahashi ,  Atsushi Hiraishi ,  Yutaka Kobayashi ,  Seigou Yukutake

IPC分类号： H01L27/11 ,  H01L27/108 ,  H01L29/76

CPC分类号： H01L27/11 ,  H01L27/1104 ,  Y10S257/903 ,  Y10S257/904

摘要： Herein disclosed is a semiconductor integrated circuit device comprising a SRAM having its memory cell composed of transfer MISFETs to be controlled through word lines and drive MISFETs. The gate electrodes of the drive MISFETs and the gate electrodes of the transfer MISFETs of the memory cell, and the word lines are individually formed of different conductive layers. The drive MISFETs and the transfer MISFETs are individually arranged to cross each other in the gate length direction. The word lines are extended in the gate length direction of the gate electrodes of the drive MISFETs and caused to cross the gate electrodes of the drive MISFETs partially.The two transfer MISFETs of the memory cell have their individual gate electrodes connected-with two respective word lines spaced from each other and extended in an identical direction. The region defined by the two word lines is arranged therein with the two drive MISFETs and the source lines.

摘要翻译： 这里公开了一种半导体集成电路器件，其包括具有其存储单元的SRAM，SRAM由通过字线控制的转移MISFET和驱动MISFET构成。 驱动MISFET的栅电极和存储单元的转移MISFET的栅电极和字线分别由不同的导电层形成。 驱动MISFET和转移MISFET分别布置成在栅极长度方向上彼此交叉。 字线在驱动MISFET的栅电极的栅极长度方向上延伸，并且部分地与驱动MISFET的栅电极交叉。 存储单元的两个转移MISFET具有彼此间隔开并沿相同方向延伸的两个相应字线连接的各自的栅电极。 由两个字线限定的区域配置有两个驱动MISFET和源极线。

公开(公告)号：US5572480A

公开(公告)日：1996-11-05

申请号：US459961

申请日：1995-06-02

申请人： Shuji Ikeda ,  Satoshi Meguro ,  Soichiro Hashiba ,  Isamu Kuramoto ,  Atsuyoshi Koike ,  Katsuro Sasaki ,  Koichiro Ishibashi ,  Toshiaki Yamanaka ,  Naotaka Hashimoto ,  Nobuyuki Moriwaki ,  Shigeru Takahashi ,  Atsushi Hiraishi ,  Yutaka Kobayashi ,  Seigou Yukutake

发明人： Shuji Ikeda ,  Satoshi Meguro ,  Soichiro Hashiba ,  Isamu Kuramoto ,  Atsuyoshi Koike ,  Katsuro Sasaki ,  Koichiro Ishibashi ,  Toshiaki Yamanaka ,  Naotaka Hashimoto ,  Nobuyuki Moriwaki ,  Shigeru Takahashi ,  Atsushi Hiraishi ,  Yutaka Kobayashi ,  Seigou Yukutake

IPC分类号： H01L27/11 ,  G11C8/00

CPC分类号： H01L27/11 ,  H01L27/1104 ,  Y10S257/903

摘要： Herein disclosed is a semiconductor integrated circuit device comprising a SRAM having its memory cell composed of transfer MISFETs to be controlled through word lines and drive MISFETs. The gate electrodes of the drive MISFETs and the gate electrodes of the transfer MISFETs of the memory cell, and the word lines are individually formed of different conductive layers. The drive MISFETs and the transfer MISFETs are individually arranged to cross each other in the gate length direction. The word lines are extended in the gate length direction of the gate electrodes of the drive MISFETs and caused to cross the gate electrodes of the drive MISFETs partially.

摘要翻译： 这里公开了一种半导体集成电路器件，其包括具有其存储单元的SRAM，SRAM由通过字线控制的转移MISFET和驱动MISFET构成。 驱动MISFET的栅电极和存储单元的转移MISFET的栅电极和字线分别由不同的导电层形成。 驱动MISFET和转移MISFET分别布置成在栅极长度方向上彼此交叉。 字线在驱动MISFET的栅电极的栅极长度方向上延伸，并且部分地与驱动MISFET的栅电极交叉。