公开(公告)号：US07705962B2

公开(公告)日：2010-04-27

申请号：US11330394

申请日：2006-01-12

申请人： Nicolaas Rudolf Kemper ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Nicolaas Ten Kate ,  Frits Van Der Meulen

发明人： Nicolaas Rudolf Kemper ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Nicolaas Ten Kate ,  Frits Van Der Meulen

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/32

CPC分类号： G03F7/70866 ,  G03F7/70341

摘要： A liquid confinement structure configured to contain a liquid in a space between a projection system and a substrate has a recess in its lower surface which is open to both a relatively low pressure source and a relatively high pressure source and through which liquid and/or gas from between the liquid confinement structure and the substrate is extracted.

摘要翻译： 构造成在投影系统和基板之间的空间中容纳液体的液体限制结构在其下表面中具有凹槽，该凹部对于相对低的压力源和相对高的压力源是开放的，并且液体和/或气体 从液体限制结构和基板之间提取。

公开(公告)号：US20100085545A1

公开(公告)日：2010-04-08

申请号：US12506565

申请日：2009-07-21

申请人： Daniel Jozef Maria DIRECKS ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Danny Maria Hubertus Philips ,  Michel Riepen ,  Clemens Johannes Gerardus Van Den Dungen ,  Adrianes Johannes Baeten ,  Fabrizio Evangelista

发明人： Daniel Jozef Maria DIRECKS ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Danny Maria Hubertus Philips ,  Michel Riepen ,  Clemens Johannes Gerardus Van Den Dungen ,  Adrianes Johannes Baeten ,  Fabrizio Evangelista

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70991

摘要： A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.

摘要翻译： 公开了一种用于光刻设备的流体处理结构。 流体处理结构具有以平面方式排成一行的多个开口。 流体处理结构被配置为使得开口在使用中朝向相对表面定向，面对表面是基底和/或基底台。 衬底台被配置为支撑衬底。 开口线的外侧是阻尼器。 阻尼器可以具有沿着开口线变化的宽度。 阻尼器宽度限定在开口线和相对的阻尼器边缘之间。

公开(公告)号：US07522261B2

公开(公告)日：2009-04-21

申请号：US10948749

申请日：2004-09-24

申请人： Carlo Cornelis Maria Luijten ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Martinus Hendrickus Antonius Leenders ,  Erik Roelof Loopstra ,  Bob Streefkerk ,  Marcel Beckers ,  Herman Boom ,  Richard Moerman

发明人： Carlo Cornelis Maria Luijten ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Martinus Hendrickus Antonius Leenders ,  Erik Roelof Loopstra ,  Bob Streefkerk ,  Marcel Beckers ,  Herman Boom ,  Richard Moerman

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/58 ,  G03B27/32

CPC分类号： G03F7/70341

摘要： An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.

摘要翻译： 浸没式光刻投影设备具有液体限制结构，其被配置为至少部分地将液体限制在投影系统和基板之间的空间上，所述约束结构在使用时具有缓冲表面，该缓冲表面位于基本上包括 衬底的上表面和保持衬底的衬底台，以限定具有流动阻力的通道。 在缓冲表面设置凹部，当使用时凹部通常充满浸没液体，以便当间隙在缓冲表面下移动时能够快速填充基板和基板台之间的间隙。 凹部可以是环形的或径向的，并且可以设置多个凹部。

公开(公告)号：US07136142B2

公开(公告)日：2006-11-14

申请号：US10852686

申请日：2004-05-25

申请人： Marcel Beckers ,  Ronald Johannes Hultermans ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Nicolaas Franciscus Koppelaars ,  Jan-Marius Schotsman ,  Ronald Van Der Ham ,  Johannes Antonius Maria Martina Van Uijtregt

发明人： Marcel Beckers ,  Ronald Johannes Hultermans ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Nicolaas Franciscus Koppelaars ,  Jan-Marius Schotsman ,  Ronald Van Der Ham ,  Johannes Antonius Maria Martina Van Uijtregt

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70933 ,  G03F7/70908

摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system to provide a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the beam with a pattern in its cross-section. The apparatus also includes a gas flushing device for flushing a substantially laminar flow of gas across the beam of radiation and/or along a surface of an optical component. The gas flushing device includes a single gas outlet that has an inner rim at a downstream end of the gas outlet. The inner rim defines a total gas outlet area. The gas outlet is provided with a laminator that has an effective area out of which, in use, the substantially laminar flow of gas flows. The laminator effective area includes material that has laminator openings and is at least as large as the total gas outlet area.

摘要翻译： 公开了一种光刻设备。 该装置包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于在其横截面中赋予光束图案。 该装置还包括用于冲洗基本层流的气体穿过辐射束和/或沿着光学部件的表面冲洗的气体冲洗装置。 气体冲洗装置包括单个气体出口，其在气体出口的下游端具有内缘。 内缘定义了总气体出口面积。 气体出口设置有层压机，其具有在使用中基本上层流的气体流动的有效区域。 层压机有效区域包括具有层压机开口并且至少与总气体出口面积一样大的材料。

公开(公告)号：US06995379B2

公开(公告)日：2006-02-07

申请号：US10458726

申请日：2003-06-11

申请人： Petrus Matthijs Henricus Vosters ,  Hernes Jacobs ,  Mark Van Heumen ,  Nicolaas Rudolf Kemper

发明人： Petrus Matthijs Henricus Vosters ,  Hernes Jacobs ,  Mark Van Heumen ,  Nicolaas Rudolf Kemper

IPC分类号： A61N5/00

CPC分类号： G03F7/70733 ,  G03F7/70716 ,  G03F7/70725

摘要： A lithographic projection apparatus in which a vacuum chamber provided with a vacuum generator constructed and arranged to generate a vacuum beam path for the projection beam, wherein the apparatus is provided with a collision protection apparatus for reducing the effects of a collision of an object table with the wall of the vacuum chamber or with another object table. These collisions may occur during a power failure or an error in a programmed control logic in a controller of the apparatus.

摘要翻译： 一种光刻投影装置，其中设置有真空发生器的真空室被构造和布置成产生用于投影光束的真空光束路径，其中该装置设置有防撞装置，用于减少对象台与 真空室的墙壁或另一个物体台。 这些碰撞可能在设备的控制器中的电源故障或编程控制逻辑的错误期间发生。

公开(公告)号：US09477158B2

公开(公告)日：2016-10-25

申请号：US11404101

申请日：2006-04-14

申请人： Nicolaas Rudolf Kemper ,  Marcel Beckers ,  Stefan Philip Christiaan Belfroid ,  Ferdy Migchelbrink ,  Sergei Shulepov

发明人： Nicolaas Rudolf Kemper ,  Marcel Beckers ,  Stefan Philip Christiaan Belfroid ,  Ferdy Migchelbrink ,  Sergei Shulepov

IPC分类号： G03F7/20

CPC分类号： G03F7/70875 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/709 ,  G03F7/70933

摘要： A plurality of extraction conduits are provided to remove immersion liquid into a chamber. The extraction conduits are arranged at different distances from a target portion of the substrate. From the chamber, a passage is provided to which a suction force is applied. When all the conduits are filled with immersion liquid, the extraction capacity will be greater than when one or more of the conduits comprise gas.

摘要翻译： 提供多个提取管道以将浸入液体移入室中。 提取管道布置在与基板的目标部分不同的距离处。 提供了一个通道，吸入力被施加到该通道上。 当所有导管充满浸没液体时，提取能力将大于当一个或多个导管包含气体时的提取能力。

公开(公告)号：US09329491B2

公开(公告)日：2016-05-03

申请号：US13168177

申请日：2011-06-24

申请人： Cédric Désiré Grouwstra ,  Nicolaas Rudolf Kemper ,  Norbertus Josephus Martinus Van Den Nieuwelaar ,  Dirk De Vries ,  Hua Li ,  Marinus Jochemsen

发明人： Cédric Désiré Grouwstra ,  Nicolaas Rudolf Kemper ,  Norbertus Josephus Martinus Van Den Nieuwelaar ,  Dirk De Vries ,  Hua Li ,  Marinus Jochemsen

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70775 ,  G03F7/70341 ,  G03F7/70725

摘要： A method of adjusting speed and/or routing of a part of a movement plan of a table under an immersion fluid supply system of a lithographic apparatus. The method includes splitting the movement plan of the table into a plurality of discrete movements; determining a risk of a bubble of a size greater than a certain size being present in immersion fluid through which a patterned beam of the lithographic apparatus will pass during a certain discrete movement by determining whether the immersion fluid supply system passes over a position at which immersion fluid leaked from the immersion fluid supply system is present; and adjusting the speed and/or routing of a part of the movement plan corresponding to (i) a discrete movement earlier than a discrete movement for which the risk of a bubble is determined, and/or (ii) a discrete movement for which the risk of a bubble is determined.

摘要翻译： 一种在光刻设备的浸没液体供应系统下调整桌子的运动计划的一部分的速度和/或路线的方法。 该方法包括将表的运动计划分成多个离散运动; 确定存在于浸没流体中的尺寸大于一定尺寸的气泡的风险，通过该浸入流体中的光刻设备的图案化束将在特定离散运动期间通过该气泡通过确定浸没流体供应系统是否经过浸没的位置 存在从浸没液体供应系统泄漏的液体; 以及调整所述运动计划的一部分的速度和/或路线，其对应于（i）比确定气泡风险的离散运动更早的离散运动，和/或（ii）离散运动， 确定泡沫的风险。

公开(公告)号：US20110199593A1

公开(公告)日：2011-08-18

申请号：US13024364

申请日：2011-02-10

申请人： Michel Riepen ,  Nicolaas Rudolf Kemper

发明人： Michel Riepen ,  Nicolaas Rudolf Kemper

IPC分类号： G03B27/52

CPC分类号： G03B27/52 ,  G03F7/70341

摘要： A meniscus pinning device has a plurality of openings through which liquid and gas from the environment are extracted. The openings are of an intermediate size, having a maximum cross-sectional dimension (e.g., diameter) in the range of from about 75 μm to about 150 μm.

摘要翻译： 弯液面钉扎装置具有多个开口，通过该开口提取来自环境的液体和气体。 开口具有中等尺寸，其最大横截面尺寸（例如，直径）在约75μm至约150μm的范围内。

公开(公告)号：US20090279063A1

公开(公告)日：2009-11-12

申请号：US12437466

申请日：2009-05-07

申请人： Michel Riepen ,  Nicolaas Rudolf Kemper ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Daniel Jozef Maria Direcks ,  Danny Maria Hubertus Philips ,  Arnold Jan Van Putten

发明人： Michel Riepen ,  Nicolaas Rudolf Kemper ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Daniel Jozef Maria Direcks ,  Danny Maria Hubertus Philips ,  Arnold Jan Van Putten

IPC分类号： G03B27/52

CPC分类号： G03B27/52 ,  G03F7/70341 ,  G03F7/70916

摘要： An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning device in an immersion hood or may be used in a drying device to remove a droplet from the substrate.

摘要翻译： 描述了一种浸没式光刻设备，其中液体去除装置被布置成从基板除去液体，例如， 在曝光期间，通过沿着一条线布置并与该线成角度的多个细长槽。 液体移除装置可以用作浸没罩中的弯月面钉扎装置，或者可以用于干燥装置中以从基底去除液滴。

公开(公告)号：US20080174750A1

公开(公告)日：2008-07-24

申请号：US12068071

申请日：2008-02-01

申请人： Michel Pieter Dansberg ,  Sebastiaan Maria Johannes Cornelissen ,  Henrikus Herman Marie Cox ,  Robert Johannes Petrus Van Diesen ,  Nicolaas Rudolf Kemper ,  Robert-Han Munnig-Schmidt ,  Harmen Klaas Van Der Schoot ,  Rob Jansen

发明人： Michel Pieter Dansberg ,  Sebastiaan Maria Johannes Cornelissen ,  Henrikus Herman Marie Cox ,  Robert Johannes Petrus Van Diesen ,  Nicolaas Rudolf Kemper ,  Robert-Han Munnig-Schmidt ,  Harmen Klaas Van Der Schoot ,  Rob Jansen

IPC分类号： G03B27/52

CPC分类号： G03F7/70933 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/7095

摘要： An apparatus is configured to position a workpiece. The apparatus includes a planar base, and a movable stage configured to support the workpiece. The stage is configured to be moved over the planar base. The apparatus also includes an actuator configured to move the stage, a contactless position measurer configured to measure a position of the stage, and a first pump configured to generate a conditioned gas flow in a volume between the measurer and the stage. The base includes a plurality of gas channels provided in the base that provide a path of the conditioned gas flow through the base.

摘要翻译： 一种装置构造成定位工件。 该装置包括平面基座和被配置为支撑工件的可移动台。 该台被配置成在平面底座上移动。 该装置还包括构造成移动台的致动器，被配置为测量台的位置的非接触位置测量器以及被配置为在测量器和台之间的体积中产生经调节的气流的第一泵。 底座包括设置在基座中的多个气体通道，其提供调节气体流经基座的路径。