摘要:
In the present invention, a plurality of exhaust paths connected to a plurality of cup bodies surrounding substrate holding portions respectively are joined together for common use, and the openings of exhaust rate adjustment sections provided on the exhaust paths are adjusted with reference to data in which combinations of the numbers of rotations of the substrate holding portions are associated with combinations of set exhaust rates of the exhaust paths when solution treatment is performed by rotating the substrate by the substrate holding portion. According to the present invention, the cup body can be exhausted at an intended exhaust rate at all times independently of the state where the substrate in which cup body is subjected to which process.
摘要:
In one embodiment, a coating and developing apparatus includes a processing block including a vertical stack of early-stage processing unit blocks; a vertical stack of later-stage processing unit blocks disposed laterally adjacent to respective ones of the early-stage processing unit blocks; a vertical stack of developing unit blocks stacked on the early-stage processing unit blocks; a vertical stack of auxiliary processing unit blocks disposed laterally adjacent to respective ones of the developing unit blocks; first transfer units, each of which are disposed between the laterally adjacent early-stage processing unit and later-stage processing unit; second transfer units, each of which is disposed between the laterally adjacent developing unit block and auxiliary processing unit block; and a auxiliary transfer mechanism for transferring a substrate between the first transfer units and between the second transfer units.
摘要:
A process block including a group of liquid-process related unit blocks, a first heating-process related block arranged on a carrier block side of the group of unit blocks, and a second heating-process related block arranged on an interface block side of the group of unit blocks. The group of liquid-process unit blocks includes doubled unit blocks for preprocessing for forming an antireflection film and a resist film, doubled unit blocks for post-processing for forming an upper layer film and performing a cleaning operation before exposure, and a unit block for developing. The first heating-process related block heats a substrate coated with a resist liquid and a substrate that has been developed. The second heating-process related block heats a substrate that has been exposed but is not yet developed, a substrate on which an antireflection film has been formed and a substrate on which an upper layer film has been formed.
摘要:
In one embodiment, a coating and developing apparatus includes a processing block including a vertical stack of early-stage processing unit blocks; a vertical stack of later-stage processing unit blocks disposed laterally adjacent to respective ones of the early-stage processing unit blocks; a vertical stack of developing unit blocks stacked on the early-stage processing unit blocks; a vertical stack of auxiliary processing unit blocks disposed laterally adjacent to respective ones of the developing unit blocks; first transfer units, each of which are disposed between the laterally adjacent early-stage processing unit and later-stage processing unit; second transfer units, each of which is disposed between the laterally adjacent developing unit block and auxiliary processing unit block; and a auxiliary transfer mechanism for transferring a substrate between the first transfer units and between the second transfer units.
摘要:
A coating and developing apparatus includes a processing block having at least one coating film-forming unit block stack and a vertically stacked developing unit block stack. Each unit block stack includes vertically stacked unit blocks, and each unit block includes processing modules containing liquid processing modules and heating modules. Each unit block includes a transport mechanism moveable along a transport passage from a carrier block side to an interface block side, to transport a substrate between the processing modules belonging to the unit block. Transfer units are provided on the carrier block sides of the coating film-forming unit blocks and the developing unit blocks respectively, for transferring a substrate to and from the transport mechanism of the associated coating film-forming or developing unit blocks. A first transfer mechanism transfers a substrate removed from a carrier to one of the transfer units associated with the coating film-forming unit blocks.
摘要:
A storage system includes plural types of storage devices that define a plurality of virtual volumes and a plurality of logical volumes. A storage controller is configured to manage the plurality of virtual volumes and the plurality of logical volumes, the plurality of virtual volumes defining first storage areas and the plurality of logical volumes defining second storage areas. A second storage area of the plurality of logical volumes is allocated to a first storage area of the plurality of virtual volumes. The storage controller is configured to determine whether data of a first storage area of a swap file is to be stored in the first tier storage device or the second tier storage device based on access information from an application server that manages a swap file information of the swap file.
摘要:
A process margin is improved and high connection reliability is obtained. Disclosed is an anisotropic conductive material including an adhesive composite and conductive particles dispersed in the adhesive composite, the adhesive composite containing a film forming resin, an ethylene vinyl acetate copolymer, a radical polymerizable resin, and a radical polymerization initiator, wherein the ethylene vinyl acetate copolymer to be used has a melt flow rate of not less than 400 g/10 min.
摘要:
A storage system comprises a plurality of hard disk drives and a storage controller providing a plurality of virtual volumes to a server and including a processor and a memory. The storage controller allocates pages of the plurality of virtual volumes to the plurality of hard disk drives in response to write requests. The storage controller controls to allocate outer sections of the plurality of hard disks to first addresses of the virtual volume and allocates inner sections of the plurality of hard disk drives to second addresses of the virtual volume, wherein the first addresses are lower than the second addresses.
摘要:
The present invention provides a computer system comprising a server and a storage system having a compression function, wherein the server includes a control unit and a cache, and the storage system has a storage area provided by a plurality of storage devices. When a designated data of a received read request is stored in the cache, the control unit of the server returns the stored data as a response to the read request, and when the designated data is not stored in the cache, the control unit acquires the designated data compressed via the compression function and stored in the storage area in the compressed state from the storage system, decompresses the acquired compression data, and returns the same as a response to the read request.
摘要:
The present invention calculates the power consumption of the storage system for each device which supplies power with a storage system, and controls the storage system to keep the power consumption not to exceed the upper limit. In order to achieve this, the power consumption of the chassis configuring the destination storage system is calculated with reference to the number of logical volumes configuring the pool which includes virtual logical volumes, and the logical volumes included in the source storage system are migrated to the virtual logical volumes included in the destination storage system, keeping the power consumption specified in advance per device supplying power to the chassis configuring the destination storage system not to exceed the upper limit value. (Refer to FIG. 27.)