公开(公告)号：US06861560B2

公开(公告)日：2005-03-01

申请号：US10609456

申请日：2003-06-27

Applicant: Andreas Walter ,  Ingo Gnüchtel ,  Anna Maltenberger ,  Recai Sezi ,  Horst Hartmann

Inventor： Andreas Walter ,  Ingo Gnüchtel ,  Anna Maltenberger ,  Recai Sezi ,  Horst Hartmann

IPC: C07C215/82 ,  C07B61/00 ,  C07C213/02 ,  C07C215/80 ,  C07C217/90 ,  C07C211/54 ,  C07C211/55

CPC classification number: C07C217/90 ,  C07C215/80 ,  C07C2603/24

Abstract: A bis-o-aminophenol has a formula I These bis-o-aminophenols permit the preparation of polybenzoxazoles stabilized at high temperatures. The bis-o-aminophenols are preferably prepared from the corresponding diols, which are first nitrosated. The nitroso compound is then reduced to the amino compound by hydrogenation with Pd/C and H2.

Abstract translation: 双邻氨基苯酚具有配方。这种双邻氨基苯酚允许制备在高温下稳定的聚苯并恶唑。 双邻氨基苯酚优选由相应的二醇制备，其首先被亚硝化。 然后通过用Pd / C和H 2氢化将亚硝基化合物还原成氨基化合物。

公开(公告)号：US06861479B2

公开(公告)日：2005-03-01

申请号：US10180438

申请日：2002-06-26

Applicant: Recai Sezi

Inventor： Recai Sezi

IPC: C08J9/26 ,  C09D5/25 ,  H01L21/312 ,  H01L21/316 ,  C08L59/00 ,  C08L67/00 ,  C08L69/00 ,  C08L71/00 ,  C08L77/06

CPC classification number: H01L21/02118 ,  C08J9/26 ,  C08J2201/046 ,  C08J2379/04 ,  H01L21/02203 ,  H01L21/02282 ,  H01L21/312 ,  H01L21/31695

Abstract: Production of a porous layer includes using a composition which includes a first polymer component and a second polymer component, the first polymer component being polyhydroxyamide and/or polybenzoxazole and stable at a temperature at which the second polymer component decomposes and volatilizes. If the composition is heated to the decomposition temperature of the second polymer component, the second component volatilizes and a porous layer that contains the first component remains.

Abstract translation: 多孔层的制造包括使用包含第一聚合物组分和第二聚合物组分的组合物，第一聚合物组分是聚羟基酰胺和/或聚苯并恶唑，并且在第二聚合物组分分解和挥发的温度下是稳定的。 如果将组合物加热至第二聚合物组分的分解温度，则第二组分挥发，并且残留含有第一组分的多孔层。

公开(公告)号：US06806344B2

公开(公告)日：2004-10-19

申请号：US10609460

申请日：2003-06-27

Applicant: Recai Sezi ,  Andreas Walter ,  Anna Maltenberger ,  Klaus Lowack

Inventor： Recai Sezi ,  Andreas Walter ,  Anna Maltenberger ,  Klaus Lowack

IPC: C08G7322

CPC classification number: C08G73/22 ,  C08G69/26 ,  C08G69/265 ,  C08G69/32 ,  H01B3/441 ,  H01L21/02118 ,  H01L21/02203 ,  H01L21/02282 ,  H01L21/76801

Abstract: Novel poly-o-hydroxyamides can be cyclized to give polybenzoxazoles which have a good diffusion barrier effect with respect to metals. The poly-o-hydroxyamides can be applied to a semiconductor substrate by customary techniques and converted into the polybenzoxazole in a simple manner by heating. This results in a good barrier layer with respect to diffusion of metals. This allows the diffusion barrier between conductor track and dielectric to be substantially dispensed.

Abstract translation: 可以使新的聚邻羟基酰胺环化，得到相对于金属具有良好扩散阻挡作用的聚苯并恶唑。 聚邻羟基酰胺可以通过常规技术应用于半导体衬底，并通过加热以简单的方式转化成聚苯并恶唑。 这导致相对于金属扩散的良好的阻挡层。 这允许基本上分配导体轨道和电介质之间的扩散阻挡层。

公开(公告)号：US06635410B2

公开(公告)日：2003-10-21

申请号：US10156484

申请日：2002-05-28

Applicant: Joerg Haussmann ,  Klaus Lowack ,  Wolfgang Radlik ,  Guenter Schmid ,  Recai Sezi

Inventor： Joerg Haussmann ,  Klaus Lowack ,  Wolfgang Radlik ,  Guenter Schmid ,  Recai Sezi

IPC: G03F700

CPC classification number: H05K3/185 ,  C23C18/1605 ,  H05K2203/0525

Abstract: A method for metallizing dielectrics includes applying a photosensitive dielectric to a substrate. The dielectric is then exposed to light through a mask, is seeded with a metal and is subjected to a temperature treatment. Afterwards, the dielectric is chemically metallized. Alternatively, the dielectric can be first be seeded with a metal after being applied to the substrate, and can then be exposed to light through a mask. Afterwards, excess seeding material is removed and the dielectric is chemically metallized.

公开(公告)号：US06599687B1

公开(公告)日：2003-07-29

申请号：US09156441

申请日：1998-09-18

Applicant: Ewald Günther ,  Recai Sezi ,  Michael Keitmann

Inventor： Ewald Günther ,  Recai Sezi ,  Michael Keitmann

IPC: G03C500

CPC classification number: H01L21/02118 ,  G03F7/0387 ,  G03F7/2024 ,  H01L21/02282 ,  H01L21/312 ,  H01L23/3171 ,  H01L2224/274 ,  H01L2924/01019 ,  H01L2924/10253 ,  H01L2924/12041 ,  Y10S430/143 ,  Y10S430/167 ,  H01L2924/00

Abstract: A process for producing structured or patterned protective and insulating layers includes applying a solution of a photosensitive polyhydroxyamide or polyhydroxyimide to a substrate and drying. The layer is patterned or structured by irradiation with UV light or X-rays through the use of a mask or by guidance of a UV or electron beam and by subsequent aqueous-alkali development. The patterned or structured layer is irradiated over the whole area with UV light and then tempered or heat-treated.

Abstract translation: 用于生产结构化或图案化的保护和绝缘层的方法包括将光敏聚羟基酰胺或聚羟基酰亚胺的溶液施加到基底上并干燥。 通过使用掩模或通过UV或电子束的引导以及随后的水 - 碱显影，通过用UV光或X射线照射来对该层进行图案化或结构化。 图案化或结构化层用UV光照射在整个区域上，然后进行回火或热处理。

公开(公告)号：US06320081B1

公开(公告)日：2001-11-20

申请号：US09161149

申请日：1998-09-24

Applicant: Michael Keitmann ,  Recai Sezi ,  Andreas Weber

Inventor： Michael Keitmann ,  Recai Sezi ,  Andreas Weber

IPC: C07C32124

CPC classification number: C07C205/38 ,  C07C205/37 ,  C07C323/09

Abstract: The invention relates to novel o-nitrophenol derivatives and o-nitrothiophenol derivatives of the following structure: where: A1 to A3 are—independently of one another—H, F, CH3, CF3, OCH3, OCF3, CH2CH3, CF2CF3, OCH2CH3 or OCF2CF3; T is O or S; R is an aliphatic or araliphatic radical; and R* is H or R.

Abstract translation: 本发明涉及以下结构的新型邻硝基苯酚衍生物和邻硝基苯硫酚衍生物：其中：A 1至A 3彼此独立地为-H，F，CH 3，CF 3，OCH 3，OCF 3，CH 2 CH 3，CF 2 CF 3，OCH 2 CH 3或OCF 2 CF 3 ; T为O或S; R是脂族或芳脂族基; 和R *是H或R.

公开(公告)号：US06156902A

公开(公告)日：2000-12-05

申请号：US161549

申请日：1998-09-24

Applicant: Recai Sezi ,  Michael Keitmann ,  Andreas Weber

Inventor： Recai Sezi ,  Michael Keitmann ,  Andreas Weber

IPC: C07D247/00 ,  C07C217/90 ,  C07C319/14 ,  C07C323/31 ,  C07D213/60 ,  C07D213/69 ,  C07D255/02 ,  C07D257/12 ,  C07D471/04 ,  C07D211/72 ,  C07C221/00

CPC classification number: C07D213/69 ,  C07C217/90

Abstract: The invention relates to novel bis-o-aminophenols, and bis-o-aminothiophenols of the following structure: ##STR1## where A.sup.1 to A.sup.3 are--independently of one another--H, CH.sub.3, OCH.sub.3, CH.sub.2 CH.sub.3, or OCH.sub.2 CH.sub.3T is O or S, andZ is a carbocyclic or heterocyclic aromatic radical.

Abstract translation: 本发明涉及以下结构的新型双邻氨基苯酚和双-O-氨基噻吩酚：其中A1至A3彼此独立地为H，CH3，OCH3，CH2CH3或OCH2CH3，T为O或S，以及 Z是碳环或杂环芳族基团。

公开(公告)号：US6096921A

公开(公告)日：2000-08-01

申请号：US388274

申请日：1999-09-01

Applicant: Recai Sezi ,  Michael Keitmann

Inventor： Recai Sezi ,  Michael Keitmann

IPC: C07C213/04 ,  C07B61/00 ,  C07C217/90 ,  C07D213/64 ,  C07D213/643 ,  C07D213/68 ,  C07C215/28 ,  C07C229/08 ,  C07C229/34 ,  C07C321/30

CPC classification number: C07D213/643 ,  C07C217/90 ,  C07D213/68

Abstract: The invention relates to novel o-aminophenolcarboxylic acids, and o-aminothiophenolcarboxylic acids of the following structure: ##STR1## where A.sup.1 to A.sup.7 are--independently of one another--H, F, CH.sub.3, CF.sub.3, OCH.sub.3, OCF.sub.3, CH.sub.2 CH.sub.3, CF.sub.2 CF.sub.3, OCH.sub.2 CH.sub.3 or OCF.sub.2 CF.sub.3, where at least one of the radicals A.sup.1 to A.sup.3 must be F or an F-containing group; T is O or S, and m is 0 or 1; and Z is a carbocyclic or heterocyclic aromatic radical.

Abstract translation: 本发明涉及以下结构的新型邻氨基苯酚羧酸和邻氨基苯硫酚羧酸：其中A1至A7彼此独立地为-H，F，CH3，CF3，OCH3，OCF3，CH2CH3，CF2CF3，OCH2CH3或OCF2CF3 其中基团A1至A3中的至少一个必须为F或含F的基团; T为O或S，m为0或1; Z是碳环或杂环芳族基团。

公开(公告)号：US5973202A

公开(公告)日：1999-10-26

申请号：US704064

申请日：1996-08-28

Applicant: Recai Sezi ,  Hellmut Ahne ,  Eva Rissel ,  Kurt Geibel

Inventor： Recai Sezi ,  Hellmut Ahne ,  Eva Rissel ,  Kurt Geibel

IPC: C08G69/26 ,  C08G69/28 ,  C08G69/32 ,  C08G73/22 ,  C08G75/32 ,  G03F7/037 ,  G03F7/038 ,  C07C231/02 ,  C08G63/00

CPC classification number: C08G75/32 ,  C08G69/32 ,  C08G73/22 ,  G03F7/0387

Abstract: In a process for the preparation of poly-o-hydroxyamides and poly-o-mercaptoamides, a bis-o-aminophenol or a bis-o-aminothiophenol is reacted with a dicarboxylic acid derivative of the following structure: ##STR1## with D=O, S, or NH and where R* is the parent body of the dicarboxylic acid and at least one of the groups R.sup.1 and R.sup.2 is CN or NO.sub.2.

Abstract translation: 在制备聚邻羟基酰胺和聚-O-巯基酰胺的方法中，将双邻氨基苯酚或双邻氨基苯硫酚与下列结构的二羧酸衍生物反应：用D = O，S 或NH，其中R *是二羧酸的母体，并且基团R 1和R 2中的至少一个是CN或NO 2。

公开(公告)号：US5760162A

公开(公告)日：1998-06-02

申请号：US703754

申请日：1996-08-27

Applicant: Recai Sezi ,  Hellmut Ahne ,  Roland Gestigkeit ,  Kurt Geibel

Inventor： Recai Sezi ,  Hellmut Ahne ,  Roland Gestigkeit ,  Kurt Geibel

IPC: C08G69/26 ,  C08G69/28 ,  C08G73/22 ,  C08G75/32 ,  G03F7/037 ,  G03F7/038 ,  C08G69/08 ,  C08G73/10

CPC classification number: G03F7/0387 ,  C08G73/22 ,  C08G75/32

Abstract: In a process for the preparation of poly-o-hydroxyamides and poly-o-mercaptoamides, a bis-o-aminophenol or a bis-o-aminothiophenol is reacted at a temperature of .ltoreq.0.degree. C. with a mixed dianhydride of a dicarboxylic acid and a sulfonic acid with the following structure: E--SO.sub.2 --O--CO--R*--CO--O--SO.sub.2 --E where E is an (optionally substituted) methyl, phenyl, or naphthyl group and R* is the parent body of the dicarboxylic acid.

Abstract translation: 在制备聚邻羟基酰胺和聚-O-巯基酰胺的方法中，将双邻氨基苯酚或双邻氨基苯硫酚在0℃的温度下与混合的二酐 具有以下结构的二羧酸和磺酸：E-SO 2 -O-CO-R * -CO-O-SO 2 -E其中E是（任选取代的）甲基，苯基或萘基，R *是 二元酸的父体。