公开(公告)号：US5079566A

公开(公告)日：1992-01-07

申请号：US594327

申请日：1990-10-09

申请人： Takashi Mori

发明人： Takashi Mori

IPC分类号： B41J2/335 ,  B41J2/355 ,  B41J35/00

CPC分类号： B41J2/355 ,  B41J35/00

摘要： An ink transferring printing mechanism includes an ink sheet having a resistance layer, a conductive layer and an ink layer which are stacked in this order, and a recording head. The recording head has a plurality of recording electrodes arranged in a line, each of which corresponds to a pixel in the image, a preheating electrode and a feedback electrode, each of said recording electrodes being positioned between the preheating electrode and the feedback electrode, at least each of the recording electrodes and the preheating electrode being integrated and stratified. Each of the recording electrodes, the preheating electrode and the feedback electrode are respectively in contact with the resistance layer of the ink sheet. A recording current corresponding to image information is supplied to each of the recording electrodes and a preheating current is supplied to the preheating electrode.

摘要翻译： 油墨转印机构包括具有依次堆叠的电阻层，导电层和油墨层的油墨片和记录头。 记录头具有排列成一行的多个记录电极，每个记录电极对应于图像中的像素，预热电极和反馈电极，每个记录电极位于预热电极和反馈电极之间， 记录电极和预热电极中的每一个都被集成和分层。 各记录电极，预热电极和反馈电极分别与油墨片的电阻层接触。 与图像信息相对应的记录电流被提供给每个记录电极，并且预热电流被提供给预热电极。

公开(公告)号：US4983994A

公开(公告)日：1991-01-08

申请号：US412797

申请日：1989-09-26

申请人： Takashi Mori ,  Eiichi Sasaki

发明人： Takashi Mori ,  Eiichi Sasaki

IPC分类号： B41J2/36

CPC分类号： B41J2/36

摘要： A printing device suitable for printing on a record medium for use in an overhead projector (OHP) prints at a density controlled as a function of the type of an OHP (transmission type of reflection type) in which the record medium will be used, and/or as a function of the distance from the OHP to the screen. The device can use a transfer printing type print head, in which case the density control can be achieved by means of amplitude or pulse width modulation of the electrical signal energizing the print head or by means of controlling the number or short energization pulses to be applied to the print head.

摘要翻译： 适用于在用于高架投影仪（OHP）的记录介质上打印的打印装置以根据将使用记录介质的OHP（透射型反射型）的类型来控制的浓度进行打印，以及 /或作为从OHP到屏幕的距离的函数。 该装置可以使用转印印刷型打印头，在这种情况下，密度控制可以通过激励打印头的电信号的幅度或脉冲宽度调制来实现，或通过控制要施加的数量或短激励脉冲 到打印头。

公开(公告)号：US4806987A

公开(公告)日：1989-02-21

申请号：US135377

申请日：1987-12-21

申请人： Takashi Mori ,  Koichi Matsumoto ,  Tsutomu Takai ,  Masaichi Murakami ,  Kyoichi Suwa

发明人： Takashi Mori ,  Koichi Matsumoto ,  Tsutomu Takai ,  Masaichi Murakami ,  Kyoichi Suwa

IPC分类号： H01L21/30 ,  G03F7/20 ,  H01L21/027 ,  G03B27/42

CPC分类号： G03F7/70475

摘要： A projection-exposing apparatus comprises a projecting optical system for projecting an image of a reticle having a predetermined pattern onto a wafer, and a stage for causing a relative shifting movement between a position of the wafer and a position of the reticle. A first exposure is effected for projecting and exposing the reticle image pattern from the projection optical system in a first area on the wafer and then the stage is shifted by a predetermined amount to effect second exposure for projecting and exposing the reticle image pattern in a second area positioned adjacent to the first area on the wafer thereby the reticle image being projected and exposed onto different areas on the same wafer. The stage causes the relative shifting movement between the reticle and the wafer in such a manner that the reticle image pattern obtained by the first exposure and the reticle image pattern obtained by the second exposure are overlapped with each other on the wafer by a predetermined amount.

摘要翻译： 投影曝光装置包括投影光学系统，用于将具有预定图案的掩模版的图像投影到晶片上，以及用于在晶片的位置和光罩之间进行相对移动的台。 进行第一曝光以在晶片上的第一区域中投影和曝光来自投影光学系统的标线片图像图案，然后将该台移动预定量，以进行第二次曝光，以在第二曝光中投影和曝光标线图像图案 区域定位成与晶片上的第一区域相邻，从而掩模版图像被投影并暴露在同一晶片上的不同区域上。 该阶段以这样的方式引起标线片和晶片之间的相对移动运动，使得通过第一曝光获得的标线图像图案和通过第二次曝光获得的标线图像图案在晶片上彼此重叠预定量。

公开(公告)号：US4058523A

公开(公告)日：1977-11-15

申请号：US723444

申请日：1976-09-15

申请人： Takashi Mori ,  Sakae Takaku ,  Nobuhiro Oi ,  Minoru Shindo ,  Takeaki Hirano ,  Shigeyuki Kataoka ,  Kouji Furuno

发明人： Takashi Mori ,  Sakae Takaku ,  Nobuhiro Oi ,  Minoru Shindo ,  Takeaki Hirano ,  Shigeyuki Kataoka ,  Kouji Furuno

IPC分类号： C07C233/12 ,  C07D295/12 ,  C07D295/10 ,  A61K31/165 ,  A61K31/535 ,  C07C103/78

CPC分类号： C07D295/12 ,  C07C233/12

摘要： Bis(benzamido)-benzene derivatives having various pharmaceutical activities such as activity for preventing and treating peptic ulcer, peripheral vasodilating action, hypotensive activity and analgesic activity and represented by the formula ##STR1## wherein X, Y, Z, R.sub.1, R.sub.2 and R.sub.3 are as defined hereinafter and a process for preparing the same are disclosed.

摘要翻译： 具有各种药物活性的双（苯甲酰氨基） - 苯衍生物，例如用于预防和治疗消化性溃疡的活性，外周血管扩张作用，降血压活性和止痛活性，并由式表示，其中X，Y，Z，R 1，R 2和R 3 如下所述，并公开了其制备方法。

公开(公告)号：US09289034B2

公开(公告)日：2016-03-22

申请号：US13884311

申请日：2010-11-10

申请人： Yoshimichi Yamakita ,  Takashi Mori ,  Tadahiro Inomata

发明人： Yoshimichi Yamakita ,  Takashi Mori ,  Tadahiro Inomata

IPC分类号： A44B19/34 ,  A44B19/12 ,  D01D5/253 ,  B29D5/02

CPC分类号： A44B19/34 ,  A44B19/12 ,  B29D5/02 ,  D01D5/253 ,  Y10T24/25 ,  Y10T24/2518

摘要： A continuous fastener element in a fastener stringer has a plurality of fine projections disposed on a circumferential surface of a monofilament continuously along a length direction of the monofilament and a plurality of recesses disposed between the projections. A cross-sectional shape of the projection is curved convexly, and a cross-sectional shape of the recess is curved concavely. A curvature of the convex curved surface of the projections is set to be larger than a curvature of the concave curved surface of the recess in a cross-section of the monofilament. At least the projections disposed on the upper and lower leg parts are twisted with respect to an extension direction of the upper and lower leg parts, and a plurality of the projections disposed on the upper leg part or the lower leg part in a twisted state face the same direction.

摘要翻译： 紧固件纵梁中的连续紧固元件具有沿单丝长度方向连续地设置在单丝的圆周表面上的多个细小突起和设置在突起之间的多个凹部。 凸起的横截面形状是凸形弯曲的，并且凹部的横截面形状被凹入地弯曲。 突起的凸曲面的曲率设定为大于单丝的截面中的凹部的凹曲面的曲率。 至少设置在上部和下部腿部上的突起相对于上部和下部腿部的延伸方向扭转，并且多个突起以扭曲状态面设置在上腿部或小腿部上 方向相同

公开(公告)号：US09200380B2

公开(公告)日：2015-12-01

申请号：US13125899

申请日：2009-10-19

申请人： Suguru Matsumoto ,  Susumu Sonokawa ,  Toshiharu Uesugi ,  Takashi Mori

发明人： Suguru Matsumoto ,  Susumu Sonokawa ,  Toshiharu Uesugi ,  Takashi Mori

IPC分类号： C30B15/30 ,  C30B29/06 ,  C30B35/00

CPC分类号： C30B29/06 ,  C30B15/305 ,  C30B35/00 ,  Y10T117/1032 ,  Y10T117/1072

摘要： The present invention provides a silicon single crystal manufacturing method for manufacturing a single crystal based on a horizontal magnetic field applied CZ method for pulling the single crystal while applying a horizontal magnetic field to a silicon raw material melt accommodated in a quartz crucible by a magnetic field application device, comprising: measuring a center position of the magnetic field generated by the magnetic field application device; and deviating the measured center position of the magnetic field from a pulling member serving as a rotation axis of the single crystal in a horizontal direction within the range of 2 to 14 mm before manufacture of the single crystal and/or during manufacture of the single crystal. As a result, the silicon single crystal manufacturing method and manufacturing apparatus that enable manufacture of a single crystal while suppressing fluctuations in diameter and in oxygen concentration without a variation caused due to characteristics of the apparatus can be provided.

摘要翻译： 本发明提供了一种基于水平磁场施加CZ方法制造单晶的硅单晶制造方法，用于在通过磁场对容纳在石英坩埚中的硅原料熔体施加水平磁场的同时拉动单晶 应用装置，包括：测量由所述磁场施加装置产生的磁场的中心位置; 并且在制造单晶之前和/或在单晶制造期间，将测量的中心位置偏离作为单晶的旋转轴的拉构件在水平方向上在2至14mm的范围内 。 结果，可以提供能够在抑制由于设备的特性引起的变化的同时抑制直径和氧浓度的波动的同时制造单晶的硅单晶制造方法和制造装置。

公开(公告)号：US09180653B2

公开(公告)日：2015-11-10

申请号：US14354443

申请日：2012-08-28

申请人： Daiki Minamida ,  Koichi Kawase ,  Osamu Kuramata ,  Takashi Mori ,  Keita Oe

发明人： Daiki Minamida ,  Koichi Kawase ,  Osamu Kuramata ,  Takashi Mori ,  Keita Oe

IPC分类号： C08J5/24 ,  G01N21/88 ,  G01N21/892 ,  B32B41/00 ,  G01N21/898 ,  G01N21/84 ,  G01N21/94 ,  B29C70/50 ,  B29C70/54 ,  B32B7/06 ,  B32B29/02 ,  G01N21/89

CPC分类号： B32B41/00 ,  B29C70/506 ,  B29C70/54 ,  B32B7/06 ,  B32B29/02 ,  B32B2041/04 ,  B32B2250/40 ,  B32B2255/12 ,  B32B2255/26 ,  B32B2262/106 ,  B32B2305/076 ,  B32B2305/08 ,  B32B2305/22 ,  B32B2307/738 ,  B32B2307/748 ,  B32B2313/04 ,  B32B2363/00 ,  B32B2377/00 ,  C08J5/24 ,  G01N21/8422 ,  G01N21/88 ,  G01N21/8806 ,  G01N21/89 ,  G01N21/8914 ,  G01N21/892 ,  G01N21/8921 ,  G01N21/898 ,  G01N21/94 ,  G01N2021/8472 ,  G01N2021/8841 ,  G01N2021/8854 ,  G01N2021/8861 ,  G01N2021/8874 ,  G01N2021/888 ,  G01N2021/8908 ,  G01N2021/8925

摘要： Provided is a method of producing prepreg including: inspecting, with an optical device, in a resin sheet made of a release paper and a resin film which is formed by coating the release paper with a resin to be impregnated into a carbon fiber bundle, the surface of the resin film, detecting a defect in the surface of the resin film which would be the cause of a defect in the prepreg to be produced, and judging the type of the detected defect; or inspecting, with an optical device, the surface of the prepreg after the release paper is separated from the prepreg sheet which is formed by impregnating a resin forming the resin film into the carbon fiber bundle, detecting defects in the surface of the prepreg, and judging the type of the detected defect.

摘要翻译： 本发明提供一种预浸料坯的制造方法，其特征在于，包括：用光学元件检查由剥离纸制成的树脂片和树脂膜，所述树脂片是通过用浸渍在碳纤维束中的树脂涂布所述剥离纸形成的， 树脂膜的表面，检测树脂膜的表面的缺陷，这将导致要生产的预浸料坯的缺陷，并判断检测到的缺陷的类型; 或者在将剥离纸与通过将形成树脂膜的树脂浸渍到碳纤维束中而形成的预浸料片分离后，使用光学装置检查预浸料的表面，检测预浸料坯的表面的缺陷，以及 判断检测到的缺陷的类型。

公开(公告)号：US09169583B2

公开(公告)日：2015-10-27

申请号：US13824455

申请日：2010-09-28

申请人： Takayuki Hasegawa ,  Takahiro Asami ,  Takashi Mori ,  Tutomu Hamatani ,  Hideki Sato

发明人： Takayuki Hasegawa ,  Takahiro Asami ,  Takashi Mori ,  Tutomu Hamatani ,  Hideki Sato

IPC分类号： D03D1/00 ,  A44B19/34

CPC分类号： D03D1/00 ,  A44B19/34 ,  A44B19/346 ,  D10B2501/0631 ,  Y10T24/25 ,  Y10T428/24008 ,  Y10T428/24479 ,  Y10T442/30

摘要： A woven tape for a slide fastener comprising an element mounting portion and a tape main portion, wherein the tape portion includes warp having a fineness of 30-100 dTex and a weaving density of 100-220 yarns/inch (2.54 cm), weft having a fineness of 60-180 dTex and a weaving density of 30-80 yarns/inch (2.54 cm), and a ratio of the number of yarns in the warp constituting a plain weave structure to the total number of yarns in the warp in the tape main portion is at least 40%. The woven tape for a slide fastener has a low weight and yet a high strength.

摘要翻译： 一种用于拉链的编织带，包括元件安装部分和带主体部分，其中带部分包括细度为30-100dTex的经纱，织造密度为100-220纱/英寸（2.54cm），纬纱具有 细度为60-180dTex，织造密度为30-80纱/英寸（2.54cm），构成平纹结构的经纱中的纱线数与纱线中的纱线总数之比 胶带主要部分至少为40％。 用于拉链的编织带具有较低的重量并且还具有高的强度。

公开(公告)号：US20140134542A1

公开(公告)日：2014-05-15

申请号：US14127392

申请日：2012-06-18

申请人： Yoshiharu Terui ,  Takashi Mori ,  Haruhiko Komoriya

发明人： Yoshiharu Terui ,  Takashi Mori ,  Haruhiko Komoriya

IPC分类号： G03F7/039

CPC分类号： G03F7/0392 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0048 ,  G03F7/16

摘要： A positive-type resist composition according to the present invention includes a fluorine-containing aliphatic alcohol, a polymer, a vinyl compound and a photoacid generator, wherein the fluorine-containing aliphatic alcohol is a monohydric C2-C8 aliphatic alcohol in which the number of hydrogen atoms is equal to or less than the number of fluorine atoms. This positive-type resist composition has a small influence on organic materials, such as less dissolution and swelling of the organic materials, and can form a resist film on an organic polymer substrate etc. by a wet application process such that the resulting resist film or resist pattern shows high solvent resistance.

摘要翻译： 根据本发明的正型抗蚀剂组合物包括含氟脂族醇，聚合物，乙烯基化合物和光酸产生剂，其中含氟脂族醇是一元C2-C8脂族醇，其中数量为 氢原子等于或小于氟原子数。 这种正型抗蚀剂组合物对有机材料的影响较小，例如有机材料的溶解和溶胀较小，并且可以通过湿施加工艺在有机聚合物基材等上形成抗蚀剂膜，使得所得的抗蚀剂膜或 抗蚀剂图案显示出高耐溶剂性。

公开(公告)号：US08716385B2

公开(公告)日：2014-05-06

申请号：US13139665

申请日：2009-12-03

申请人： Haruhiko Komoriya ,  Shinichi Sumida ,  Kenjin Inomiya ,  Takashi Mori ,  Takamasa Kitamoto ,  Yusuke Kanto

发明人： Haruhiko Komoriya ,  Shinichi Sumida ,  Kenjin Inomiya ,  Takashi Mori ,  Takamasa Kitamoto ,  Yusuke Kanto

IPC分类号： C09D133/16

CPC分类号： G03F7/038 ,  C08F20/28 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/004 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  Y10T428/24479

摘要： Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R2 and R3 each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.

摘要翻译： 公开了由以下通式（1）表示的可聚合的含氟单体。 在该式中，R 1表示氢原子，甲基，氟原子或三氟甲基。 n为0或1的整数，m为1〜（3 + n）的整数。 R2和R3各自独立地表示氢原子或保护基。 含有通过聚合或共聚单体获得的含氟聚合物的抗蚀剂适用于通过浸渍曝光的微细加工或基于浸渍曝光的双重图案化工艺。