摘要:
A method includes forming a stress compensation layer over a first side of a semiconductor substrate and forming a Group III-nitride layer over a second side of the substrate. Stress created on the substrate by the Group III-nitride layer is at least partially reduced by stress created on the substrate by the stress compensation layer. Forming the stress compensation layer could include forming a stress compensation layer from amorphous or microcrystalline material. Also, the method could include crystallizing the amorphous or microcrystalline material during subsequent formation of one or more layers over the second side of the substrate. Crystallizing the amorphous or microcrystalline material could occur during subsequent formation of the Group III-nitride layer and/or during an annealing process. The amorphous or microcrystalline material could create no or a smaller amount of stress on the substrate, and the crystallized material could create a larger amount of stress on the substrate.
摘要:
A base structure for high performance Silicon Germanium:Carbon (SiGe:C) based heterojunction bipolar transistors (HBTs) with phosophorus atomic layer doping (ALD) is disclosed. The ALD process subjects the base substrate to nitrogen gas (in ambient temperature approximately equal to 500 degrees Celsius) and provides an additional SiGe:C spacer layer. During the ALD process, the percent concentrations of Germanium (Ge) and carbon (C) are substantially matched and phosphorus is a preferred dopant. The improved SiGe:C HBT is less sensitive to process temperature and exposure times, and exhibits lower dopant segregation and sharper base profiles.
摘要:
A method for forming a self-aligned bipolar transistor structure uses the selective growth of a doped silicon emitter in a sloped oxide emitter window to form the self-aligned structure. In an alternate process flow, the top emitter layer is SiGe with a high Ge content that is etched off selectively after deposition of the extrinsic base layer. In another alternate flow, a nitride plug formed on top of the emitter blocks the extrinsic base implant from the emitter region.
摘要:
A microscanner composed of a semiconductor wafer, having formed as a part thereof a cantilevered portion and having mounted thereon at least one laser diode. The cantilevered portion has electrically interfaced thereto a plurality of interconnects capable of delivering varying voltages. The cantilevered portion is deflected in response to the varying voltages and therefore produces a scanning action about an "x" axis, a "y" axis, or an "x" and "y" axis dependent upon the external varying voltage applied thereto and the design of the cantilevered portion. This scanning action operates to scan the light emitted by the at least one laser diode. The microscanner operates to generate a resultant integrated scanned image. This image can be implemented as either a virtual image display or a projected image display.
摘要:
An array of annular waveguide VCSELs for achieving a stable single high order mode light source characterized as emitting a plurality of emission beams of varying wavelengths. The device array including a first mirror stack with mirror pairs in a Al.sub.x Ga.sub.1-x As/Al.sub.y Ga.sub.1-y As material system lattice matched to an active region. The active region includes an active structure sandwiched between a first cladding region adjacent the first mirror stack and a second cladding region, the active structure having at least one quantum well. The VCSEL further includes a second mirror stack lattice matched to the second cladding region and having mirror pairs in a Al.sub.x Ga.sub.1-x As/Al.sub.y Ga.sub.1-y As material system. The second mirror stack is etched to define a first VCSEL and at least one additional VCSEL, each VCSEL including an etched region, thereby defining an annular emission region through which light generated by the annular waveguide VCSEL is emitted.
摘要翻译:用于实现稳定的单个高阶模式光源的环形波导VCSEL的阵列,其特征在于发射多个不同波长的发射光束。 该器件阵列包括在与有源区匹配的Al x Ga 1-x As / Al y Ga 1-y As材料体系晶格中具有镜对的第一反射镜叠层。 有源区包括夹在邻近第一反射镜叠层的第一包层区域和第二包层区域之间的有源结构,该有源结构具有至少一个量子阱。 VCSEL还包括与第二包层区域匹配的第二反射镜堆叠晶格并且在Al x Ga 1-x As / Al y Ga 1-y As材料体系中具有镜对。 蚀刻第二反射镜叠层以限定第一VCSEL和至少一个附加VCSEL,每个VCSEL包括蚀刻区域,由此限定环形发射区域,通过该环形发射区域发射由环形波导VCSEL产生的光。
摘要:
A VCSEL for emitting long wavelength light and method of fabrication including a substrate element, a first stack of distributed Bragg reflectors, a first oxide layer, a GaInAsN active region with an active structure sandwiched between a first cladding region adjacent the first oxide layer and a second cladding region, the active structure including a nitride based quantum well, a second oxide layer adjacent the active region, and a second stack of distributed Bragg reflectors adjacent the second oxide layer.
摘要:
A VCSEL for high power operation and method of fabrication including a substrate element, a heat dissipation layer disposed on the substrate element, a first mirror stack, an active region lattice matched to a surface of the first mirror stack, and a second mirror stack lattice matched to a surface of the active region. An electrical contact is coupled to a surface of the active region and an electrical contact is positioned on another surface of the active region. The VCSEL is fabricated initially as two wafer structures each including a heat dissipation layer. The two wafer structures are flip mounted and the two heat dissipation layers are fused together to form a single heat dissipation layer. The structure is then selectively etched to remove a substrate element onto which the first wafer structure was formed.
摘要:
An ultraviolet/blue/green vertical cavity surface emitting laser (VCSEL) for use in high density data storage that includes the fabrication of a VCSEL structure on a metallic single crystal substrate. The metallic single crystal substrate is utilized as a back reflecting mirror that in conjunction with an aluminum gallium nitride/gallium nitride distributed Bragg reflector serves to increase the overall reflectance of the VCSEL device. The metallic substrate is fabricated of a material such as nickel aluminum, thereby achieving an improved lattice match to the included III-nitride materials.
摘要:
A semiconductive substrate (101) with a surface (102) having a first stack of distributed Bragg reflectors (109) disposed on the surface (102) of the semiconductive substrate (101). A first transition region (140) is disposed on the first stack of distributed Bragg reflectors (109) with a first cladding region (113) being disposed on the first transition region (140). An active area (117) is disposed on the first cladding region (113) with a second cladding region (123) being disposed on the active area (117). A second transition region (145) having a layer (255) of aluminum arsenide is disposed on the second cladding region (123) with a second stack of distributed Bragg reflectors (127) being disposed on the second transition region (145).
摘要:
A VCSEL for emitting long wavelength light including a first mirror stack lattice matched to the surface of a substrate and including mirror pairs in a II-VI material system, an InP based active region lattice matched to a surface of the first mirror stack, and a second mirror stack lattice matched to a surface of the active region and including mirror pairs in a II-VI material system. An electrical contact is coupled to a surface of the active region and an electrical contact is positioned on another surface of the active region. In a specific embodiment the II-VI material system includes ZnCdSe/MgZnCdSe.