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163 条记录 (耗时 0.022 秒)

    Process for producing optically active aliphatic fluoroalcohol
    62.
    发明授权
    Process for producing optically active aliphatic fluoroalcohol 有权
    光学活性脂肪族氟代醇的制造方法

    公开(公告)号：US08558033B2

    公开(公告)日：2013-10-15

    申请号：US13170347

    申请日：2011-06-28

    申请人： Takeaki Katayama ,  Toshihide Takemoto ,  Kunihiko Murata

    发明人： Takeaki Katayama ,  Toshihide Takemoto ,  Kunihiko Murata

    IPC分类号： C07C29/143

    CPC分类号： C07C29/143 ,  C07B2200/07 ,  C07C31/38

    摘要： The problem to be resolved by the present invention is to provide a method for efficiently synthesizing optically active lower aliphatic alcohols that have difficulty in separation from organic solvents, without using a special reactor.The present invention relates to a method for producing an optically active aliphatic alcohol having a fluorine atom at α position, wherein an optically active alcohol is produced by reacting an aliphatic ketone having a fluorine atom at α position in water using a formate, under the presence of an asymmetric catalyst represented by general formula (1) and an acid.

    摘要翻译： 本发明要解决的问题是提供一种高效合成难以与有机溶剂分离的光学活性低级脂族醇的方法，而不使用特殊的反应器。 本发明涉及一种在α位具有氟原子的光学活性脂族醇的制造方法，其中通过使甲酸钠在水中的α位具有氟原子的脂族酮与甲酸酯反应来制备光学活性醇， 的由通式（1）表示的不对称催化剂和酸。

    CLEANING LIQUID COMPOSITION FOR ELECTRONIC DEVICE
    64.
    发明申请
    CLEANING LIQUID COMPOSITION FOR ELECTRONIC DEVICE 有权
    电子设备清洁液体组合物

    公开(公告)号：US20130143785A1

    公开(公告)日：2013-06-06

    申请号：US13705575

    申请日：2012-12-05

    申请人： Kanto Kagaku Kabushiki Kaisha

    发明人： Yumiko TANIGUCHI ,  Kikue MORITA ,  Chiyoko HORIKE ,  Takuo OHWADA

    IPC分类号： C11D7/32 ,  C11D7/36

    CPC分类号： C11D7/3209 ,  C11D3/30 ,  C11D3/361 ,  C11D7/36 ,  C11D11/0047 ,  C23G1/18 ,  C23G1/20 ,  H01L21/02052 ,  H01L21/02068

    摘要： [Purpose] To provide a cleaning liquid composition that has excellent removability for metallic impurities and particulates, does not cause corrosion of Cu, and can clean a semiconductor substrate having copper wiring in a production process for an electronic device such as a semiconductor device.[Solution means] A cleaning liquid composition for cleaning a semiconductor substrate having copper wiring, the cleaning liquid composition containing one or more types of basic compound containing no metal, and one or more types of phosphonic acid-based chelating agent, and having a hydrogen ion concentration (pH) of 8 to 10.

    摘要翻译： [目的]提供一种对于金属杂质和微粒具有优异的除去性的清洗液组合物，不会引起Cu的腐蚀，并且可以在半导体装置等电子器件的制造工序中清洗具有铜布线的半导体基板。 [解决方案]一种用于清洗具有铜布线的半导体衬底的清洗液组合物，含有一种或多种不含金属的碱性化合物的洗涤液组合物，以及一种或多种类型的膦酸类螯合剂，并具有氢 离子浓度（pH）为8〜10。

    Composition for photoresist stripping solution and process of photoresist stripping
    67.
    发明授权
    Composition for photoresist stripping solution and process of photoresist stripping 失效
    光致抗蚀剂剥离溶液的组成和光致抗蚀剂剥离工艺

    公开(公告)号：US07816312B2

    公开(公告)日：2010-10-19

    申请号：US11371444

    申请日：2006-03-09

    申请人： Takuo Oowada ,  Kaoru Ikegami

    发明人： Takuo Oowada ,  Kaoru Ikegami

    IPC分类号： C11D7/50

    CPC分类号： G03F7/426 ,  G03F7/425

    摘要： The present invention provides a composition for photoresist stripping solution which shows a superior stripping property of photoresists and damaged photoresist layers remained after dry etching in the fabrication process of semiconductor circuit devices, without attacking new wiring materials and interlayer insulating film materials, as well as a process of stripping of photoresists and damaged photoresist layers. The composition for photoresist stripping solution which contains at least one of acetylene alcohol compounds and organic sulfonic acid compounds, and at least one of polyvalent alcohols and their derivatives is used.

    摘要翻译： 本发明提供一种用于光致抗蚀剂剥离溶液的组合物，其在半导体电路器件的制造工艺中在干蚀刻之后保留了光致抗蚀剂和损伤的光致抗蚀剂层的优良剥离性能，而不侵蚀新的布线材料和层间绝缘膜材料，以及 剥离光致抗蚀剂和损伤的光致抗蚀剂层的过程。 使用含有乙炔醇化合物和有机磺酸化合物中的至少一种的光致抗蚀剂剥离溶液的组合物，以及多元醇及其衍生物中的至少一种。

    ASYMMETRIC CATALYST AND PROCESS FOR PREPARING OPTICALLY ACTIVE ALCOHOLS USING THE SAME
    68.
    发明申请
    ASYMMETRIC CATALYST AND PROCESS FOR PREPARING OPTICALLY ACTIVE ALCOHOLS USING THE SAME 有权
    不对称催化剂及其制备使用其的光学活性醇的方法

    公开(公告)号：US20100261924A1

    公开(公告)日：2010-10-14

    申请号：US12758257

    申请日：2010-04-12

    申请人： Masahito Watanabe ,  Junichi Hori

    发明人： Masahito Watanabe ,  Junichi Hori

    IPC分类号： C07C35/18 ,  C07F15/00 ,  C07C307/02

    CPC分类号： C07B53/00 ,  B01J31/1805 ,  B01J31/2295 ,  B01J2231/643 ,  B01J2531/827 ,  C07F15/0046 ,  C07F17/02

    摘要： The present invention provides an organic metal compound, a ligand, an asymmetric catalyst, and a process for preparing optically-active alcohols using the asymmetric catalyst. The organic metal compound of the present invention is expressed by the following general formula (1): wherein in general formula (1), R1 and R2 are a mutually identical or mutually different, unsubstituted or substituted alkyl group, aryl group, cycloalkyl group, or R1 and R2 are bound to form an alicyclic ring, R3 is a hydrogen atom or an alkyl group, R4 is a branched alkyl group or an alkyl group that does or does not form a ring by itself, or an unsubstituted or substituted aryl group, or an unsubstituted or substituted heterocyclic group, Ar is an unsubstituted or substituted cyclopentadienyl group that is bound to M via a π bond, or an unsubstituted or substituted benzene, X is a hydride group or an anionic group, M is ruthenium, rhodium or iridium, L is a solvent molecule or a water molecule, l is 1 or 2, m is an integer from 0 to 2, n is 0 or 1, and when n is 0, X does not exist, and * represents asymmetric carbon, wherein R4 is not a camphor group, a camphor derivative group, an isopropyl group or a phenyl group whenever R1 and R2 are both a phenyl group.

    摘要翻译： 本发明提供有机金属化合物，配体，不对称催化剂，以及使用不对称催化剂制备光学活性醇的方法。 本发明的有机金属化合物由以下通式（1）表示：其中，通式（1）中，R 1和R 2为相互相同或相互不同的未取代或取代的烷基，芳基，环烷基， 或R 1和R 2结合形成脂环，R 3为氢原子或烷基，R 4为支链烷基或自身不形成环的烷基或未取代或取代的芳基 ，或未取代或取代的杂环基团，Ar是未经取代或取代的环戊二烯基，其经由＆pgr与M结合; 键或未取代或取代的苯，X为氢化物基团或阴离子基团，M为钌，铑或铱，L为溶剂分子或水分子，l为1或2，m为0〜 2，n为0或1，当n为0时，X不存在，*表示不对称碳，其中R 4不是樟脑基，樟脑衍生物基，异丙基或苯基，只要R1和R2为 均为苯基。

    Method for producing optically active quinuclidinols having one or more substituted groups at the 2-position
    69.
    发明授权
    Method for producing optically active quinuclidinols having one or more substituted groups at the 2-position 失效
    在2-位具有一个或多个取代基的光学活性奎宁环醇的制备方法

    公开(公告)号：US07687630B2

    公开(公告)日：2010-03-30

    申请号：US11906103

    申请日：2007-09-28

    申请人： Takeaki Katayama ,  Kunihiko Murata

    发明人： Takeaki Katayama ,  Kunihiko Murata

    IPC分类号： C07D453/02

    CPC分类号： C07D453/02

    摘要： The invention provides a method for producing optically active 3-quinuclidinols having one or more substituted groups at the 2-position; wherein 3-quinuclidinones having one or more substituted groups at the 2-position are reacted with compounds providing hydrogen in the presence of a certain metal complex.

    摘要翻译： 本发明提供了在2-位具有一个或多个取代基的光学活性3-奎宁环醇的制备方法; 其中在2-位具有一个或多个取代基的3-奎宁环酮与在某种金属络合物存在下提供氢的化合物反应。

    ETCHING SOLUTION COMPOSITION FOR METAL FILMS
    70.
    发明申请
    ETCHING SOLUTION COMPOSITION FOR METAL FILMS 有权
    蚀刻金属膜的溶液组成

    公开(公告)号：US20090124091A1

    公开(公告)日：2009-05-14

    申请号：US12352020

    申请日：2009-01-12

    申请人： Kazuhiro Fujikawa ,  Tsuguhiro Tago

    发明人： Kazuhiro Fujikawa ,  Tsuguhiro Tago

    IPC分类号： H01L21/306 ,  B44C1/22

    CPC分类号： C23F1/20 ,  H01L21/32134

    摘要： The present invention aims to provide an etching solution composition which enables to etch a metal film in a controllable manner, form a desired definite tapered shape, and obtain a smooth surface without causing etching solution exudation trace. Said problems have been solved by the present invention, which is an etching solution composition for etching metal films containing one or more surfactants selected from the group consisting of alkyl sulfate or perfluoroalkenyl phenyl ether sulfonic acid and the salts thereof.

    摘要翻译： 本发明的目的在于提供一种能够以可控制的方式蚀刻金属膜，形成期望的定形锥形形状的蚀刻溶液组合物，并获得光滑表面而不引起蚀刻溶液渗出痕迹。 所述问题已经通过本发明来解决，本发明是用于蚀刻含有一种或多种选自烷基硫酸盐或全氟链烯基苯基醚磺酸的表面活性剂的金属膜的蚀刻溶液组合物及其盐。