Memristive device
    61.
    发明授权
    Memristive device 有权
    忆阻器

    公开(公告)号:US08547727B2

    公开(公告)日:2013-10-01

    申请号:US13119932

    申请日:2008-12-12

    IPC分类号: G11C11/00

    摘要: A memristive routing device includes a memristive matrix, mobile dopants moving with the memristive matrix in response to programming electrical fields and remaining stable within the memristive matrix in the absence of the programming electrical fields; and at least three electrodes surrounding the memristive matrix. A method for tuning electrical circuits with a memristive device includes measuring a circuit characteristic and applying a programming voltage to the memristive device which causes motion of dopants within the memristive device to alter the circuit characteristic. A method for increasing a switching speed of a memristive device includes drawing dopants from two geometrically separated locations into close proximity to form two conductive regions and then switching the memristive device to a conductive state by applying a programming voltage which rapidly merges the two conductive regions to form a conductive pathway between a source electrode and a drain electrode.

    摘要翻译: 忆阻路由设备包括忆阻矩阵,响应于编程电场而与忆阻矩阵一起移动的移动掺杂物,并且在没有编程电场的情况下在忆阻矩阵内保持稳定; 以及围绕忆阻矩阵的至少三个电极。 一种用忆阻器件调谐电路的方法包括测量电路特性并将编程电压施加到忆阻器件,其使得忆阻器件内的掺杂剂的运动改变电路特性。 用于增加忆阻器件的切换速度的方法包括将来自两个几何分离位置的掺杂剂绘制成紧密接近形成两个导电区域,然后通过施加快速合并两个导电区域的编程电压将忆阻器件切换到导通状态 在源电极和漏电极之间形成导电路径。

    METHOD FOR MANUFACTURING THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICE
    62.
    发明申请
    METHOD FOR MANUFACTURING THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICE 有权
    制造三维半导体存储器件的方法

    公开(公告)号:US20130203227A1

    公开(公告)日:2013-08-08

    申请号:US13880641

    申请日:2011-06-30

    IPC分类号: H01L45/00

    摘要: The present disclosure provides a method for manufacturing a three-dimensional semiconductor memory device. In the method, a storage array is divided into a plurality of storage sub-arrays. As a result, a respective via of each storage sub-array can be etched respectively, which is different from the prior art, where a via for a bottom electrode of a plurality of layers of resistive cells is etched at one time. The vias are filled with metal so that storage sub-arrays are connected with each other. The method for manufacturing the three-dimensional semiconductor memory device according to the present disclosure can substantially reduce process complexity and difficulty of etching process in high-density integration, and also improve a number of layers of the resistive cells integrated in the storage array.

    摘要翻译: 本公开提供了一种用于制造三维半导体存储器件的方法。 在该方法中,存储阵列被分成多个存储子阵列。 结果,可以分别蚀刻每个存储子阵列的相应通孔,这与现有技术不同,其中一次蚀刻多层电阻单元的底部电极的通孔。 通孔用金属填充,使得存储子阵列彼此连接。 根据本公开的制造三维半导体存储器件的方法可以大大降低高密度集成中的工艺复杂度和蚀刻工艺的难度,并且还可以改善集成在存储阵列中的电阻式电池的多个层。

    SEMICONDUCTOR STORAGE DEVICE AND METHOD FOR MANUFACTURING SAME
    65.
    发明申请
    SEMICONDUCTOR STORAGE DEVICE AND METHOD FOR MANUFACTURING SAME 有权
    半导体存储器件及其制造方法

    公开(公告)号:US20120248399A1

    公开(公告)日:2012-10-04

    申请号:US13515435

    申请日:2010-12-13

    IPC分类号: H01L27/24

    摘要: Disclosed are a semiconductor storage device and a method for manufacturing the semiconductor storage device, whereby the bit cost of memory using a variable resistance material is reduced. The semiconductor storage device has: a substrate; a first word line (2) which is provided above the substrate; a first laminated body, which is disposed above the first word line (2), and which has the N+1 (N≧1) number of first inter-gate insulating layers (11-15) and the N number of first semiconductor layers (21p-24p) alternately laminated in the height direction of the substrate; a first bit line (3), which extends in the direction that intersects the first word line (2), and which is disposed above the laminated body; a first gate insulating layer (9) which is provided on the side surface of the N+1 number of the first inter-gate insulating layers (11-15) and those of the N number of the first semiconductor layers (21p-24p); a first channel layer (8p) which is provided on the side surface of the first gate insulating layer (9); and a first variable resistance material layer (7) which is provided on the side surface of the first channel layer. The first variable material layer (7) is in a region where the first word line (2) and the first bit line (3) intersect each other. Furthermore, a polysilicon diode (PD) is used as a selection element.

    摘要翻译: 公开了一种半导体存储装置和用于制造半导体存储装置的方法,由此降低了使用可变电阻材料的存储器的位成本。 半导体存储装置具有:基板; 设置在基板上方的第一字线(2) 第一层叠体,其设置在第一字线(2)的上方,并且具有N + 1(N≥1)个第一栅极间绝缘层(11-15)和N个第一半导体层 (21p-24p)在基板的高度方向上交替层叠; 第一位线(3),其在与所述第一字线(2)相交的方向上延伸,并且位于所述层叠体的上方; 设置在N + 1个第一栅极绝缘层(11-15)的侧表面和N个第一半导体层(21p-24p)的侧表面上的第一栅极绝缘层(9) ; 设置在第一栅极绝缘层(9)的侧面上的第一沟道层(8p); 以及设置在第一沟道层的侧表面上的第一可变电阻材料层(7)。 第一可变材料层(7)在第一字线(2)和第一位线(3)彼此相交的区域中。 此外,使用多晶硅二极管(PD)作为选择元件。

    Memristor amorphous metal alloy electrodes
    68.
    发明授权
    Memristor amorphous metal alloy electrodes 有权
    忆阻器非晶金属合金电极

    公开(公告)号:US08063395B2

    公开(公告)日:2011-11-22

    申请号:US12570286

    申请日:2009-09-30

    IPC分类号: H01L47/00

    摘要: A nanoscale switching device comprises at least two electrodes, each of a nanoscale width; and an active region disposed between and in electrical contact with the electrodes, the active region containing a switching material capable of carrying a species of dopants and transporting the dopants under an electrical field, wherein at least one of the electrodes comprises an amorphous conductive material.

    摘要翻译: 纳米级切换装置包括至少两个电极,每个电极具有纳米级宽度; 以及设置在电极之间并且与电极电接触的有源区域,所述有源区域包含能够承载一种掺杂剂并在电场下传输掺杂剂的开关材料,其中所述电极中的至少一个包括非晶导电材料。

    Four-terminal reconfigurable devices
    70.
    发明授权
    Four-terminal reconfigurable devices 有权
    四端可重新配置设备

    公开(公告)号:US08053752B2

    公开(公告)日:2011-11-08

    申请号:US12987089

    申请日:2011-01-08

    IPC分类号: H01L29/04

    摘要: Reconfigurable devices and methods for the fabrication thereof are provided. In one aspect, a reconfigurable device is provided. The reconfigurable device comprises a substrate; a first dielectric layer on the substrate; a conductive layer recessed into at least a portion of a side of the first dielectric layer opposite the substrate; at least one second dielectric layer over the side of the first dielectric layer opposite the substrate, so as to cover the conductive layer; a heater within the second dielectric layer; at least one programmable via extending through the second dielectric layer, extending through and surrounded by the heater and in contact with the conductive layer, the programmable via comprising at least one phase change material; a capping layer over the programmable via; a first conductive via and a second conductive via, each extending through the second dielectric layer and in contact with the heater; and a third conductive via extending through the second dielectric layer and in contact with the conductive layer.

    摘要翻译: 提供了可重构的装置及其制造方法。 在一个方面,提供了可重新配置的设备。 可重构装置包括基板; 基底上的第一介电层; 导电层,凹入到与衬底相对的第一电介质层的一侧的至少一部分中; 在所述第一电介质层的与所述衬底相对的一侧上的至少一个第二电介质层,以覆盖所述导电层; 第二介电层内的加热器; 至少一个可编程通道延伸穿过第二电介质层,延伸穿过并被加热器包围并与导电层接触,该可编程通孔包括至少一个相变材料; 可编程通道上的覆盖层; 第一导电通孔和第二导电通孔,每个延伸通过第二介电层并与加热器接触; 以及延伸穿过第二介电层并与导电层接触的第三导电通孔。