公开(公告)号：US06242151B1

公开(公告)日：2001-06-05

申请号：US09372035

申请日：1999-08-11

申请人： Tomoyoshi Furihata ,  Hideto Kato ,  Satoshi Okazaki

发明人： Tomoyoshi Furihata ,  Hideto Kato ,  Satoshi Okazaki

IPC分类号： G03F7023

CPC分类号： C08L61/14 ,  C08G8/28 ,  C08G8/32 ,  G03F7/023

摘要： The invention provides a novel polymer in the form of a novolac resin in which some of the hydrogen atoms of the hydroxyl groups are replaced by 1,2-naphthoquinonediazidosulfonyl ester groups and some of the hydrogen atoms of the remaining hydroxyl groups are replaced by substituted carbonyl or sulfonyl groups. The polymer has a weight average molecular weight calculated as polystyrene of 1,000-30,000. The polymer is formulated into a resist composition having improved uniformity, sensitivity, resolution and pattern geometry in microfabrication.

摘要翻译： 本发明提供一种酚醛清漆树脂形式的新型聚合物，其中羟基的一些氢原子被1,2-萘醌二叠氮磺酰酯基团取代，其余羟基的一些氢原子被取代的羰基 或磺酰基。 该聚合物的重均分子量为聚苯乙烯计算为1000-3,000。 将聚合物配制成具有改进的微细加工中的均匀性，灵敏度，分辨率和图案几何形状的抗蚀剂组合物。

公开(公告)号：US06218069B1

公开(公告)日：2001-04-17

申请号：US09480627

申请日：2000-01-10

申请人： Hideto Kato ,  Tomoyoshi Furihata ,  Satoshi Okazaki

发明人： Hideto Kato ,  Tomoyoshi Furihata ,  Satoshi Okazaki

IPC分类号： G03F7023

CPC分类号： G03F7/023

摘要： A photosensitive resin composition contains a photosensitive resin comprising recurring units of formula (1) and having a Mw of 1,300-11,000 and 20-5,000 ppm of a tertiary amine compound of formula (2). R is hydrogen or a 1,2-naphthoquinonediazido-5-sulfonic acid residue, the content of 1,2-naphthoquinonediazido-5-sulfonic acid residue in R is 3-27 mol %, and m is a number from 0 to 3, X is a C6-20 alkyl, aryl or aralkyl group, Y and Z each are a C1-20 alkyl group. The composition is improved in sensitivity stability and adhesion to substrates and eliminates the risk of causing corrosion of metal substrates.

摘要翻译： 感光性树脂组合物含有包含式（1）的重复单元，Mw为1,300〜11,000和20〜500ppm的式（2）的叔胺化合物的感光性树脂，R为氢或1,2-萘醌二叠氮 -5-磺酸残基，R中1,2-萘醌二叠氮基-5-磺酸残基的含量为3-27mol％，m为0-3的数，X为C6-20烷基，芳基或 芳烷基，Y和Z各自为C 1-20烷基。 该组合物的灵敏度稳定性和与基材的粘附性得到改善，并且消除了引起金属基材腐蚀的风险。

公开(公告)号：US5346979A

公开(公告)日：1994-09-13

申请号：US3398

申请日：1993-01-12

申请人： Hiroshige Okinoshima ,  Hideto Kato

发明人： Hiroshige Okinoshima ,  Hideto Kato

IPC分类号： C07F7/10 ,  C08G73/10 ,  C08G77/48 ,  C08G77/54 ,  H01B3/46 ,  C08G77/26

CPC分类号： C08G73/106 ,  C08G73/101 ,  C08G73/1039

摘要： A novel curable polyimide resin of structural formula (1) or (2) is provided wherein R.sup.1 and R.sup.2 are independently substituted or unsubstituted monovalent C.sub.1-10 hydrocarbon groups, R.sup.3 is a divalent C.sub.1-10 organic group, X is a tetravalent organic group containing an aromatic or aliphatic ring, Y is a divalent organic group, Z is a divalent organic group containing an aromatic ring, W is a trivalent organic group containing an aromatic ring, m is an integer of 1 to 3, and n is an integer of at least 1. It can be prepared by reacting a polyimide with a silicon compound. The curable resin forms with a solvent a solution having a low viscosity and shelf stability and cures at relatively low temperatures below 300.degree. C. into coatings having heat resistance, mechanical strength, electrical properties, solvent resistance and substrate adherence. ##STR1##

摘要翻译： 提供了结构式（1）或（2）的新型可固化聚酰亚胺树脂，其中R1和R2独立地是取代或未取代的一价C1-10烃基，R3是二价C1-10有机基团，X是含四价有机基团 芳香族或脂肪族环，Y为二价有机基团，Z为含有芳香环的二价有机基团，W为含有芳环的三价有机基团，m为1〜3的整数，n为 可以通过使聚酰亚胺与硅化合物反应来制备。 固化树脂与溶剂形成具有低粘度和储存稳定性的溶液，并且在低于300℃的相对低的温度下固化成具有耐热性，机械强度，电性能，耐溶剂性和基材粘附性的涂层。

公开(公告)号：US4652663A

公开(公告)日：1987-03-24

申请号：US862676

申请日：1986-05-13

申请人： Toshio Takago ,  Yasushi Yamamoto ,  Koichi Yamaguchi ,  Hideto Kato

发明人： Toshio Takago ,  Yasushi Yamamoto ,  Koichi Yamaguchi ,  Hideto Kato

IPC分类号： C08K5/5475 ,  C07F7/02 ,  C07F7/12 ,  C07F7/18 ,  C08K5/49 ,  C08K5/5419 ,  C08K5/5425 ,  C08K5/5435 ,  C08L27/12 ,  C07F7/08 ,  C07F7/10 ,  C07D303/02

CPC分类号： C07F7/025 ,  C07F7/1836

摘要： A class of novel organosilane compounds are disclosed as represented by the general formulaRSi(OCH.sub.2 CF.sub.3).sub.3,in which R is an atom or group selected from the class consisting of a hydrogen atom, unsaturated monovalent aliphatic hydrocarbon groups having from 2 to 20 carbon atoms, monovalent aryl groups and monovalent organic groups having from 3 to 20 carbon atoms and containing at least one hetero atom, i.e. an atom other than carbon and hydrogen atoms, such as oxygen, halogens, sulfur and nitrogen, the said hetero atom-containing organic group being bonded to the silicon atom through a carbon-to-silicon linkage. Several particular compounds belonging to the class were synthesized and identified.

摘要翻译： 公开了一类由通式RSi（OCH2CF3）3表示的新型有机硅烷化合物，其中R是选自氢原子，具有2至20个碳原子的不饱和一价脂族烃基的原子或基团 具有3至20个碳原子并含有至少一个杂原子的单价芳基和一价有机基团，即除碳和氢原子之外的原子，如氧，卤素，硫和氮，所述含杂原子的有机物 基团通过碳 - 硅键连接到硅原子上。 合成并鉴定了属于该类的几种特定化合物。

公开(公告)号：US08785585B2

公开(公告)日：2014-07-22

申请号：US13343930

申请日：2012-01-05

申请人： Masahiro Furuya ,  Shohei Tagami ,  Hideto Kato ,  Hideyuki Ito ,  Masahiro Yoshizawa

发明人： Masahiro Furuya ,  Shohei Tagami ,  Hideto Kato ,  Hideyuki Ito ,  Masahiro Yoshizawa

IPC分类号： C08G77/08

CPC分类号： C09J183/04 ,  C08G77/12 ,  C08G77/20 ,  C08G77/50 ,  C08G77/80 ,  C08L83/00 ,  C09J183/14 ,  H01L21/02013 ,  H01L21/6835 ,  H01L21/6836 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2221/68381 ,  H01L2221/68386

摘要： A temporary adhesive for which temporary adhesion and subsequent detachment are simple. The temporary adhesive composition includes: (A) an organopolysiloxane having a weight-average molecular weight of at least 15,000, obtained by a hydrosilylation reaction between (A1) and (A2) described below, and (B) an organic solvent having a boiling point of not more than 220° C., wherein (A1) is an alkenyl group-containing organopolysiloxane having a weight-average molecular weight exceeding 2,000, comprising 35 to 99 mol % of T siloxane units and 1 to 25 mol % of M siloxane units, and in which alkenyl groups bonded to silicon atoms represent at least 2 mol % of all the organic groups bonded to silicon atoms, and (A2) is a specific organohydrogenpolysiloxane having at least two silicon atom-bonded hydrogen atoms or a specific hydrosilyl group-containing compound.

摘要翻译： 一种临时粘合剂，其临时粘合和随后的分离是简单的。 临时粘合剂组合物包括：（A）通过下述（A1）和（A2）之间的氢化硅烷化反应获得的重均分子量为至少15,000的有机聚硅氧烷和（B）具有沸点 不超过220℃，其中（A1）是重均分子量超过2,000的含烯基的有机聚硅氧烷，包含35-99摩尔％的T硅氧烷单元和1至25摩尔％的M硅氧烷单元 并且其中与硅原子键合的烯基表示与硅原子键合的所有有机基团的至少2摩尔％，（A2）是具有至少两个硅原子键合的氢原子的特定有机氢聚硅氧烷或特定的氢化硅烷基 - 含有化合物。

公开(公告)号：US08785114B2

公开(公告)日：2014-07-22

申请号：US13157460

申请日：2011-06-10

申请人： Hideto Kato ,  Hiroshi Kanbara ,  Tomoyoshi Furihata ,  Yoshinori Hirano

发明人： Hideto Kato ,  Hiroshi Kanbara ,  Tomoyoshi Furihata ,  Yoshinori Hirano

IPC分类号： G03F7/30 ,  G03F7/40 ,  G03F7/038 ,  G03F7/023 ,  G03F7/20

CPC分类号： C09D163/04 ,  B81C1/00619 ,  B81C2201/0108 ,  G03F7/0226 ,  G03F7/0236 ,  G03F7/30 ,  G03F7/40 ,  G03F7/70466

摘要： A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, providing the inorganic material film with an aperture, and etching away the sacrificial film pattern through the aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) forming a sacrificial film using a composition comprising a cresol novolac resin and a crosslinker, (B) exposing patternwise the film to first high-energy radiation, (C) developing, and (D) exposing the sacrificial film pattern to second high-energy radiation and heat treating for thereby forming crosslinks within the cresol novolac resin.

摘要翻译： 通过图案化牺牲膜来制造微结构，在图案上形成无机材料膜，为无机材料膜提供孔，并通过孔蚀刻掉牺牲膜图案，以限定具有图案轮廓的空间 。 图案化阶段包括以下步骤：（A）使用包含甲酚酚醛清漆树脂和交联剂的组合物形成牺牲膜，（B）将膜图案化为第一高能辐射，（C）显影，和（D）曝光 牺牲膜图案到第二高能量辐射和热处理，从而在甲酚酚醛清漆树脂内形成交联。

公开(公告)号：US08673537B2

公开(公告)日：2014-03-18

申请号：US12963727

申请日：2010-12-09

申请人： Masahiro Furuya ,  Michihiro Sugo ,  Hideto Kato ,  Kazunori Kondo ,  Shohei Tagami ,  Tomoyuki Goto

发明人： Masahiro Furuya ,  Michihiro Sugo ,  Hideto Kato ,  Kazunori Kondo ,  Shohei Tagami ,  Tomoyuki Goto

IPC分类号： G03F7/004 ,  G03F7/038

CPC分类号： G03F7/0387 ,  C08G73/1039 ,  C08G73/1042 ,  C08G73/1046 ,  C08G73/1053 ,  C08G73/106 ,  C08K5/3445 ,  C08K5/34922 ,  C08K5/41 ,  C08K5/49 ,  C08L63/00 ,  C08L79/08 ,  C09D179/08 ,  C09J179/08 ,  G03F7/0382 ,  G03F7/0757 ,  H05K3/287 ,  H05K2201/0154 ,  H05K2201/0162 ,  Y10S430/107 ,  Y10T428/24802 ,  Y10T428/269 ,  C08L2666/22

摘要： The invention relates to a photo-curable resin composition, which contains a polyimide silicone having a primary alcoholic hydroxyl group, as a component (A); at least one compound selected from the group consisting of an amino condensation product modified with formalin or a formalin-alcohol and a phenol compound having two or more in average of methylol group or alkoxymethylol group in one molecule thereof, as a component (B); and a photo-acid generator as a component (C). When used as an adhesive, the photo-curable resin composition further contains a multifunctional epoxy compound as a component (D).

摘要翻译： 本发明涉及含有主要醇羟基的聚酰亚胺硅氧烷作为组分（A）的光固化树脂组合物; 作为组分（B）的至少一种选自由福尔马林或福尔马林醇修饰的氨基缩合产物和在其一分子中具有两个或更多个平均羟甲基或烷氧基羟甲基的酚化合物的化合物; 和作为（C）成分的光酸发生剂。 作为粘合剂使用时，光固化性树脂组合物还含有作为（D）成分的多官能环氧化合物。

公开(公告)号：US08378148B2

公开(公告)日：2013-02-19

申请号：US12898136

申请日：2010-10-05

申请人： Takato Sakurai ,  Michihiro Sugo ,  Takanobu Takeda ,  Hideto Kato

发明人： Takato Sakurai ,  Michihiro Sugo ,  Takanobu Takeda ,  Hideto Kato

IPC分类号： C07C43/23 ,  C07C41/26

CPC分类号： C07C43/23 ,  C07C41/26 ,  C08K5/06 ,  C08K5/1515

摘要： Bisphenol derivatives having both alcoholic hydroxyl and allyl groups are novel and useful as reagents for modifying organic resins and silicone resins.

摘要翻译： 具有醇羟基和烯丙基两者的双酚衍生物是新型的，可用作改性有机树脂和有机硅树脂的试剂。

公开(公告)号：US20130029145A1

公开(公告)日：2013-01-31

申请号：US13556655

申请日：2012-07-24

申请人： Hideto Kato ,  Michihiro Sugo ,  Shohei Tagami

发明人： Hideto Kato ,  Michihiro Sugo ,  Shohei Tagami

IPC分类号： C09J183/04 ,  C09J7/02 ,  B32B27/04 ,  B32B7/12 ,  B32B37/02 ,  B32B38/10

CPC分类号： H01L21/6836 ,  C08G77/04 ,  C08G77/14 ,  C08G77/52 ,  C08G77/70 ,  C09J183/04 ,  C09J183/14 ,  H01L2221/68327 ,  H01L2221/6834 ,  Y10T428/2848 ,  Y10T428/31515 ,  Y10T428/31663

摘要： A laminate comprising a support, a temporary adhesive layer, and a wafer having a circuit-forming front surface and a back surface to be processed allows for processing the wafer. The temporary adhesive layer consists of a first temporary bond layer (A) of thermoplastic organosiloxane polymer which is releasably bonded to the front surface of the wafer and a second temporary bond layer (B) of thermosetting modified siloxane polymer which is laid contiguous to the first temporary bond layer and releasably bonded to the support.

摘要翻译： 包括支撑体，临时粘合剂层和具有电路形成前表面和待加工的背面的晶片的层压体允许处理晶片。 临时粘合剂层由热塑性有机硅氧烷聚合物的第一临时粘结层（A）组成，该第一临时粘结层（A）可释放地结合到晶片的前表面，以及热固性改性的硅氧烷聚合物的第二临时粘合层（B） 临时粘合层并且可释放地结合到载体上。

公开(公告)号：US20110305990A1

公开(公告)日：2011-12-15

申请号：US13157460

申请日：2011-06-10

申请人： Hideto KATO ,  Hiroshi Kanbara ,  Tomoyoshi Furihata ,  Yoshinori Hirano

发明人： Hideto KATO ,  Hiroshi Kanbara ,  Tomoyoshi Furihata ,  Yoshinori Hirano

IPC分类号： G03F7/20 ,  G03F7/004

CPC分类号： C09D163/04 ,  B81C1/00619 ,  B81C2201/0108 ,  G03F7/0226 ,  G03F7/0236 ,  G03F7/30 ,  G03F7/40 ,  G03F7/70466

摘要： A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, providing the inorganic material film with an aperture, and etching away the sacrificial film pattern through the aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) forming a sacrificial film using a composition comprising a cresol novolac resin and a crosslinker, (B) exposing patternwise the film to first high-energy radiation, (C) developing, and (D) exposing the sacrificial film pattern to second high-energy radiation and heat treating for thereby forming crosslinks within the cresol novolac resin.

摘要翻译： 通过图案化牺牲膜来制造微结构，在图案上形成无机材料膜，为无机材料膜提供孔，并通过孔蚀刻掉牺牲膜图案，以限定具有图案轮廓的空间 。 图案化阶段包括以下步骤：（A）使用包含甲酚酚醛清漆树脂和交联剂的组合物形成牺牲膜，（B）将膜图案化为第一高能辐射，（C）显影，和（D）曝光 牺牲膜图案到第二高能量辐射和热处理，从而在甲酚酚醛清漆树脂内形成交联。