公开(公告)号：US20160070167A1

公开(公告)日：2016-03-10

申请号：US14840654

申请日：2015-08-31

Applicant: FUJIFILM CORPORATION

Inventor： Shohei KATAOKA ,  Akinori SHIBUYA ,  Toshiaki FUKUHARA ,  Hajime FURUTANI ,  Michihiro SHIRAKAWA

IPC: G03F7/038 ,  G03F7/32 ,  C07C311/51 ,  G03F7/20

CPC classification number: G03F7/038 ,  C07C25/18 ,  C07C233/04 ,  C07C235/88 ,  C07C311/03 ,  C07C311/06 ,  C07C311/51 ,  C07C311/53 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  C07D327/06 ,  C07D333/46 ,  C07D333/76 ,  C07D411/06 ,  C08F220/26 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/325 ,  H01L21/0275

Abstract: There is provided a pattern forming method comprising (i) a step of forming a film containing an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a compound represented by the specific formula, (B) a compound different from the compound (A) and capable of generating an acid upon irradiation with an actinic ray or radiation, and (P) a resin that does not react with the acid generated from the compound (A) and is capable of decreasing the solubility for an organic solvent-containing developer by the action of the acid generated from the compound (B), (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern; the actinic ray-sensitive or radiation-sensitive resin composition above; a resist film using the composition.

Abstract translation: 提供了一种图案形成方法，其包括（i）形成含有光化射线敏感性或辐射敏感性树脂组合物的膜的步骤，所述树脂组合物含有（A）由特定式表示的化合物，（B）不同于化合物 （A），并且能够在用光化射线或辐射照射时产生酸，和（P）不与化合物（A）产生的酸反应的树脂，并且能够降低对有机溶剂 - 通过由化合物（B）产生的酸的作用，（ii）曝光膜的步骤，和（iii）通过使用含有机溶剂的显影剂显影曝光的膜以形成负型图案的步骤 ; 上述的光化射线敏感或辐射敏感树脂组合物; 使用该组合物的抗蚀剂膜。

公开(公告)号：US20160048082A1

公开(公告)日：2016-02-18

申请号：US14919329

申请日：2015-10-21

Applicant: FUJIFILM Corporation

Inventor： Masafumi KOJIMA ,  Akiyoshi GOTO ,  Michihiro SHIRAKAWA ,  Hajime FURUTANI ,  Akinori SHIBUYA

IPC: G03F7/32 ,  G03F7/20

CPC classification number: G03F7/325 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/2053

Abstract: A pattern-forming method includes forming a film on a substrate by using an actinic ray-sensitive or radiation-sensitive resin composition containing at least a resin that exhibits, due to an action of an acid, increase in polarity and decrease in solubility with respect to a developer including an organic solvent, and a compound that generates an acid by being irradiated with actinic rays or radiation; exposing the film; and forming a negative tone pattern by developing the exposed film with a developer including an organic solvent, in which the developer includes at least one compound A selected from the group consisting of an onium salt, a polymer having an onium salt, a nitrogen-containing compound including three or more nitrogen atoms, a basic polymer, and a phosphorus-based compound.

Abstract translation: 图案形成方法包括通过使用至少含有树脂的光化射线敏感性或辐射敏感性树脂组合物在基材上形成膜，所述树脂组合物由于酸的作用而显示极性增加并且溶解度降低 包括有机溶剂的显影剂和通过用光化射线或辐射照射产生酸的化合物; 曝光电影; 以及通过用包括有机溶剂的显影剂显影所述曝光膜形成负色调图案，其中所述显影剂包括至少一种选自以下的化合物A：鎓盐，具有鎓盐的聚合物，含氮的 包括三个或更多个氮原子的化合物，碱性聚合物和磷基化合物。

公开(公告)号：US20140234761A1

公开(公告)日：2014-08-21

申请号：US14261896

申请日：2014-04-25

Applicant: FUJIFILM Corporation

Inventor： Michihiro SHIRAKAWA ,  Keita KATO ,  Tadahiro ODANI ,  Atsushi NAKAMURA ,  Hidenori TAKAHASHI ,  Kaoru IWATO

IPC: G03F7/095 ,  G03F7/30

CPC classification number: G03F7/095 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0757 ,  G03F7/091 ,  G03F7/094 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/325 ,  H01L21/0271

Abstract: A pattern forming method contains: (i) a step of forming a first film on a substrate by using a first resin composition (I), (ii) a step of forming a second film on the first film by using a second resin composition (II) different from the resin composition (I), (iii) a step of exposing a multi-layered film having the first film and the second film, and (iv) a step of developing the first film and the second film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.

Abstract translation: 图案形成方法包括：（i）通过使用第一树脂组合物（I）在基材上形成第一膜的步骤，（ii）通过使用第二树脂组合物在第一膜上形成第二膜的步骤 II），（iii）暴露具有第一膜和第二膜的多层膜的步骤，和（iv）在暴露的第一膜和第二膜中显影第一膜和第二膜的步骤 通过使用含有机溶剂的显影剂形成负图案的多层膜。

公开(公告)号：US20140045117A1

公开(公告)日：2014-02-13

申请号：US14035139

申请日：2013-09-24

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Hidenori TAKAHASHI ,  Michihiro SHIRAKAWA ,  Shohei KATAOKA ,  Shoichi SAITOH ,  Fumihiro YOSHINO

IPC: G03F7/038

CPC classification number: G03F7/0382 ,  C08F20/28 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/405 ,  C08F2220/283 ,  C08F220/42 ,  C08F2220/1825

Abstract: A pattern forming method, includes: (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a1) a repeating unit capable of decomposing by an action of an acid to produce a carboxyl group, represented by the following formula (I) as defined in the specification and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film; and (iii) a step of performing a development by using a developer containing an organic solvent to form a negative pattern.

Abstract translation: 图案形成方法包括：（i）从含有（P）具有（a1）能够通过酸的作用分解的重复单元的树脂的光化射线敏感性或辐射敏感性树脂组合物形成膜的步骤 以产生由本说明书中定义的下式（I）表示的羧基，和（B）能够在用光化射线或辐射照射时产生酸的化合物; （ii）曝光胶片的步骤; 和（iii）通过使用含有有机溶剂的显影剂进行显影以形成负图案的步骤。

公开(公告)号：US20140011134A1

公开(公告)日：2014-01-09

申请号：US14011837

申请日：2013-08-28

Applicant: Fujifilm Corporation

Inventor： Hidenori TAKAHASHI ,  Shuhei YAMAGUCHI ,  Shohei KATAOKA ,  Michihiro SHIRAKAWA ,  Fumihiro YOSHINO ,  Shoichi SAITOH

IPC: G03F7/004 ,  G03F7/20

CPC classification number: G03F7/004 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/40

Abstract: A pattern forming method contains (i) a step of forming a film by an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a) a repeating unit represented by the specific formula, and (B) a compound capable of generating an organic acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film, and (iii) a step of developing the film by using an organic solvent-containing developer to form a negative pattern.

Abstract translation: 图案形成方法包括（i）通过含有（P）具有（a）由该具体式表示的重复单元的树脂的光化射线敏感性或辐射敏感性树脂组合物形成膜的步骤，（B） 能够在用光化射线或辐射照射时产生有机酸的化合物; （ii）曝光该薄膜的步骤，（iii）通过使用含有机溶剂的显影剂来显影该薄膜以形成负图形的步骤。