公开(公告)号：US08083901B2

公开(公告)日：2011-12-27

申请号：US12071218

申请日：2008-02-19

申请人： Arun K. Sharma ,  Theodore Sideropoulos ,  Berne K. Stober ,  Brian D. Albert ,  Alvin U. Chen ,  Vikram Singh

发明人： Arun K. Sharma ,  Theodore Sideropoulos ,  Berne K. Stober ,  Brian D. Albert ,  Alvin U. Chen ,  Vikram Singh

IPC分类号： B01D3/06 ,  B01D3/20

CPC分类号： B01D1/305 ,  B01D3/18 ,  B01D3/20 ,  B01D3/205

摘要： A de-entrainment device separates entrained liquid from vapor in a fluid stream that flows through a chimney tray in a distillation tower. The separated liquid is collected and shielded from the fluid stream to prevent re-entrainment of the liquid in the vapor flowing upward into the tower. The chimney tray includes risers with hats that have gutters to guide liquid toward the tray deck, channels to collect and drain liquid from the top of the hats to the tray deck, and baffles extending from the risers to shield the liquid collected on the tray deck from the vapor flow.

摘要翻译： 去夹带装置将流过流过蒸馏塔中的烟囱式塔板的流体流中的夹带液体与蒸汽分离。 分离的液体被收集并从流体流屏蔽，以防止液体向上流入塔中的蒸汽再次夹带。 烟囱式托盘包括具有盖子的立管，其具有导槽以将液体引向托盘甲板，通道收集并将液体从帽子的顶部排出到托盘甲板，以及从立管延伸的挡板以屏蔽收集在托盘甲板上的液体 从蒸汽流。

公开(公告)号：US20090104761A1

公开(公告)日：2009-04-23

申请号：US11875062

申请日：2007-10-19

申请人： Yongbae Jeon ,  Vikram Singh ,  Timothy Miller ,  Ziwei Fang ,  Steven Walther ,  Atul Gupta

发明人： Yongbae Jeon ,  Vikram Singh ,  Timothy Miller ,  Ziwei Fang ,  Steven Walther ,  Atul Gupta

IPC分类号： H01L21/26 ,  C23C16/513

CPC分类号： H01J37/32642 ,  H01J37/32412 ,  H01J37/32935

摘要： A method of plasma doping includes generating a plasma comprising dopant ions proximate to a platen supporting a substrate in a plasma chamber. The platen is biased with a bias voltage waveform having a negative potential that attracts ions in the plasma to the substrate for plasma doping. At least one sensor measuring data related to charging conditions favorable for forming an electrical discharge is monitored. At least one plasma process parameter is modified in response to the measured data, thereby reducing a probability of forming an electrical discharge.

摘要翻译： 等离子体掺杂的方法包括产生等离子体，该等离子体包括邻近于在等离子体室中支撑衬底的压板的掺杂剂离子。 压板被具有负电位的偏压电压波形偏置，其将等离子体中的离子吸引到用于等离子体掺杂的衬底。 监测至少一个测量与有利于形成放电的充电条件有关的数据的传感器。 响应于测量数据修改至少一个等离子体处理参数，从而降低形成放电的可能性。

公开(公告)号：US20080200015A1

公开(公告)日：2008-08-21

申请号：US11676069

申请日：2007-02-16

申请人： Timothy Miller ,  Vikram Singh

发明人： Timothy Miller ,  Vikram Singh

IPC分类号： H01L21/04

CPC分类号： H01L21/2236 ,  H01J37/32412 ,  H01J37/32706

摘要： A method of multi-step plasma doping a substrate includes igniting a plasma from a process gas. A first plasma condition is established for performing a first plasma doping step. The substrate is biased so that ions in the plasma having the first plasma condition impact a surface of the substrate thereby exposing the substrate to a first dose. The first plasma condition transitions to a second plasma condition. The substrate is biased so that ions in the plasma having the second plasma condition impact the surface of the substrate thereby exposing the substrate to a second dose. The first and second plasma conditions are chosen so that the first and second doses combine to achieve a predetermined distribution of dose across at least a portion of the substrate.

摘要翻译： 多级等离子体掺杂衬底的方法包括从处理气体点燃等离子体。 建立第一等离子体条件用于执行第一等离子体掺杂步骤。 衬底被偏置，使得具有第一等离子体状态的等离子体中的离子影响衬底的表面，从而将衬底暴露于第一剂量。 第一等离子体条件转变到第二等离子体条件。 衬底被偏置，使得具有第二等离子体状态的等离子体中的离子冲击衬底的表面，从而将衬底暴露于第二剂量。 选择第一和第二等离子体条件使得第一和第二剂量组合以实现在衬底的至少一部分上的预定剂量分布。

公开(公告)号：US07383233B1

公开(公告)日：2008-06-03

申请号：US09710543

申请日：2000-11-09

申请人： Vikram Singh ,  Lisa McClung ,  Gilbert C. L. Leong ,  Karl-Heinz Hetfleisch-Wenzel

发明人： Vikram Singh ,  Lisa McClung ,  Gilbert C. L. Leong ,  Karl-Heinz Hetfleisch-Wenzel

IPC分类号： H04K1/00

CPC分类号： G06Q30/06 ,  G06Q50/188

摘要： A method for designing an electronic transactions system and forming a proposal for doing business on a global communications network is disclosed. The invention includes reviewing existing direct sales screening processes, creating new processes, integrating new and existing screening processes, determining and implementing legal terms and conditions for electronic transactions and forming electronic media for posting. Additional steps may include identifying possible transactions based on available products and services, approaching subject matter experts to obtain data, preparing electronic templates and filter mechanisms, and presentation of proposed methods. Steps dealing with legal issues include incorporating terms and conditions of sales through the site, preparing agreements for financial institutions to govern electronic payments, and developing exclusion clauses for traditional third party contracts. Key project personnel create content for an interactive site on a global communications network. A system for filtering and collecting payments electronically may also be implemented.

摘要翻译： 公开了一种用于设计电子交易系统并形成在全球通信网络上进行业务的提案的方法。 本发明包括审查现有的直接销售筛选流程，创建新流程，整合新的和现有的筛选流程，确定和实施电子交易的法律条款和条件，形成电子媒体发布。 附加步骤可以包括基于可用的产品和服务识别可能的交易，接近主题专家获取数据，准备电子模板和过滤机制以及提出的方法的呈现。 处理法律问题的步骤包括通过现场纳入销售条款和条件，为金融机构制定协议以管理电子支付，以及制定传统第三方合同的排除条款。 主要项目人员在全球通信网络上为互动网站创建内容。 也可以实现用于电子过滤和收取付款的系统。

公开(公告)号：US20070084564A1

公开(公告)日：2007-04-19

申请号：US11163303

申请日：2005-10-13

申请人： Atul Gupta ,  Edmund Winder ,  Vikram Singh ,  Harold Persing

发明人： Atul Gupta ,  Edmund Winder ,  Vikram Singh ,  Harold Persing

IPC分类号： C23F1/00

CPC分类号： H01J37/321 ,  H01J37/32412 ,  H01L21/26513 ,  H01L21/26526 ,  H01L21/2658 ,  H01L21/26586 ,  H01L29/66803

摘要： A doping apparatus includes a chamber and a plasma source. The plasma source generates dopant ions from a feed gas and provides the dopant ions to the chamber. A platen is positioned in the chamber proximate to the plasma source. The platen supports a substrate having planar and nonplanar features. At least one of a pressure proximate to the substrate, a flow rate of the feed gas, a power of the plasma, and a voltage applied to the platen is chosen so that dopant ions are implanted into both the planar and non-planar nonplanar features surfaces of the substrate.

摘要翻译： 掺杂装置包括腔室和等离子体源。 等离子体源从进料气体产生掺杂剂离子，并将掺杂剂离子提供给室。 压板位于室中，靠近等离子体源。 压板支撑具有平面和非平面特征的衬底。 选择靠近衬底的压力，进料气体的流速，等离子体的功率和施加到压板的电压中的至少一个，使得掺杂剂离子注入平面和非平面非平面特征 基板的表面。

公开(公告)号：US20050260354A1

公开(公告)日：2005-11-24

申请号：US10850222

申请日：2004-05-20

申请人： Vikram Singh ,  Atul Gupta ,  Harold Persing ,  Steven Walther ,  Anne Testoni

发明人： Vikram Singh ,  Atul Gupta ,  Harold Persing ,  Steven Walther ,  Anne Testoni

IPC分类号： H01J37/32 ,  C23C14/00 ,  C23C16/00

CPC分类号： H01J37/32495 ,  H01J37/32412

摘要： A method for plasma ion implantation of a substrate includes providing a plasma ion implantation system including a process chamber, a source for producing a plasma in the process chamber, a platen for holding the substrate in the process chamber, and a voltage source for accelerating ions from the plasma into the substrate, depositing on interior surfaces of the process chamber a fresh coating that is similar in composition to a deposited film that results from plasma ion implantation of the substrate, before depositing the fresh coating, cleaning interior surfaces of the process chamber by removing an old film using one or more activated cleaning precursors, plasma ion implantation of the substrate according to a plasma ion implantation process, and repeating the steps of cleaning interior surfaces of the process chamber and depositing a fresh coating following plasma ion implantation of one or more substrates.

摘要翻译： 用于等离子体离子注入衬底的方法包括提供等离子体离子注入系统，其包括处理室，用于在处理室中产生等离子体的源，用于将衬底保持在处理室中的压板和用于加速离子的电压源 从等离子体进入衬底，在沉积新鲜涂层之前，在沉积新鲜涂层之前，在处理室的内表面上沉积与组合物中与等离子体离子注入导致的沉积膜相似的新涂层，清洁处理室的内表面 通过使用一种或多种激活的清洁前体去除旧膜，根据等离子体离子注入工艺等离子体离子注入基板，并重复清洁处理室的内表面并在等离子体离子注入之后沉积新涂层的步骤 或更多的基材。

公开(公告)号：US20050205212A1

公开(公告)日：2005-09-22

申请号：US10905172

申请日：2004-12-20

申请人： Vikram Singh ,  Harold Persing ,  Timothy Miller

发明人： Vikram Singh ,  Harold Persing ,  Timothy Miller

IPC分类号： H01J37/32 ,  C23F1/00

CPC分类号： H01J37/32412

摘要： A plasma source includes a chamber that contains a process gas. The chamber has a chamber top comprising a first section formed of a dielectric material that extends in a horizontal direction. A second section of the chamber top is formed of a dielectric material that extends a height from the first section in a vertical direction. A top section of the chamber top is formed of a conductive material that extends a length across the second section in the horizontal direction. A radio frequency antenna is positioned proximate to at least one of the first section and the second section. The radio frequency antenna induces radio frequency currents into the chamber that excite and ionize the process gas so as to generate a plasma in the chamber.

摘要翻译： 等离子体源包括含有工艺气体的腔室。 该室具有室顶部，其包括由在水平方向上延伸的电介质材料形成的第一部分。 腔室顶部的第二部分由在垂直方向上从第一部分延伸高度的电介质材料形成。 腔室顶部的顶部由导电材料形成，该导电材料在水平方向上延伸穿过第二部分的长度。 无线电频率天线位于第一部分和第二部分中的至少一个附近。 射频天线将射频电流引入到腔室中，激发和离子化处理气体，以便在腔室中产生等离子体。

公开(公告)号：US6039836A

公开(公告)日：2000-03-21

申请号：US993791

申请日：1997-12-19

申请人： Rajinder Dhindsa ,  Vikram Singh ,  Ken Tokunaga

发明人： Rajinder Dhindsa ,  Vikram Singh ,  Ken Tokunaga

IPC分类号： H05H1/46 ,  C23C16/505 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  C23C16/50 ,  H05H1/00

CPC分类号： H01J37/32623 ,  H01J37/32642 ,  Y10S156/915

摘要： An improved focus ring is configured for use in a plasma processing chamber. The focus ring is configured to overlap at least a portion of a substrate-holding chuck that is powered by radio frequency (RF) power during plasma operation to act as an electrode. The focus ring includes an upper surface that is exposed to a plasma region within the plasma processing chamber during the plasma operation. The focus ring further includes a chuck-overlapping portion that overlaps the portion of the substrate-holding chuck, at least a portion of the chuck-overlapping portion being formed of a first material having a lower dielectric constant than a remainder of the focus ring.

摘要翻译： 改进的聚焦环被配置用于等离子体处理室。 聚焦环被配置为与在等离子体操作期间由射频（RF）功率供电的基板保持卡盘的至少一部分重叠以用作电极。 聚焦环包括在等离子体操作期间暴露于等离子体处理室内的等离子体区域的上表面。 焦点环还包括与基板保持卡盘的部分重叠的卡盘重叠部分，卡盘重叠部分的至少一部分由具有比聚焦环的剩余部分更低的介电常数的第一材料形成。

公开(公告)号：US20110111159A1

公开(公告)日：2011-05-12

申请号：US12855399

申请日：2010-08-12

申请人： Frank SINCLAIR ,  Vikram Singh

发明人： Frank SINCLAIR ,  Vikram Singh

IPC分类号： B05D5/12 ,  B32B3/02

CPC分类号： G11B5/012 ,  B82Y10/00 ,  G11B5/743

摘要： An improved patterned magnetic bit data storage media and a method for manufacturing the same is disclosed. In one particular exemplary embodiment, the improved patterned magnetic bit data storage media may comprise an active region exhibiting substantially ferromagnetism; and an inactive region exhibiting substantially paramagnetism, the inactive region comprising at least two grains and a grain boundary interposed therebetween, wherein each of the at least two grains contain ferromagnetic material, and wherein the at least two grains are antiferromagnetically coupled.

摘要翻译： 公开了一种改进的图案化磁位数据存储介质及其制造方法。 在一个特定示例性实施例中，改进的图案化磁位数据存储介质可以包括显示出基本上铁磁性的有源区; 和表现出基本上顺磁性的非活性区域，所述非活性区域包含至少两个晶粒和插入其间的晶界，其中所述至少两个晶粒中的每一个含有铁磁材料，并且其中所述至少两个晶粒是反铁磁耦合的。

公开(公告)号：US20100048018A1

公开(公告)日：2010-02-25

申请号：US12198083

申请日：2008-08-25

申请人： Atul Gupta ,  Heyun Yin ,  Vikram Singh

发明人： Atul Gupta ,  Heyun Yin ,  Vikram Singh

IPC分类号： H01L21/768

CPC分类号： H01L21/76834 ,  H01L21/76822 ,  H01L21/76825 ,  H01L21/76826 ,  H01L21/76832 ,  H01L21/76883 ,  H01L21/76886

摘要： A method of fabricating metal interconnects with reduced electromigration includes depositing metal interconnects on a substrate comprising electronic devices. A layer is deposited on the metal interconnects. The layer is doped with at least one dopant having a dopant concentration that increases an electromigration resistance of the metal atoms.

摘要翻译： 制造具有减少的电迁移的金属互连的方法包括在包括电子器件的衬底上沉积金属互连。 一层沉积在金属互连上。 该层掺杂有至少一种具有增加金属原子的电迁移阻力的掺杂剂浓度的掺杂剂。