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公开(公告)号:US10462391B2
公开(公告)日:2019-10-29
申请号:US15210056
申请日:2016-07-14
Applicant: KLA-Tencor Corporation
Inventor: Yung-Ho Alex Chuang , David L. Brown , Devis Contarato , John Fielden , Daniel I. Kavaldjiev , Guoheng Zhao , Jehn-Huar Chern , Guowu Zheng , Donald W. Pettibone , Stephen Biellak
IPC: H04N5/335 , G01N21/95 , G06T7/00 , H04N5/225 , H04N5/347 , H04N5/378 , H04N5/3745 , H04N5/376 , G01N21/956
Abstract: An inspection system and methods in which analog image data values (charges) captured by an image sensor are binned (combined) before or while being transmitted as output signals on the image sensor's output sensing nodes (floating diffusions), and in which an ADC is controlled to sequentially generate multiple corresponding digital image data values between each reset of the output sensing nodes. According to an output binning method, the image sensor is driven to sequentially transfer multiple charges onto the output sensing nodes between each reset, and the ADC is controlled to convert the incrementally increasing output signal after each charge is transferred onto the output sensing node. According to a multi-sampling method, multiple charges are vertically or horizontally binned (summed/combined) before being transferred onto the output sensing node, and the ADC samples each corresponding output signal multiple times. The output binning and multi-sampling methods may be combined.
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公开(公告)号:US20190131465A1
公开(公告)日:2019-05-02
申请号:US16151225
申请日:2018-10-03
Applicant: KLA-Tencor Corporation
Inventor: Jehn-Huar Chern , Ali R. Ehsani , Gildardo Delgado , David L. Brown , Yung-Ho Alex Chuang , John Fielden
IPC: H01L31/0216 , G01N21/956 , H01L27/146 , G01N21/95 , H01L27/148 , G01N21/88
CPC classification number: H01L31/0216 , G01N21/8806 , G01N21/9501 , G01N21/956 , G01N2021/95676 , H01L27/1462 , H01L27/1464 , H01L27/14685 , H01L27/14689 , H01L27/14806
Abstract: An inspection system including an optical system (optics) to direct light from an illumination source to a sample, and to direct light reflected/scattered from the sample to one or more image sensors. At least one image sensor of the system is formed on a semiconductor membrane including an epitaxial layer having opposing surfaces, with circuit elements formed on one surface of the epitaxial layer, and a pure boron layer and a doped layer on the other surface of the epitaxial layer. The image sensor may be fabricated using CCD (charge coupled device) or CMOS (complementary metal oxide semiconductor) technology. The image sensor may be a two-dimensional area sensor, or a one-dimensional array sensor. The image sensor can be included in an electron-bombarded image sensor and/or in an inspection system.
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公开(公告)号:US20190066962A1
公开(公告)日:2019-02-28
申请号:US16177144
申请日:2018-10-31
Applicant: KLA-Tencor Corporation
Inventor: Yung-Ho Alex Chuang , John Fielden
IPC: H01J29/38 , H01L27/148 , H01J31/50 , G02B21/12 , G01N21/95 , H01J31/26 , H01J1/34 , H01L27/146
Abstract: A photocathode is formed on a monocrystalline silicon substrate having opposing illuminated (top) and output (bottom) surfaces. To prevent oxidation of the silicon, a thin (e.g., 1-5 nm) boron layer is disposed directly on the output surface using a process that minimizes oxidation and defects. An optional second boron layer is formed on the illuminated (top) surface, and an optional anti-reflective material layer is formed on the second boron layer to enhance entry of photons into the silicon substrate. An optional external potential is generated between the opposing illuminated (top) and output (bottom) surfaces. The photocathode forms part of novel electron-bombarded charge-coupled device (EBCCD) sensors and inspection systems.
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公开(公告)号:US20190049851A1
公开(公告)日:2019-02-14
申请号:US16161010
申请日:2018-10-15
Applicant: KLA-Tencor Corporation
Inventor: Yung-Ho Alex Chuang , Yinying Xiao-Li , Xuefeng Liu , John Fielden
IPC: G03F7/20 , H01J37/073 , H01J1/34 , H01J1/304 , H01J35/06
CPC classification number: G03F7/70008 , H01J1/304 , H01J1/34 , H01J35/065 , H01J37/073 , H01J2201/30411 , H01J2201/3048 , H01J2237/0635
Abstract: An electron source is formed on a silicon substrate having opposing first and second surfaces. At least one field emitter is prepared on the second surface of the silicon substrate to enhance the emission of electrons. To prevent oxidation of the silicon, a thin, contiguous boron layer is disposed directly on the output surface of the field emitter using a process that minimizes oxidation and defects. The field emitter can take various shapes such as pyramids and rounded whiskers. One or several optional gate layers may be placed at or slightly lower than the height of the field emitter tip in order to achieve fast and accurate control of the emission current and high emission currents. The field emitter can be p-type doped and configured to operate in a reverse bias mode or the field emitter can be n-type doped.
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75.
公开(公告)号:US10044164B2
公开(公告)日:2018-08-07
申请号:US15239268
申请日:2016-08-17
Applicant: KLA-Tencor Corporation
Inventor: Yung-Ho Alex Chuang , Xiaoxu Lu , Justin Dianhuan Liou , J. Joseph Armstrong , Yujun Deng , John Fielden
Abstract: A repetition rate (pulse) multiplier includes one or more beam splitters and prisms forming one or more ring cavities with different optical path lengths that delay parts of the energy of each pulse. A series of input laser pulses circulate in the ring cavities and part of the energy of each pulse leaves the system after traversing the shorter cavity path, while another part of the energy leaves the system after traversing the longer cavity path, and/or a combination of both cavity paths. By proper choice of the ring cavity optical path length, the repetition rate of an output series of laser pulses can be made to be a multiple of the input repetition rate. The relative energies of the output pulses can be controlled by choosing the transmission and reflection coefficients of the beam splitters. Some embodiments generate a time-averaged output beam profile that is substantially flat in one dimension.
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公开(公告)号:US10032619B2
公开(公告)日:2018-07-24
申请号:US15842540
申请日:2017-12-14
Applicant: KLA-Tencor Corporation
Inventor: Yung-Ho Alex Chuang , Xiaoxu Lu , Justin Liou , John Fielden
CPC classification number: H01J61/025 , H01J61/125 , H01J61/16 , H01J61/20 , H01J61/54 , H01J65/04 , H05H1/24
Abstract: A high brightness laser-sustained broadband light source includes a gas containment structure and a pump laser configured to generate a pump beam including illumination of a wavelength at least proximate to a weak absorption line of a neutral gas contained in the gas containment structure. The broadband light source includes one or more anamorphic illumination optics configured to focus the pump beam into an approximately elliptical beam waist positioned in or proximate to the center of the gas containment structure. The broadband light source includes one or more first collection optics configured to collect broadband radiation emitted by the plasma in a direction substantially aligned with a longer axis of the elliptical beam waist.
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公开(公告)号:US20180070040A1
公开(公告)日:2018-03-08
申请号:US15806913
申请日:2017-11-08
Applicant: KLA-Tencor Corporation
Inventor: Yung-Ho Alex Chuang , John Fielden , David L. Brown , Jingjing Zhang , Keith Lyon , Mark Shi Wang
IPC: H04N5/3722
CPC classification number: H04N5/3722 , G01N21/956 , G01N2201/12
Abstract: Pixel aperture size adjustment in a linear sensor is achieved by applying more negative control voltages to central regions of the pixel's resistive control gate, and applying more positive control voltages to the gate's end portions. These control voltages cause the resistive control gate to generate an electric field that drives photoelectrons generated in a selected portion of the pixel's light sensitive region into a charge accumulation region for subsequent measurement, and drives photoelectrons generated in other portions of the pixel's light sensitive region away from the charge accumulation region for subsequent discard or simultaneous readout. A system utilizes optics to direct light received at different angles or locations from a sample into corresponding different portions of each pixel's light sensitive region. Multiple aperture control electrodes are selectively actuated to collect/measure light received from either narrow or wide ranges of angles or locations, thereby enabling rapid image data adjustment.
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78.
公开(公告)号:US09804101B2
公开(公告)日:2017-10-31
申请号:US14300227
申请日:2014-06-09
Applicant: KLA-Tencor Corporation
Inventor: Yujun Deng , Yung-Ho Chuang , John Fielden
CPC classification number: G01N21/9501 , G01N21/8806 , G02F1/3534 , G02F1/39 , H01S3/0078 , H01S3/0092 , H01S3/094015
Abstract: A DUV laser includes an optical bandwidth filtering device, such as etalon, which is disposed outside of the laser oscillator cavity of the fundamental laser, and which directs one range of wavelengths into one portion of a frequency conversion chain and another range of wavelengths into another portion of the frequency conversion train, thereby reducing the bandwidth of the DUV laser output while maintaining high conversion efficiency in the frequency conversion chain.
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公开(公告)号:US20170070025A1
公开(公告)日:2017-03-09
申请号:US15335266
申请日:2016-10-26
Applicant: KLA-Tencor Corporation
Inventor: Yung-Ho Chuang , Xiaoxu Lu , John Fielden
IPC: H01S3/109
CPC classification number: H01S3/109 , G02F1/353 , G02F1/3534 , G02F1/3558 , G02F2001/3507 , G02F2001/354 , G02F2201/17 , G02F2203/15 , H01S3/0092
Abstract: A deep ultra-violet (DUV) continuous wave (CW) laser includes a fundamental CW laser configured to generate a fundamental frequency with a corresponding wavelength between about 1 μm and 1.1 μm, a third harmonic generator module including one or more non-linear optical (NLO) crystals that generate a third harmonic and an optional second harmonic, and a fifth harmonic generator. The fifth harmonic generator module includes a cavity resonant at the fundamental frequency, and combines the fundamental frequency with the third harmonic in a first NLO crystal to generate a fourth harmonic, then combines the fourth harmonic with unconsumed fundamental frequency in a second NLO crystal to generate the fifth harmonic. One or more lenses are used to focus the third and fourth harmonics in the first and second NLO crystals, respectively.
Abstract translation: 深紫外(DUV)连续波(CW)激光器包括配置为产生具有约1μm和1.1μm之间的对应波长的基频的基本CW激光器,包括一个或多个非线性光学器件的三次谐波发生器模块 (NLO)晶体,其产生三次谐波和可选的二次谐波,以及五次谐波发生器。 第五谐波发生器模块包括在基频处谐振的腔,并且在第一NLO晶体中组合基频和三次谐波以产生第四谐波,然后在第二NLO晶体中组合第四谐波与未消耗的基频,以产生 五次谐波。 使用一个或多个透镜来分别在第一和第二NLO晶体中聚焦第三和第四谐波。
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公开(公告)号:US20170063026A1
公开(公告)日:2017-03-02
申请号:US15344383
申请日:2016-11-04
Applicant: KLA-Tencor Corporation
Inventor: Yung-Ho Chuang , J. Joseph Armstrong , Yujun Deng , Justin Dianhuan Liou , Vladimir Dribinski , John Fielden
IPC: H01S4/00
CPC classification number: H01S3/302 , G01N21/9501 , G02B17/0892 , G02F1/353 , G02F1/395 , G02F2001/354 , H01S3/005 , H01S3/0092 , H01S3/067 , H01S3/06754 , H01S3/10053 , H01S3/11 , H01S3/16 , H01S3/1643 , H01S3/1666 , H01S3/23 , H01S3/2308
Abstract: An improved solid-state laser for generating sub-200 nm light is described. This laser uses a fundamental wavelength between about 1030 nm and 1065 nm to generate the sub-200 nm light. The final frequency conversion stage of the laser creates the sub-200 nm light by mixing a wavelength of approximately 1109 nm with a wavelength of approximately 234 nm. By proper selection of non-linear media, such mixing can be achieved by nearly non-critical phase matching. This mixing results in high conversion efficiency, good stability, and high reliability.
Abstract translation: 描述了用于产生亚200nm光的改进的固态激光器。 该激光器使用约1030nm和1065nm之间的基本波长来产生亚200nm的光。 激光的最终变频阶段通过将约1109nm的波长与约234nm的波长混合而产生亚200nm的光。 通过适当选择非线性介质,可以通过几乎非关键的相位匹配来实现这种混合。 这种混合导致高转换效率,良好的稳定性和高可靠性。
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