公开(公告)号：US06678037B2

公开(公告)日：2004-01-13

申请号：US09971769

申请日：2001-10-09

申请人： Jan Van Elp ,  Martinus Hendrikus Antonius Leenders ,  Vadim Yevgenyevich Banine ,  Hugo Matthieu Visser ,  Levinus Pieter Bakker

发明人： Jan Van Elp ,  Martinus Hendrikus Antonius Leenders ,  Vadim Yevgenyevich Banine ,  Hugo Matthieu Visser ,  Levinus Pieter Bakker

IPC分类号： G03B2754

CPC分类号： G03F7/70575 ,  G03F7/70191 ,  G03F7/702

摘要： In a lithographic projection apparatus, a grating spectral filter is used to filter an EUV projection beam. The grating spectral filter is preferably a blazed, grazing incidence, reflective grating. Cooling channels may be provided in or on the rear of the grating spectral filter. The grating spectral filter may be formed of a material effectively invisible to the desired radiation.

摘要翻译： 在光刻投影设备中，使用光栅光谱滤波器来过滤EUV投影光束。 光栅光谱滤波器优选地是闪耀的，掠入射的反射光栅。 冷却通道可以设置在光栅光谱滤波器的背面中或后面。 光栅光谱滤波器可以由对期望的辐射有效地不可见的材料形成。

公开(公告)号：US09488574B2

公开(公告)日：2016-11-08

申请号：US12682939

申请日：2008-10-13

申请人： Thomas Koehler ,  Tim Nielsen ,  Bernhard Brendel ,  Andy Ziegler ,  Ronny Ziegler ,  Levinus Pieter Bakker ,  Martinus Bernardus Van Der Mark

发明人： Thomas Koehler ,  Tim Nielsen ,  Bernhard Brendel ,  Andy Ziegler ,  Ronny Ziegler ,  Levinus Pieter Bakker ,  Martinus Bernardus Van Der Mark

IPC分类号： G01N21/47 ,  A61B5/00 ,  G01N21/17

CPC分类号： G01N21/4795 ,  A61B5/0073 ,  A61B5/0091 ,  A61B5/4312 ,  A61B2562/146 ,  G01N2021/1787 ,  G01N2201/0826 ,  G01N2201/0833

摘要： A device (1) for imaging the interior of an optically turbid medium is provided. The device comprises a receptacle (3; 103) structured to accommodate an optically turbid medium for examination and an optically matching medium filling a space between an inner surface (6; 106) of the receptacle (3; 103) and the optically turbid medium. The device comprises at least one light source generating light to be coupled into the receptacle (3; 103) and at least one detector for detecting light emanating from the receptacle (3; 103). A coupling surface (10; 110) optically coupled to the inner surface (6; 106) of the receptacle and a coupling member (11; 111) optically coupled to the light source and the detector are provided. The coupling surface (10; 110) and the coupling member (11; 111) are movable to a plurality of different positions relative to each other and structured to establish an optical connection from the light source to the inner surface (6; 106) of the receptacle and from the inner surface (6; 106) of the receptacle to the at least one detector in the plurality of different positions.

摘要翻译： 提供了用于对光学混浊介质的内部成像的装置（1）。 该装置包括构造成容纳用于检查的光学混浊介质的容器（3; 103）和填充容器（3; 103）的内表面（6; 106）与光学混浊介质之间的空间的光学匹配介质。 所述装置包括至少一个光源，其产生要耦合到所述插座（3; 103）中的光和至少一个用于检测从所述插座（3; 103）发出的光的检测器。 光耦合到容器的内表面（6; 106）的耦合表面（10; 110）和光学耦合到光源和检测器的耦合构件（11; 111）。 联接表面（10; 110）和联接构件（11; 111）可以相对于彼此移动到多个不同的位置，并被构造成建立从光源到内表面（6; 106）的光学连接 所述容器和所述容器的内表面（6; 106）到所述多个不同位置中的所述至少一个检测器。

公开(公告)号：US08318288B2

公开(公告)日：2012-11-27

申请号：US10981736

申请日：2004-11-05

申请人： Levinus Pieter Bakker

发明人： Levinus Pieter Bakker

IPC分类号： G02B17/00

CPC分类号： G03F7/70191 ,  G02B1/11 ,  G02B5/00 ,  Y10T428/24355

摘要： An optical element includes a top layer which is transmissive for EUV radiation with wavelength λ in the range of 5-20 nm, and a structure of the top layer is a structure having an rms roughness value equal to or larger than λ/10 for spatial periods equal to or smaller than λ/2. The structure promotes transmission through the top layer to the optical element.

摘要翻译： 光学元件包括对波长λ在5-20nm范围内的EUV辐射透射的顶层，并且顶层的结构是具有等于或大于λ/ 10的rms粗糙度的结构用于空间 周期等于或小于λ/ 2。 该结构促进通过顶层的传输到光学元件。

公开(公告)号：US08269179B2

公开(公告)日：2012-09-18

申请号：US12318291

申请日：2008-12-24

申请人： Arnoud Cornelis Wassink ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

发明人： Arnoud Cornelis Wassink ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G03B27/52 ,  G03B27/72 ,  G01J3/10

CPC分类号： G03F7/70916

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统，配置成将辐射束投影到衬底上的投影系统，以及用于将碎屑颗粒从辐射束中过滤的过滤系统。 过滤器系统包括用于捕集碎片颗粒的多个箔，用于保持多个箔的支撑件，以及具有布置成要冷却的表面的冷却系统。 冷却系统和支撑件相对于彼此定位，使得在冷却系统的表面和支撑件之间形成间隙。 冷却系统还被布置成将气体注入到间隙中。

公开(公告)号：US20120163022A1

公开(公告)日：2012-06-28

申请号：US13376387

申请日：2010-06-07

申请人： Levinus Pieter Bakker ,  Jun She ,  Hugo Johan Cornelissen ,  Gongming Wei

发明人： Levinus Pieter Bakker ,  Jun She ,  Hugo Johan Cornelissen ,  Gongming Wei

IPC分类号： F21V7/00 ,  F21V7/07 ,  F21V7/04 ,  F21V7/08 ,  F21V8/00 ,  F21V7/06

CPC分类号： G02B6/0016 ,  G02B6/0021

摘要： This invention relates to an illumination apparatus. The illumination apparatus comprises a light guide plate and a light source configured to emit light into the light guide plate through a first surface, and the light guide plate comprises a concentrator configured to direct incident light in the light guide plate so as to radiate in a direction substantially parallel to a preset plane. The preset plane is perpendicular to any one of the top surface and bottom surface of the light guide plate, and intersects the first surface and a second surface of the light guide plate or intersects the first surface and one of the side surfaces at an angle that is substantially larger than the critical angle of a total reflection. In this way, unwanted light loss in the light guide plate is reduced, and the distribution of the light intensity or luminance along the light guide plate is improved, i.e., a substantially uniform distribution of the light intensity can be achieved.

摘要翻译： 本发明涉及一种照明装置。 照明装置包括导光板和被配置为通过第一表面将光发射到导光板中的光源，并且导光板包括集中器，其被配置为将入射光引导到导光板中以便辐射到 方向基本上平行于预设平面。 预设平面垂直于导光板的顶表面和底表面中的任何一个，并且与导光板的第一表面和第二表面相交，或者与第一表面和侧表面之一相交，角度与 远大于全反射的临界角。 以这种方式，导光板中的不需要的光损失减小，并且沿导光板的光强度或亮度分布得到改善，即可以实现大致均匀的光强分布。

公开(公告)号：US08173975B2

公开(公告)日：2012-05-08

申请号：US10599345

申请日：2005-03-18

申请人： Jeroen Jonkers ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

发明人： Jeroen Jonkers ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G21K5/00

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70908

摘要： A method for removing contaminant particles, such as atoms, molecules, clusters, ions, and the like, produced by a radiation source during generation of short-wave radiation having a wavelength of up to approximately 20 nm, includes guiding a first gas between the radiation source and a particle trap arranged in a wall of a chamber. In order to protect an optical device and/or articles to be irradiated against contamination, the method introducing a second gas into the chamber and its pressure is adjusted such that it is at least as high as the pressure of the first gas.

摘要翻译： 在产生具有高达约20nm的波长的短波辐射的产生期间，用于去除由辐射源产生的污染物颗粒（例如原子，分子，簇，离子等）的方法包括：引导第一气体 辐射源和布置在室的壁中的颗粒捕获器。 为了保护光学装置和/或要照射污染的物品，将第二气体引入室内的方法及其压力被调节至至少与第一气体的压力一样高。

公开(公告)号：US07852460B2

公开(公告)日：2010-12-14

申请号：US11482147

申请日：2006-07-07

申请人： Levinus Pieter Bakker ,  Jeroen Jonkers ,  Frank Jeroen Pieter Schuurmans ,  Hugo Matthieu Visser

发明人： Levinus Pieter Bakker ,  Jeroen Jonkers ,  Frank Jeroen Pieter Schuurmans ,  Hugo Matthieu Visser

IPC分类号： G03B27/54

CPC分类号： B82Y10/00 ,  G02B17/004 ,  G02B17/006 ,  G02B27/0043 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70891 ,  G03F7/70916

摘要： A lithographic projection apparatus includes a reflector assembly, the reflector assembly includes a first and a second reflector extending in a direction of an optical axis, the first and second reflector each having a reflective surface, a backing surface and an entry section at respectively a first and a second distance from the optical axis, the first distance being larger than the second distance, rays deriving from a point on the optical axis being cut off by the entry sections of the first and second reflectors and being reflected on the reflective surface of the first reflector and defining a high radiation intensity zone and a low radiation intensity zone between the reflectors; a radial support member configured to support the reflectors extending in the low radiation intensity zone, wherein the radial support member creates a shade in a downstream direction of the optical axis and a virtual shade in an upstream direction of the optical axis; and a structure placed in the virtual shade.

摘要翻译： 光刻投影设备包括反射器组件，反射器组件包括沿光轴方向延伸的第一和第二反射器，第一和第二反射器各自具有反射表面，背衬表面和入口部分分别为第一 并且与所述光轴的距离为第二距离，所述第一距离大于所述第二距离，从所述光轴上的点导出的光线被所述第一反射器和所述第二反射器的入射部分切断并且在所述光轴的反射表面上被反射 第一反射器并且在反射器之间限定高辐射强度区域和低辐射强度区域; 径向支撑构件，构造成支撑在低辐射强度区域中延伸的反射器，其中径向支撑构件在光轴的下游方向上产生阴影，并在光轴的上游方向上产生虚拟阴影; 以及放置在虚拟阴影中的结构。

公开(公告)号：US20100272331A1

公开(公告)日：2010-10-28

申请号：US12747177

申请日：2008-12-10

申请人： Bernhard Johannes Brendel ,  Tim Nielsen ,  Levinus Pieter Bakker ,  Henricus Wilhelm Peter Van Der Heijden

发明人： Bernhard Johannes Brendel ,  Tim Nielsen ,  Levinus Pieter Bakker ,  Henricus Wilhelm Peter Van Der Heijden

IPC分类号： G06T7/00

CPC分类号： A61B5/4312 ,  A61B5/0091

摘要： A method for assessing measurement quality in acquisition of an image of the interior of a medium (1) is provided. The method comprises the steps: subsequently irradiating the medium (1) with light from a plurality of different source positions (s) and, for each source position, detecting light emanating from the medium in a plurality of different detection positions (d) for acquisition of an image of the interior of the medium (1). The method further comprises the step: providing information about whether the measurement quality is deteriorated by exploiting signal symmetry under reversal of the light path.

摘要翻译： 提供了一种评估介质内部图像的测量质量的方法（1）。 该方法包括以下步骤：随后对来自多个不同源位置的光照射介质（1），并且对于每个源位置，在多个不同检测位置（d）中检测从介质发出的光以进行采集 介质（1）的内部的图像。 该方法还包括以下步骤：通过在光路反转下利用信号对称来提供关于测量质量是否劣化的信息。

公开(公告)号：US07714306B2

公开(公告)日：2010-05-11

申请号：US11512432

申请日：2006-08-30

申请人： Johannes Hubertus Josephina Moors ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

发明人： Johannes Hubertus Josephina Moors ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G21K5/10

CPC分类号： G03F7/70916 ,  G03F7/70983

摘要： A lithographic apparatus includes a radiation source configured to emit radiation to form a radiation beam, the radiation being of a type which can create plasma in a low pressure environment in the apparatus, and an optical component configured to condition the radiation beam, impart the conditioned radiation beam with a pattern in its cross-section to form a patterned radiation beam, project the patterned radiation beam onto a target portion of a substrate, and/or to detect radiation. The optical component is provided with a plasma quenching structure, the plasma quenching structure being configured to provide electron-ion recombination in, on and/or near the optical component.

摘要翻译： 光刻设备包括被配置为发射辐射以形成辐射束的辐射源，该辐射是能够在该设备中的低压环境中产生等离子体的类型，以及被配置为调节辐射束的光学部件， 辐射束在其横截面上具有图案以形成图案化的辐射束，将图案化的辐射束投影到衬底的目标部分上和/或检测辐射。 光学部件设置有等离子体淬火结构，等离子体淬火结构被配置为在光学部件的内部和/或附近提供电子 - 离子复合。

公开(公告)号：US07701554B2

公开(公告)日：2010-04-20

申请号：US11024013

申请日：2004-12-29

申请人： Levinus Pieter Bakker

发明人： Levinus Pieter Bakker

IPC分类号： G03B27/34 ,  G03B27/42

CPC分类号： G03F7/70958 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F7/70983 ,  G21K5/10 ,  G21K2201/067

摘要： An optical component for use in a lithographic apparatus. The optical component includes an optical element having an optical surface for reflecting electromagnetic radiation, and a protective zone covering the optical surface. The protective zone is provided with a material that substantially protects the optical surface against sputtering when the optical component is in use. The material has a refractive index that approximately equals unity for at least a predetermined wavelength of electromagnetic radiation to which the optical surface is exposed.

摘要翻译： 用于光刻设备的光学部件。 光学部件包括具有用于反射电磁辐射的光学表面的光学元件和覆盖光学表面的保护区域。 保护区设置有当光学部件在使用时基本上保护光学表面免受溅射的材料。 该材料具有对于光学表面暴露于的至少一个预定波长的电磁辐射近似等于1的折射率。