Compensation for distortion in contact lithography
    71.
    发明授权
    Compensation for distortion in contact lithography 失效
    接触光刻中的失真补偿

    公开(公告)号:US07613538B2

    公开(公告)日:2009-11-03

    申请号:US11492365

    申请日:2006-07-24

    摘要: A method of contact lithography includes predicting distortions likely to occur in transferring a pattern from a mold to a substrate during a contact lithography process; and modifying the mold to compensate for the distortions. A contact lithography system includes a design subsystem configured to generate data describing a lithography pattern; an analysis subsystem configured to identify one or more distortions likely to occur when using a mold created from the data; and a mold modification subsystem configured to modify the data to compensate for the one or more distortions identified by the analysis subsystem.

    摘要翻译: 接触光刻的方法包括预测在接触光刻工艺期间将图案从模具转移到衬底可能发生的变形; 并修改模具以补偿失真。 接触光刻系统包括设计子系统,被配置为产生描述光刻图案的数据; 分析子系统被配置为识别当使用从数据创建的模具时可能发生的一个或多个失真; 以及模具修改子系统,被配置为修改数据以补偿由分析子系统识别的一个或多个失真。

    Systems And Methods For Auto-Aligning Members Bearing Correlated Patterns
    72.
    发明申请
    Systems And Methods For Auto-Aligning Members Bearing Correlated Patterns 审中-公开
    自动对齐轴承相关模式的成员的系统和方法

    公开(公告)号:US20090246425A1

    公开(公告)日:2009-10-01

    申请号:US12262068

    申请日:2008-10-30

    IPC分类号: B32B7/04 B29C65/00 B29C43/20

    CPC分类号: G01B7/31 Y10T156/1744

    摘要: A method of aligning first and second mating surfaces includes: generating a random or pseudo-random function; convolving the random or pseudo-random function with a spread function to produce a correlated function; forming a pattern of bi-polar material on the first mating surface based on a quantization of the correlated function; and forming a complementary pattern of the bi-polar material on the second mating surface. The complementary patterns exert a force on each other toward a desired alignment of the first and second mating surfaces. A system includes a first member having a first correlated pattern of material disposed on a first mating surface; and a second member having a second correlated pattern of material disposed on a second mating surface, wherein the second correlated pattern is complementary to the first correlated pattern. The first and second correlated patterns interact to facilitate a desired alignment of the first and second members.

    摘要翻译: 对准第一和第二匹配表面的方法包括:产生随机或伪随机函数; 将随机或伪随机函数与扩展函数进行卷积以产生相关函数; 基于所述相关函数的量化,在所述第一配合表面上形成双极材料的图案; 以及在所述第二配合表面上形成所述双极材料的互补图案。 互补图案相互朝向第一和第二配合表面的期望对准施加力。 一种系统包括:第一构件,具有设置在第一配合表面上的材料的第一相关图案; 以及具有设置在第二配合表面上的材料的第二相关图案的第二构件,其中所述第二相关图案与所述第一相关图案互补。 第一和第二相关图案相互作用以促进第一和第二构件的期望对准。

    Microresonator systems and methods of fabricating the same
    73.
    发明授权
    Microresonator systems and methods of fabricating the same 有权
    微谐振器系统及其制造方法

    公开(公告)号:US07561770B2

    公开(公告)日:2009-07-14

    申请号:US11888016

    申请日:2007-07-30

    IPC分类号: G02B6/26 G02B6/42

    摘要: Various embodiments of the present invention are related to microresonator systems that can be used as a laser, a modulator, and a photodetector and to methods for fabricating the microresonator systems. In one embodiment, a microresonator system comprises a substrate having a top surface layer, at least one waveguide embedded within the substrate, and a microdisk having a top layer, an intermediate layer, a bottom layer, current isolation region, and a peripheral annular region. The bottom layer of the microdisk is in electrical communication with the top surface layer of the substrate and is positioned so that at least a portion of the peripheral annular region is located above the at least one waveguide. The current isolation region is configured to occupy at least a portion of a central region of the microdisk and has a relatively lower refractive index and relatively larger bandgap than the peripheral annular region.

    摘要翻译: 本发明的各种实施方案涉及可用作激光的微谐振器系统,调制器和光电检测器以及用于制造微谐振器系统的方法。 在一个实施例中,微谐振器系统包括具有顶表面层,嵌入在衬底内的至少一个波导的衬底和具有顶层,中间层,底层,电流隔离区和外围环形区的微盘 。 微型盘的底层与衬底的顶表面层电连通并且被定位成使得周边环形区域的至少一部分位于至少一个波导的上方。 电流隔离区被配置为占据微型盘的中心区域的至少一部分,并且具有比周边环形区域相对更低的折射率和相对较大的带隙。

    Method and system for offset estimation and alignment
    75.
    发明申请
    Method and system for offset estimation and alignment 有权
    偏移估计和校准的方法和系统

    公开(公告)号:US20080095407A1

    公开(公告)日:2008-04-24

    申请号:US11584074

    申请日:2006-10-20

    IPC分类号: G06K9/00 G06K9/36

    摘要: A method for determining an offset vector. The method includes obtaining an image of a first feature. An image of a second feature is also obtained. Also, a combination image of the first feature and the second feature is obtained. A plurality of composite images is utilized to determine an accurate offset vector between the first feature and the second feature in the combination image. The plurality of composite images is based on the image of the first feature and the image of the second feature.

    摘要翻译: 一种用于确定偏移矢量的方法。 该方法包括获得第一特征的图像。 还获得第二特征的图像。 此外,获得第一特征和第二特征的组合图像。 使用多个合成图像来确定组合图像中第一特征和第二特征之间的精确偏移矢量。 多个合成图像基于第一特征的图像和第二特征的图像。

    Compensation for distortion in contact lithography
    76.
    发明申请
    Compensation for distortion in contact lithography 失效
    接触光刻中的失真补偿

    公开(公告)号:US20080021587A1

    公开(公告)日:2008-01-24

    申请号:US11492365

    申请日:2006-07-24

    IPC分类号: G06F17/50 G06F19/00

    摘要: A method of contact lithography includes predicting distortions likely to occur in transferring a pattern from a mold to a substrate during a contact lithography process; and modifying the mold to compensate for the distortions. A contact lithography system includes a design subsystem configured to generate data describing a lithography pattern; an analysis subsystem configured to identify one or more distortions likely to occur when using a mold created from the data; and a mold modification subsystem configured to modify the data to compensate for the one or more distortions identified by the analysis subsystem.

    摘要翻译: 接触光刻的方法包括预测在接触光刻工艺期间将图案从模具转移到衬底可能发生的变形; 并修改模具以补偿失真。 接触光刻系统包括设计子系统,被配置为产生描述光刻图案的数据; 分析子系统被配置为识别当使用从数据创建的模具时可能发生的一个或多个失真; 以及模具修改子系统,被配置为修改数据以补偿由分析子系统识别的一个或多个失真。

    Photonic crystal Raman sensors and methods including the same
    77.
    发明申请
    Photonic crystal Raman sensors and methods including the same 有权
    光子晶体拉曼传感器和方法包括相同

    公开(公告)号:US20070252981A1

    公开(公告)日:2007-11-01

    申请号:US11413877

    申请日:2006-04-27

    IPC分类号: G01J3/44 G01N21/66

    CPC分类号: G01J3/44 G01N21/658

    摘要: Raman-enhancing structures include a photonic crystal having a resonant cavity and at least one waveguide coupled to the resonant cavity. A nanostructure comprising a Raman-enhancing material is disposed proximate the resonant cavity of the photonic crystal. Raman-enhancing structures include a microdisk resonator, at least one waveguide coupled to the microdisk resonator, and a nanostructure comprising a Raman-enhancing material disposed proximate the microdisk resonator. Methods for performing Raman spectroscopy include generating radiation, guiding the radiation through a waveguide to a resonant cavity in a photonic crystal or a microdisk resonator, resonating the radiation in the resonant cavity or microdisk resonator, providing an analyte proximate the resonant cavity or microdisk resonator, subjecting the analyte to the resonating radiation, and detecting Raman scattered radiation.

    摘要翻译: 拉曼增强结构包括具有谐振腔和耦合到谐振腔的至少一个波导的光子晶体。 包含拉曼增强材料的纳米结构设置在光子晶体的谐振腔附近。 拉曼增强结构包括微盘谐振器,耦合到微盘谐振器的至少一个波导和包括靠近微盘谐振器设置的拉曼增强材料的纳米结构。 用于执行拉曼光谱的方法包括产生辐射,将辐射通过波导引导到光子晶体或微盘谐振器中的谐振腔,谐振谐振腔或微盘谐振器中的辐射,提供靠近谐振腔或微盘谐振器的分析物, 对分析物进行共振辐射,并检测拉曼散射辐射。

    Active interconnects and control points in integrated circuits
    79.
    发明授权
    Active interconnects and control points in integrated circuits 有权
    集成电路中的有源互连和控制点

    公开(公告)号:US07242199B2

    公开(公告)日:2007-07-10

    申请号:US11112795

    申请日:2005-04-21

    IPC分类号: G01R27/08

    摘要: In various embodiments of the present invention, tunable resistors are introduced at the interconnect layer of integrated circuits in order to provide a for adjusting internal voltage and/or current levels within the integrated circuit to repair defective components or to configure the integrated circuit following manufacture. For example, when certain internal components, such as transistors, do not have specified electronic characteristics due to manufacturing defects, adjustment of the variable resistances of the tunable resistors included in the interconnect layer of integrated circuits according to embodiments of the present invention can be used to adjust internal voltage and/or levels in order to ameliorate the defective components. In other cases, the tunable resistors may be used as switches to configure integrated circuit components, including individual transistors and logic gates as well as larger, hierarchically structured functional modules and domains.

    摘要翻译: 在本发明的各种实施例中,在集成电路的互连层处引入可调电阻器,以便提供用于调整集成电路内的内部电压和/或电流水平以修复有缺陷的部件或者在制造之后配置集成电路。 例如,当诸如晶体管的某些内部组件由于制造缺陷而没有指定的电子特性时,可以使用根据本发明的实施例的集成电路的互连层中包括的可调谐电阻的可变电阻的调整 以调整内部电压和/或电平以便改善有缺陷的部件。 在其他情况下,可调谐电阻器可以用作开关以配置集成电路部件,包括单独的晶体管和逻辑门以及更大的分层结构的功能模块和域。

    Switching device and methods for controlling electron tunneling therein
    80.
    发明授权
    Switching device and methods for controlling electron tunneling therein 有权
    用于控制电子隧穿的开关装置和方法

    公开(公告)号:US08502198B2

    公开(公告)日:2013-08-06

    申请号:US11414578

    申请日:2006-04-28

    IPC分类号: H01L29/08

    摘要: A switching device includes at least one bottom electrode and at least one top electrode. The top electrode crosses the bottom electrode at a non-zero angle, thereby forming a junction. A metal oxide layer is established on at least one of the bottom electrode or the top electrode. A molecular layer including a monolayer of organic molecules and a source of water molecules is established in the junction. Upon introduction of a forward bias, the molecular layer facilitates a redox reaction between the electrodes, thereby reducing a tunneling gap between the electrodes.

    摘要翻译: 开关装置包括至少一个底部电极和至少一个顶部电极。 顶部电极以非零角度穿过底部电极,从而形成结。 在底电极或顶电极中的至少一个上建立金属氧化物层。 在连接处建立了包括有机分子单层和水分子源的分子层。 在引入正向偏压时,分子层促进电极之间的氧化还原反应,从而减少电极之间的隧道间隙。