公开(公告)号：US20120132108A1

公开(公告)日：2012-05-31

申请号：US13389178

申请日：2010-07-26

申请人： Yoichi Ishihara ,  Toshiharu Hirai ,  Michio Komatsu

发明人： Yoichi Ishihara ,  Toshiharu Hirai ,  Michio Komatsu

IPC分类号： C08K3/36 ,  C09D7/12 ,  C09D1/00 ,  B82Y30/00

CPC分类号： C09D7/1225 ,  B82Y30/00 ,  C01B13/363 ,  C01P2004/61 ,  C01P2004/64 ,  C01P2004/84 ,  C01P2004/88 ,  C01P2006/22 ,  C08K3/22 ,  C08K9/02 ,  C09C1/3623 ,  C09C1/3661 ,  C09C1/3692 ,  C09C3/006 ,  C09C3/041 ,  C09C3/063 ,  C09C3/12 ,  C09D7/1266 ,  C09D7/1291 ,  C09D7/62 ,  C09D7/67 ,  C09D7/70

摘要： Core-shell type composite oxide fine particles are described in which the core particles are oxide fine particles or composite oxide fine particles that do not contain silicon and/or aluminum as main components, and the surface of the core particles is covered with a shell including a composite oxide that contains silicon and aluminum as main components, the shell containing silicon and aluminum in a weight ratio in terms of oxides, SiO2/Al2O3, in the range of 2.0 to 30.0. A dispersion liquid of the core-shell type composite oxide fine particles exhibits very high stability.

摘要翻译： 描述了核 - 壳型复合氧化物细颗粒，其中芯颗粒是不含硅和/或铝作为主要成分的氧化物细颗粒或复合氧化物细颗粒，并且芯颗粒的表面被壳包覆，包括 包含硅和铝作为主要成分的复合氧化物，以氧化物SiO 2 / Al 2 O 3的重量比计含有硅和铝的壳体在2.0至30.0的范围内。 核 - 壳型复合氧化物微粒的分散液显示出非常高的稳定性。

公开(公告)号：US20120094109A1

公开(公告)日：2012-04-19

申请号：US13381362

申请日：2010-06-07

申请人： Michio Komatsu

发明人： Michio Komatsu

IPC分类号： B32B3/26 ,  B29C44/12

CPC分类号： B29C45/0013 ,  B29C44/0446 ,  B29C44/585 ,  B29C44/586 ,  B29K2311/14 ,  C08J9/122 ,  C08J2201/032 ,  C08J2497/00 ,  C08L97/02 ,  Y10T428/249978 ,  Y10T428/249979 ,  Y10T428/249981 ,  Y10T428/249989

摘要： A wood powder-containing resin molded article which can be reduced in weight by reducing an amount of thermoplastic resin, and also has excellent mechanical strength, and a method for producing the same are provided. A wood powder-containing resin molded article 1 is made of a thermoplastic resin containing wood powder, and includes a non-foamed layer 2 formed on a surface and a foamed layer 3 formed in an inner portion. The foamed layer 3 includes, in order from a side close to the surface, a first foamed layer 3a, a second foamed layer 3b having cells with a smaller average pore size than those of the first foamed layer 3a, and a third foamed layer 3c having cells with a larger average pore size than those of the first foamed layer 3a. The wood powder-containing resin molded article 1 contains a perfuming component.

摘要翻译： 提供一种含木粉的树脂成型体，其通过减少热塑性树脂的量可以减少重量，并且还具有优异的机械强度及其制造方法。 含有木粉的树脂成型体1由含有木粉的热塑性树脂制成，并且包括在表面上形成的非发泡层2和形成在内部的发泡层3。 发泡层3从靠近表面的一侧依次包括具有比第一发泡层3a小的平均孔径的第一发泡层3a和第二发泡层3b，以及第三发泡层3c 具有比第一发泡层3a大的平均孔径的细胞。 含有木粉的树脂成型品1含有加香成分。

公开(公告)号：US20110257298A1

公开(公告)日：2011-10-20

申请号：US13141725

申请日：2009-08-12

申请人： Yoichi Ishihara ,  Sachio Murai ,  Toshiharu Hirai ,  Michio Komatsu

发明人： Yoichi Ishihara ,  Sachio Murai ,  Toshiharu Hirai ,  Michio Komatsu

IPC分类号： C09D163/00 ,  C08K3/34 ,  C09D175/04

CPC分类号： C09C1/3661 ,  B82Y30/00 ,  C01G23/08 ,  C01P2002/72 ,  C01P2002/74 ,  C01P2002/78 ,  C01P2004/64 ,  C01P2006/12 ,  C08K3/22 ,  C08K9/02 ,  C09C1/3684 ,  C09D7/62 ,  C09D7/67 ,  C09D163/00 ,  C09D175/04 ,  C09D183/04 ,  G02B1/105 ,  G02B1/14

摘要： The present invention relates to a coating composition containing metal oxide particles with a high refractive index and low photocatalytic activity and a coating film obtained by applying the coating composition onto a substrate. The coating composition contains metal oxide particles with a high refractive index obtained by coating the specific fine particles of the titanium-based oxide on their surfaces with at least a silica-based oxide or a silica-based composite oxide, and the coating film is obtained by applying the coating composition onto a substrate. The metal oxide particles with not only a high refractive index but also low photocatalytic activity, and therefore a coating film with excellent weathering resistance and light resistance can be formed on a substrate.

摘要翻译： 本发明涉及具有高折射率和低光催化活性的金属氧化物颗粒的涂料组合物和通过将涂料组合物涂布在基材上而获得的涂膜。 该涂料组合物含有通过用至少二氧化硅系氧化物或二氧化硅系复合氧化物在其表面上涂布钛基氧化物的特定微粒而得到的具有高折射率的金属氧化物粒子，得到涂膜 通过将涂料组合物涂布在基材上。 可以在基板上形成不仅具有高折射率，而且光催化活性低的金属氧化物粒子，因此具有优异的耐候性和耐光性的涂膜。

公开(公告)号：US07998567B2

公开(公告)日：2011-08-16

申请号：US11665747

申请日：2005-10-11

申请人： Miki Egami ,  Hiroki Arao ,  Akira Nakashima ,  Michio Komatsu

发明人： Miki Egami ,  Hiroki Arao ,  Akira Nakashima ,  Michio Komatsu

IPC分类号： B32B3/26

CPC分类号： H01L21/02126 ,  C09D183/02 ,  C09D183/04 ,  H01L21/02203 ,  H01L21/02282 ,  H01L21/02351 ,  H01L21/3121 ,  Y10T428/249953

摘要： Disclosed is a coating liquid for forming a protective film having high film strength and a low specific dielectric constant for semiconductor processing, and a method for preparing the coating liquid. The coating liquid is a liquid composition comprising (a) silicon compound obtained by hydrolyzing tetraalkyl orthosilicate (TAOS) and alkoxysilane (AS) in the presence of tetraalkyl ammonium hydroxide (TAAOH) and water, or a silicon compound obtained by hydrolyzing or partially hydrolyzing tetraalkyl orthosilicate (TAOS) in the presence of tetraalkyl ammonium hydroxide (TAAOH) and water, mixing the hydrolyzed or partially hydrolyzed product with alkoxysilane (AS) or a hydrolyzed or partially hydrolyzed product thereof, and hydrolyzing all or a portion of the mixture, (b) an organic solvent, and (c) water. The coating liquid is characterized in that a quantity of water contained in the liquid composition is in the range from 35 to 65% by weight.

摘要翻译： 公开了一种用于形成用于半导体加工的具有高膜强度和低比介电常数的保护膜的涂布液，以及一种制备涂布液的方法。 涂布液是一种液体组合物，其包含（a）在四烷基氢氧化铵（TAAOH）和水的存在下水解四烷基原硅酸酯（TAOS）和烷氧基硅烷（AS）而获得的硅化合物，或通过水解或部分水解四烷基 在四烷基氢氧化铵（TAAOH）和水的存在下，将水解或部分水解的产物与烷氧基硅烷（AS）或其水解或部分水解产物混合，并水解所有或部分混合物，（b） ）有机溶剂，和（c）水。 涂布液的特征在于，液体组合物中含有的水的量在35至65重量％的范围内。

公开(公告)号：US20090061199A1

公开(公告)日：2009-03-05

申请号：US11665747

申请日：2005-10-11

申请人： Miki Egami ,  Hiroki Arao ,  Akira Nakashima ,  Michio Komatsu

发明人： Miki Egami ,  Hiroki Arao ,  Akira Nakashima ,  Michio Komatsu

IPC分类号： B32B3/26 ,  C09D7/12

CPC分类号： H01L21/02126 ,  C09D183/02 ,  C09D183/04 ,  H01L21/02203 ,  H01L21/02282 ,  H01L21/02351 ,  H01L21/3121 ,  Y10T428/249953

摘要： Disclosed is a coating liquid for forming a protective film having high film strength and a low specific dielectric constant for semiconductor processing, and a method for preparing the coating liquid. The coating liquid is a liquid composition comprising (a) silicon compound obtained by hydrolyzing tetraalkyl orthosilicate (TAOS) and alkoxysilane (AS) in the presence of tetraalkyl ammonium hydroxide (TAAOH) and water, or a silicon compound obtained by hydrolyzing or partially hydrolyzing tetraalkyl orthosilicate (TAOS) in the presence of tetraalkyl ammonium hydroxide (TAAOH) and water, mixing the hydrolyzed or partially hydrolyzed product with alkoxysilane (AS) or a hydrolyzed or partially hydrolyzed product thereof, and hydrolyzing all or a portion of the mixture, (b) an organic solvent, and (c) water. The coating liquid is characterized in that a quantity of water contained in the liquid composition is in the range from 35 to 65% by weight.

摘要翻译： 公开了一种用于形成用于半导体加工的具有高膜强度和低比介电常数的保护膜的涂布液，以及一种制备涂布液的方法。 涂布液是一种液体组合物，其包含（a）在四烷基氢氧化铵（TAAOH）和水的存在下水解四烷基原硅酸酯（TAOS）和烷氧基硅烷（AS）而获得的硅化合物，或通过水解或部分水解四烷基 在四烷基氢氧化铵（TAAOH）和水的存在下，将水解或部分水解的产物与烷氧基硅烷（AS）或其水解或部分水解产物混合，并水解所有或部分混合物，（b） ）有机溶剂，和（c）水。 涂布液的特征在于，液体组合物中含有的水的量在35至65重量％的范围内。

公开(公告)号：US20090025609A1

公开(公告)日：2009-01-29

申请号：US12086745

申请日：2006-12-15

申请人： Miki Egami ,  Hiroki Arao ,  Akira Nakashima ,  Michio Komatsu

发明人： Miki Egami ,  Hiroki Arao ,  Akira Nakashima ,  Michio Komatsu

IPC分类号： C09D7/12 ,  C07F7/18

CPC分类号： H01L21/316 ,  C01B33/12 ,  C08G77/50 ,  C09D183/14 ,  H01B3/08 ,  H01L21/02126 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/3122

摘要： A coating liquid for forming a low dielectric constant amorphous silica-based coating film with a dielectric constant of 3.0 or below and a film strength (Young's modulus) of 3.0 GPa or more, and also having a smooth surface with an excellent hydrophobicity. The coating liquid contains (1) a silicon compound obtained by hydrolyzing bis(trialcoxysilyl)alkane (BTASA) and alcoxysilane (AS) in the presence of tetraalkylammoniumhydroxide (TAAOH), or (2) a silicon compound obtained by hydrolyzing bis(trialcoxysilyl)alkane (BTASA), alcoxysilane (AS) and tetraalkylorthosilicate (TAOS) in the presence of tetraalkylammoniumhydroxide (TAAOH).

摘要翻译： 一种用于形成介电常数为3.0以下，膜强度（杨氏模量）为3.0GPa以上的低介电常数无定形二氧化硅系涂膜的涂布液，并且还具有疏水性优异的光滑表面。 涂布液含有（1）在四烷基氢氧化铵（TAAOH）存在下水解双（试剂 - 甲硅烷基）烷烃（BTASA）和烷氧基硅烷（AS））得到的硅化合物，或（2）通过水解双（试剂 - 甲硅烷基）烷烃获得的硅化合物 （BTASA），烷氧基硅烷（AS）和四烷基原硅酸盐（TAOS）在四烷基氢氧化铵（TAAOH）存在下。

公开(公告)号：US07431903B2

公开(公告)日：2008-10-07

申请号：US10494176

申请日：2002-10-29

申请人： Tsuguo Koyanagi ,  Katsuhiro Shirono ,  Atsushi Tanaka ,  Michio Komatsu

发明人： Tsuguo Koyanagi ,  Katsuhiro Shirono ,  Atsushi Tanaka ,  Michio Komatsu

IPC分类号： B32B5/16 ,  C01G23/047 ,  C01G23/053 ,  C01G23/08

CPC分类号： B82Y30/00 ,  B01J21/063 ,  B01J21/066 ,  B01J35/004 ,  B01J37/036 ,  B01J37/16 ,  C01G23/00 ,  C01G23/04 ,  C01G23/0536 ,  C01G25/00 ,  C01P2002/52 ,  C01P2004/03 ,  C01P2004/13 ,  C01P2004/54 ,  C01P2004/64 ,  C01P2006/12 ,  C01P2006/40 ,  H01G9/2031 ,  Y02E10/542 ,  Y10T428/2975 ,  Y10T428/2982

摘要： The process for preparing tubular titanium oxide particles comprises subjecting a water dispersion sol, which is obtained by dispersing (i) titanium oxide particles and/or (ii) titanium oxide type composite oxide particles comprising titanium oxide and an oxide other than titanium oxide in water, said particles having an average particle diameter of 2 to 100 nm, to hydrothermal treatment in the presence of an alkali metal hydroxide. After the hydrothermal treatment, reduction treatment (including nitriding treatment) may be carried out. The tubular titanium oxide particles obtained in this process are useful as catalysts, catalyst carriers, adsorbents, photocatalysts, decorative materials, optical materials and photoelectric conversion materials. Especially when the particles are used for semiconductor films for photovoltaic cells or photocatalysts, prominently excellent effects are exhibited.

摘要翻译： 制备管状氧化钛颗粒的方法包括将通过将（i）氧化钛颗粒和/或（ii）氧化钛和氧化钛以外的氧化钛的氧化钛型复合氧化物颗粒分散在水中而获得的水分散溶胶 所述颗粒的平均粒径为2〜100nm，在碱金属氢氧化物存在下进行水热处理。 在水热处理之后，可以进行还原处理（包括氮化处理）。 在该方法中获得的管状二氧化钛颗粒可用作催化剂，催化剂载体，吸附剂，光催化剂，装饰材料，光学材料和光电转换材料。 特别是当微粒用于光伏电池或光催化剂的半导体膜时，显示出显着优异的效果。

公开(公告)号：US07163892B2

公开(公告)日：2007-01-16

申请号：US10275087

申请日：2001-04-23

申请人： Atsushi Tonai ,  Toshiharu Hirai ,  Tsuguo Koyanagi ,  Masayuki Matsuda ,  Michio Komatsu

发明人： Atsushi Tonai ,  Toshiharu Hirai ,  Tsuguo Koyanagi ,  Masayuki Matsuda ,  Michio Komatsu

IPC分类号： H01L21/44 ,  H01L21/336 ,  H01L21/4763

CPC分类号： H01L21/76877 ,  H01L21/288

摘要： There is provided a process for producing an integrated circuit, wherein not only can conductive fine particles be deposited efficiently and densely in minute wiring channels and connecting holes but also a circuit of low wiring resistance and high density can be formed and wherein a high-degree integration can be achieved to thereby bring about an economic advantage. In particular, there is provided a process for producing an integrated circuit, comprising coating a substrate provided with wiring channels with a coating liquid for integrated circuit formation containing conductive fine particles to thereby form an integrated circuit on the substrate, wherein the coating liquid for integrated circuit formation while being exposed to ultrasonic waves is applied to the wiring channels.

摘要翻译： 提供了一种用于制造集成电路的方法，其中不仅可以在微小的布线通道和连接孔中有效且致密地沉积导电细颗粒，而且可以形成低布线电阻和高密度的电路，其中高度 可以实现一体化，从而带来经济优势。 具体地说，提供了一种集成电路的制造方法，其特征在于，在具有布线通道的基板上涂布含有导电性微粒的集成电路形成用涂布液，从而在基板上形成集成电路，其特征在于， 暴露于超声波的电路形成被施加到布线通道。

公开(公告)号：US06599846B2

公开(公告)日：2003-07-29

申请号：US09914418

申请日：2001-08-28

申请人： Michio Komatsu ,  Akira Nakashima ,  Miki Egami ,  Ryo Muraguchi

发明人： Michio Komatsu ,  Akira Nakashima ,  Miki Egami ,  Ryo Muraguchi

IPC分类号： H01L2131

CPC分类号： H01L21/316

摘要： The present invention provides a method for forming a silica-containing film with a low-dielectric constant of 3 or less on a semiconductor substrate steadily, which comprises steps of (a) applying a coating liquid for forming the silica-containing film with the low-dielectric constant onto the semiconductor substrate, (b) heating the thus coated film at 50 to 350° C., and then (c) curing the thus treated film at 350 to 450° C. in an inert-gas atmosphere containing 500 to 15,000 ppm by volume of oxygen, and also provides a semiconductor substrate having a silica-containing film formed by the above method. The above step (b) for the thermal treatment is preferably conducted at 150 to 350° C. for 1 to 3 minutes in an air atmosphere. Also, the above curing step (c) is preferably conducted by placing the semiconductor substrate on a hot plate kept at 350 to 450° C. According to the present invention, a semiconductor substrate coated with a silica-containing film having characteristics of a low-dielectric constant of 3 or less, a low moisture adsorptivity and high film strength without causing any damage to the metal wiring arranged on the substrate, can be obtained steadily.

摘要翻译： 本发明提供一种在半导体基板上稳定地形成具有3以下的低介电常数的含二氧化硅的膜的方法，该方法包括以下步骤：（a）将形成含二氧化硅的膜的涂布液涂布到低 （b）在50至350℃下加热涂覆的膜，然后（c）在350至450℃下在含有500至500℃的惰性气体气氛中固化如此处理的膜 15000体积ppm的氧，并且还提供具有通过上述方法形成的含二氧化硅的半导体衬底。用于热处理的上述步骤（b）优选在150-350℃下进行1至3分钟 在空气气氛中。 此外，上述固化步骤（c）优选通过将半导体衬底放置在保持在350至450℃的热板上来进行。根据本发明，涂覆了具有低特性的含二氧化硅的膜的半导体衬底 - 可以稳定地获得3或更小的吸湿性和低膜强度，而不会对布置在基底上的金属布线造成任何损坏。

公开(公告)号：US06562465B1

公开(公告)日：2003-05-13

申请号：US09446686

申请日：1999-12-23

申请人： Akira Nakashima ,  Atsushi Tonai ,  Michio Komatsu

发明人： Akira Nakashima ,  Atsushi Tonai ,  Michio Komatsu

IPC分类号： B32B2736

CPC分类号： G03F7/093 ,  C08K3/34 ,  C08K9/04 ,  C09D7/62 ,  C09D7/67 ,  C09D183/14 ,  Y10T428/249969 ,  Y10T428/24999 ,  Y10T428/2962 ,  Y10T428/31507 ,  Y10T428/31663 ,  C08L2666/54

摘要： A coating liquid for forming a silica-based film having a low dielectric constant, as low as 3 or less, comprising (i) silica-based fine particles having phenyl groups and (ii) a polysiloxazane which can be produced by reacting hydrolyzate of an alkoxysilane represented by the formula (XnSi(OR1)4−n)and/or hydrolyzate of a halogenated silane represented by the formula (XnSiX′4−n) with a polysilazane represented by —(SiR2R4—NR3)—m, or a coating-liquid for forming the silica-based film, comprising (i) silica-based fine particles having phenyl groups and (ii′) an oxidatively decomposable resin with the weight ratio of the particles to the resin being in the range of 0.5 to 5.

摘要翻译： 一种用于形成低介电常数低至3或更低的二氧化硅基膜的涂布液，其包含（i）具有苯基的二氧化硅基微粒和（ii）聚硅氧氮烷，其可以通过使 由式（XnSi（OR1）4-n）表示的烷氧基硅烷和/或由式（XnSiX'4-n）表示的卤代硅烷与 - （SiR2R4-NR3）-m表示的聚硅氮烷的水解产物或涂层 - 用于形成二氧化硅基膜的液体，其包含（i）具有苯基的二氧化硅基微粒和（ii'）具有颗粒与树脂的重量比在0.5至5的氧化分解性树脂。