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71.发明授权Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby 失效光刻设备，确定模型参数的方法，器件制造方法以及由此制造的器件公开(公告)号：US07565219B2
公开(公告)日：2009-07-21
申请号：US10730254
申请日：2003-12-09
IPC分类号： G06F19/00
CPC分类号： G03F9/7092
摘要： A method according to one embodiment of the invention relates to determining at least one parameter of a model that provides information about a position of an object. The object has a plurality of alignment marks of which desired positions are known. The method includes measuring a plurality of positional parameters for each alignment mark. Based on the measured plurality of positional parameters, which are weighted with weighing coefficients, at least one parameter of the model of the object is determined. The numerical value of each weighing coefficient is determined together with the at least one parameter of the model.
摘要翻译： 根据本发明的一个实施例的方法涉及确定提供关于对象的位置的信息的模型的至少一个参数。 物体具有多个已知位置的对准标记。 该方法包括测量每个对准标记的多个位置参数。 基于所测量的多个位置参数，其被称重系数加权，确定对象的模型的至少一个参数。 每个称重系数的数值与模型的至少一个参数一起确定。
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公开(公告)号：US20080165332A1
公开(公告)日：2008-07-10
申请号：US11948801
申请日：2007-11-30
IPC分类号： G03B27/68
CPC分类号： G03F7/70725 , G03F7/70258 , G03F7/70358 , G03F7/70458 , G03F7/70525 , G03F7/70633 , G03F7/70783
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support for a patterning device, a substrate table for a substrate, a projection system, and a control system. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The projection system is configured to project the patterned radiation beam as an image onto a target portion of the substrate along a scan path. The scan path is defined by a trajectory in a scanning direction of an exposure field of the lithographic apparatus. The control system is coupled to the support, the substrate table and the projection system for controlling an action of the support, the substrate table and the projection system, respectively. The control system is configured to correct a local distortion of the image in a region along the scan path by a temporal adjustment of the image in that region.
摘要翻译： 光刻设备包括配置成调节辐射束的照明系统，图案形成装置的支撑件，用于衬底的衬底台，投影系统和控制系统。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 投影系统被配置为沿着扫描路径将图案化的辐射束作为图像投影到基板的目标部分上。 扫描路径由光刻设备的曝光场的扫描方向上的轨迹限定。 控制系统耦合到支撑件，基板台和投影系统，用于分别控制支撑件，基板台和投影系统的作用。 控制系统被配置为通过在该区域中的图像的时间调整来校正沿着扫描路径的区域中的图像的局部失真。
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73.发明申请Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method 审中-公开检测方法和装置，光刻设备，光刻处理单元和器件制造方法公开(公告)号：US20080148875A1
公开(公告)日：2008-06-26
申请号：US11641944
申请日：2006-12-20
IPC分类号： G01M19/00
CPC分类号： G03F7/70616
摘要： Two drive systems are responsible for moving a substrate beneath, for example, an illumination system or a measurement radiation beam. A first drive system drives a substrate in a X direction and a second drive system drives the substrate in a Y direction. In order to make a measurement of a feature of the substrate surface, targets are arranged in a lattice. Rather than having the lattice aligned with the X and Y directions such that only one drive system operates at a time to step between the targets, the lattice of targets is arranged at an angle with respect to the X and Y axes such that both drive systems operate simultaneously in order to move between the targets. The targets (or sub-targets within the targets) may also be arranged with respect to each other so as to save scribelane space and to create a most economical path between them.
摘要翻译： 两个驱动系统负责在例如照明系统或测量辐射束之下移动衬底。 第一驱动系统沿X方向驱动基板，第二驱动系统沿Y方向驱动基板。 为了测量衬底表面的特征，靶被布置成格子。 不是使格子与X和Y方向对准，使得只有一个驱动系统一次在目标之间步进操作，目标的格子相对于X和Y轴以一定角度布置，使得两个驱动系统 同时操作，以便在目标之间移动。 目标（或目标内的子目标）也可以相对于彼此布置，以便节省scribelane空间并且在它们之间创建最经济的路径。
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74.发明申请Lithographic apparatus and device manufacturing method with reduced scribe lane usage for substrate measurement 有权平版印刷设备和器件制造方法，具有减少基片测量的划线通道用途公开(公告)号：US20070222960A1
公开(公告)日：2007-09-27
申请号：US11384836
申请日：2006-03-21
IPC分类号： G03B27/54
CPC分类号： G03F7/70433 , G03F7/70625 , G03F7/70633 , G03F9/7049 , G03F9/7076 , G03F9/708 , G03F9/7084
摘要： In a device manufacturing method and lithographic apparatus wherein a pattern is transferred from a patterning device onto a substrate, a measurement target is provided on the substrate in a process enabling execution of a substrate measurement using radiation of a first wavelength. Subsequently the measurement target is transformed in a grid of conducting material, the grid having grid openings which are smaller than the first wavelength. The space in the scribe lane where the measurement target was, is now shielded and may be used again in further layers or processing steps of the substrate.
摘要翻译： 在其中将图案从图案形成装置转印到基板上的装置制造方法和光刻设备中，在能够使用第一波长的辐射执行基板测量的处理中，在基板上提供测量目标。 随后，将测量目标变换为导电材料的栅格，栅格具有比第一波长小的栅格开口。 测量目标的划线中的空间现在被屏蔽，并且可以再次用于基板的更多层或处理步骤。
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公开(公告)号：US07084955B2
公开(公告)日：2006-08-01
申请号：US10803104
申请日：2004-03-18
CPC分类号： G03F7/70691 , G03F7/70216 , G03F9/7084
摘要： A lithographic projection apparatus is provided with an optical system built into the wafer table for producing an image of a wafer mark that is provided on the back side of the wafer. The image is located at the plane of the front side of the wafer and can be viewed by an alignment system from the front side of the wafer. Simultaneous alignment between marks on the back and front of the wafer and a mask can be performed using a pre-existing alignment system.
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76.发明申请Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby 失效光刻设备，确定模型参数的方法，器件制造方法以及由此制造的器件公开(公告)号：US20050147902A1
公开(公告)日：2005-07-07
申请号：US11007578
申请日：2004-12-09
CPC分类号： G03F9/7092
摘要： A method according to one embodiment of the invention relates to determining at least one parameter of a model that provides information about a position of an object. The object may include a plurality of alignment marks of which desired positions are known. The method includes measuring a plurality of positional parameters for each alignment mark. Based on the measured plurality of positional parameters, which are weighted with weighing coefficients, at least one parameter of the model of the object is determined. The numerical value of each weighing coefficient is determined together with the at least one parameter of the model.
摘要翻译： 根据本发明的一个实施例的方法涉及确定提供关于对象的位置的信息的模型的至少一个参数。 物体可以包括多个对准标记，其中期望的位置是已知的。 该方法包括测量每个对准标记的多个位置参数。 基于所测量的多个位置参数，其被称重系数加权，确定对象的模型的至少一个参数。 每个称重系数的数值与模型的至少一个参数一起确定。
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77.发明授权公开(公告)号：US09229338B2
公开(公告)日：2016-01-05
申请号：US13059405
申请日：2009-07-27
IPC分类号： G01B11/00 , G03B27/32 , G03B27/54 , G03B27/74 , H01L23/28 , G03F7/20 , G03F9/00 , H01L23/544
CPC分类号： G01N21/9501 , G01N21/4738 , G01N2201/06113 , G01N2201/10 , G02B5/1823 , G02B5/1861 , G03F7/70058 , G03F7/70633 , G03F7/70683 , G03F9/70 , G03F9/7046 , G03F9/7076 , H01L23/544 , H01L2924/0002 , Y10T428/24612 , H01L2924/00
摘要： Scatterometry for measuring overlay. A second set of superimposed gratings are superposed over a first set of superimposed gratings. The second set of gratings have a different periodicity from the first set of gratings or a different orientation. Consequently the first order diffraction pattern from the second set of superimposed gratings can be distinguished from the first order diffraction pattern from the first set of superimposed gratings.
摘要翻译： 用于测量覆盖层的散射法。 第二组叠加的光栅叠加在第一组叠加的光栅上。 第二组光栅具有与第一组光栅不同的周期性或不同的取向。 因此，来自第二组叠加光栅的一阶衍射图可以与来自第一组叠加光栅的一阶衍射图案区分开。
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公开(公告)号：US08786825B2
公开(公告)日：2014-07-22
申请号：US12936327
申请日：2009-04-20
CPC分类号： G03F7/7065 , G01N21/47 , G01N21/4788 , G01N21/9501 , G01N21/956 , G03F7/70633 , G03F9/7049 , G03F9/7088
摘要： The present invention makes the use of measurement of a diffraction spectrum in or near an image plane in order to determine a property of an exposed substrate. In particular, the positive and negative first diffraction orders are separated or diverged, detected and their intensity measured to determine overlay (or other properties) of exposed layers on the substrate.
摘要翻译： 本发明使用在图像平面内或附近测量衍射光谱，以便确定曝光的基底的性质。 特别地，正和负的第一衍射级被分离或发散，被检测并且测量它们的强度以确定衬底上的暴露层的覆盖层（或其它性质）。
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79.发明授权Method and apparatus for angular-resolved spectroscopic lithography characterization 有权用于角分辨光谱光刻特征的方法和装置公开(公告)号：US08724109B2
公开(公告)日：2014-05-13
申请号：US12865828
申请日：2009-02-09
IPC分类号： G01B11/00
CPC分类号： G03F7/70633
摘要： An apparatus and method to determine overlay of a target on a substrate (6) by measuring, in the pupil plane (40) of a high numerical aperture len (L1), an angle-resolved spectrum as a result of radiation being reflected off the substrate. The overlay is determined from the anti-symmetric component of the spectrum, which is formed by subtracting the measured spectrum and a mirror image of the measured spectrum. The measured spectrum may contain only zeroth order reflected radiation from the target.
摘要翻译： 一种用于通过在高数值孔径len（L1）的光瞳平面（40）中测量作为辐射的结果的角度分辨光谱从 基质。 通过从测量光谱中减去测量光谱和所测量的光谱的镜像形成的光谱的反对称分量来确定覆盖。 所测量的光谱可能仅包含来自目标的零级反射辐射。
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公开(公告)号：US08724087B2
公开(公告)日：2014-05-13
申请号：US12933481
申请日：2009-04-08
申请人： Marcus Adrianus Van De Kerkhof , Antoine Gaston Marie Kiers , Maurits Van Der Schaar , Leonardus Henricus Marie Verstappen , Scott Anderson Middlebrooks , Andreas Fuchs
发明人： Marcus Adrianus Van De Kerkhof , Antoine Gaston Marie Kiers , Maurits Van Der Schaar , Leonardus Henricus Marie Verstappen , Scott Anderson Middlebrooks , Andreas Fuchs
IPC分类号： G03B27/54
CPC分类号： G03F7/70616 , G01N21/47 , G01N21/9501
摘要： A scatterometer configured to measure a property of a substrate, includes a radiation source configured to provide a radiation beam; and a detector configured to detect a spectrum of the radiation beam reflected from a target (30) on the surface of the substrate (W) and to produce a measurement signal representative of the spectrum. The apparatus includes a beam shaper (51, 53) interposed in the radiation path between the radiation source and the detector, the beam shaper being configured to adjust the cross section of the beam dependent on the shape and/or size of the target.
摘要翻译： 配置成测量衬底性质的散射仪包括被配置为提供辐射束的辐射源; 以及检测器，其被配置为检测从所述基板（W）的表面上的目标（30）反射的所述辐射束的光谱，并产生表示所述光谱的测量信号。 该装置包括插入在辐射源和检测器之间的辐射路径中的光束整形器（51,53），光束整形器被配置为根据目标的形状和/或尺寸来调节光束的横截面。
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