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71.发明申请SYSTEMS AND METHODS FOR BUFFER GAS FLOW STABILIZATION IN A LASER PRODUCED PLASMA LIGHT SOURCE 有权激光产生的等离子体光源中缓冲气体流动稳定的系统和方法公开(公告)号：US20120313016A1
公开(公告)日：2012-12-13
申请号：US13156188
申请日：2011-06-08
IPC分类号： G21K5/00
摘要： An extreme-ultraviolet (EUV) light source comprising an optic, a target material, and a laser beam passing through said optic along a beam path to irradiate said target material. The EUV light source further includes a system generating a gas flow directed toward said target material along said beam path, said system having a tapering member surrounding a volume and a plurality of gas lines, each gas line outputting a gas stream into said volume.
摘要翻译： 一种极紫外（EUV）光源，包括光学元件，目标材料和沿着光束路径通过所述光学元件以照射所述目标材料的激光束。 EUV光源还包括沿着所述光束路径产生朝向所述目标材料的气流的系统，所述系统具有包围体积和多条气体管线的锥形构件，每条气体管线将气流输送到所述体积中。
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公开(公告)号：US08304752B2
公开(公告)日：2012-11-06
申请号：US12638413
申请日：2009-12-15
申请人： Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Jason Paxton , Nam-Hyong Kim , Jerzy R. Hoffman
发明人： Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Jason Paxton , Nam-Hyong Kim , Jerzy R. Hoffman
CPC分类号： H01S3/2232 , G03F7/70033 , H01S3/0014 , H01S3/0407 , H01S3/041 , H01S3/086 , H01S3/2308 , H05G2/008
摘要： A method for producing extreme ultraviolet light includes producing a target material at a target location; supplying pump energy to a gain medium of at least one optical amplifier that has an amplification band to produce an amplified light beam; propagating the amplified light beam through the gain medium using one or more optical components of a set of optical components; delivering the amplified light beam to the target location using one or more optical components of the optical component set; producing with a guide laser a guide laser beam that has a wavelength outside of the amplification band of the gain medium and inside the wavelength range of the optical components; and directing the guide laser beam through the optical component set to thereby align one or more optical components of the optical component set.
摘要翻译： 用于生产极紫外光的方法包括在目标位置产生目标材料; 向具有放大频带的至少一个光放大器的增益介质提供泵浦能量以产生放大的光束; 使用一组光学部件的一个或多个光学部件将放大的光束传播通过增益介质; 使用所述光学部件组的一个或多个光学部件将放大的光束传送到目标位置; 用导向激光器产生具有波长在增益介质的放大频带之外且在光学部件的波长范围内的引导激光束; 并且引导所述引导激光束通过所述光学部件组，从而对准所述光学部件组的一个或多个光学部件。
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73.发明授权公开(公告)号：US08283643B2
公开(公告)日：2012-10-09
申请号：US12592107
申请日：2009-11-18
CPC分类号： H05G2/003 , H01S3/005 , H01S3/2391 , H05G2/008
摘要： An EUV light source device is described herein which may comprise a laser beam travelling along a beam path, at least a portion of the beam path aligned along a linear axis; a material for interaction with the laser beam at an irradiation site to create an EUV light emitting plasma; a first reflector having a focal point, the first reflector positioned with the focal point on the linear axis, the first reflector receiving laser light along the beam path; and a second reflector receiving laser light reflected by the first reflector and directing the laser light toward the irradiation site.
摘要翻译： 本文描述了EUV光源装置，其可以包括沿着光束路径传播的激光束，所述光束路径的至少一部分沿线性轴线对准; 用于在照射部位与激光束相互作用以产生EUV发光等离子体的材料; 具有焦点的第一反射器，所述第一反射器的焦点位于所述线性轴线上，所述第一反射器沿着所述光束路径接收激光; 以及第二反射器，其接收由所述第一反射器反射并且将所述激光引向所述照射部位的激光。
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公开(公告)号：US08173985B2
公开(公告)日：2012-05-08
申请号：US12638092
申请日：2009-12-15
IPC分类号： H05G2/00 , H01L21/027 , G03F7/20
CPC分类号： H05G2/008
摘要： An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; an extreme ultraviolet light vacuum chamber defining an interior vacuum space that houses an extreme ultraviolet light collector and the target location; and a beam delivery system that is configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location. The beam delivery system includes a beam expansion system that expands a size of the amplified light beam and a focusing element that is configured and arranged to focus the amplified light beam at the target location.
摘要翻译： 极紫外光系统包括产生放大光束的驱动激光系统; 配置成在目标位置产生目标材料的目标材料输送系统; 极紫外光真空室限定内部真空空间，其容纳极紫外光收集器和目标位置; 以及光束传送系统，其被配置为接收从驱动激光系统发射的放大的光束并将放大的光束引向目标位置。 光束传送系统包括扩大放大光束的尺寸的光束扩展系统和配置和布置成将放大的光束聚焦在目标位置处的聚焦元件。
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公开(公告)号：US20120087386A1
公开(公告)日：2012-04-12
申请号：US12639339
申请日：2009-12-16
CPC分类号： G03F7/70341 , G03F7/70025 , G03F7/70041 , G03F7/7055
摘要： An apparatus/method may comprise a line narrowed pulsed lithography laser light source which may comprise: a seed pulse providing laser system which may comprise: a first pulsed seed laser producing seed pulses at a rate of X kHz; a second pulsed seed laser producing seed pulses at a rate of X kHz; an amplification system which may comprise: a first amplifier gain system which may comprise a first and a second pulsed gas discharge amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½X kHz on output pulses from the first seed laser; a second amplifier gain system which may comprise a first and a second pulsed amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½X kHz on output pulses from the second seed laser.
摘要翻译： 一种装置/方法可以包括线窄的脉冲光刻激光光源，其可以包括：提供激光系统的种子脉冲，其可以包括：以X kHz的速率产生种子脉冲的第一脉冲种子激光器; 第二脉冲种子激光器以XkHz的速率产生种子脉冲; 放大系统，其可以包括：第一放大器增益系统，其可以包括第一和第二脉冲气体放电放大器增益介质，每个具有在UV范围内的标称中心波长，并且每个在来自第一个的输出脉冲上以1/2X kHz工作 种子激光 第二放大器增益系统，其可以包括第一和第二脉冲放大器增益介质，每个具有在UV范围内的标称中心波长，并且每个在来自第二种子激光器的输出脉冲上以1/2XkHz工作。
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公开(公告)号：US08144740B1
公开(公告)日：2012-03-27
申请号：US12639339
申请日：2009-12-16
IPC分类号： H01S3/13
CPC分类号： G03F7/70341 , G03F7/70025 , G03F7/70041 , G03F7/7055
摘要： An apparatus/method may comprise a line narrowed pulsed lithography laser light source which may comprise: a seed pulse providing laser system which may comprise: a first pulsed seed laser producing seed pulses at a rate of X kHz; a second pulsed seed laser producing seed pulses at a rate of X kHz; an amplification system which may comprise: a first amplifier gain system which may comprise a first and a second pulsed gas discharge amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½X kHz on output pulses from the first seed laser; a second amplifier gain system which may comprise a first and a second pulsed amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½X kHz on output pulses from the second seed laser.
摘要翻译： 一种装置/方法可以包括线窄的脉冲光刻激光光源，其可以包括：提供激光系统的种子脉冲，其可以包括：以X kHz的速率产生种子脉冲的第一脉冲种子激光器; 第二脉冲种子激光器以XkHz的速率产生种子脉冲; 放大系统，其可以包括：第一放大器增益系统，其可以包括第一和第二脉冲气体放电放大器增益介质，每个具有在UV范围内的标称中心波长，并且每个在来自第一个的输出脉冲上以1/2X kHz工作 种子激光 第二放大器增益系统，其可以包括第一和第二脉冲放大器增益介质，每个具有在UV范围内的标称中心波长，并且每个在来自第二种子激光器的输出脉冲上以1/2X kHz工作。
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77.发明授权System method and apparatus for selecting and controlling light source bandwidth 有权选择和控制光源带宽的系统方法和装置公开(公告)号：US08144739B2
公开(公告)日：2012-03-27
申请号：US12605306
申请日：2009-10-23
IPC分类号： H01S3/10
CPC分类号： H01S3/08009 , G01J3/02 , G01J3/0237 , G01J3/027 , G01J3/06 , G01J3/14 , G01J3/18 , G01J2003/1208 , G02B5/1828 , H01S3/08004 , H01S3/1055 , H01S3/1067
摘要： The bandwidth selection mechanism includes a first actuator mounted on a second face of a dispersive optical element, the second face being opposite from a reflective face, the first actuator having a first end coupled to a first end block and a second end coupled to a second end block, the first actuator being operative to apply equal and opposite forces to the first end block and the second end block to bend the body of the dispersive optical element along the longitudinal axis of the body and in a first direction normal to the reflective face of the dispersive optical element. The bandwidth selection mechanism also includes a second actuator being operative to apply equal and opposite forces to bend the body along the longitudinal axis of the body, in a second direction perpendicular to the reflective face of the dispersive optical element.
摘要翻译： 所述带宽选择机构包括安装在分散光学元件的第二面上的第一致动器，所述第二面与反射面相对，所述第一致动器具有联接到第一端块的第一端和耦合到第二端的第二端 第一致动器可操作以对第一端块和第二端块施加相等且相反的力，以沿着主体的纵向轴线并沿垂直于反射面的第一方向弯曲分散光学元件的主体 的色散光学元件。 带宽选择机构还包括第二致动器，其可操作以在垂直于分散光学元件的反射面的第二方向上施加相等且相反的力沿着身体的纵向轴线弯曲身体。
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公开(公告)号：US07999915B2
公开(公告)日：2011-08-16
申请号：US11981450
申请日：2007-10-30
申请人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Robert A. Bergstedt , Ivan Lalovic
发明人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Robert A. Bergstedt , Ivan Lalovic
CPC分类号： G03F7/70625 , G03F7/70025 , G03F7/70583 , G03F7/70616 , H01S3/08004 , H01S3/08059 , H01S3/10092 , H01S3/225 , H01S3/2251 , H01S3/2308
摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.
摘要翻译： 一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统，其可以包括种子激光振荡器，其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，其包括激光输出光束 脉冲，其可以包括环形功率放大级。
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公开(公告)号：US20110140008A1
公开(公告)日：2011-06-16
申请号：US12638092
申请日：2009-12-15
IPC分类号： G21K5/04
CPC分类号： H05G2/008
摘要： An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; an extreme ultraviolet light vacuum chamber defining an interior vacuum space that houses an extreme ultraviolet light collector and the target location; and a beam delivery system that is configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location. The beam delivery system includes a beam expansion system that expands a size of the amplified light beam and a focusing element that is configured and arranged to focus the amplified light beam at the target location.
摘要翻译： 极紫外光系统包括产生放大光束的驱动激光系统; 配置成在目标位置产生目标材料的目标材料输送系统; 极紫外光真空室限定内部真空空间，其容纳极紫外光收集器和目标位置; 以及光束传送系统，其被配置为接收从驱动激光系统发射的放大的光束并将放大的光束引向目标位置。 光束传送系统包括扩大放大光束的尺寸的光束扩展系统和配置和布置成将放大的光束聚焦在目标位置处的聚焦元件。
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公开(公告)号：US07920616B2
公开(公告)日：2011-04-05
申请号：US11980172
申请日：2007-10-30
IPC分类号： H01S3/22
CPC分类号： H01S3/2383 , G03F7/70583 , H01S3/0057 , H01S3/08036 , H01S3/08059 , H01S3/10092 , H01S3/225 , H01S3/2325
摘要： A method/apparatus may comprise a laser light source which may comprise a solid state seed laser system producing a seed laser output having a nominal center wavelength at a pulse repetition rate; a first and a second gas discharge laser amplifier gain medium each operating at a pulse repetition rate less than that of the seed laser system; a beam divider providing each of the respective first and second amplifier gain mediums with seed laser output pulses; a frequency converter modifying the nominal center wavelength of the output of the seed laser to essentially the nominal center wavelength of the amplifier gain medium; a beam combiner combining the outputs of the respective amplifier gain mediums to provide a light source output having the pulse repetition rate of the seed laser; a coherence buster operating on either or both of the output of the seed laser or amplifier gain mediums.
摘要翻译： 方法/装置可以包括激光光源，其可以包括固态种子激光器系统，其产生具有脉冲重复率的标称中心波长的种子激光器输出; 第一和第二气体放电激光放大器增益介质，每个以比种子激光器系统的脉冲重复频率工作; 一个分束器，为每个相应的第一和第二放大器增益介质提供种子激光输出脉冲; 变频器将种子激光器的输出的标称中心波长修改为基本上放大器增益介质的标称中心波长; 组合各个放大器增益介质的输出以提供具有种子激光器的脉冲重复率的光源输出的光束组合器; 在种子激光器或放大器增益介质的输出中的任一个或两者上工作的相干致动器。
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