Semiconductor device
    80.
    发明授权
    Semiconductor device 有权
    半导体器件

    公开(公告)号:US09362417B2

    公开(公告)日:2016-06-07

    申请号:US13751753

    申请日:2013-01-28

    CPC classification number: H01L29/78693 H01L29/41733 H01L29/7869

    Abstract: To provide a highly reliable semiconductor device in which a transistor including an oxide semiconductor film has stable electric characteristics. The semiconductor device includes a gate electrode layer over a substrate, a gate insulating film over the gate electrode layer, an oxide semiconductor film over the gate insulating film, a drain electrode layer which is over the oxide semiconductor film so as to overlap with the gate electrode layer, and a source electrode layer provided so as to cover part of an outer edge portion of the oxide semiconductor film. An outer edge portion of the drain electrode layer is on an inner side than an outer edge portion of the gate electrode layer.

    Abstract translation: 为了提供一种高可靠性的半导体器件,其中包括氧化物半导体膜的晶体管具有稳定的电特性。 半导体器件包括在基板上的栅极电极层,栅极电极层上的栅极绝缘膜,栅极绝缘膜上的氧化物半导体膜,位于氧化物半导体膜上方以与栅极重叠的漏极层 电极层和设置为覆盖氧化物半导体膜的外缘部的一部分的源电极层。 漏电极层的外缘部位于比栅电极层的外缘部更内侧。

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