POWER SUPPLY APPARATUS AND CONTROLLING METHOD THEREOF

    公开(公告)号:US20240235383A9

    公开(公告)日:2024-07-11

    申请号:US18237122

    申请日:2023-08-23

    CPC classification number: H02M1/4225 H02M1/385

    Abstract: The present disclosure provides power supply apparatuses and controlling methods thereof. In some embodiments, a power supply apparatus includes a power factor correction (PFC) circuit, and a control circuit configured to control the PFC circuit. The PFC circuit includes a power inputter configured to receive alternating current voltage to be rectified, an inductor having an end coupled to an end of the power inputter, a first switching element configured to be turned on and off according to a first control signal, a second switching element configured to be turned on and off according to a second control signal, and an outputter configured to output a direct current voltage through an output capacitor. The control circuit is further configured to respectively apply the first and second control signals to the first and second switching elements such that the first and the second switching elements are alternately turned on.

    Method for processing audio data and electronic device therefor

    公开(公告)号:US11341981B2

    公开(公告)日:2022-05-24

    申请号:US16793370

    申请日:2020-02-18

    Abstract: Disclosed is an electronic device including a speaker, a communication circuit, a processor, and a memory. The processor is configured to receive first data including a first audio frame corresponding to a first interval and a second audio frame corresponding to a second interval subsequent to the first interval, using the communication circuit, to store the second audio frame in the memory in response to reception of the first data, to output a first audio signal generated based on the first audio frame, through the speaker, and to store the third audio frame in the memory and output a second audio signal generated based on the second audio frame of the second data through the speaker when second data including the second audio frame and a third audio frame corresponding to a third interval subsequent to the second interval is received using the communication circuit.

    SEMICONDUCTOR DEVICES
    79.
    发明申请

    公开(公告)号:US20220115539A1

    公开(公告)日:2022-04-14

    申请号:US17560804

    申请日:2021-12-23

    Abstract: Semiconductor devices are provided. A semiconductor device includes a fin structure having a plurality of first semiconductor patterns and a plurality of second semiconductor patterns alternately stacked on a substrate, and extending in a first direction. The semiconductor device includes a semiconductor cap layer on an upper surface of the fin structure, and extending along opposite side surfaces of the fin structure in a second direction crossing the first direction. The semiconductor device includes a gate electrode on the semiconductor cap layer, and extending in the second direction. The semiconductor device includes a gate insulating film between the semiconductor cap layer and the gate electrode. Moreover, the semiconductor device includes a source/drain region connected to the fin structure. The plurality of first semiconductor patterns include silicon germanium (SiGe) having a germanium (Ge) content in a range of 25% to 35%, and the plurality of second semiconductor patterns include silicon (Si).

    Semiconductor device
    80.
    发明授权

    公开(公告)号:US11251197B2

    公开(公告)日:2022-02-15

    申请号:US16927044

    申请日:2020-07-13

    Inventor: Sanghoon Lee

    Abstract: A semiconductor device including a lower structure, an upper pattern, a stacked structure, a separation structure passing through the stacked structure, a vertical structure comprising a channel layer, wherein the stacked structure comprises a plurality of interlayer insulating layers and a plurality of gate layers, the lower structure comprises a first lower pattern and a second lower pattern of a material different from a material of the first lower pattern, the first lower pattern comprises a first portion between the second lower pattern and the channel layer, a second portion extending from the first portion to a region between the second lower pattern and the upper pattern, and a third portion extending from the first portion to a region between the second lower pattern and the substrate structure, and the first lower pattern does not extend toward a side surface of the upper pattern.

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