公开(公告)号：US08446560B2

公开(公告)日：2013-05-21

申请号：US12735823

申请日：2009-02-19

申请人： Johannes Hubertus Josephina Moors ,  Norbertus Benedictus Koster ,  Erik Roelo Loopstra ,  Martin Frans Pierre Smeets ,  Antonius Theodorus Wilhelmus Kempen

发明人： Johannes Hubertus Josephina Moors ,  Norbertus Benedictus Koster ,  Erik Roelo Loopstra ,  Martin Frans Pierre Smeets ,  Antonius Theodorus Wilhelmus Kempen

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70933 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70916

摘要： A lithographic apparatus includes a magnet being contained in a protective enclosure, the protective enclosure being arranged to protect the magnet from contact with a H2-containing or H-atom containing gas. The enclosure may further contain a hydrogen getter, such as a magnet-surface modifying gas, or a non-hydrogen containing gas. A non-hydrogen containing gas flow may be provided or a non-hydrogen getter gas flow may be provided through at least part of the protective enclosure.

摘要翻译： 光刻设备包括容纳在保护壳体中的磁体，保护壳体被布置成保护磁体免受含H2或含H原子气体的接触。 外壳还可以包含氢气吸气剂，例如磁体表面改性气体或非含氢气体。 可以提供不含氢的气流，或者可以通过保护外壳的至少一部分提供非氢吸气剂气流。

公开(公告)号：US20110188011A1

公开(公告)日：2011-08-04

申请号：US12973844

申请日：2010-12-20

申请人： Dirk Heinrich EHM ,  Arnoldus Jan Storm ,  Johannes Hubertus Josephina Moors ,  Almut Czap ,  Mona Nagel ,  Jacques Cor Johan van der Donck ,  Jetske Karina Stortelder ,  Marijn Sandtke ,  Maria Isabel Catalina Caballero ,  Luigi Scaccabarozzi

发明人： Dirk Heinrich EHM ,  Arnoldus Jan Storm ,  Johannes Hubertus Josephina Moors ,  Almut Czap ,  Mona Nagel ,  Jacques Cor Johan van der Donck ,  Jetske Karina Stortelder ,  Marijn Sandtke ,  Maria Isabel Catalina Caballero ,  Luigi Scaccabarozzi

IPC分类号： G03F7/20 ,  G03B27/52 ,  B08B5/04

CPC分类号： G03F7/70925 ,  B82Y10/00 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70975 ,  G03F7/70983 ,  G21K1/062

摘要： An optical assembly is mounted in a projection exposure apparatus (101) for EUV microlithography and includes at least one vacuum chamber (70, 71, 68a), at least one optical element (6, 7; 65, 66; 63) arranged in the vacuum chamber (70, 71, 68a), the optical element (6, 7; 65, 66; 63) having an optical surface (18) arranged to be impinged upon by a useful beam bundle (3) of the projection exposure apparatus (101), and a cleaning device (72) configured to clean the optical surface (18). The cleaning device (72) is configured to perform particle cleaning of the optical surface (18) at a gas pressure within the vacuum chamber (70,71, 68a) which is higher than a vacuum pressure (po) for performing an exposure operation with the projection exposure apparatus (101). As a result, optical elements having respective optical surfaces arranged to be impinged upon by a useful beam bundle can be cleaned reliably of foreign particles.

摘要翻译： 光学组件安装在用于EUV微光刻的投影曝光设备（101）中，并且包括至少一个真空室（70,71,68a），至少一个光学元件（6,7; 65,66,63） 所述光学元件（6,7; 65,66,63）具有光学表面（18），所述光学表面被布置成被所述投影曝光设备的有用束束（3）撞击 101）和被构造成清洁光学表面（18）的清洁装置（72）。 清洁装置（72）构造成在真空室（70,71,68a）内的气体压力下进行光学表面（18）的粒子清洁，该气体压力高于用于进行曝光操作的真空压力（po） 投影曝光装置（101）。 结果，可以可靠地清洁具有布置成被有用的束束撞击的各个光学表面的光学元件的外来颗粒。

公开(公告)号：US20110037961A1

公开(公告)日：2011-02-17

申请号：US12937498

申请日：2009-04-15

申请人： Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn ,  Dirk Heinrich Ehm

发明人： Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn ,  Dirk Heinrich Ehm

IPC分类号： G03B27/42

CPC分类号： G03F7/70933 ,  G03F7/70925 ,  G03F7/70975

摘要： A lithographic apparatus includes a projection system constructed and arranged to project a beam of radiation onto a target portion of a substrate, an internal sensor having a sensing surface, and a mini-reactor movable with respect to the sensor. The mini-reactor includes an inlet for a hydrogen containing gas, a hydrogen radical generator, and an outlet for a hydrogen radical containing gas. The mini-reactor is constructed and arranged to create a local mini-environment comprising hydrogen radicals to treat the sensing surface.

摘要翻译： 光刻设备包括投影系统，该投影系统构造和布置成将辐射束投影到基板的目标部分上，具有感测表面的内部传感器和相对于传感器可移动的微型反应堆。 微型反应器包括用于含氢气体的入口，氢根发生器和用于含氢自由基气体的出口。 微型反应器被构造和布置成产生包含氢自由基的局部微环境以处理感测表面。

公开(公告)号：US20110037960A1

公开(公告)日：2011-02-17

申请号：US12989045

申请日：2009-04-16

申请人： Luigi Scaccabarozzi ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Pavel Stanislavoich Antsiferov ,  Vladimir Mihailovitch Krivtsun ,  Leonid Alexandrovich Dorokhin ,  Maarten Van Kampen

发明人： Luigi Scaccabarozzi ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Pavel Stanislavoich Antsiferov ,  Vladimir Mihailovitch Krivtsun ,  Leonid Alexandrovich Dorokhin ,  Maarten Van Kampen

IPC分类号： G03B27/52

CPC分类号： G03F7/70925

摘要： A lithographic apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device is configured to impart a pattern to the beam of radiation. The apparatus includes a patterning device cleaning system configured to provide an electrostatic force to contaminant particles that are on the patterning device and that are electrically charged by the beam of radiation, in order to remove the contaminant particles from the patterning device.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统和被配置为支撑图案形成装置的支撑结构。 图案形成装置被配置为向辐射束施加图案。 该装置包括图案形成装置清洁系统，该图案形成装置清洁系统被配置为向图案形成装置上的污染物颗粒提供静电力，并且由辐射束对其进行带电，以便从图案形成装置移除污染物颗粒。

公开(公告)号：US20110013166A1

公开(公告)日：2011-01-20

申请号：US12832258

申请日：2010-07-08

申请人： Erik Roelof Loopstra ,  Vladimir Vitalevich Ivanov ,  Johannes Hubertus Josephina Moors ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin ,  Dennis De Graaf ,  Uwe Bruno Heini Stamm

发明人： Erik Roelof Loopstra ,  Vladimir Vitalevich Ivanov ,  Johannes Hubertus Josephina Moors ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin ,  Dennis De Graaf ,  Uwe Bruno Heini Stamm

IPC分类号： G03B27/54 ,  G21K5/04

CPC分类号： H05G2/003 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

摘要： A radiation system includes a target material supply configured to supply droplets of target material along a trajectory, and a laser system that includes an amplifier and optics. The optics are configured to establish a first beam path which passes through the amplifier and through a first location on the trajectory, and to establish a second beam path which passes through the amplifier and through a second location on the trajectory. The laser system is configured to generate a first pulse of laser radiation when photons emitted from the amplifier are reflected along the first beam path by a droplet of target material at the first location on the trajectory. The laser system is configured to generate a second pulse of laser radiation when photons emitted from the amplifier are reflected along the second beam path by the droplet of target material at the second location on the trajectory.

摘要翻译： 辐射系统包括被配置为沿着轨迹提供目标材料的液滴的目标材料供应，以及包括放大器和光学器件的激光系统。 光学器件被配置成建立穿过放大器并通过轨迹上的第一位置的第一光束路径，并且建立穿过放大器并通过轨迹上的第二位置的第二光束路径。 激光系统被配置为当从放大器发射的光子在轨迹上的第一位置处通过目标材料的液滴沿着第一光束路径反射时，产生激光辐射的第一脉冲。 激光系统被配置为当从放大器发射的光子在轨道上的第二位置处由靶材料的液滴沿着第二光束路径反射时，产生激光辐射的第二脉冲。

公开(公告)号：US20090115980A1

公开(公告)日：2009-05-07

申请号：US12318291

申请日：2008-12-24

申请人： Arnoud Cornelis Wassink ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

发明人： Arnoud Cornelis Wassink ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G03B27/52 ,  G01J3/10 ,  G03B27/72

CPC分类号： G03F7/70916

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统，配置成将辐射束投影到衬底上的投影系统，以及用于将碎屑颗粒从辐射束中过滤的过滤系统。 过滤器系统包括用于捕集碎片颗粒的多个箔，用于保持多个箔的支撑件，以及具有布置成要冷却的表面的冷却系统。 冷却系统和支撑件相对于彼此定位，使得在冷却系统的表面和支撑件之间形成间隙。 冷却系统还被布置成将气体注入到间隙中。

公开(公告)号：US07248340B2

公开(公告)日：2007-07-24

申请号：US10874690

申请日：2004-06-24

申请人： Erik Leonardus Ham ,  Robert Gabriël Maria Lansbergen ,  Ellart Alexander Meijer ,  Hendricus Johannes Maria Meijer ,  Hans Meiling ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Gert-Jan Heerens

发明人： Erik Leonardus Ham ,  Robert Gabriël Maria Lansbergen ,  Ellart Alexander Meijer ,  Hendricus Johannes Maria Meijer ,  Hans Meiling ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Gert-Jan Heerens

IPC分类号： G03B27/42 ,  G03B27/62

CPC分类号： G03B27/52 ,  G03F7/70741

摘要： A transport box for transporting a lithographic patterning device and a lithographic apparatus adapted to cooperate with the transport box are presented. The transport box is provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. The box also includes a closure part for closing the opening, and a channel system for evacuating and/or feeding gasses from/to the inner space the box.

摘要翻译： 提出了用于传送平版印刷图案形成装置的传送箱和适于与传送箱配合的光刻设备。 输送箱设置有具有用于存储图案形成装置的存储位置的内部空间和用于传送图案形成装置的开口的容器部分。 该箱还包括用于封闭开口的封闭部分，以及用于将气体从箱体内部空间排出和/或送入箱体的内部空间的通道系统。

公开(公告)号：US07151589B2

公开(公告)日：2006-12-19

申请号：US10972755

申请日：2004-10-26

申请人： Erik Leonardus Ham ,  Gert-Jan Heerens ,  Robert Gabriël Maria Lansbergen ,  Ellard Alexander Meijer ,  Hendricus Johannes Maria Meijer ,  Hans Meiling ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors

发明人： Erik Leonardus Ham ,  Gert-Jan Heerens ,  Robert Gabriël Maria Lansbergen ,  Ellard Alexander Meijer ,  Hendricus Johannes Maria Meijer ,  Hans Meiling ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors

IPC分类号： G03B27/32 ,  G03B27/52

CPC分类号： G03B27/52 ,  G03F7/70741

摘要： According to an embodiment, a box for transporting a lithographic patterning device is arranged to cooperate with a lithographic apparatus. The transport box may be provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. Prior to transfer of the patterning device from the inner space to the apparatus, the inner space is pressurized. The box may also comprise a closure part for closing the opening, and/or a channel system for evacuating and/or feeding gasses from/to the inner space of the box. Other embodiments include a lithographic apparatus comprising and/or configured to cooperate with such a box.

摘要翻译： 根据实施例，用于传送平版印刷图案形成装置的盒被布置成与光刻设备配合。 运输箱可以设置有具有内部空间的容器部分，该内部空间具有用于存储图案形成装置的存储位置和用于图案形成装置的传送的开口。 在将图案形成装置从内部空间传送到装置之前，内部空间被加压。 箱子还可以包括用于关闭开口的封闭部分和/或用于将气体从箱体的内部空间排出和/或进气的通道系统。 其他实施例包括包括和/或配置为与这种盒配合的光刻设备。

公开(公告)号：US06940587B2

公开(公告)日：2005-09-06

申请号：US10670801

申请日：2003-09-26

申请人： Hans Van Der Laan ,  Johannes Jacobus Matheus Baselmans ,  Antonius Johannes Josephus Van Dijsseldonk ,  Martinus Hendrikus Antonius Leenders ,  Johannes Hubertus Josephina Moors

发明人： Hans Van Der Laan ,  Johannes Jacobus Matheus Baselmans ,  Antonius Johannes Josephus Van Dijsseldonk ,  Martinus Hendrikus Antonius Leenders ,  Johannes Hubertus Josephina Moors

IPC分类号： G01M11/02 ,  G03F7/20 ,  H01L21/027 ,  G03B27/52 ,  G03B27/54 ,  G03B27/68

CPC分类号： G03F7/706

摘要： A measurement system configured to measure wave front aberrations of a projection system, as well as a lithographic apparatus including such a measurement system, is provided wherein the measurement system includes a diffractive element and structure configured to increase the pupil filling of the radiation in the pupil of the projection system, both movable into the projection beam between a radiation system and the projection system, and a sensor module configured to sense radiation that has traversed the projection system to measure wave front aberrations of the projection system.

摘要翻译： 提供了一种被配置为测量投影系统的波前像差的测量系统以及包括这种测量系统的光刻设备，其中测量系统包括衍射元件和结构，其被配置为增加瞳孔中的瞳孔填充 所述投影系统可移动到辐射系统和投影系统之间的投影光束中;以及传感器模块，被配置为感测已经穿过投影系统的辐射以测量投影系统的波前像差。

公开(公告)号：US06741329B2

公开(公告)日：2004-05-25

申请号：US10235854

申请日：2002-09-06

申请人： Martinus Hendrikus Antonius Leenders ,  Johannes Hubertus Josephina Moors ,  Erik Roelof Loopstra ,  Noud Jan Gilissen ,  Markus Franciscus Antonius Eurlings

发明人： Martinus Hendrikus Antonius Leenders ,  Johannes Hubertus Josephina Moors ,  Erik Roelof Loopstra ,  Noud Jan Gilissen ,  Markus Franciscus Antonius Eurlings

IPC分类号： G03B2742

CPC分类号： G03F7/70066 ,  G03F7/70083 ,  G03F7/70358 ,  G03F7/70558

摘要： An illumination intensity adjustment device includes a plurality of blades disposed in the projection beam so as to cast half-shadows extending across the illumination field. The blades can be selectively rotated to increase their width perpendicular to the projection beam to control uniformity.

摘要翻译： 照明强度调节装置包括设置在投影光束中的多个叶片，以便投射横过照明场的半阴影。 叶片可以选择性地旋转以增加它们垂直于投影光束的宽度，以控制均匀性。