公开(公告)号：US06940587B2

公开(公告)日：2005-09-06

申请号：US10670801

申请日：2003-09-26

申请人： Hans Van Der Laan ,  Johannes Jacobus Matheus Baselmans ,  Antonius Johannes Josephus Van Dijsseldonk ,  Martinus Hendrikus Antonius Leenders ,  Johannes Hubertus Josephina Moors

发明人： Hans Van Der Laan ,  Johannes Jacobus Matheus Baselmans ,  Antonius Johannes Josephus Van Dijsseldonk ,  Martinus Hendrikus Antonius Leenders ,  Johannes Hubertus Josephina Moors

IPC分类号： G01M11/02 ,  G03F7/20 ,  H01L21/027 ,  G03B27/52 ,  G03B27/54 ,  G03B27/68

CPC分类号： G03F7/706

摘要： A measurement system configured to measure wave front aberrations of a projection system, as well as a lithographic apparatus including such a measurement system, is provided wherein the measurement system includes a diffractive element and structure configured to increase the pupil filling of the radiation in the pupil of the projection system, both movable into the projection beam between a radiation system and the projection system, and a sensor module configured to sense radiation that has traversed the projection system to measure wave front aberrations of the projection system.

摘要翻译： 提供了一种被配置为测量投影系统的波前像差的测量系统以及包括这种测量系统的光刻设备，其中测量系统包括衍射元件和结构，其被配置为增加瞳孔中的瞳孔填充 所述投影系统可移动到辐射系统和投影系统之间的投影光束中;以及传感器模块，被配置为感测已经穿过投影系统的辐射以测量投影系统的波前像差。

公开(公告)号：US06750949B2

公开(公告)日：2004-06-15

申请号：US10193688

申请日：2002-07-12

申请人： Erik Roelof Loopstra ,  Dominicus Jacobus Petrus Adrianus Franken ,  Josephus Jacobus Smits ,  Antonius Johannes Josephus Van Dijsseldonk ,  Johannes Hubertus Josephina Moors ,  Albrecht Hof ,  Günter Maul ,  Michael Mühlbeyer ,  Klaus Mehlkopp

发明人： Erik Roelof Loopstra ,  Dominicus Jacobus Petrus Adrianus Franken ,  Josephus Jacobus Smits ,  Antonius Johannes Josephus Van Dijsseldonk ,  Johannes Hubertus Josephina Moors ,  Albrecht Hof ,  Günter Maul ,  Michael Mühlbeyer ,  Klaus Mehlkopp

IPC分类号： G03B2742

CPC分类号： G03F7/70258 ,  G02B7/008 ,  G02B7/02 ,  G03F7/70833

摘要： A lithographic projection apparatus according to one embodiment of the invention includes a projection system having a plurality of optical elements or sensors mounted on a frame. The frame includes support portions made of a material (e.g. a glass ceramic) having a coefficient of thermal expansion of less than or approximately equal to 0.1×10−6 K−1.

摘要翻译： 根据本发明的一个实施例的光刻投影设备包括具有安装在框架上的多个光学元件或传感器的投影系统。 框架包括由热膨胀系数小于或大约等于0.1×10 -6 K -1的材料（例如玻璃陶瓷）制成的支撑部分。

公开(公告)号：US07148952B2

公开(公告)日：2006-12-12

申请号：US10976314

申请日：2004-10-29

申请人： Markus Franciscus Antonius Eurlings ,  Johannes Jacobus Matheus Baselmans ,  Hako Botma ,  Jan Bruining ,  Marcel Mathijs Theodore Marie Dierichs ,  Antonius Johannes Josephus Van Dijsseldonk ,  Judocus Marie Dominicus Stoeldraijer

发明人： Markus Franciscus Antonius Eurlings ,  Johannes Jacobus Matheus Baselmans ,  Hako Botma ,  Jan Bruining ,  Marcel Mathijs Theodore Marie Dierichs ,  Antonius Johannes Josephus Van Dijsseldonk ,  Judocus Marie Dominicus Stoeldraijer

IPC分类号： G03B27/42

CPC分类号： G03F7/70075

摘要： The present invention provides a lithographic apparatus comprising an illumination system for providing a projection beam of radiation. The illumination system comprises at least one movable optical element (7), such that a projection beam of radiation (4) can be shifted around a central position. This ensures that inhomogeneities in the intensity distribution in the projection beam (4) will be smeared out, which in turn provides an improved homogeneity of the exposure of a surface to be illuminated by the system, such as a wafer or other substrate. The optical element (7) may comprise a motor movable mirror, prism, filter, lens, axicon, diffuser, diffractive optical array, optical integrator, etc. The invention further provides a device manufacturing method, using a lithographic apparatus according to the invention, wherein the optical element is moved, in order to provide an optimum homogeneity for the projection beam of radiation.

摘要翻译： 本发明提供了一种包括用于提供投影射线束的照明系统的光刻设备。 照明系统包括至少一个可移动光学元件（7），使得投影射线束（4）能够围绕中心位置移动。 这确保了投影束（4）中的强度分布中的不均匀性将被涂抹，这反过来提供了由诸如晶片或其它基底的系统照射的表面的曝光的改进的均匀性。 光学元件（7）可以包括电动机可移动镜，棱镜，滤镜，透镜，旋转三棱镜，漫射器，衍射光学阵列，光学积分器等。本发明还提供了一种使用根据本发明的光刻设备的器件制造方法， 其中所述光学元件被移动，以便为所述投影射束提供最佳均匀性。

公开(公告)号：US07116399B2

公开(公告)日：2006-10-03

申请号：US10844570

申请日：2004-05-13

申请人： Wilhelmus Josephus Box ,  Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Josephus Jacobus Smits ,  Marc Wilhelmus Maria Van Der Wijst

发明人： Wilhelmus Josephus Box ,  Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Josephus Jacobus Smits ,  Marc Wilhelmus Maria Van Der Wijst

IPC分类号： G03B27/42 ,  G03B27/54 ,  G02B7/02

CPC分类号： G03F7/70808 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/70858 ,  G03F7/70891 ,  G03F7/709 ,  G03F7/70991

摘要： A lithographic projection apparatus contains a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system contains one or more optically active mirrors and heat shields located to intercept heat radiation to or from the mirrors and/or their support. The heat shields are actively cooled and the mirrors and the heat shields and the mirrors are supported separately on a support frame to reduce vibration of the mirrors due to active cooling. The heat shields may include heat shields that intercept heat radiation to or from the support and/or respective heat shields for individual mirrors that intercept heat radiation to or from the mirrors.

摘要翻译： 光刻投影设备包含投影系统，该投影系统配置成将图案化的辐射束投影到基板的目标部分上。 投影系统包含一个或多个光学反射镜和隔热罩，其被定位成拦截到达镜子和/或其支撑件的热辐射。 热屏蔽被主动冷却，镜子和隔热罩和镜子分别支撑在支撑框架上，以减少由于主动冷却引起的反射镜振动。 隔热罩可以包括热屏蔽件，该隔热板截取向支撑和/或相应的隔热板的热辐射，用于隔离到或从反射镜散发的各个反射镜。

公开(公告)号：US20140085619A1

公开(公告)日：2014-03-27

申请号：US14002000

申请日：2011-12-21

申请人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

发明人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

IPC分类号： G03F7/20

CPC分类号： G03F7/70191 ,  B82Y10/00 ,  G02B1/11 ,  G02B5/1838 ,  G02B5/281 ,  G02B5/283 ,  G03F7/70008 ,  G03F7/702 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

摘要翻译： 一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度 过滤器具有彼此不同的辐射过滤结构。

公开(公告)号：US08570489B2

公开(公告)日：2013-10-29

申请号：US12741960

申请日：2008-11-07

申请人： Jan Bernard Plechelmus Van Schoot ,  Antonius Johannes Josephus Van Dijsseldonk ,  Hans Van Der Laan ,  Diederik Jan Maas

发明人： Jan Bernard Plechelmus Van Schoot ,  Antonius Johannes Josephus Van Dijsseldonk ,  Hans Van Der Laan ,  Diederik Jan Maas

IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70291 ,  G03F7/70208 ,  G03F7/70941

摘要： A lithographic projection apparatus including a support structure configured to support a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate holder configured to hold a substrate; a projection system configured to expose the patterned beam of radiation on a target portion of the substrate; and a system configured to compensate one or more perturbation factors by providing an additional beam of radiation to be exposed on the target portion of the substrate, the additional beam of radiation being imparted in its cross-section with an additional pattern which is based on the pattern of the patterning device and on lithographic projection apparatus property data, the lithographic projection apparatus property data characterizing a level and nature of one or more systematic perturbation factors of different lithographic apparatus.

摘要翻译： 一种光刻投影设备，包括被配置为支撑图案形成装置的支撑结构，所述图案形成装置被配置为在其横截面中赋予图案的辐射束; 衬底保持器，其构造成保持衬底; 投影系统，被配置为将所述图案化的辐射束暴露在所述基板的目标部分上; 以及被配置为通过提供待暴露在所述基板的目标部分上的另外的辐射束来补偿一个或多个扰动因子的系统，所述附加辐射束在其横截面中被赋予附加图案，所述另外的图案基于 图案形成装置的图案和光刻投影装置的属性数据，光刻投影装置的属性数据表征不同光刻装置的一个或多个系统扰动因子的水平和性质。

公开(公告)号：US07312860B2

公开(公告)日：2007-12-25

申请号：US11594075

申请日：2006-11-08

申请人： Arie Jeffrey Den Boef ,  Hans Van Der Laan ,  Antonius Johannes Josephus Van Dijsseldonk ,  Mircea Dusa ,  Antoine Gaston Marie Kiers

发明人： Arie Jeffrey Den Boef ,  Hans Van Der Laan ,  Antonius Johannes Josephus Van Dijsseldonk ,  Mircea Dusa ,  Antoine Gaston Marie Kiers

IPC分类号： G01B9/00

CPC分类号： G03F7/706

摘要： In a method according to one embodiment of the invention, aberrations in a lithographic apparatus are detected by printing a test pattern having at least one degree of symmetry and being sensitive to a particular aberration in the apparatus, and using a scatterometer to derive information concerning the aberration. The test structure may comprise a two-bar grating, in which case the inner and outer duty ratios can be reconstructed to derive information indicative of comatic aberration. Alternatively, a hexagonal array of dots can be used, such that scatterometry data can be used to reconstruct dot diameters indicative of 3-wave aberration.

摘要翻译： 在根据本发明的一个实施例的方法中，通过印刷具有至少一个对称度并对装置中的特定像差敏感的测试图案来检测光刻设备中的像差，并且使用散射仪来得到关于 像差 测试结构可以包括双杆格栅，在这种情况下，可以重建内部和外部占空比以导出指示彗形像差的信息。 或者，可以使用六边形点阵列，使得散射测量数据可以用于重建指示3波像差的点直径。

公开(公告)号：US20100321657A1

公开(公告)日：2010-12-23

申请号：US12741960

申请日：2008-11-07

申请人： Jan Bernard Plechelmus VAN SCHOOT ,  Diederik Jan Maas ,  Antonius Johannes Josephus Van Dijsseldonk ,  Hans Van Der Laan

发明人： Jan Bernard Plechelmus VAN SCHOOT ,  Diederik Jan Maas ,  Antonius Johannes Josephus Van Dijsseldonk ,  Hans Van Der Laan

IPC分类号： G03B27/52

CPC分类号： G03F7/70291 ,  G03F7/70208 ,  G03F7/70941

摘要： A lithographic projection apparatus including a support structure configured to support a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate holder configured to hold a substrate; a projection system configured to expose the patterned beam of radiation on a target portion of the substrate; and a system configured to compensate one or more perturbation factors by providing an additional beam of radiation to be exposed on the target portion of the substrate, the additional beam of radiation being imparted in its cross-section with an additional pattern which is based on the pattern of the patterning device and on lithographic projection apparatus property data, the lithographic projection apparatus property data characterizing a level and nature of one or more systematic perturbation factors of different lithographic apparatus.

摘要翻译： 一种光刻投影设备，包括被配置为支撑图案形成装置的支撑结构，所述图案形成装置被配置为在其横截面中赋予图案的辐射束; 衬底保持器，其构造成保持衬底; 投影系统，被配置为将所述图案化的辐射束暴露在所述基板的目标部分上; 以及被配置为通过提供待暴露在所述基板的目标部分上的另外的辐射束来补偿一个或多个扰动因子的系统，所述附加辐射束在其横截面中被赋予附加图案，所述另外的图案基于 图案形成装置的图案和光刻投影装置的属性数据，光刻投影装置的属性数据表征不同光刻装置的一个或多个系统扰动因子的水平和性质。

公开(公告)号：US07151594B2

公开(公告)日：2006-12-19

申请号：US10696742

申请日：2003-10-30

申请人： Arie Jeffrey Den Boef ,  Hans Van Der Laan ,  Antonius Johannes Josephus Van Dijsseldonk ,  Mircea Dusa ,  Antoine Gaston Marie Kiers

发明人： Arie Jeffrey Den Boef ,  Hans Van Der Laan ,  Antonius Johannes Josephus Van Dijsseldonk ,  Mircea Dusa ,  Antoine Gaston Marie Kiers

IPC分类号： G01B9/00

CPC分类号： G03F7/706

摘要： In a method according to one embodiment of the invention, aberrations in a lithographic apparatus are detected by printing a test pattern having at least one degree of symmetry and being sensitive to a particular aberration in the apparatus, and using a scatterometer to derive information concerning the aberration. The test structure may comprise a two-bar grating, in which case the inner and outer duty ratios can be reconstructed to derive information indicative of comatic aberration. Alternatively, a hexagonal array of dots can be used, such that scatterometry data can be used to reconstruct dot diameters indicative of 3-wave aberration.

摘要翻译： 在根据本发明的一个实施例的方法中，通过印刷具有至少一个对称度并对装置中的特定像差敏感的测试图案来检测光刻设备中的像差，并且使用散射仪来得到关于 像差 测试结构可以包括双杆格栅，在这种情况下，可以重建内部和外部占空比以导出指示彗形像差的信息。 或者，可以使用六边形点阵列，使得散射测量数据可以用于重建指示3波像差的点直径。

公开(公告)号：US07253880B2

公开(公告)日：2007-08-07

申请号：US10995536

申请日：2004-11-24

申请人： Erik Roelof Loopstra ,  Petrus Rutgerus Bartray ,  Antonius Johannes Josephus Van Dijsseldonk ,  Paulus Martinus Maria Liebregts

发明人： Erik Roelof Loopstra ,  Petrus Rutgerus Bartray ,  Antonius Johannes Josephus Van Dijsseldonk ,  Paulus Martinus Maria Liebregts

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70141 ,  G03F7/70091

摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation and projection system configured to project the radiation beam onto a target portion of a substrate. At least one of the illumination system and the projection system includes a focusing element for reflecting or refracting the beam. A plurality of stop discs is provided, each having an aperture therethrough, together with a disc positioner configured to place one of the stop discs adjacent the focusing element to control the numerical aperture (NA) of the projection system or illumination system. The apparatus further includes a disc changer configured to select one of the stop discs and provide the selected stop disc to the disc positioner, the disc changer being external to the projection system or illumination system.

摘要翻译： 光刻设备包括被配置为提供辐射束和投影系统的照明系统，其配置成将辐射束投影到基板的目标部分上。 照明系统和投影系统中的至少一个包括用于反射或折射光束的聚焦元件。 提供了多个止动盘，每个具有穿过其中的孔，以及配置成将止动盘中的一个邻近聚焦元件放置以控制投影系统或照明系统的数值孔径（NA）的盘定位器。 该装置还包括一个换盘器，其被配置为选择一个停止盘并将所选择的停止盘提供给盘定位器，换盘器位于投影系统或照明系统的外部。