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    WIDE ANGLE MIRROR SYSTEM
    71.
    发明申请
    WIDE ANGLE MIRROR SYSTEM 审中-公开

    公开(公告)号：US20080037127A1

    公开(公告)日：2008-02-14

    申请号：US11691769

    申请日：2007-03-27

    Applicant: Michael F. Weber

    Inventor： Michael F. Weber

    IPC: G02B1/10

    CPC classification number: G02B5/285 ,  G02B5/0816 ,  G02B5/305 ,  G02B6/0011

    Abstract: Composite mirror systems include a wideband thin film interference stack having a plurality of microlayers and an optically thick layer having a refractive index greater than air but less than the smallest refractive index of the stack. The mirror systems can provide high reflectivity for light propagating in the stack and in the optically thick layer at supercritical angles, while avoiding degradation in reflectivity if dirt or other disturbances such as absorbing materials are present at the mirror backside for example due to contact with a support structure.

    Silicon wafer based macroscopic mirror for wide angle scanning applications
    73.
    发明授权
    Silicon wafer based macroscopic mirror for wide angle scanning applications 失效
    用于广角扫描应用的基于硅晶片的宏观镜

    公开(公告)号：US06953254B2

    公开(公告)日：2005-10-11

    申请号：US10921522

    申请日：2004-08-19

    Applicant: Joseph T. Pesik

    Inventor： Joseph T. Pesik

    IPC: G02B5/08 ,  G02B7/182 ,  G02B26/08 ,  G02B26/10

    CPC classification number: G02B5/0816 ,  G02B5/08 ,  G02B5/0808 ,  G02B7/1821 ,  G02B26/0816 ,  G02B26/101

    Abstract: A macroscopic mirror for wide angle scanning applications comprises: a silicon substrate section of a predetermined shape and macroscopic size cut from a silicon wafer comprising a flat, polished surface side and an etched, rough surface side; and a plurality of layers, including a layer of reflective medium, disposed on the flat, polished surface of the substrate section in such a manner to minimize flexural distortion of the flat surface. The macroscopic mirror is made by a method comprising the steps of: preparing the silicon wafer by polishing one side to a predetermined flatness and etching the other side to a predetermined roughness; cutting the substrate section from the prepared silicon wafer to a predetermined shape and macroscopic size; and applying the plurality of layers on the flat, polished surface. The macroscopic mirror is included in a mirror system wherein the rough surface side is bonded to supporting arms of a drive mechanism which scans the mirror at a predetermined scanning rate in at least one plane of rotation.

    Abstract translation: 用于广角扫描应用的宏观镜包括：从硅晶片切割出预定形状和宏观尺寸的硅衬底部分，其包括平坦抛光表面侧和蚀刻的粗糙表面侧; 以及多个层，包括反射介质层，以使得平坦表面的弯曲变形最小化的方式设置在基板部分的平坦抛光表面上。 宏观镜是通过以下步骤制成的：通过将一侧抛光至预定的平面度并将另一侧蚀刻到预定的粗糙度来制备硅晶片; 将衬底部分从所制备的硅晶片切割成预定形状和宏观尺寸; 以及将所述多个层施加在所述平坦抛光表面上。 宏观镜包括在镜系统中，其中粗糙表面侧结合到在至少一个旋转平面中以预定扫描速率扫描反射镜的驱动机构的支撑臂。

    Ultraviolet filter for ring laser gyroscope mirrors
    74.
    发明授权
    Ultraviolet filter for ring laser gyroscope mirrors 有权

    公开(公告)号：US11962118B2

    公开(公告)日：2024-04-16

    申请号：US17081764

    申请日：2020-10-27

    Applicant: Honeywell International Inc.

    Inventor： Randy Ramberg ,  Lance Vrieze ,  Steven C. Albers ,  Dean Eivind Johnson

    IPC: H01S3/08 ,  G01C19/66 ,  G02B1/02 ,  G02B5/08 ,  G02B5/28 ,  H01S3/083

    CPC classification number: H01S3/08059 ,  G01C19/661 ,  G02B1/02 ,  G02B5/0816 ,  G02B5/283 ,  H01S3/083

    Abstract: A multilayer mirror comprises a reflector section including a plurality of alternating layers of a high index material and a low index material, and a filter section over the reflector section. The filter section comprises a first filter layer including a low index material on a layer of high index material of the reflector section; a second filter layer on the first filter layer, the second filter layer comprising a high index material that is different than the high index material in the reflector section; and a third filter layer on the second filter layer, the third filter layer comprising a low index material. Each filter layer has an optical thickness greater than or equal to the optical thickness of each layer of the alternating layers. The filter section substantially blocks ultraviolet (UV) energy, thereby preventing UV energy from substantially impinging on the high index material of the reflector section.

    OPTICAL ARTICLE WITH ANTIBACTERIAL FUNCTION
    77.
    发明公开
    OPTICAL ARTICLE WITH ANTIBACTERIAL FUNCTION 审中-公开

    公开(公告)号：US20230176253A1

    公开(公告)日：2023-06-08

    申请号：US17917625

    申请日：2021-04-09

    Applicant: Essilor International

    Inventor： Hélène MAURY ,  Mathieu FEUILLADE

    IPC: G02B1/115 ,  G02B1/18 ,  G02B5/08

    CPC classification number: G02B1/115 ,  G02B1/18 ,  G02B5/0816

    Abstract: The invention relates to an optical article, such as an ophthalmic lens, comprising a transparent substrate with a front main face and a rear main face, at least one of its main faces being coated with a multilayer interference coating, such as a mirror coating or an antireflective coating, which is the top coating of the article, wherein the outermost layer of the top coating comprises a material having antibacterial properties, or wherein the outermost layer of the top coating is a porous layer and the layer directly underneath the outermost layer of the top coating is a layer comprising a material having antibacterial properties.

    METHOD FOR TREATING A MIRRORED OPTICAL ITEM
    78.
    发明公开
    METHOD FOR TREATING A MIRRORED OPTICAL ITEM 审中-公开

    公开(公告)号：US20230161086A1

    公开(公告)日：2023-05-25

    申请号：US17916279

    申请日：2021-04-02

    Applicant: BNL EUROLENS

    Inventor： Vincente ESTEVEZ RODRIGUEZ ,  Laure LE BIHAN

    IPC: G02B5/08 ,  C23C14/58 ,  G02B1/12 ,  G02B1/14 ,  G02B1/18 ,  G02B5/28

    CPC classification number: G02B5/0816 ,  C23C14/5833 ,  G02B1/12 ,  G02B1/14 ,  G02B1/18 ,  G02B5/286

    Abstract: The invention relates to a method for treating a mirrored optical item, comprising: a substrate (10), a mirroring stack (21) of at least two interference layers (M1 to M6) carried by the substrate (10), thus increasing the reflection and having: an interference layer (M1) distant from the substrate (10), with a first initial thickness and a first refractive index and at least one near interference layer (M2) arranged between the substrate (10) and the distant interference layer (M1), with a second thickness and a second refractive index different from the first refractive index, the mirroring stack (21) giving the mirrored optical ilem (1) a first colouring according to the CIELAB space, by means of an interferometry phenomenon, the method comprising a step (103) of removing, by ion bombardment, at least in one first predetemrined zone (Z1), a thickness of the mirrored stack that is less than the sum of the initial thicknesses concerned by the removal step, the mirrored optical item having, by means of an interferometry phenomenon, a second colouring according to the CIELAB space different from the first colouring.

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