公开(公告)号：US07710564B1

公开(公告)日：2010-05-04

申请号：US12109831

申请日：2008-04-25

Applicant: Peter Hill ,  Robert Danen ,  Charles N. Wang

Inventor： Peter Hill ,  Robert Danen ,  Charles N. Wang

IPC: G01J4/00

CPC classification number: G01N21/9501 ,  G01N21/21 ,  G01N21/8806 ,  G01N21/956 ,  G03F7/7065

Abstract: In one embodiment, a surface inspection system comprises a radiation directing assembly to target radiation onto a surface of an object, the radiation directing assembly comprising a radiation source that emits a broadband radiation beam, a polarization control assembly comprising at least one of a linear polarizer and an apochromatic retarder, an aperture control mechanism, and a beam splitter, a radiation collection assembly to collect radiation reflected from the surface of the object, the radiation collection assembly comprising, a polarization control assembly comprising at least one of a linear polarizer and an apochromatic retarder, an aperture control mechanism, and at least one radiation sensing device.

Abstract translation: 在一个实施例中，表面检查系统包括辐射导向组件以将辐射对准到物体的表面上，所述辐射导向组件包括发射宽带辐射束的辐射源，偏振控制组件包括线性偏振器 以及复消色差延迟器，孔径控制机构和分束器，用于收集从物体表面反射的辐射的辐射收集组件，所述辐射收集组件包括：偏振控制组件，其包括线性偏振器和 复消色差延迟器，孔径控制机构和至少一个辐射感测装置。

公开(公告)号：US20100104173A1

公开(公告)日：2010-04-29

申请号：US12649898

申请日：2009-12-30

Applicant: Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

Inventor： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

IPC: G06K9/62

CPC classification number: G03F7/7065 ,  G01N21/95684

Abstract: A pattern inspection method and apparatus in which a deep ultraviolet light or an ultraviolet light is irradiated onto a specimen on which a pattern is formed, an image of the specimen which is irradiated with the deep ultraviolet light or the ultraviolet light is formed and the formed image is detected with a rear-surface irradiation type image sensor, which is sensitive to wavelengths of no greater than 400 nmm. A signal outputted from the image sensor is processed so as to detect a defect of the specimen by converting an analog image signal outputted from the image sensor to a digital image signal with an A/D converter, and a display displays information of the defect detected.

Abstract translation: 将深紫外光或紫外线照射到形成有图案的试样上的图案检查方法和装置形成了被深紫外线或紫外线照射的样本的图像，形成 使用对不大于400nm的波长敏感的背面照射型图像传感器来检测图像。 处理从图像传感器输出的信号，以便通过用A / D转换器将从图像传感器输出的模拟图像信号转换为数字图像信号来检测样本的缺陷，并且显示器显示检测到的缺陷的信息 。

公开(公告)号：US07646906B2

公开(公告)日：2010-01-12

申请号：US11048630

申请日：2005-01-31

Applicant: Zain K. Saidin ,  Yalin Xiong ,  Lance Glasser ,  Carl Hess ,  Moshe E. Preil

Inventor： Zain K. Saidin ,  Yalin Xiong ,  Lance Glasser ,  Carl Hess ,  Moshe E. Preil

IPC: G06K9/00

CPC classification number: G03F1/84 ,  G03F1/36 ,  G03F7/70433 ,  G03F7/70441 ,  G03F7/705 ,  G03F7/70533 ,  G03F7/70616 ,  G03F7/7065 ,  G03F7/70666 ,  G06Q30/0206

Abstract: Computer-implemented methods for detecting defects in reticle design data are provided. One method includes generating a first simulated image illustrating how the reticle design data will be printed on a reticle using a reticle manufacturing process. The method also includes generating second simulated images using the first simulated image. The second simulated images illustrate how the reticle will be printed on a wafer at different values of one or more parameters of a wafer printing process. The method further includes detecting defects in the reticle design data using the second simulated images. Another method includes the generating steps described above in addition to determining a rate of change in a characteristic of the second simulated images as a function of the different values. This method also includes detecting defects in the reticle design data based on the rate of change.

Abstract translation: 提供了用于检测标线设计数据缺陷的计算机实现方法。 一种方法包括生成第一模拟图像，其示出如何使用标线制造工艺将掩模版设计数据印刷在掩模版上。 该方法还包括使用第一模拟图像生成第二模拟图像。 第二模拟图像示出了在晶片印刷过程的一个或多个参数的不同值下如何将掩模版印刷在晶片上。 该方法还包括使用第二模拟图像检测掩模版设计数据中的缺陷。 除了确定作为不同值的函数的第二模拟图像的特性的变化率之外，另一种方法包括上述生成步骤。 该方法还包括基于变化率检测掩模版设计数据中的缺陷。

公开(公告)号：US07639345B2

公开(公告)日：2009-12-29

申请号：US11252230

申请日：2005-10-18

Applicant: Joost Jeroen Ottens ,  Aschwin Lodewijk Hendricus Johannes Van Meer ,  Wim Tjibbo Tel ,  Jacob Willem Vink ,  Rene Theodorus Petrus Compen ,  Petrus Johannes Gerrits

Inventor： Joost Jeroen Ottens ,  Aschwin Lodewijk Hendricus Johannes Van Meer ,  Wim Tjibbo Tel ,  Jacob Willem Vink ,  Rene Theodorus Petrus Compen ,  Petrus Johannes Gerrits

IPC: G03B27/62 ,  G03B27/58

CPC classification number: G03F7/70916 ,  G03F7/7065 ,  G03F7/707 ,  G03F9/7003

Abstract: The invention provides a height detecting apparatus for a lithographic apparatus. The height mapping apparatus includes a height mapping unit for providing at least one height map of a top surface of an object to be placed in a radiation beam of the lithographic apparatus, the object to be clamped by a clamping force applied thereto on a support constructed to support the object. The height mapping apparatus also includes a control unit for controlling the mapping unit to provide the at least one height map of the object relative to at least two different clamping pressure levels.

Abstract translation: 本发明提供一种用于光刻设备的高度检测装置。 高度测绘装置包括高度测绘单元，用于提供待放置在光刻设备的辐射束中的待放置物体的顶表面的至少一个高度图，待施加到其上的夹持力夹持在被构造的支撑体上 支持对象。 高度测绘装置还包括控制单元，用于控制映射单元以相对于至少两个不同的夹紧压力水平提供对象的至少一个高度图。

公开(公告)号：US07627165B2

公开(公告)日：2009-12-01

申请号：US11360813

申请日：2006-02-24

Applicant: Junji Oaki ,  Shinji Sugihara ,  Yuichi Nakatani

Inventor： Junji Oaki ,  Shinji Sugihara ,  Yuichi Nakatani

IPC: G06K9/00

CPC classification number: G03F7/7065 ,  G03F1/84 ,  G03F7/705 ,  G06T7/0004

Abstract: An image correction device for use in pattern inspection apparatus is disclosed. This device includes a pattern extraction unit for extracting a pattern, as a cut-and-paste pattern, from a pattern existence region of an inspection reference pattern image and a pattern image of a workpiece being tested. The device also includes a pattern pasting unit for pasting the cut-and-paste pattern in blank regions of the reference and under-test pattern images to thereby create a pasted reference pattern image and a pasted test pattern image. The device further includes an equation generator for generating by linear predictive modeling a set of simultaneous equations relative to the pasted reference and test pattern images, a parameter generator for solving these equations to obtain a model parameter(s), and a unit for creating a corrected pattern image by the linear predictive modeling using the model parameter(s).

Abstract translation: 公开了一种用于图案检查装置的图像校正装置。 该装置包括：图案提取单元，用于从检查参考图案图像的图案存在区域和被测工件的图案图像中提取图案作为切割和粘贴图案。 该装置还包括一个图案粘贴单元，用于将剪切和粘贴图案粘贴在参考和未测试图案图像的空白区域中，从而产生粘贴的参考图案图像和粘贴的测试图案图像。 该装置还包括一个等式发生器，用于通过线性预测建模生成相对于粘贴的参考和测试图案图像的一组联立方程，用于求解这些方程以获得模型参数的参数发生器，以及用于创建 通过使用模型参数的线性预测建模来校正图案图像。

公开(公告)号：US07616805B2

公开(公告)日：2009-11-10

申请号：US12249328

申请日：2008-10-10

Applicant: Shigeru Matsui ,  Katsuya Suzuki

Inventor： Shigeru Matsui ,  Katsuya Suzuki

IPC: G06K9/00

CPC classification number: G06T7/001 ,  G01N21/95607 ,  G03F7/7065 ,  G06T2207/30148

Abstract: The pattern defect inspection apparatus is operable to detect defects by comparing a detection image, which is obtained through scanning by an image sensor those patterns that have the identical shape and are continuously disposed on the object under tested at equal intervals in row and column directions, with a reference image obtained by scanning neighboring identical shape patterns in the row and column directions. This apparatus has a unit for generating an average reference image by statistical computation processing from the images of identical shape patterns lying next to the detection image including at least eight nearest chips on the up-and-down and right-and-left sides and at diagonal positions with the detection image being intermediately situated. The apparatus also includes a unit that detects a defect by comparing the detection image to the average reference image thus generated.

Abstract translation: 图案缺陷检查装置可以通过将通过图像传感器进行扫描而得到的检测图像进行比较来检测缺陷，所述检测图像具有相同形状且连续设置在被检测物体上的行和列方向上等间隔的那些图案， 具有通过扫描行和列方向上的相邻相同形状图案而获得的参考图像。 该装置具有用于通过统计计算处理从邻近检测图像的相同形状图案的图像生成平均参考图像的单元，该检测图像包括上下左右侧至少八个最近的码片，以及在 对角位置，检测图像位于中间位置。 该装置还包括通过将检测图像与由此生成的平均参考图像进行比较来检测缺陷的单元。

公开(公告)号：US20090231558A1

公开(公告)日：2009-09-17

申请号：US12429017

申请日：2009-04-23

Applicant: Giora Dishon ,  Moshe Finarov ,  Zvi Nirel ,  Yoel Cohen

Inventor： Giora Dishon ,  Moshe Finarov ,  Zvi Nirel ,  Yoel Cohen

IPC: G03F7/20

CPC classification number: G03F7/70058 ,  G01B11/14 ,  G01N21/88 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8867 ,  G03F7/3028 ,  G03F7/70525 ,  G03F7/70616 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/7065 ,  G03F7/70675 ,  G03F7/7075 ,  G03F7/70991 ,  H01L21/67155

Abstract: Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a predetermined pattern to produce a latent image of the mask on the photoresist coating, a developing station in which the latent image is developed, an unloading station in which the substrates are unloaded and a monitoring station for monitoring the substrates with respect to predetermined parameters of said photolithography process before reaching the unloading station.

Abstract translation: 用于根据预定的光刻工艺处理衬底的设备包括其中装载衬底的装载站，其中衬底涂覆有光致抗蚀剂材料的涂覆站，其中光致抗蚀剂涂层通过掩模暴露于光的曝光站 具有预定图案以在光致抗蚀剂涂层上产生掩模的潜像，其中潜像显影的显影站，卸载基板的卸载站和用于相对于预定参数监测基板的监控站 的光刻工艺。

公开(公告)号：US20090220895A1

公开(公告)日：2009-09-03

申请号：US12074148

申请日：2008-02-29

Applicant: Cesar M. Garza ,  Sungseo Cho

Inventor： Cesar M. Garza ,  Sungseo Cho

IPC: G03F7/26

CPC classification number: G03F7/7065 ,  H01L22/12

Abstract: A method for patterning a substrate is provided, which comprises (a) providing a substrate; (b) applying a first layer comprising a first photo resist to the substrate; (c) applying a second layer comprising a second photo resist over the first layer; (d) patterning the second layer; and (e) inspecting the patterned second layer with an inspection tool; wherein at least one of the first and second layers comprises a contrasting agent which increases the contrast between the first and second layers to the inspection tool.

Abstract translation: 提供了一种图案化衬底的方法，其包括（a）提供衬底; （b）将包含第一光致抗蚀剂的第一层施加到所述基底上; （c）在第一层上施加包含第二光致抗蚀剂的第二层; （d）图案化第二层; 和（e）用检查工具检查图案化的第二层; 其中所述第一层和所述第二层中的至少一个包括对比剂，其将所述第一层和所述第二层之间的对比度增加到所述检查工具。

公开(公告)号：US07561938B2

公开(公告)日：2009-07-14

申请号：US11545067

申请日：2006-10-06

Applicant: Salman Akram ,  Warren M. Farnworth ,  Derek J. Gochnour ,  David R. Hembree ,  Michael E. Hess ,  John O. Jacobson ,  James M. Wark ,  Alan G. Wood

Inventor： Salman Akram ,  Warren M. Farnworth ,  Derek J. Gochnour ,  David R. Hembree ,  Michael E. Hess ,  John O. Jacobson ,  James M. Wark ,  Alan G. Wood

IPC: G06F19/00

CPC classification number: G03F7/7065 ,  G06F11/006 ,  H01L2223/5444

Abstract: An inventive method in an integrated circuit (IC) manufacturing process for using data regarding repair procedures conducted on ICs at probe to determine whether any further repairs will be conducted later in the manufacturing process includes storing the data in association with a fuse ID of each of the ICs. The ID codes of the ICs are automatically read, for example, at an opens/shorts test during the manufacturing process. The data stored in association with the ID codes of the ICs is then accessed, and additional repair procedures the ICs may undergo are selected in accordance with the accessed data. Thus, for example, the accessed data may indicate that an IC is unrepairable, so the IC can proceed directly to a scrap bin without having to be queried to determine whether it is repairable, as is necessary in traditional IC manufacturing processes.

Abstract translation: 在集成电路（IC）制造过程中的创造性方法，用于使用关于在探针上的IC进行的修复程序的数据，以确定是否在制造过程中稍后进行进一步的修理，包括将数据与每个的熔丝ID相关联地存储 IC。 IC的ID代码在制造过程中例如在打开/短路测试中自动读取。 然后访问与IC的ID代码相关联存储的数据，并且根据所访问的数据选择IC可能经历的附加修复过程。 因此，例如，访问的数据可以指示IC不可修复，因此IC可以直接进入废料仓，而不必被查询以确定其是否可修复，如在传统IC制造过程中所必需的。

公开(公告)号：US07518789B2

公开(公告)日：2009-04-14

申请号：US10959022

申请日：2004-10-04

Applicant: David R. Shafer ,  Yung-Ho Chuang ,  J. Joseph Armstrong

Inventor： David R. Shafer ,  Yung-Ho Chuang ,  J. Joseph Armstrong

IPC: G02B13/14 ,  G03B27/54

CPC classification number: G03F7/70225 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/0856 ,  G02B17/0892 ,  G02B17/0896 ,  G02B21/04 ,  G02B21/16 ,  G03F1/84 ,  G03F7/70275 ,  G03F7/70483 ,  G03F7/70616 ,  G03F7/7065

Abstract: A design for inspecting specimens, such as photomasks, for unwanted particles and features such as pattern defects is provided. The system provides no central obscuration, an external pupil for aperturing and Fourier filtering, and relatively relaxed manufacturing tolerances, and is suited for both broad-band bright-field and laser dark field imaging and inspection at wavelengths below 365 nm. In many instances, the lenses used may be fashioned or fabricated using a single material. Multiple embodiments of the objective lensing arrangement are disclosed, all including at least one small fold mirror and a Mangin mirror. The system is implemented off axis such that the returning second image is displaced laterally from the first image so that the lateral separation permits optical receipt and manipulation of each image separately. The objective designs presented have the optical axis of the Mangin mirror image relay at ninety degrees to the optical axis defined by the focusing lenses, or an in-line or straight objective having one ninety degree bend of light rays.

Abstract translation: 提供了用于检查样品的设计，例如光掩模，用于不想要的颗粒和诸如图案缺陷的特征。 该系统不提供中心遮蔽，用于打开和傅立叶滤波的外部光瞳，以及相对放松的制造公差，并且适用于波长低于365nm的宽带亮场和激光暗场成像和检查。 在许多情况下，所使用的透镜可以使用单一材料来制造或制造。 公开了物镜设计的多个实施例，全部包括至少一个小折叠镜和Mangin镜。 系统离轴实现，使得返回的第二图像从第一图像横向移位，使得横向分离允许分别对每个图像进行光学接收和操纵。 所提出的目标设计具有与由聚焦透镜限定的光轴90度的Mangin镜像继电器的光轴，或具有一个九十度光线弯曲的直列或直线物镜。