Abstract:
Preferential etches for Gallium Arsenide and Gallium Aluminum Arsenide materials provide a novel single crystalline layer thin film of GaAs for use as a free standing transmission secondary electron emitter or as a photocathode layer on an intermediate epitaxial layer of GaAlAs. Etching of a central area of a substrate layer of GaAs provides an annular rim supporting structure for the epitaxial GaAlAs and GaAs layers. A particular composition of hydrogen peroxide and ammonium hydroxide preferentially etches GaAs while hydrochloric acid preferentially etches GaAlAs.
Abstract:
A long wavelength photoemitter, for example a III-V semiconductor, having a work function reduction activation layer thereon, with means for overcoming the energy barrier between the semiconductor conduction band edge and the vacuum comprising means for thermally energizing the photoexcited electrons in the conduction band from a lower energy level therein to a higher "metastable" energy level in which they may reside for a sufficient time such that the electrons can pass with high probability from the elevated energy level into the vacuum over the energy barrier. In one embodiment, promotion of electrons to this higher energy level in the conduction band results from proper selection of the semiconductor alloy with conduction band levels favoring such room temperature thermal excitation. In another embodiment, a Schottky barrier is formed between the semiconductor emitter surface and the activation layer, by means of which an internal electric field is applied to the cathode resulting in high effective electron temperature for energy level transfer analogous to the intervalley electron transfer process of the Gunn effect. In yet other embodiments, composite semiconductor bodies are fabricated in which one region may advantageously be designed for efficient absorption of long-wavelength photons, and another for efficient operation of the promotion mechanism, which together assure a high quantum efficiency. Other properties of the biased promotion layer may be used to minimize emission of electrons which have been excited by purely thermal means, thus providing a low dark current, usually considered to be incompatible with long-wavelength infrared response.
Abstract:
A photoemissive cathode is provided consisting of colloidal semiconducting material on a base transparent to visible and/or infrared radiation. The semiconductor material may be a binary or ternary compound from the groups III-V or II-VI of the periodic table. The semiconducting colloids are formed by a simultaneous precipitation and doping process.
Abstract:
A gallium arsenide photocathode is formed from a substrate of gallium arsenide on which are grown a first thin gallium aluminum arsenide layer and a further thin active layer of gallium arsenide. A coating of wax is applied over the thin active GaAs layer and around the sides and peripheral edges of the structure. A central region of the GaAs substrate is then etched to expose the inner GaAlAs layer while leaving a supporting rim around the edges. The rim permits use of a thinner GaAlAs layer.
Abstract:
A solid state radiation sensitive field emitter cathode comprising a single crystal semiconductor member having a body portion with a uniform array of closely spaced and very sharp electron emitting projections from one surface in the form of needles or whisker like members. Electrons are emitted into vacuum when a planar-parallel positive anode is mounted in close proximity to the surface. The cathode is responsive to input radiation such as electrons or light directed onto the cathode in modifying the electron emission from the array of electron emitter projections. The method of manufacturing the cathode by providing a predetermined pattern or mosaic of islands of a material exhibiting a greater etch resistant property than the semiconductor material, on a wafer of a semiconductor material and then etching out between and beneath the islands to undercut to a point where the islands are supported by only a small whisker of the semiconductor material. Removal of the islands results in an electron emitter being exposed from beneath each island wherein carriers generated within the body portion and also carriers generated within the depletion regions of the tips deffuse to the electron emitter projections wherein establishment of a high electric field at the tips of the electron emitter projections results in electron emission primarily due to conduction band tunneling. The device provides about 106 emitting points of close proximity so as to effect photographic-like imaging.
Abstract:
A solid state radiation sensitive device is described employing JFETs as the sensitive elements. Two terminal construction is achieved by using a common conductor to capacitively couple to the JFET gate and to one of the source and drain connections.
Abstract:
In order to obtain an optimum freedom in the choice of the material in a semitransparent photocathode which consists of IIIV semiconductor compounds and in which the matching of the lattice constant of the active layer to that of the substrate is achieved by an intermediate layer, and thus to arrive at a sensitivity and/or optical wide band condition which is as high as possible, according to the invention the composition of the intermediate layer is independent of the substrate and of the active layer and its lattice constant differs from the lattice constant of the active layer by less than 0.3% and differs from the grid constant of the substrate up to several per cent, for example up to 3%. Such a photocathode may consist in particular of a substrate of GaP, an intermediate layer of AlxGa1 xAs with x>0.8 and an active layer of GaAs.
Abstract translation:为了获得在由III-V族半导体化合物组成的半透明光电阴极中选择材料的最佳自由度,并且通过中间层实现了有源层的晶格常数与衬底的晶格常数的匹配, 并且因此达到尽可能高的灵敏度和/或光学宽带状态,根据本发明,中间层的组成与衬底和有源层无关,其晶格常数不同于晶格常数 的活性层小于0.3%,并且不同于衬底的栅格常数达几个百分比,例如高达3%。 这种光电阴极可以特别包括GaP的衬底,具有x> 0.8的Al x Ga 1-x As的中间层和GaAs的有源层。
Abstract:
A sandwich structure of photosensitive junctions in series with a mosaic of photoemitters. An external grid is positioned adjacent the mosaic of photoemitters and has the high voltage side of a step up voltage divider thereto with the low voltage side connected to the input side of the sandwich structure. The sandwich structure and external grid are enclosed in a vacuum envelope for converting an input optical radiant image into an electron image for display on an electroluminescent screen. A bias light is uniformly flooded over the mosaic of photoemitters to provide saturation electron current therefrom. The flow of electrons emitted from the photoemitters are in proportion to the intensity of infrared light incident on the input side of the sandwich structure. The input side of the structure has an antireflection coating thereof for aiding the incident infrared light in producing electron-hole pairs across the photosensitive junctions.
Abstract:
A tuneable field assisted photocathode structured as a three layer double heterojunction device with a low work function cesium oxide coating on the electron emitting surface. An internal field assistance bias aids the flow of electrons from a narrow bandgap region, where they are photo-generated, to the wider bandgap negative electron affinity surface region for vacuum emission.
Abstract:
A PHOTOEMITTER HAVING A HIGH QUANTUM EFFICIENCY AND A LOW WORK FUNCTION FOR PHOTOEMISSION, E.G. PHOTOELECTRIC THRESHOLD, IS FORMED BY DEPOSITING A 10-100 A. FILM OF A WIDE BANDGAP GROUP III-V COMPOUND, E.G. GALLIUM PHOSPHIDE, ATOP A 0.5-10 MICRON THICK LAYER OF A SECOND GROUP III-V COMPOUND, E.G. GALLIUM ANTIMONIDE, HAVING A BANDGAP MATCHING THE DESIRED PHOTOELECTRIC THRESHOLD. THE FILM SURFACE THEN IS TREATED WITH CESIUM (OR CESIUM AND OXYGEN) TO REDUCE THE SURFACE WORK FUNCTION OF THE COMPOSITE STRUCTURE TO THE DESIRED PHOTOELECTRIC THRESHOLD. WHEN THE GROUP III-V LAYER FORMING THE PHOTOEMITTER IS EPITAXIALLY GROWN ATOP AN ORIENTED SUBSTRATE OF A SEMICONDUCTIVE MATERIAL SUCH AS GALLIUM ARSENIDE HAVING A BANDGAP WIDER THAN THE BANDGAP OF THE OVERLYING LAYER, THE RESULTING PHOTOEMITTER IS TRANSPARENT ONLY IN A RANGE BETWEEN THE BANDGAP OF THE SUBSTRATE AND THE BANDGAP OF THE OVERLYING LAYER.