Electron beam apparatus and high-voltage discharge prevention method
    71.
    发明申请
    Electron beam apparatus and high-voltage discharge prevention method 失效
    电子束装置及高压放电防止方法

    公开(公告)号:US20030155525A1

    公开(公告)日:2003-08-21

    申请号:US10295951

    申请日:2002-11-18

    CPC classification number: H01J37/241 H01J2237/0206

    Abstract: Disclosed is an electron beam apparatus and method which can retain the state that minimizes the amount of water content contained at a gap between a high-voltage cable and a high-voltage introduction insulator to thereby prevent creation of high-voltage discharge and current leakage. The apparatus comprises a means for applying a high voltage to an acceleration electrode while eliminating electron release from an electron source and for detecting a change in an emission current corresponding to a change in an acceleration voltage at this time. In addition, the apparatus comprises a means for issuing a cautionary notice or warning when the change of this emission current exceeds a prespecified value. Further, the apparatus comprises a means for letting a dry gas flow in a gap portion between the electron gun's high-voltage cable and the high-voltage introduction insulator to thereby dehumidify said gap portion. With such an arrangement, it is possible to prevent high-voltage discharge due to an increase in water content of the gap portion and also instability of an electron beam due to a leakage current.

    Abstract translation: 公开了一种电子束装置和方法,其可以保持使高压电缆和高压引入绝缘体之间的间隙中含有的含水量最小化的状态,从而防止高压放电和电流泄漏的产生。 该装置包括用于向加速电极施加高电压同时消除电子从电子源的释放并且用于检测与此时加速电压的变化相对应的发射电流的变化的装置。 此外,该装置包括当该发射电流的变化超过预定值时发出警告通知或警告的装置。 此外,该装置包括用于使干燥气体在电子枪的高压电缆和高压引入绝缘体之间的间隙部分中流动从而对所述间隙部分进行除湿的装置。 通过这样的布置,可以防止由于间隙部分的水分含量增加引起的高压放电以及由于漏电流引起的电子束的不稳定性。

    Power supply hardening for ion beam systems
    72.
    发明授权
    Power supply hardening for ion beam systems 有权
    离子束系统的电源硬化

    公开(公告)号:US06452196B1

    公开(公告)日:2002-09-17

    申请号:US09467700

    申请日:1999-12-20

    Inventor: Bo H. Vanderberg

    CPC classification number: H01J37/3171 H01J37/241 H01L2924/0002 H01L2924/00

    Abstract: An improved ion implantation system is provided by the present invention. The system includes at least one power supply for providing voltage to at least one electrode and, a switching system operatively coupled between the at least one power supply and the at least one electrode. The switching system decouples the at least one power supply and the at least one electrode at a predetermined threshold to mitigate overload of the at least one power supply.

    Abstract translation: 通过本发明提供改进的离子注入系统。 该系统包括用于向至少一个电极提供电压的至少一个电源,以及可操作地耦合在所述至少一个电源和所述至少一个电极之间的开关系统。 交换系统将至少一个电源和至少一个电极分离到预定阈值以减轻至少一个电源的过载。

    Arc suppressor for electron gun
    73.
    发明授权
    Arc suppressor for electron gun 失效
    电子枪电弧抑制器

    公开(公告)号:US5177402A

    公开(公告)日:1993-01-05

    申请号:US816981

    申请日:1992-01-03

    CPC classification number: H01J37/248 H01J37/241 H01J2237/0206

    Abstract: An arc suppressor is provided for an electron gun of the type used e.g. in semiconductor lithography equipment. The arc suppressor prevents damaging emission properties of the electron gun either due to variation of the cathode work function or any damage to the emitter apex. The arc suppressor includes a resistance and an inductor in series with each electrode lead providing voltage or current to the various electrodes of the electron gun. The inductance is provided by a ferrite toroid which contains a plurality of holes in addition to the main central hole. The leads for each electrode are wrapped around the toroid through the various holes, with one hole being provided for each lead. Thus advantageously each lead is isolated magnetically from the others, reducing the transformer and capacitive effects that couple one lead to another.

    Electron beam current stabilizing device
    74.
    发明授权
    Electron beam current stabilizing device 失效
    电子束电流稳定装置

    公开(公告)号:US4398132A

    公开(公告)日:1983-08-09

    申请号:US290801

    申请日:1981-08-05

    Abstract: Disclosed is an electron beam current stabilizing device comprising a sensing element (12) responsive to the beam current deviation from the predetermined value, a saw-tooth voltage shaper (14) connected to a high-voltage transformer (2) of an acceleration voltage source and providing periodic saw-tooth voltage, smoothly sloping portions thereof being shaped starting from the moment when the voltage at the high-voltage transformer (2) crosses zero, an adder (13) whose one input is connected to the output of the sensing element (12), and the other input, to the output of the shaper (14), a threshold element (15) connected to the output of the adder (13), a differentiator (16) connected to the output of the threshold element (15) to shape the electric driving pulses when the smoothly sloping portions of the saw-tooth voltage cross at the output of the adder (13) the threshold level of the threshold element (15), a light source connected to the output of the differentiator (16) to convert the electric driving pulses into the light pulses, and a photothyristor ( 11) controlled by light pulses and inserted into the primary winding of the heater transformer (5) supplied from one of the secondary windings of the high-voltage transformer (2).

    Abstract translation: PCT No.PCT / SU79 / 00133 Sec。 371日期1981年8月5日 102(e)日期1981年8月5日PCT提交1979年12月26日PCT公布。 第WO81 / 01937号公报 日期:1981年7月9日。公开的是一种电子束电流稳定装置,包括响应于光束电流偏离预定值的感测元件(12),连接到高压变压器的锯齿电压整形器(14) 2),并且提供周期性的锯齿电压,其平滑的倾斜部分从高压变压器(2)的电压跨越零的时刻开始成形,一个输入端连接的加法器(13) 到所述成像器(14)的输出端的所述感测元件(12)的输出端和所述另一输入端连接到所述加法器(13)的输出的阈值元件(15),与所述加法器 当锯齿电压的平滑倾斜部分在加法器(13)的输出处交叉的阈值元件(15)的阈值电平时,阈值元件(15)的输出以对电驱动脉冲进行整形, 连接到差分输出 或(16)将电驱动脉冲转换为光脉冲,以及由光脉冲控制并插入到从高压的次级绕组中的一个提供的加热变压器(5)的初级绕组中的光敏晶体管(11) 变压器(2)。

    Electron beam generating source
    75.
    发明授权
    Electron beam generating source 失效
    电子束生成源

    公开(公告)号:US3808498A

    公开(公告)日:1974-04-30

    申请号:US24689572

    申请日:1972-04-24

    Applicant: JEOL LTD

    Inventor: FUJISAWA M

    CPC classification number: H01J3/026 H01J37/065 H01J37/07 H01J37/241

    Abstract: This specification discloses an electron beam generating source having a control electrode comprising electrically conductive and nonconductive or slightly conductive layers, said nonconductive or slightly conductive layer facing an anode. The surface of said conductive layer in contact with said nonconductive or slightly conductive layer faces a cathode, thereby preventing electron emission from said contact surface and so by eliminating or almost entirely eliminating micro discharge.

    Abstract translation: 本说明书公开了一种具有控制电极的电子束产生源,该控制电极包括导电和非导电或稍微导电的层,所述非导电或微导电层面向阳极。 与所述非导电或略导电层接触的所述导电层的表面面向阴极,从而防止从所述接触表面发射电子,因此通过消除或几乎完全消除微量放电。

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