Abstract:
A substrate transfer apparatus, for minimizing flexion or bending when transferring a large-sized angular substrate or plate, wherein transfer arms are constructed with holding portions extending in a direction perpendicular to a transfer direction and further holding portions extending in a direction parallel to the transfer direction, respectively. As a result of this, it is possible to suspend the glass substrate W at the four peripheral side portions from below by means of the holding portions of the transfer arms and to move or transfer it suspended in this way.
Abstract:
A method and system for eliminating electrostatic charge of a processing section in which a processed object is transferred along a predetermined path for receiving treatment. An electrostatic charge eliminating member, arranged independently of the processing section, is transferred along the path of the processed object to eliminate the electrostatic charge of the processing section.
Abstract:
In the present invention, an articulated arm is configured so that a plurality of arms are connected by rotatable joints, and by rotating the joints, the articulated arm can be extended and contracted. A detection unit detects the angle of rotation of the joints of the articulated arm, for different postures the number of which is at least the number of arms of the articulated arm. A calculation unit calculates the expansion amount of each of the plurality of arms on the basis of the angle of rotation of the joints at each of the postures detected by the detection unit.
Abstract:
An embodiment relates to a loading cassette and a target substrate loading method to which same is applied. The loading cassette according to the embodiment comprises: an upper plate; a lower plate facing the upper plate while having a space therebetween; an edge support part for connecting the upper plate to the lower plate and supporting the left and right edges of a target substrate; and a rear surface support part for connecting the upper plate to the lower plate and supporting the center and the rear surface-edge of the target substrate.
Abstract:
According to an embodiment, an apparatus for manufacturing a display apparatus includes a separation part to separate a half-cut target into a plurality of target portions, wherein the separation part includes a plurality of first moving parts each driven in a driving direction to move the target, and as each of the plurality of first moving parts is driven, a distance between the separated target portions gradually increases.
Abstract:
A neutron shielding packing body configured to pack a semiconductor device is disclosed. The neutron shielding packing body reduces Total Ionizing Dose (TID) defects caused in the semiconductor device by collisions with neutrons during air transportation of the semiconductor device. The neutron shielding packing body includes hydrogen and boron.
Abstract:
Provided is a pressure-sensitive adhesive structure including a carbon nanotube aggregate formed on a base material in which carbon nanotubes forming the carbon nanotube aggregate are hardly detached. The pressure-sensitive adhesive structure of the present invention includes: a base material; an intermediate layer; and a carbon nanotube aggregate layer, wherein the carbon nanotube aggregate layer includes a plurality of carbon nanotube aggregates, wherein the intermediate layer includes a layer containing the carbon nanotubes and a fixing agent, and wherein the intermediate layer has a thickness of 100 nm or more.
Abstract:
An apparatus for manufacturing semiconductors is provided by which adhesion of moisture to a wafer in an EFEM is easily prevented. The apparatus 1 for manufacturing the semiconductors comprises processing equipment 30 that processes a wafer 90, a FOUP 40 that supplies the wafer 90 and that houses the wafer 90 that has been processed, an EFEM 10 that transfers the wafer 90 between the FOUP 40 and the processing equipment 30, a fan and filter unit 20 that sends an airflow 72 from above to the EFEM 10, an ultrasonic oscillator 52 that generates high-frequency power, and a vibrator 54 that generates ultrasonic waves 80 by using the high-frequency power that is generated by the ultrasonic oscillator 52 and that applies the ultrasonic waves 80 to the wafer 90 that is transported in the EFEM 10 and that has been processed.
Abstract:
A laser annealing apparatus (1) according to an embodiment includes a laser oscillator (4) configured to generate a laser beam (L), a floating-type conveying stage (3) configured to float and convey a workpiece (W) to be irradiated with the laser beam (L), and a beam profiler (7) configured to measure a beam profile of the laser beam (L). The floating-type conveying stage (3) includes a conveying surface (3a) opposed to the workpiece (W), and a bottom surface (3b) on the side opposite to the conveying surface (3a). The beam profiler (7) is positioned below the bottom surface (3b) of the floating-type conveying stage (3). The floating-type conveying stage (3) includes a detachable part (12) in a part of it. An opening (S) is formed by detaching the detachable part (12) from the floating-type conveying stage (3), the opening (3) extending from the conveying surface (3a) to the bottom surface (3b). The beam profiler (7) is configured to measure the beam profile of the laser beam (L) through the opening (S).
Abstract:
Provided is a mounting member that is excellent in low dusting property and hardly contaminates an object to be mounted while being excellent in gripping force and heat resistance. In one embodiment of the present invention, the mounting member includes an aggregate of carbon nanotubes for forming amounting surface, wherein a standard deviation of diameters of the carbon nanotubes is 3 nm or less. In one embodiment of the present invention, the mounting member includes an aggregate of carbon nanotubes for forming a mounting surface, wherein the aggregate of the carbon nanotubes includes carbon nanotubes each having a multi-walled structure, and wherein a standard deviation of wall numbers of the carbon nanotubes is 3 or less.