Abstract:
A back side illumination photodiode includes a light-receiving back side surface of a semiconductor material substrate. An area of the light-receiving back side surface includes a recess. The recess is filled with a material having an optical index that is lower than an optical index of the semiconductor material substrate. Both the substrate and the filling material are transparent to an operating wavelength of the photodiode. The recess may be formed to have a ring shape.
Abstract:
A connector for a plastic waveguide includes a connector body having first and second openings aligned with one another. The first opening is configured to receive the plastic waveguide. A radio frequency (RF) antenna is positioned within the second opening of the connector body.
Abstract:
A method for controlling the breakdown of an antifuse memory cell formed on a semiconductor substrate, including the steps of: applying a programming voltage; detecting a breakdown time; and interrupting the application of the programming voltage at a time following the breakdown time by a post-breakdown time.
Abstract:
A semiconductor electro-optical phase shifter may include a substrate, an optical waveguide segment (12) formed on the substrate, and first and second zones of opposite conductivity types configured to form a first bipolar junction perpendicular to the substrate. The phase shifter may also include a dynamic control structure configured to reverse bias the first junction and a static control structure configured to direct a quiescent current in the second zone, parallel to the first junction.
Abstract:
An integrated circuit includes four electronic components, a buried UTBOX layer under and plumb with the electronic components, and two pairs of oppositely doped ground planes plumb with corresponding components under the layer. A first isolation trench mutually isolates the ground planes from corresponding wells made plumb and in contact with the ground planes and exhibiting the first doping type. Bias electrodes contact respective wells and ground planes. One pair of electrodes is for connecting to a first bias voltage and the other pair is for connecting to a second bias voltage. Also included are a semiconductor substrate exhibiting the first type of doping and a deeply buried well exhibiting the second type of doping. The deeply buried well contacts the other wells and separates them from the substrate. Finally, a control electrode couples to the deeply buried well.
Abstract:
A reference voltage generation circuit, including a first current source in series with a first bipolar transistor; a second current source in series with a first resistor; a third current source in series with a second bipolar transistor, the third current source being assembled as a current mirror with the first current source; a second resistor between the base of the second bipolar transistor and the junction point between the current source and the first resistor; and a fourth current source in series with a third resistor, the junction point between the fourth current source and the third resistor defining a reference voltage terminal.
Abstract:
An ESD protection device for an electro-optical device may include an optical waveguide segment being in semiconductor material and including a central zone of a first conductivity type, and first and second wings of a second conductivity type different from the first conductivity type and being integral with the central zone. The ESD protection device may include a first conduction terminal on the first wing for defining a first protection terminal, a second conduction terminal on the second wing for defining a second protection terminal, and a resistive contact structure of the first conductivity type having a transverse arm integral with the central zone, and an end in ohmic contact with the first conduction terminal, the resistive contact structure being electrically insulated from the first wing.
Abstract:
A semiconductor electro-optical phase shifter may include a central zone configured to be placed in an optical waveguide and doped at a first conductivity type, a first lateral zone adjacent a first face of the central region and doped at a second conductivity type, and a second lateral zone adjacent a second face of the central zone and doped at the second conductivity type.
Abstract:
A method for producing a microelectronic device provided with different strained areas in the superficial layer of a semi-conductor on insulator type substrate comprising amorphizing a region of said superficial layer and then a lateral recrystallization of said region from crystalline areas adjoining this region (FIG. 1E).
Abstract:
A Silicon On Insulator current source array includes input control for receiving a control voltage, a first reference input for receiving a first reference voltage, and a second reference input for receiving a second reference voltage. A chain of several Silicon On Insulator MOS transistors, of the same type, have control electrodes all connected to the input control, first conduction electrodes are all connected to the first reference input, and second conduction electrodes are respectively connected to the second reference input through several load circuits respectively configured to be traversed by several currents when the several transistors are ON upon application of the control voltage on the input control. An input bias is coupled to a semiconductor well located below an insulating buried layer located below the chain of transistors for receiving a biasing voltage difference.