公开(公告)号：US20080017884A1

公开(公告)日：2008-01-24

申请号：US11766329

申请日：2007-06-21

Applicant: Chang-Oh Jeong ,  Sang-Gab Kim ,  Jun-Hyung Souk ,  Hong-Gyun Kim ,  In-Sun Hwang ,  Min-Seok Oh ,  Hong-Kee Chin ,  Yu-Gwang Jeong ,  Seung-Ha Choi ,  Hi-Kuk Lee ,  Shi-Yul Kim

Inventor： Chang-Oh Jeong ,  Sang-Gab Kim ,  Jun-Hyung Souk ,  Hong-Gyun Kim ,  In-Sun Hwang ,  Min-Seok Oh ,  Hong-Kee Chin ,  Yu-Gwang Jeong ,  Seung-Ha Choi ,  Hi-Kuk Lee ,  Shi-Yul Kim

IPC: H01L27/13 ,  H01L21/3205 ,  H01L23/48

CPC classification number: G02F1/133528 ,  G02F1/134336 ,  G02F2001/133548 ,  H01L27/12

Abstract: A display apparatus includes a first substrate, a gate line formed on the first substrate, a gate insulating layer formed on the gate line, a semiconductor layer formed on the gate insulating layer, a data line formed on the semiconductor layer and including a source electrode, a drain electrode facing the source electrode, a first electrode electrically connected to the drain electrode, in a second substrate facing the first substrate, a second electrode formed on the second substrate, and a liquid crystal layer disposed between the first electrode and the second electrode. At least one of the first and second electrodes includes a plurality of line patterns to polarize incident light.

Abstract translation: 显示装置包括第一基板，形成在第一基板上的栅极线，形成在栅极线上的栅极绝缘层，形成在栅极绝缘层上的半导体层，形成在半导体层上的数据线，并且包括源极 面对源电极的漏电极，与漏电极电连接的第一电极，与第一衬底相对的第二衬底，形成在第二衬底上的第二电极，以及设置在第一电极和第二电极之间的液晶层 电极。 第一和第二电极中的至少一个包括使入射光偏振的多个线图案。

公开(公告)号：US20070254221A1

公开(公告)日：2007-11-01

申请号：US11788503

申请日：2007-04-20

Applicant: Hi-Kuk Lee ,  Yuko Yako ,  Kyu-Young Kim

Inventor： Hi-Kuk Lee ,  Yuko Yako ,  Kyu-Young Kim

IPC: C09K19/40

CPC classification number: H01L21/0212 ,  G03F7/0046 ,  G03F7/0048 ,  G03F7/0226 ,  G03F7/0757 ,  H01L21/02126 ,  H01L21/02282 ,  H01L21/2855 ,  H01L21/3121 ,  H01L27/124 ,  H01L27/1248 ,  H01L27/14632

Abstract: A photosensitive resin composition includes an alkali-soluble resin, a quinone diazide, a surfactant, and a solvent. The surfactant includes an organic fluorine compound having the structure a first silicone compound having the structure a second silicone compound having the structure The resin composition may be used in display panels.

Abstract translation: 光敏树脂组合物包括碱溶性树脂，醌二叠氮化物，表面活性剂和溶剂。 表面活性剂包括具有结构的具有结构的第一硅氧烷化合物的有机氟化合物，其结构为具有结构的第二硅氧烷化合物。该树脂组合物可用于显示面板。

公开(公告)号：US20070040976A1

公开(公告)日：2007-02-22

申请号：US11506295

申请日：2006-08-18

Applicant: Dong-ki Lee ,  Jae-sung Kim ,  Hi-kuk Lee

Inventor： Dong-ki Lee ,  Jae-sung Kim ,  Hi-kuk Lee

IPC: G02F1/141 ,  G02F1/1339

CPC classification number: G02F1/133707 ,  G02F2001/133357 ,  G02F2202/02

Abstract: A liquid crystal display (LCD) and a method of manufacturing the same. The LCD includes a first display panel including a first field-generating electrode formed on a first insulating substrate, a second display panel opposite to the first display panel and including a second field-generating electrode formed on a second insulating substrate, a liquid crystal layer formed between the first display panel and the second display panel, and organic layers formed on the second field-generating electrode and including a cell gap maintaining unit positioned between the first display panel and the second display panel, for allowing the first display panel and the second display panel to maintain a constant gap therebetween, and a liquid crystal alignment guide unit having a tilt surface that pre-tilts the liquid crystal layer, the liquid crystal alignment guide unit and the cell gap maintaining unit having a top height difference of not less than 2 μm.

Abstract translation: 一种液晶显示器（LCD）及其制造方法。 LCD包括：第一显示面板，包括形成在第一绝缘基板上的第一场产生电极，与第一显示面板相对的第二显示面板，并且包括形成在第二绝缘基板上的第二场产生电极，液晶层 形成在第一显示面板和第二显示面板之间的有机层和形成在第二场致发电极上的有机层，并且包括位于第一显示面板和第二显示面板之间的单元间隙保持单元，用于允许第一显示面板和第二显示面板 第二显示面板以保持它们之间的恒定的间隙;以及液晶取向引导单元，其具有预倾斜液晶层的倾斜面，液晶取向引导单元和单元间隙保持单元的顶部高度差不小于 超过2个妈妈。

公开(公告)号：US20060188808A1

公开(公告)日：2006-08-24

申请号：US11346047

申请日：2006-02-02

Applicant: Jeong-Min Park ,  Mi-Sun Ryu ,  Hi-Kuk Lee ,  Woo-Seok Jeon

Inventor： Jeong-Min Park ,  Mi-Sun Ryu ,  Hi-Kuk Lee ,  Woo-Seok Jeon

IPC: G03C1/76 ,  G03C1/492 ,  G03C1/494

CPC classification number: H01L27/1288 ,  G03F7/0007 ,  G03F7/0226 ,  G03F7/0236 ,  H01L27/1214 ,  H01L29/458 ,  H01L29/4908

Abstract: A photoresist composition includes a novolac resin having where each of R1, R2, R3, and R4 is an alkyl group having a hydrogen atom or between one through six carbon atoms and n is an integer ranging from zero through three; and a mercapto compound having Z1-SH, or SH-Z2-SH, where each of Z1 and Z2 is an alkyl group or an allyl group having one through twenty carbon atoms, a sensitizer, and a solvent.

Abstract translation: 光致抗蚀剂组合物包括其中R 1，R 2，R 3和R 4各自的酚醛清漆树脂 是具有氢原子或1至6个碳原子的烷基，n是0至3的整数; 和具有<？in-line-formula description =“In-line Formulas”end =“lead”？> Z _{-SH的巯基化合物，或<？in-line-formula description =“ 在线公式“end =”tail“？> <？in-line-formula description =”In-line Formulas“end =”lead“？> SH-Z <2> -SH，<？ 在线公式描述=“在线公式”end =“tail”？>其中Z 1和Z 2中的每一个是烷基或烯丙基 具有一至二十个碳原子，敏化剂和溶剂。}

公开(公告)号：US08968983B2

公开(公告)日：2015-03-03

申请号：US13565589

申请日：2012-08-02

Applicant: Cha-Dong Kim ,  Sang Hyun Yun ,  Jung-In Park ,  Su-Yeon Sim ,  Hi-Kuk Lee ,  Sang-Tae Kim ,  Yong-Il Kim ,  Shi-Jin Sung ,  Eun-Sang Lee ,  Sung-Yeol Jin

Inventor： Cha-Dong Kim ,  Sang Hyun Yun ,  Jung-In Park ,  Su-Yeon Sim ,  Hi-Kuk Lee ,  Sang-Tae Kim ,  Yong-Il Kim ,  Shi-Jin Sung ,  Eun-Sang Lee ,  Sung-Yeol Jin

IPC: G03F7/022 ,  G03F7/023 ,  G03F7/40

CPC classification number: G03F7/0226 ,  G03F7/023 ,  G03F7/40 ,  Y10T428/1005

Abstract: A photoresist composition, a method of forming a pattern using the photoresist composition, and a method of manufacturing a display substrate are disclosed. A photoresist composition includes an alkali-soluble resin, a quinone diazide-based compound, a multivalent phenol-based compound, and a solvent. Therefore, photosensitivity for light having a wavelength in a range of about 392 nm to about 417 nm may be improved, and reliability of forming a photo pattern and a thin film pattern using the photoresist composition may be improved.

Abstract translation: 公开了一种光致抗蚀剂组合物，使用光致抗蚀剂组合物形成图案的方法，以及制造显示基板的方法。 光致抗蚀剂组合物包括碱溶性树脂，醌二叠氮化合物，多价酚类化合物和溶剂。 因此，可以改善波长在约392nm至约417nm范围内的光的光敏性，并且可以提高使用光致抗蚀剂组合物形成光图案和薄膜图案的可靠性。

公开(公告)号：US08804098B2

公开(公告)日：2014-08-12

申请号：US12926920

申请日：2010-12-17

Applicant: Dong Seok Baek ,  Sang Don Jang ,  Ho Seok Choi ,  Hi Kuk Lee ,  Oui Serg Kim

Inventor： Dong Seok Baek ,  Sang Don Jang ,  Ho Seok Choi ,  Hi Kuk Lee ,  Oui Serg Kim

IPC: G03B27/52

CPC classification number: G03B27/52 ,  G03B27/72 ,  G03F7/70291 ,  G03F7/70508 ,  G03F7/7085

Abstract: Example embodiments are directed to a maskless exposure apparatus that generates and/or corrects exposure data using at least one information of intensity information, central position information, focus information, and/or shape information of a plurality of beams acquired using a measurement optical unit, and a control method thereof. The maskless exposure apparatus includes the measurement optical unit including a photo sensor and an image sensor, and a control unit configured to generate and/or correct the exposure data using the information acquired by the measurement optical unit.

Abstract translation: 示例性实施例涉及一种无掩模曝光装置，其使用使用测量光学单元获取的多个光束的强度信息，中心位置信息，聚焦信息和/或形状信息的至少一个信息来生成和/或校正曝光数据， 及其控制方法。 无掩模曝光装置包括：测量光学单元，包括光传感器和图像传感器;以及控制单元，被配置为使用由测量光学单元获取的信息来生成和/或校正曝光数据。

公开(公告)号：US08574971B2

公开(公告)日：2013-11-05

申请号：US12900936

申请日：2010-10-08

Applicant: Sang-Hyun Yun ,  Cha-Dong Kim ,  Jung-In Park ,  Hi-Kuk Lee

Inventor： Sang-Hyun Yun ,  Cha-Dong Kim ,  Jung-In Park ,  Hi-Kuk Lee

IPC: H01L21/336

CPC classification number: H01L27/1288 ,  H01L27/1214

Abstract: An approach for patterning and etching without a mask is provided in a manufacturing a thin-film transistor, a gate electrode, a gate insulating layer, a semiconductor layer, an ohmic contact layer and source metal layer of a substrate. A first photoresist pattern including a first photo pattern and a second photo pattern is formed using a digital exposure device by generating a plurality of spot beams, the first photo pattern is formed to a first region of the base substrate and has a first thickness, and the second photo pattern is formed to a second region adjacent to the first region, and has a second thickness and a width in a range of about 50% to about 60% of a diameter of the spot beam. The source metal layer is patterned to form a source electrode and a drain electrode, and the source electrode and the drain electrode are spaced apart from each other in the first region of an active pattern.

Abstract translation: 在制造薄膜晶体管，栅极电极，栅极绝缘层，半导体层，欧姆接触层和源极金属层的衬底的制造中提供了用于没有掩模的图案化和蚀刻的方法。 使用数字曝光装置通过产生多个点光来形成包括第一照片图案和第二照片图案的第一光致抗蚀剂图案，第一照片图案形成于基底基板的第一区域并具有第一厚度，并且 第二照片图案形成在与第一区域相邻的第二区域上，并且具有第二厚度和在点光束直径的约50％至约60％的范围内的宽度。 图案化源极金属层以形成源电极和漏电极，并且源电极和漏电极在活性图案的第一区域中彼此间隔开。

公开(公告)号：US20120301684A1

公开(公告)日：2012-11-29

申请号：US13309679

申请日：2011-12-02

Applicant: Sang Hyun YUN ,  Cha-Dong KIM ,  Jung-In PARK ,  Hi-Kuk LEE ,  Su-Yeon SIM

Inventor： Sang Hyun YUN ,  Cha-Dong KIM ,  Jung-In PARK ,  Hi-Kuk LEE ,  Su-Yeon SIM

IPC: B32B3/00 ,  G03F7/20 ,  G03F7/24 ,  G03B27/54

CPC classification number: G03F1/36 ,  G03F7/70441

Abstract: A method for manufacturing a photosensitive film pattern includes: forming a thin film on a substrate; forming a photosensitive film on the thin film; arranging an exposure apparatus including a photo-modulation element on the photosensitive film; exposing the photosensitive film using the exposure apparatus according to an exposure pattern of the photo-modulation element; and developing the exposed photosensitive film to form a photosensitive film pattern. The exposure pattern includes a main pattern of a quadrangular shape and a at least one assistance pattern positioned at a corner of the main pattern. The photosensitive film pattern has a quadrangular shape with a long edge and a short edge, and a corner with a curved surface having a curvature radius of 20% to 40% of a length of the short edge.

Abstract translation: 感光膜图案的制造方法包括：在基板上形成薄膜; 在薄膜上形成感光膜; 在感光膜上布置包括光调制元件的曝光装置; 根据光调制元件的曝光图案，使用曝光装置曝光感光膜; 并显影曝光的感光膜以形成感光膜图案。 曝光图案包括四边形的主图案和位于主图案的拐角处的至少一个辅助图案。 感光膜图案具有长边缘和短边缘的四边形形状，以及具有曲率半径为短边长度的20％至40％的曲面的拐角。

公开(公告)号：US08284338B2

公开(公告)日：2012-10-09

申请号：US13239759

申请日：2011-09-22

Applicant: Chong-Chul Chai ,  Shi-Yul Kim ,  Sang-Gab Kim ,  Jun-Hyung Souk ,  Sang-Woo Whangbo ,  Won-Kie Chang ,  Hi-Kuk Lee ,  Soo-Wan Yoon ,  Soo-Jin Kim

Inventor： Chong-Chul Chai ,  Shi-Yul Kim ,  Sang-Gab Kim ,  Jun-Hyung Souk ,  Sang-Woo Whangbo ,  Won-Kie Chang ,  Hi-Kuk Lee ,  Soo-Wan Yoon ,  Soo-Jin Kim

IPC: G02F1/1343 ,  G02F1/13

CPC classification number: G02F1/136213 ,  G02F1/13458 ,  G02F2001/136236 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A mask is provided. The mask includes a mask body, a first exposing part and a second exposing part. The first exposing part is on the mask body. The first exposing part includes a first light transmitting portion and second light transmitting portions. The first light transmitting portion exposes a portion of the photoresist film corresponding to the output terminal to a light of a first light amount. The second light transmitting portions exposes an adjacent portion of the photoresist film adjacent to the output terminal to a light of a second light amount smaller than the first light amount. The second exposing part is on the mask body. The second exposing part includes third light transmitting portions for partially exposing the photoresist film corresponding to the storage electrode to a light of a third light amount that is between the first and second light amounts.

Abstract translation: 提供面罩。 面罩包括面罩主体，第一曝光部和第二曝光部。 第一曝光部分在面罩主体上。 第一曝光部分包括第一透光部分和第二透光部分。 第一光透射部分将与输出端子相对应的光致抗蚀剂膜的一部分暴露于第一光量的光。 第二透光部分使邻近输出端子的光致抗蚀剂膜的相邻部分暴露于小于第一光量的第二光量的光。 第二曝光部位在面罩主体上。 第二曝光部分包括用于将对应于存储电极的光致抗蚀剂膜部分地曝光到处于第一和第二光量之间的第三光量的光的第三透光部分。

公开(公告)号：US20120019793A1

公开(公告)日：2012-01-26

申请号：US13185983

申请日：2011-07-19

Applicant: Sang Hyun Park ,  Sang Don Jang ,  Hi Kuk Lee

Inventor： Sang Hyun Park ,  Sang Don Jang ,  Hi Kuk Lee

IPC: G03B27/42

CPC classification number: G03F7/70291 ,  G03F7/70275

Abstract: According to example embodiments, a method of operating an exposure apparatus including a stage having a plurality of beam measurement devices, and an exposure head unit having a first set of exposure heads and a second set of exposure heads includes measuring a position of a first exposure head of the first set of exposure heads by moving the stage to coincide a first beam measurement device of the plurality of beam measurement devices with the first exposure head, setting the measured position of the first exposure head as a reference position, and measuring positions of the second set of exposure heads with respect to the reference position.

Abstract translation: 根据示例性实施例，一种操作包括具有多个光束测量装置的平台的曝光装置的方法和具有第一组曝光头和第二组曝光头的曝光头单元包括测量第一曝光的位置 通过移动舞台使第一组曝光头的头部与多个光束测量装置的第一光束测量装置与第一曝光头重合，将第一曝光头的测量位置设置为基准位置，并且测量位置 相对于参考位置的第二组曝光头。