PNEUMATIC TIRE
    82.
    发明申请
    PNEUMATIC TIRE 有权
    气动轮胎

    公开(公告)号:US20100193102A1

    公开(公告)日:2010-08-05

    申请号:US12671463

    申请日:2008-07-30

    IPC分类号: B60C13/02

    摘要: The present invention includes a run-flat tire 1 comprising a plurality of turbulence generation ridges 20 which extend on a surface of a tire side portion 3 in a tire-radial direction and which are arranged at a pitch in a tire-circumferential direction and relationship Si>So is satisfied. Si is the sum of sidewall areas of all the turbulence generation ridges located at the inner side, in the tire-radial direction, of a maximum width position of the pneumatic tire. So is the sum of sidewall areas of all the turbulence generation ridges located at the outer side, in the tire-radial direction, of the tire maximum width position.

    摘要翻译: 本发明包括一种漏气保用轮胎1,其包括多个湍流产生脊20,其在轮胎侧部3的轮胎 - 径向方向上延伸并且沿轮胎周向方向和间距配置 Si>所以满意 Si是位于充气轮胎的最大宽度位置的轮胎径向内侧的所有湍流产生脊的侧壁面积的总和。 位于轮胎最大宽度位置的轮胎 - 径向外侧的所有湍流产生脊的侧壁面积的总和也是如此。

    PNEUMATIC TIRE
    83.
    发明申请
    PNEUMATIC TIRE 有权
    气动轮胎

    公开(公告)号:US20100180994A1

    公开(公告)日:2010-07-22

    申请号:US12526384

    申请日:2008-02-08

    申请人: Masashi Yamaguchi

    发明人: Masashi Yamaguchi

    IPC分类号: B60C23/19 B60C13/00

    摘要: A pneumatic tire 1 according to the present invention has turbulence generating protrusions on a tire surface, each of the turbulence generating protrusions having a sharp edge part. In the pneumatic tire, the following relationships are satisfied: 0.015≦H/√R≦0.64; 1.0≦p/H≦50.0; 0.1≦H/e≦3.0; 1.0≦L/H≦50.0; and 1.0≦(p−w)/w≦100.0, where “R” is a tire radius, “H” is a protrusion maximum height, “p” is a protrusion circumferential-direction interval, “e” is a protrusion radial-direction interval, “L” is a protrusion radial-direction length, and “w” is a protrusion circumferential-direction length.

    摘要翻译: 根据本发明的充气轮胎1在轮胎表面上具有湍流产生突起,每个湍流产生突起具有尖锐的边缘部分。 在充气轮胎中,满足以下关系:0.015≦̸ H /√R≦̸ 0.64; 1.0≦̸ p / H≦̸ 50.0; 0.1≦̸ H / e≦̸ 3.0; 1.0≦̸ L / H≦̸ 50.0; 和1.0≦̸(p-w)/w≦̸100.0,其中“R”是轮胎半径,“H”是突出最大高度,“p”是突出周向间隔,“e”是突起径向 方向间隔,“L”是突出径向长度,“w”是突出圆周方向长度。

    Connection rod for internal combustion engine
    85.
    发明授权
    Connection rod for internal combustion engine 有权
    内燃机连杆

    公开(公告)号:US07350438B2

    公开(公告)日:2008-04-01

    申请号:US11125239

    申请日:2005-05-10

    IPC分类号: F16C9/04

    摘要: An internal combustion engine connecting rod is designed with bolts having a minimum required strength. A strength safety factor Sfa is calculated based on an axial strength limit load FX of the bolt and the maximum load FB to be born by the bolt due to a piston inertia force (Sfa=FX/FB) acting on the connecting rod. A mating surface separation safety factor Sfb is calculated based on the tensile load (FB−FC) resulting from the piston inertia force and the load FE carried by the bolts at a mating surface separation limit, i.e., the maximum bolt load FE at which the connecting rod main body and the cap remain in contact without separating (Sfb=FE/(FB−FC)). The mating surface separation safety factor Sfb of the connecting rod is set to be equal to or larger than the strength safety factor Sfa of the bolts (Sfb≧Sfa).

    摘要翻译: 内燃机连杆设计为具有最小要求强度的螺栓。 强度安全系数Sfa基于螺栓的轴向强度极限载荷F×X 和由于活塞惯性而由螺栓承受的最大载荷F B B计算 作用在连杆上的力(Sfa = F / X / F B B)。 配合表面分离安全系数Sfb是基于活塞惯性力和载荷F E的导致的拉伸载荷(F B)来计算的, / SUB,在配合表面分离极限下,即连杆主体和盖保持接触而不分离的最大螺栓载荷F E(Sfb = F = Sfa)。

    Plasma CVD film formation apparatus provided with mask
    86.
    发明申请
    Plasma CVD film formation apparatus provided with mask 审中-公开
    设置有掩模的等离子体CVD膜形成装置

    公开(公告)号:US20070065597A1

    公开(公告)日:2007-03-22

    申请号:US11227525

    申请日:2005-09-15

    IPC分类号: C23C16/00 H05H1/24

    摘要: A plasma CVD apparatus for forming a thin film on a wafer having diameter Dw and thickness Tw, includes: a vacuum chamber; a shower plate; a top plate; a top mask portion for covering a top surface peripheral portion of the wafer; and a side mask portion for covering a side surface portion of the wafer. The side mask portion has an inner diameter of Dw+α, and the top mask portion is disposed at a clearance of Tw+β between a bottom surface of the top mask portion and a wafer-supporting surface of the top plate, wherein α is more than zero, and β is more than zero.

    摘要翻译: 在具有直径Dw和厚度Tw的晶片上形成薄膜的等离子体CVD装置包括:真空室; 淋浴板 顶板 用于覆盖晶片的顶表面周边部分的顶部掩模部分; 以及用于覆盖晶片的侧表面部分的侧面掩模部分。 侧面罩部分具有Dw +α的内径,并且顶部掩模部分设置在顶部掩模部分的底表面和顶板的晶片支承表面之间的Tw +β间隙处,其中α是 超过零,beta超过零。

    Method and apparatus for etching Si
    88.
    发明申请
    Method and apparatus for etching Si 审中-公开
    蚀刻Si的方法和装置

    公开(公告)号:US20060021704A1

    公开(公告)日:2006-02-02

    申请号:US11229533

    申请日:2005-09-20

    IPC分类号: C23F1/00

    CPC分类号: H01J37/32082 H01L21/3065

    摘要: A method for dry-etching a Si substrate or a Si layer in a processing chamber includes the step of supplying an etching gas into the processing chamber, wherein the etching gas is a mixture gas including Cl2, O2 and NF3 and a residence time τ of the etching gas is equal to or greater than about 180 msec, the residence time τ being defined as: τ=pV/Q where p represents an inner pressure of the processing chamber; V, an effective volume of etching space formed on the Si substrate or the Si layer; and Q, a flow rate of the etching gas.

    摘要翻译: 用于在处理室中干蚀刻Si衬底或Si层的方法包括向处理室提供蚀刻气体的步骤,其中蚀刻气体是包括Cl 2 O 2,O &lt; 2&gt;和NF 3&gt;和蚀刻气体的停留时间τ等于或大于约180msec,停留时间τt定义为: -formulae description =“In-line Formulas”end =“lead”?> tau = pV / Q <?in-line-formula description =“In-line Formulas”end =“tail”?>其中p表示内部压力 的处理室; V,在Si衬底或Si层上形成的有效体积的蚀刻空间; Q为蚀刻气体的流量。

    Control system of optimizing the function of machine assembly using GA-Fuzzy inference
    89.
    发明授权
    Control system of optimizing the function of machine assembly using GA-Fuzzy inference 失效
    使用GA模糊推理优化机组装配功能的控制系统

    公开(公告)号:US06895286B2

    公开(公告)日:2005-05-17

    申请号:US09727424

    申请日:2000-12-01

    IPC分类号: G05B13/02 G06N3/12

    CPC分类号: G05B13/0265

    摘要: The invention provides an optimization device for a unitary apparatus that can obtain optimum characteristics as a combined apparatus, without losing user's selectivity and unitary apparatus's versatility. The optimization device includes an optimization process section that optimizes dynamic characteristics of the unitary apparatus using genetic algorithms and fuzzy inference, with functional characteristics of a combined apparatus as evaluation reference.

    摘要翻译: 本发明提供了一种可以获得作为组合装置的最佳特性的单一装置的优化装置,而不会失去用户的选择性和整体装置的多功能性。 优化装置包括优化处理部分,其利用遗传算法和模糊推理优化单一装置的动态特性,并将组合装置的功能特性作为评估参考。