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    Constant force mechanical scribers and methods for using same in semiconductor processing applications
    82.
    发明授权
    Constant force mechanical scribers and methods for using same in semiconductor processing applications 失效
    恒力机械刻划机及其在半导体加工应用中的使用方法

    公开(公告)号：US07707732B2

    公开(公告)日：2010-05-04

    申请号：US12252354

    申请日：2008-10-15

    申请人： Alex Shenderovich ,  Boris Djurovic ,  Daniel Liu ,  Wen Chang ,  Benyamin Buller ,  Erel Milshtein

    发明人： Alex Shenderovich ,  Boris Djurovic ,  Daniel Liu ,  Wen Chang ,  Benyamin Buller ,  Erel Milshtein

    IPC分类号： B43L13/00

    CPC分类号： B28D5/0011 ,  B28D1/225 ,  Y10T83/0333 ,  Y10T83/0341 ,  Y10T83/0348 ,  Y10T83/343

    摘要： A scribing system comprising a mounting mechanism, stylus, and force generating mechanism is provided. The mounting mechanism is configured to rotate an elongated object in such a manner that the object is subjected to a bow effect wherein a middle portion of the object bends relative to the end portions of the object. The stylus is for scribing the object at a position x along the long dimension of the object while the mounting mechanism rotates the object. The force generating mechanism is connected to the stylus so that the stylus applies the same constant force to the elongated object regardless of the position x along the long dimension of the object that the stylus is positioned, while the mounting mechanism rotates the object and thereby subjects the object to the bow effect, thereby scribing the object.

    摘要翻译： 提供了包括安装机构，触针和力产生机构的划线系统。 安装机构构造成使细长物体以使得物体经受弓形效应的方式旋转，其中物体的中间部分相对于物体的端部弯曲。 触控笔用于在安装机构旋转对象的同时沿着物体的长尺寸在x的位置划线物体。 力产生机构连接到触针，使得触笔对细长物体施加相同的恒定力，而不管沿着触针定位的物体的长尺寸的位置x，而安装机构旋转物体，从而使被摄体 对象对弓的效果，从而刻划对象。

    ELONGATED SEMICONDUCTOR DEVICES, METHODS OF MAKING SAME, AND SYSTEMS FOR MAKING SAME
    83.
    发明申请
    ELONGATED SEMICONDUCTOR DEVICES, METHODS OF MAKING SAME, AND SYSTEMS FOR MAKING SAME 审中-公开
    延长的半导体器件，制造它们的方法和制造它们的系统

    公开(公告)号：US20100012353A1

    公开(公告)日：2010-01-21

    申请号：US12502981

    申请日：2009-07-14

    申请人： Erel Milshtein ,  Benyamin Buller

    发明人： Erel Milshtein ,  Benyamin Buller

    IPC分类号： H05K1/00 ,  H01L21/3205

    CPC分类号： H01L31/046 ,  H01L31/02168 ,  H01L31/035281 ,  H01L31/0463 ,  H01L31/048 ,  H01L31/073 ,  H01L31/0749 ,  Y02E10/541 ,  Y02E10/543

    摘要： A patterned conductive layer is disposed around a nonplanar substrate, where a boundary of the conductive layer is defined by a single groove that traverses a perimeter of the substrate a plurality of times. A patterned conductive layer is disposed around a nonplanar substrate, where the patterned conductive layer is divided into a plurality of conductive islands by a groove that extends through a thickness of the conductive layer and traverses a perimeter of the substrate a plurality of times, and a groove extends through the thickness of the conductive layer and traverses a length of the substrate. A method of patterning a conductive layer disposed around a nonplanar substrate includes scribing the conductive layer thereby forming a continuous groove that traverses a perimeter of the conductive layer a plurality of times.

    摘要翻译： 图案化的导电层设置在非平面基底周围，其中导电层的边界由穿过基底的周边多次的单个凹槽限定。 图案化导电层设置在非平面衬底周围，其中图案化导电层通过延伸穿过导电层的厚度并跨过衬底的周边多次的沟槽分成多个导电岛，并且 凹槽延伸穿过导电层的厚度并穿过衬底的一段长度。 图案化设置在非平面基板周围的导电层的方法包括划分导电层，从而形成多次穿过导电层的周边的连续凹槽。

    ELONGATED PHOTOVOLTAIC DEVICES, METHODS OF MAKING SAME, AND SYSTEMS FOR MAKING SAME
    84.
    发明申请
    ELONGATED PHOTOVOLTAIC DEVICES, METHODS OF MAKING SAME, AND SYSTEMS FOR MAKING SAME 失效
    延长的光伏器件，制造它们的方法和制造它们的系统

    公开(公告)号：US20100012167A1

    公开(公告)日：2010-01-21

    申请号：US12502978

    申请日：2009-07-14

    申请人： Erel Milshtein ,  Benyamin Buller

    发明人： Erel Milshtein ,  Benyamin Buller

    IPC分类号： H01L31/042 ,  H01L31/18

    CPC分类号： H01L31/0516 ,  H01L31/022425 ,  H01L31/035281 ,  H01L31/046 ,  H01L31/0463 ,  Y02E10/50

    摘要： Under one aspect, a nonplanar photovoltaic module having a length includes: (a) an elongated nonplanar substrate; and (b) a plurality of solar cells disposed on the elongated nonplanar substrate, wherein each solar cell in the plurality of solar cells is defined by (i) a plurality of grooves around the nonplanar photovoltaic module and (ii) a groove along the length of the photovoltaic module. In some embodiments, each groove of the plurality of grooves about the photovoltaic module, independently, has a repeating pattern, a non-repeating pattern, or is helical. In some embodiments, the module further includes a patterned conductor providing serial electrical communication between adjacent solar cells. In some embodiments, portions of the patterned conductor providing serial electrical communication between adjacent solar cells are within a groove of the plurality of grooves about the photovoltaic module.

    摘要翻译： 在一个方面，具有长度的非平面光伏模块包括：（a）细长非平面基板; 和（b）设置在细长非平面基板上的多个太阳能电池，其中多个太阳能电池中的每个太阳能电池由（i）围绕非平面光伏模块的多个槽限定，以及（ii）沿着该长度 的光伏组件。 在一些实施例中，围绕光伏模块的多个凹槽中的每个凹槽独立地具有重复图案，非重复图案或螺旋形。 在一些实施例中，模块还包括图案化导体，其提供相邻太阳能电池之间的串联电连通。 在一些实施例中，提供相邻太阳能电池之间的串联电连通的图案化导体的部分位于围绕光伏模块的多个凹槽的凹槽内。

    Encapsulated Photovoltaic Device Used With A Reflector And A Method of Use for the Same
    85.
    发明申请
    Encapsulated Photovoltaic Device Used With A Reflector And A Method of Use for the Same 审中-公开
    与反射器一起使用的封装光伏器件及其使用方法

    公开(公告)号：US20090078303A1

    公开(公告)日：2009-03-26

    申请号：US12235496

    申请日：2008-09-22

    申请人： Thomas Brezoczky ,  Benyamin Buller ,  Chris M. Gronet

    发明人： Thomas Brezoczky ,  Benyamin Buller ,  Chris M. Gronet

    IPC分类号： H01L31/042

    CPC分类号： H01L31/035281 ,  F24S23/74 ,  F24S23/80 ,  F24S40/40 ,  H01L31/0543 ,  H01L31/0547 ,  H02S20/23 ,  Y02B10/12 ,  Y02E10/45 ,  Y02E10/52

    摘要： An apparatus is provided that has photovoltaic modules and a concentrator mechanically attached to a frame. Each module has (i) an outer shell defining an inner volume, (ii) a substrate in the inner volume, and (iii) a material on the substrate that converts light to electric energy. The outer shell allows light energy that strikes the shell to be directed towards the material. The concentrator has concentrator assemblies, each associated with a respective photovoltaic module. Each concentrator assembly comprises a first and second surface that form a concave structure that transmits light energy entering the concave structure to the associated photovoltaic module. The first and second surfaces each comprise substantially the shape of the involute of the particular photovoltaic module associated with the concentrator assembly. Each photovoltaic module extends from a first to a second support of the frame and is electrically coupled to an electric contact in the first support.

    摘要翻译： 提供了一种装置，其具有机械地附接到框架的光伏模块和集中器。 每个模块具有（i）限定内部体积的外壳，（ii）内部体积中的衬底，以及（iii）将光转换成电能的衬底上的材料。 外壳允许撞击壳体的光能被引向材料。 集中器具有集中器组件，每个集中器组件与相应的光伏模块相关联。 每个集中器组件包括形成凹入结构的第一和第二表面，其将进入凹构造的光能传递到相关联的光伏模块。 第一和第二表面各自包括与集中器组件相关联的特定光伏模块的渐开线的形状。 每个光伏模块从框架的第一支撑件延伸到第二支撑件并且电耦合到第一支撑件中的电触头。

    Writing a circuit design pattern with shaped particle beam flashes
    86.
    发明授权
    Writing a circuit design pattern with shaped particle beam flashes 失效
    编写具有成形粒子束闪光的电路设计图案

    公开(公告)号：US07476880B2

    公开(公告)日：2009-01-13

    申请号：US11243299

    申请日：2005-10-03

    申请人： Benyamin Buller ,  Richard L. Lozes ,  Robert M. Sills

    发明人： Benyamin Buller ,  Richard L. Lozes ,  Robert M. Sills

    IPC分类号： G21K5/10 ,  H01J37/08

    CPC分类号： H01J37/302 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31776 ,  Y10S430/143

    摘要： A shaped particle beam writing strategy can be used to write a pattern with a particle beam onto a substrate. The pattern comprises a circuit design that is fractured into a plurality of arbitrary polygons. The writing strategy comprises transforming and fracturing the arbitrary polygons into a plurality of restricted polygons, each restricted polygon being represented by a location coordinate, at least two dimension coordinates, and at least one external edge indicator. Thereafter, the restricted polygons are tiled into a set of tiles comprising interior tiles and external edge tiles. Flash data is assigned for each tile such that the interior tiles are assigned a first flash area and the external edge tiles are assigned a second flash area that is smaller than the first flash area. The flash data is arranged in a selected order to write the pattern with a modulated particle beam, such as an electron beam, on a substrate.

    摘要翻译： 可以使用成形的粒子束写入策略来将具有粒子束的图案写入到衬底上。 该图案包括断裂成多个任意多边形的电路设计。 写入策略包括将任意多边形变换和压缩成多个受限多边形，每个受限多边形由位置坐标，至少两个维度坐标以及至少一个外部边缘指示符表示。 此后，将限制的多边形平铺成包括内部瓦片和外部边缘瓦片的一组瓦片。 为每个瓦片指定闪存数据，使得内部瓦片被分配第一闪光区域，并且外部边缘瓦片被分配比第一闪光区域小的第二闪光区域。 闪光数据以选定的顺序排列，以便在衬底上用诸如电子束的调制的粒子束来写入图案。

    Placement effects correction in raster pattern generator
    87.
    发明授权
    Placement effects correction in raster pattern generator 失效
    栅格图案生成器中的放置效果校正

    公开(公告)号：US07476879B2

    公开(公告)日：2009-01-13

    申请号：US11241887

    申请日：2005-09-30

    申请人： Richard L. Lozes ,  Benyamin Buller

    发明人： Richard L. Lozes ,  Benyamin Buller

    IPC分类号： G21G5/00 ,  H01J37/302

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31769 ,  H01J2237/31796 ,  Y10S430/143

    摘要： A method for generating a charged particle beam flash. The method includes computing an array of dose correction multipliers, based, at least in part, on a resist sensitivity correction factor, and computing a displacement vector to account for placement effects, such as resist charging. The displacement vector is defined as {right arrow over (δ)}c=dP{circle around (×)}{right arrow over (K)} , where {right arrow over (δ)}c—represents the displacement vector, d represents the array of dose correction multipliers, P represents pattern exposure data, {circle around (×)} represents a mathematical convolution operation, and {right arrow over (K)} represents a Poisson kernel converted to a spatial domain. The method further includes using the displacement vector to modify position of the charged particle beam flash.

    摘要翻译： 一种产生带电粒子束闪光的方法。 该方法包括至少部分地基于抗蚀剂敏感度校正因子来计算剂量校正乘数的阵列，以及计算位移矢量以考虑诸如抗蚀剂充电的放置效应。 位移矢量被定义为{右箭头（delta）} c = dP {（x）周围的圆（{K}}右箭头}），其中{右箭头（（delta）} c-表示位移矢量，d 表示剂量校正乘数的阵列，P表示图案曝光数据，{circle around（x）}表示数学卷积运算，{right arrow over（K）}表示转换为空间域的泊松核。 该方法还包括使用位移矢量来修改带电粒子束闪光的位置。

    Beam exposure correction system and method
    88.
    发明授权
    Beam exposure correction system and method 失效
    光束曝光校正系统及方法

    公开(公告)号：US07417233B2

    公开(公告)日：2008-08-26

    申请号：US11237554

    申请日：2005-09-28

    申请人： Scott C. Stovall ,  Benyamin Buller ,  Jimmy Iskandar ,  Ming Lun Yu

    发明人： Scott C. Stovall ,  Benyamin Buller ,  Jimmy Iskandar ,  Ming Lun Yu

    IPC分类号： G21K1/08

    CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304

    摘要： A system and method of determining shape and position corrections of a beam such as a particle or other beam used in a system such as a particle beam lithography. The method of providing corrected deflector voltages may include determining a voltage step value by subtracting a previous deflector voltage value with a current deflector voltage value; determining a plurality of correction values using the voltage step value and an exposure time for the current deflector voltage value; selecting a current voltage correction value from the plurality of correction values using the current deflector voltage value; and calculating a corrected deflector voltage value by adding the current voltage correction value to the current deflector voltage value.

    摘要翻译： 确定诸如粒子束光刻系统中使用的粒子或其他束的束的形状和位置校正的系统和方法。 提供校正的偏转器电压的方法可以包括通过用电流偏转器电压值减去先前的偏转器电压值来确定电压阶跃值; 使用所述电压阶跃值和所述电流偏转器电压值的曝光时间来确定多个校正值; 使用所述电流偏转器电压值从所述多个校正值中选择当前电压校正值; 以及通过将当前电压校正值与当前偏转器电压值相加来计算校正的偏转器电压值。