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    Optical system and photolithography tool comprising same
    83.
    发明授权
    Optical system and photolithography tool comprising same 有权
    包括其的光学系统和光刻工具

    公开(公告)号：US07355791B2

    公开(公告)日：2008-04-08

    申请号：US11251300

    申请日：2005-10-14

    申请人： Vladimir Kamenov ,  Toralf Gruner

    发明人： Vladimir Kamenov ,  Toralf Gruner

    IPC分类号： G02B5/30

    CPC分类号： G03F7/70225 ,  G02B5/3091 ,  G02B17/02 ,  G02B17/08 ,  G02B17/0892 ,  G03F7/70241 ,  G03F7/70958 ,  G03F7/70966

    摘要： An optical system, for example a lens for a photolithography tool, includes a group of optical elements (L1, L2) that each comprise a birefringent cubic crystal such as CaF2. The crystal lattices of the crystals have different orientations, e.g. for reducing the overall retardance of the group by mutual compensation. The [110] crystal axis of at least one optical element (L1, L2) is tilted with respect to an optical axis (34) of the system (10) by a predefined tilting angle (θ1, θ2) having an absolute value between 1° and 20°. This reduces the magnitude, but not significantly changes the orientation of intrinsic birefringence. By selecting an appropriate tilting angle it is possible to achieve a better performance of the optical system. For example, the overall retardance of the optical system may be reduced, or the angular retardance distribution may be symmetrized.

    摘要翻译： 光学系统，例如用于光刻工具的透镜，包括一组各自包括诸如CaF 2 2的双折射立方晶体的光学元件（L 1，L 2）。 晶体的晶格具有不同的取向，例如 通过相互补偿减少集团的整体延迟。 至少一个光学元件（L 1，L 2）的[110]晶轴相对于系统（10）的光轴（34）倾斜预定倾斜角（θ1 >，θ2> 2），其绝对值在1°和20°之间。 这降低了幅度，但并没有显着地改变固有双折射的取向。 通过选择适当的倾斜角度，可以实现光学系统的更好的性能。 例如，可以减小光学系统的总体延迟，或者可以对角度延迟分布进行对称化。

    Lens Made of a Crystalline Material
    84.
    发明申请
    Lens Made of a Crystalline Material 有权
    透镜由结晶材料制成

    公开(公告)号：US20080019013A1

    公开(公告)日：2008-01-24

    申请号：US11864193

    申请日：2007-09-28

    申请人： Birgit Enkisch ,  Hartmut Enkisch ,  Toralf Gruner

    发明人： Birgit Enkisch ,  Hartmut Enkisch ,  Toralf Gruner

    IPC分类号： G02B3/00

    CPC分类号： G03F7/70966 ,  B24B13/00 ,  G02B1/02 ,  G02B3/00

    摘要： As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.

    摘要翻译： 作为用于物镜的透镜或透镜部件的制造的初步阶段，特别是用于微光刻投影系统的投影物镜，光学坯料由晶体材料制成。 作为制造光学坯料的第一步，确定在材料的晶体结构中限定的第一晶体方向的取向。 然后将该材料加工成光学坯料，使得第一结晶方向基本上垂直于光学坯料的光学坯料表面。 随后，将标记施加到光学毛坯或光学毛坯的安装元件。 标记与第二结晶方向具有定义的关系，其相对于第一结晶方向定向成非零角度。

    Lens made of a crystalline material
    85.
    发明授权
    Lens made of a crystalline material 有权
    透镜由结晶材料制成

    公开(公告)号：US07292388B2

    公开(公告)日：2007-11-06

    申请号：US10983569

    申请日：2004-11-08

    申请人： Birgit Enkisch ,  Hartmut Enkisch ,  Toralf Gruner

    发明人： Birgit Enkisch ,  Hartmut Enkisch ,  Toralf Gruner

    IPC分类号： G02B13/14

    CPC分类号： G03F7/70966 ,  B24B13/00 ,  G02B1/02 ,  G02B3/00

    摘要： As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.

    摘要翻译： 作为用于物镜的透镜或透镜部件的制造的初步阶段，特别是用于微光刻投影系统的投影物镜，光学坯料由晶体材料制成。 作为制造光学坯料的第一步，确定在材料的晶体结构中限定的第一晶体方向的取向。 然后将该材料加工成光学坯料，使得第一结晶方向基本上垂直于光学坯料的光学坯料表面。 随后，将标记施加到光学毛坯或光学毛坯的安装元件。 标记与第二结晶方向具有定义的关系，其相对于第一结晶方向定向成非零角度。

    Optical system for ultraviolet light
    89.
    发明申请
    Optical system for ultraviolet light 有权
    紫外线光学系统

    公开(公告)号：US20060119750A1

    公开(公告)日：2006-06-08

    申请号：US11252598

    申请日：2005-10-19

    申请人： Alexander Epple ,  Toralf Gruner ,  Wolfgang Singer

    发明人： Alexander Epple ,  Toralf Gruner ,  Wolfgang Singer

    IPC分类号： G02F1/1335

    CPC分类号： G02B17/0892 ,  G02B3/12 ,  G02B3/14 ,  G02B13/143 ,  G02B17/0812

    摘要： An optical system for ultraviolet light having wavelengths λ≦200 nm, which may be designed in particular as a catadioptric projection objective for microlithography, has a plurality of optical elements including optical elements made of synthetic quartz glass or a fluoride crystal material transparent to a wavelength λ≦200 nm. At least two of the optical elements are utilized for forming at least one liquid lens group including a first delimiting optical element, a second delimiting optical element, and a liquid lens, which is arranged in an interspace between the first delimiting optical element and the second delimiting optical element and contains a liquid transparent to ultraviolet light having wavelengths λ≦200 nm. This enables effective correction of chromatic aberrations even in the case of systems that are difficult to correct chromatically.

    摘要翻译： 波长λ<= 200nm的紫外光的光学系统可以特别设计为用于微光刻的反射折射投影物镜，具有多个光学元件，包括由合成石英玻璃制成的光学元件或透明于 波长λ<= 200nm。 至少两个光学元件用于形成至少一个液体透镜组，该液体透镜组包括第一限定光学元件，第二限定光学元件和液体透镜，该液体透镜组布置在第一限定光学元件和第二限定光学元件之间的间隙中 限定光学元件并且包含对波长λ<= 200nm的透明紫外光的液体。 这使得即使在难以校正色彩的系统的情况下也能够有效地校正色像差。

    Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method
    90.
    发明申请
    Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method 失效
    用于改善至少两个光学元件的成像特性和光刻制造方法的方法

    公开(公告)号：US20050254773A1

    公开(公告)日：2005-11-17

    申请号：US11185066

    申请日：2005-07-20

    申请人： Birgit Kurz ,  Toralf Gruner ,  Alexander Kohl

    发明人： Birgit Kurz ,  Toralf Gruner ,  Alexander Kohl

    IPC分类号： G02B7/00 ,  G02B5/30 ,  G03F7/20 ,  H01L21/027 ,  G02B6/00

    CPC分类号： G03F7/70591 ,  G02B5/3083 ,  G03F7/70258 ,  G03F7/70566 ,  G03F7/70966 ,  Y10S359/90

    摘要： A method for improving imaging properties of two or more optical elements comprises the step of determining for at least one of the two optical elements a polarisation-dependent perturbation. In a further step a polarisation-independent perturbation is determined for at least one of the two optical elements. Then a target position for the at least one movable optical element is calculated such that, in the target position, the total perturbation of the at least two optical elements which is made up of the polarisation-dependent perturbations and polarisation-independent perturbations of the two optical elements, is minimized. Finally the at least one movable optical element is moved the to the calculated target position.

    摘要翻译： 一种用于改善两个或多个光学元件的成像特性的方法包括确定两个光学元件中的至少一个偏振相关扰动的步骤。 在另一步骤中，确定两个光学元件中的至少一个的偏振无关扰动。 然后，计算出至少一个可移动光学元件的目标位置，使得在目标位置中，由偏振相关扰动和两极偏振独立扰动构成的至少两个光学元件的总扰动 光学元件被最小化。 最后，将至少一个可移动光学元件移动到计算出的目标位置。