摘要:
Thermoplastic molding materials contain A) from 1 to 99% by weight of a partly aromatic copolyamide composed of a.sub.1) from 30 to 44 mol % of units which are derived from terephthalic acid, a.sub.2) from 6 to 25 mol % of units which are derived from isophthalic acid, a.sub.3) from 43 to 49.5 mol % of units which are derived from hexamethylenediamine and a.sub.4) from 0.5 to 7 mol % of units which are derived from aliphatic cyclic diamines of 6 to 30 carbon atoms, the molar percentages of components a.sub.1) to a.sub.4) together giving 100%, B) from 1 to 99% by weight of a polyetherimide, C) from 0 to 30% by weight of a polymeric component having OH groups, D) from 0 to 60% by weight of fibrous or particulate fillers or mixtures thereof, E) from 0 to 40% by weight of rubber impact modifiers and F) from 0 to 40% by weight of conventional additives and processing assistants.
摘要:
The present invention relates to a process for the production of low-chlorine-content polybiphenyl sulfone polymers, to the polybiphenyl sulfone polymers obtainable in this way, to polybiphenyl sulfone polymers with less than 800 ppm content of organically bonded chlorine, to thermoplastic molding compositions and moldings, fibers, films, membranes, or foams comprising the polybiphenyl sulfone polymers mentioned, and also to their use for the production of moldings, of fibers, of films, of membranes, or of foams.
摘要:
The present invention relates to a process for preparing a block copolymer comprising polyarylene ether and polyalkylene oxide blocks, comprising the reaction of an HO-terminated polyarylene ether with a monomeric alkylene oxide. The present invention also relates to a block copolymer obtainable from this process. The invention additionally relates to a triblock polymer with polyalkylene oxide-polyaryl ether-polyalkylene oxide blocks.
摘要:
The present invention relates to thermoplastic molding compositions composed of the following components: (A) at least one polyarylene ether (A1) having an average of at most 0.1 phenolic end groups per polymer chain, and at least one polyarylene ether (A2) having an average of at least 1.5 phenolic end groups per polymer chain, (B) at least one fibrous or particulate filler, and (C) optionally further additives and/or processing aids. The present invention further relates to a process for producing the thermoplastic molding compositions of the invention, the use of these for producing moldings, fibers, foams, or films, and to the resultant moldings, fibers, foams, and films.
摘要:
The present invention relates to the use of a molding composition for producing a feed container consisting essentially of a copolymer composed of (A) from 5 to 60% by weight of units of the formula (I) and (B) from 40 to 95% by weight of units of the formula (II) where the total of the proportions by weight is 100% by weight, based on the copolymer, and where the demolding force of the molding composition is from 1800 to 2800 N.
摘要:
Silicon semiconductor wafers are produced by pulling a single crystal at a seed crystal from a melt heated in a crucible; supplying heat to the center of the crucible bottom with a heating power which, in the course of the growth of a cylindrical section of the single crystal, is increased at least once to not less than 2 kW and is then decreased again; and slicing semiconductor wafers from the pulled single crystal.
摘要:
The present invention relates to polyarylene ether block copolymers according to the general formula A-K—X—K-A, where —X— is a polyarylene ether segment with number-average molar mass of at least 5000 g/mol, and A- is a segment of the general structure R2NH—(R1—NH—CO—Ar—CO—NH)n—R1—NH—, in which R1 is a linear or branched alkylene group having from 2 to 12 carbon atoms and Ar is an arylene group having from 6 to 18 carbon atoms, and R2 is selected from aryloyl, alkyloyl, and H, and in which the number average of n is from 1 to 3, and there is a coupling group K of the structure —CO—Ar3—CO— linking each A to X, in which Ar13 is an aromatic group having from 6 to 18 carbon atoms. The present invention also relates to a process for the production of the polyarylene ether block copolymers of the invention, to polymer compositions comprising the polyarylene ether block copolymers of the invention, and also to the use thereof for the production of moldings, of films, of fibers, or of foams.
摘要:
The present invention relates to a mixture of at least two different dispersing agents, an aqueous dispersion containing a UV absorber selected from benzotriazoles, benzotriazines and benzophenones and a mixture of at least two different dispersing agents and a method for reducing the differential pressure in the static dyeing process.
摘要:
Lighting elements composed of thermoplastic molding compositions comprising A) from 10 to 99.9% by weight of at least one thermoplastic polyester, B) from 0.1 to 50% by weight of at least one terpolymer, obtainable from b1) at least one vinylaromatic monomer, b2) at least one C1-C4-alkyl (meth)acrylate or (meth)acrylonitrile, and b3) from 0.1 to 10% by weight, based on the total weight of the components b1) to b3), of at least one monomer which comprises an α,β-unsaturated anhydride, and C) from 0 to 60% by weight of other additives, where the total of the percentages by weight of components A) to C) is 100%.
摘要:
Semiconductor wafers composed of monocrystalline silicon and doped with nitrogen contain an OSF region and a Pv region, wherein the OSF region extends from the center radially toward the edge of the wafer as far as the Pv region; the wafer has an OSF density of less than 10 cm−2, a BMD density in the bulk of at least 3.5×108 cm−3, and a radial distribution of the BMD density with a fluctuation range BMDmax/BMDmin of not more than 3. The wafers are produced by controlling initial nitrogen content and maintaining oxygen within a narrow window, followed by a heat treatment.
摘要翻译:由单晶硅构成并掺杂有氮的半导体晶片包含OSF区域和Pv区域,其中OSF区域从中心径向延伸至晶片边缘至Pv区域; 晶片具有小于10cm -2的OSF密度,至少3.5×10 8 cm -3的本体的BMD密度以及具有不大于3的波动范围BMDmax / BMDmin的BMD密度的径向分布 通过控制初始氮含量并将氧保持在窄窗口内,然后进行热处理来生产晶片。