公开(公告)号：US20050208634A1

公开(公告)日：2005-09-22

申请号：US11116192

申请日：2005-04-28

申请人： Yoshihiro Usuda ,  Yousuke Nishio ,  Hisashi Yasueda ,  Shinichi Sugimoto

发明人： Yoshihiro Usuda ,  Yousuke Nishio ,  Hisashi Yasueda ,  Shinichi Sugimoto

IPC分类号： C07K14/195 ,  C12N1/21 ,  C12N15/52 ,  C12P13/04 ,  C12N9/10

CPC分类号： C12P13/04 ,  C07K14/195 ,  C12N15/52

摘要： The present invention provides polypeptides and polynucleotides involved in C1 assimilation in Methylophilus methylotrophus and methods of producing amino acids in microorganisms having enhanced or attenuated expression of these polypeptides and/or polynucleotides.

摘要翻译： 本发明提供参与甲基嗜球细胞嗜甲基病毒的C1同化的多肽和多核苷酸，以及在这些多肽和/或多核苷酸具有增强或减弱的表达的微生物中产生氨基酸的方法。

公开(公告)号：US20050087129A1

公开(公告)日：2005-04-28

申请号：US10932042

申请日：2004-09-02

申请人： Takahiro Kitano ,  Manabu Hama ,  Shinichi Sugimoto ,  Naoya Hirakawa

发明人： Takahiro Kitano ,  Manabu Hama ,  Shinichi Sugimoto ,  Naoya Hirakawa

IPC分类号： H01L21/027 ,  B05D3/04 ,  H01L21/00 ,  B05C11/00

CPC分类号： H01L21/67034 ,  B05D3/0493

摘要： The invention includes a hermetic container provided with a substrate mount; a vacuum exhauster connected to the hermetic container; a current member; and a current member raising and lowering mechanism. When the current member is raised and lowered as a function of the pressure inside the hermetic container, a liquid flow of the coating solution on the substrate is controlled, thereby controlling the uniformity of the film thickness of the coating solution.

摘要翻译： 本发明包括设置有基板安装件的密封容器; 连接到密封容器的真空排气器; 现任会员 和当前成员升降机制。 当根据密封容器内部的压力升高和降低当前构件时，控制基底上的涂布液的液体流动，从而控制涂布溶液的膜厚均匀性。

公开(公告)号：US06884294B2

公开(公告)日：2005-04-26

申请号：US10122390

申请日：2002-04-16

申请人： Tomohide Minami ,  Shinichi Sugimoto ,  Takahiro Kitano ,  Jun Ookura ,  Hiroaki Kurishima

发明人： Tomohide Minami ,  Shinichi Sugimoto ,  Takahiro Kitano ,  Jun Ookura ,  Hiroaki Kurishima

IPC分类号： B05D1/00 ,  B05D1/02 ,  H01L21/00 ,  B05C5/00

CPC分类号： H01L21/6715 ,  B05D1/005 ,  B05D1/02

摘要： A coating solution is sprayed on a rotating wafer held horizontally from a nozzle provided above the wafer while the nozzle is travelling over the wafer from a wafer center to a wafer outer area, thus spirally spraying the coating solution on the wafer. The nozzle stops when the coating solution has reached the wafer outer area and the coating solution is sprayed in circle on the wafer outer area while the wafer is rotating. A coating solution including a component of a coating film and a solvent may be sprayed on a first area to be coated of the wafer and the coating solution and a solvent for the coating film may be sprayed on a second edge area located outside the first area of the wafer.

摘要翻译： 当喷嘴从晶片中心移动到晶片外部区域上时，将涂布溶液喷涂在从设置在晶片上方的喷嘴水平保持的旋转晶片上，从而将涂布溶液螺旋地喷涂在晶片上。 当涂层溶液已经到达晶片外部区域时，喷嘴停止，并且在晶片旋转的同时将涂布溶液圆形喷涂在晶片外部区域上。 包括涂膜和溶剂的组分的涂布溶液可以喷涂在晶片和涂布溶液的待涂覆的第一区域上，并且用于涂膜的溶剂可以喷涂在位于第一区域外部的第二边缘区域 的晶片。

公开(公告)号：US06808566B2

公开(公告)日：2004-10-26

申请号：US10217458

申请日：2002-08-14

申请人： Takahiro Kitano ,  Manabu Hama ,  Shinichi Sugimoto ,  Naoya Hirakawa

发明人： Takahiro Kitano ,  Manabu Hama ,  Shinichi Sugimoto ,  Naoya Hirakawa

IPC分类号： B05C1100

CPC分类号： H01L21/67034 ,  B05D3/0493

摘要： The invention includes a hermetic container provided with a substrate mount; a vacuum exhauster connected to the hermetic container; a current member; and a current member raising and lowering mechanism. When the current member is raised and lowered as a function of the pressure inside the hermetic container, a liquid flow of the coating solution on the substrate is controlled, thereby controlling the uniformity of the film thickness of the coating solution.

摘要翻译： 本发明包括设置有基板安装件的密封容器; 连接到密封容器的真空排气器; 现任会员 和当前成员升降机制。 当根据密封容器内部的压力升高和降低当前构件时，控制基底上的涂布液的液体流动，从而控制涂布溶液的膜厚均匀性。

公开(公告)号：US06776845B2

公开(公告)日：2004-08-17

申请号：US10152562

申请日：2002-05-23

申请人： Tomohide Minami ,  Shinichi Sugimoto ,  Takahiro Kitano ,  Jun Ookura ,  Hiroaki Kurishima

发明人： Tomohide Minami ,  Shinichi Sugimoto ,  Takahiro Kitano ,  Jun Ookura ,  Hiroaki Kurishima

IPC分类号： B05C1100

CPC分类号： H01L21/67253 ,  B05D1/005 ,  B05D1/26 ,  H01L21/6715

摘要： When a coating film is formed on a substrate, the inplane uniformity of the thickness of the coating film is enhanced to improve through put. Above the substrate, there are provided main and auxiliary nozzles separately movable, and monitoring means for monitoring the state of the surface of the substrate to detect the occurrence of an uncoated region on the surface of the substrate. On the basis of previously prepared coating data, a coating liquid is spirally applied on the substrate by the main nozzle. Then, if the monitoring means detects the occurrence of the uncoated region in a coated region in which the coating liquid has been applied by the main nozzle, a control part detects whether it is required to supply the coating liquid to the uncoated region. If it is required, the coating liquid is supplied to the uncoated region by the auxiliary nozzle. On the other hand, the portion of occurrence of the uncoated region has been grasped by the control part. If the uncoated region is continuously detected at the same place with respect to two substrates, it is determined that the setting of coating data is erroneous, and this is modified.

公开(公告)号：US06773510B2

公开(公告)日：2004-08-10

申请号：US10122389

申请日：2002-04-16

申请人： Takahiro Kitano ,  Shinichi Sugimoto ,  Shinji Kobayashi ,  Naoya Hirakawa ,  Akira Fukutomi ,  Nobukazu Ishizaka

发明人： Takahiro Kitano ,  Shinichi Sugimoto ,  Shinji Kobayashi ,  Naoya Hirakawa ,  Akira Fukutomi ,  Nobukazu Ishizaka

IPC分类号： B05C1102

CPC分类号： H01L21/67178 ,  G03F7/162 ,  G03F7/3021 ,  H01L21/67069

摘要： The present invention relates to a processing unit for processing a substrate, which comprises a chamber for housing the substrate and forming a hermetically closeable processing room, and an exhauster for exhausting an atmosphere in the processing room from an upper portion of the chamber to reduce a pressure in the processing room. The processing unit of the present invention includes a current plate for controlling an atmospheric current formed in the processing room when the pressure is reduced, and the chamber has a mounting table for mounting the substrate thereon, an almost cylindrical lid body with its lower face open for covering the substrate on the mounting plate from above and forming the processing room integrally with the mounting table, and a supporting member for supporting the current plate so that the current plate is parallel to the mounting plate. According to the present invention, the speed of an atmospheric current flowing between the current plate and the substrate becomes uniform within the surface of the substrate, and consequently when a coating film on the substrate is dried, the film is planarized to have a uniform thickness.

摘要翻译： 本发明涉及一种用于处理基板的处理单元，其包括用于容纳基板并形成密封处理室的室，以及用于从室的上部排出处理室中的气氛的排气器，以减少 处理室压力。 本发明的处理单元包括用于当压力降低时控制在处理室中形成的大气电流的电流板，并且该腔室具有用于将基板安装在其上的安装台，其下表面打开的几乎圆柱形的盖体 用于从上方覆盖安装板上的基板并与安装台一体地形成处理室;以及支撑构件，用于支撑当前板，使得当前板平行于安装板。 根据本发明，在基板表面之间流动的当前板和基板之间的大气电流的速度变得均匀，因此当基板上的涂膜被干燥时，该膜被平坦化以具有均匀的厚度 。

公开(公告)号：US06303381B1

公开(公告)日：2001-10-16

申请号：US09455921

申请日：1999-12-07

申请人： Yoshiya Gunji ,  Hisashi Yasueda ,  Yoshio Kawahara ,  Shinichi Sugimoto

发明人： Yoshiya Gunji ,  Hisashi Yasueda ,  Yoshio Kawahara ,  Shinichi Sugimoto

IPC分类号： C12N1500

CPC分类号： C07K14/195 ,  C12N15/11 ,  C12N15/74 ,  C12N15/90

摘要： A novel insertion sequence, which has been found in the sMMO gene coding for methane monooxygenase of methane-assimilating bacterium Methylococcus capsulatus NCIMB 11132 strain, and has inverted repeat sequences consisting of a sequence of the nucleotide numbers 5-19 of SEQ ID NO: 1 at the both ends, can be utilized as effective means for genetic analysis including creation of insertion mutant strains, gene mapping, promoter searching, insertion of genetic information into chromosomal DNA, disruption of specific gene and the like, or utilized for improving methane-assimilating bacteria by chromosomal genetic engineering techniques.

摘要翻译： 已经在编码甲烷同化细菌甲壳螨NCIMB 11132株的甲烷单加氧酶的sMMO基因中发现了新的插入序列，并且具有由SEQ ID NO：1的核苷酸编号5-19的序列组成的反向重复序列 在两端都可以用作遗传分析的有效手段，包括插入突变菌株的创建，基因作图，启动子搜索，遗传信息插入染色体DNA，破坏特定基因等，或用于改善甲烷同化 细菌通过染色体遗传工程技术。

公开(公告)号：US09150891B2

公开(公告)日：2015-10-06

申请号：US13497894

申请日：2010-09-24

申请人： Keishi Sakaguchi ,  Takanori Matsuda ,  Takumi Kobayashi ,  Makoto Ito ,  Naoki Nagano ,  Masahiro Hayashi ,  Daisuke Honda ,  Yosuke Taoka ,  Yuji Okita ,  Hitoshi Izumida ,  Shinichi Sugimoto

发明人： Keishi Sakaguchi ,  Takanori Matsuda ,  Takumi Kobayashi ,  Makoto Ito ,  Naoki Nagano ,  Masahiro Hayashi ,  Daisuke Honda ,  Yosuke Taoka ,  Yuji Okita ,  Hitoshi Izumida ,  Shinichi Sugimoto

IPC分类号： C12P7/64 ,  C12P21/06 ,  C12N1/00 ,  C12N1/10 ,  C12N15/00 ,  C11C3/00 ,  C12N9/02 ,  C12N15/79 ,  C12N15/82

CPC分类号： C12P7/6409 ,  C11C3/00 ,  C12N9/0071 ,  C12N9/0083 ,  C12N15/79 ,  C12N15/8201 ,  C12N15/8247 ,  C12P7/6427

摘要： Disclosed is a transformation method whereby an ability to produce a useful substance of a stramenopile can be improved. The method for transforming a stramenopile comprises transferring a foreign gene into the stramenopile which is a microorganism belonging to the class Labyrinthula, more specifically, to a genus Labyrinthula, Altornia, Aplanochytrium, Schizochytrium, Aurantiochytrium, Thraustochytrium, Ulkenia, etc. Said foreign gene, which is a gene relating to tolerance against an antibiotic, a colorimetric protein and/or a fatty acid desaturase (Δ5 desaturase gene, Δ12 desaturase gene and/or ω3 desaturase gene), is transferred by using the electroporation or gene-gun technique.

摘要翻译： 公开了能够提高产生有机物的能力的转化方法。 用于转化stramenopile的方法包括将外源基因转移到作为属于Labyrinthula类的微生物的地幔中，更具体地是属于Labyrinthula，Altornia，Aplanochytrium，Schizochytrium，Aurantiochytrium，Thraustochytrium，Ulkenia等。所述外源基因， 其是与抗生素，比色蛋白质和/或脂肪酸去饱和酶（＆Dgr。5去饱和酶基因，＆Dgr; 12去饱和酶基因和/或ω3去饱和酶基因）的耐受相关的基因通过使用电穿孔或基因 - 枪技术。

公开(公告)号：US20140091562A1

公开(公告)日：2014-04-03

申请号：US14119296

申请日：2012-05-22

申请人： Shinichi Sugimoto

发明人： Shinichi Sugimoto

IPC分类号： B60R21/231

CPC分类号： B60R21/231 ,  B60R21/237 ,  B60R2021/23146

摘要： Provided are an airbag and an airbag device that are capable of reducing impact on an occupant at an out of position while providing restraining ability with respect to the occupant in a normally seated state. An airbag device includes an airbag 2 that is normally folded and accommodated in a seat 11 of a vehicle and that is inflated and deployed in an emergency, and an inflator 3 that supplies gas to the airbag 2. The airbag 2 includes a bag member 21 that is formed of a base cloth 2a, and a plurality of pleats 22 that are formed at the bag member 21. The pleats 22 have a crease portion 23 in a front-back direction of the vehicle to allow the gas to escape to the crease portion 23 upon loading from the front-back direction of the vehicle when the bag member 21 is inflated and deployed.

摘要翻译： 提供一种气囊和安全气囊装置，其能够在正常就座状态下对乘员施加限制能力的同时，减轻对乘员的冲击。 安全气囊装置包括通常折叠并容纳在车辆的座椅11中并且在紧急情况下被充气和展开的气囊2以及向气囊2供应气体的充气器3.气囊2包括袋构件21 由基布2a和形成在袋构件21上的多个褶22形成。褶22在车辆的前后方向上具有折痕部23，以允许气体逸出到折痕 当袋构件21被充气和展开时从车辆的前后方向装载时的部分23。

公开(公告)号：US08628111B2

公开(公告)日：2014-01-14

申请号：US13513795

申请日：2010-11-08

申请人： Shinichi Sugimoto ,  Daisuke Sugimoto

发明人： Shinichi Sugimoto ,  Daisuke Sugimoto

IPC分类号： B60R21/16

CPC分类号： B60R21/207 ,  B60R21/2171 ,  B60R21/23138 ,  B60R21/233 ,  B60R21/237 ,  B60R2021/23123 ,  B60R2021/23316 ,  B60R2021/23332 ,  B60R2021/2612

摘要： Provided is a side airbag device such that locally high stress is prevented from being generated at the sewn portion between panels by high temperature and pressure gas. An inner panel is folded in half, and the upper edges thereof are sewn together by a seam so as to form an inner bag. This inner bag is placed on an outer panel, the outer panel is folded in half, and the periphery thereof is sewn by a seam. An inflator equipped with a distributor is inserted into the inner bag through openings and, and a gas jetting portion is disposed in the immediate vicinity of a communication opening.

摘要翻译： 提供了一种侧面安全气囊装置，使得通过高温和高压气体防止在面板之间的缝合部分处产生局部高应力。 将内板折叠成一半，其上边缘通过缝缝合在一起形成内袋。 该内袋被放置在外板上，外板折叠成一半，其周边通过接缝缝合。 配备有分配器的充气机通过开口插入到内袋中，并且气体喷射部分设置在紧邻连通开口处。