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    LIGHT SOURCE FOR LITHOGRAPHY EXPOSURE PROCESS
    83.
    发明申请
    LIGHT SOURCE FOR LITHOGRAPHY EXPOSURE PROCESS 审中-公开

    公开(公告)号：US20190310556A1

    公开(公告)日：2019-10-10

    申请号：US16449645

    申请日：2019-06-24

    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

    Inventor： Hsin-Feng CHEN ,  Han-Lung CHANG ,  Li-Jui CHEN ,  Bo-Tsun LIU

    IPC: G03F7/20 ,  H05G2/00

    Abstract: A method for generating a radiation light in a lithography exposure system is provided. The method includes connecting a first nozzle assembly coupled to a support to an outlet of a storage member that receives a target fuel inside. The method further includes guiding the target fuel flowing through the first nozzle assembly and supplying a droplet of the target fuel into an excitation zone via the first nozzle assembly. The method also includes moving the support to connect a second nozzle assembly coupled to the support with the outlet. In addition, the method includes guiding the target fuel flowing through the second nozzle assembly and supplying a droplet of the target fuel into the excitation zone via the second nozzle assembly. The method further includes irradiating the droplet of the target fuel in the excitation zone with a laser pulse.

    EXTREME ULTRAVIOLET CONTROL SYSTEM
    85.
    发明申请
    EXTREME ULTRAVIOLET CONTROL SYSTEM 审中-公开

    公开(公告)号：US20190101831A1

    公开(公告)日：2019-04-04

    申请号：US16029408

    申请日：2018-07-06

    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

    Inventor： Jen-Yang CHUNG ,  Chieh HSIEH ,  Shang-Chieh CHIEN ,  Li-Jui CHEN ,  Po-Chung CHENG

    IPC: G03F7/20 ,  G03F1/24

    Abstract: A method of controlling a droplet illumination module/droplet detection module system of an extreme ultraviolet (EUV) radiation source includes irradiating a target droplet with light from a droplet illumination module and detecting light reflected and/or scattered by the target droplet. The method includes determining whether an intensity of the detected light is within an acceptable range. In response to determining that the intensity of the detected light is not within the acceptable range, a parameter of the droplet illumination module is automatically adjusted to set the intensity of the detected light within the acceptable range.

    LITHOGRAPHY CONTAMINATION CONTROL
    89.
    发明公开
    LITHOGRAPHY CONTAMINATION CONTROL 审中-公开

    公开(公告)号：US20230273534A1

    公开(公告)日：2023-08-31

    申请号：US18311795

    申请日：2023-05-03

    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

    Inventor： Chieh HSIEH ,  Tai-Yu CHEN ,  Cho-Ying LIN ,  Heng-Hsin LIU ,  Li-Jui CHEN ,  Shang-Chieh CHIEN

    IPC: G03F7/00 ,  G02B17/06 ,  H05G2/00

    CPC classification number: G03F7/70925 ,  G03F7/70033 ,  G02B17/0663 ,  G03F7/70491 ,  H05G2/008 ,  G03F7/70808

    Abstract: A lithography system is provided capable of deterring contaminants, such as tin debris from entering into the scanner. The lithography system in accordance with various embodiments of the present disclosure includes a processor, an extreme ultraviolet light source, a scanner, and a hollow connection member. The light source includes a droplet generator for generating a droplet, a collector for reflecting extreme ultraviolet light into an intermediate focus point, and a light generator for generating pre-pulse light and main pulse light. The droplet generates the extreme ultraviolet light in response to the droplet being illuminated with the pre-pulse light and the main pulse light. The scanner includes a wafer stage. The hollow connection member includes an inlet that is in fluid communication with an exhaust pump. The hollow connection member provides a hollow space in which the intermediate focus point is disposed. The hollow connection member is disposed between the extreme ultraviolet light source and the scanner.

    LITHOGRAPHY CONTAMINATION CONTROL
    90.
    发明申请
    LITHOGRAPHY CONTAMINATION CONTROL 有权

    公开(公告)号：US20230060899A1

    公开(公告)日：2023-03-02

    申请号：US17461744

    申请日：2021-08-30

    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

    Inventor： Chieh HSIEH ,  Tai-Yu CHEN ,  Cho-Ying LIN ,  Shang-Chieh CHIEN ,  Li-Jui CHEN ,  Heng-Hsin LIU

    IPC: G03F7/20 ,  H05G2/00 ,  G02B17/06

    Abstract: A lithography system is provided capable of deterring contaminants, such as tin debris from entering into the scanner. The lithography system in accordance with various embodiments of the present disclosure includes a processor, an extreme ultraviolet light source, a scanner, and a hollow connection member. The light source includes a droplet generator for generating a droplet, a collector for reflecting extreme ultraviolet light into an intermediate focus point, and a light generator for generating pre-pulse light and main pulse light. The droplet generates the extreme ultraviolet light in response to the droplet being illuminated with the pre-pulse light and the main pulse light. The scanner includes a wafer stage. The hollow connection member includes an inlet that is in fluid communication with an exhaust pump. The hollow connection member provides a hollow space in which the intermediate focus point is disposed. The hollow connection member is disposed between the extreme ultraviolet light source and the scanner.

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