Position detecting method
    82.
    发明授权
    Position detecting method 有权
    位置检测方法

    公开(公告)号:US07576858B2

    公开(公告)日:2009-08-18

    申请号:US11734594

    申请日:2007-04-12

    IPC分类号: G01B11/00

    CPC分类号: G03F9/7092 G03F9/7046

    摘要: A method for calculating a position of an image of an alignment mark formed on an object to be detected includes the steps of obtaining first information indicative of a center position in the alignment mark based on a detection signal, obtaining a waveform characteristic of the detection signal as second information, and correcting the first information based on the second information that has been obtained, and a measurement error of the center position of the alignment mark, which result from an optical system for detecting the alignment mark.

    摘要翻译: 用于计算形成在待检测物体上的对准标记的图像的位置的方法包括以下步骤:基于检测信号获得指示对准标记中的中心位置的第一信息,获得检测信号的波形特性 作为第二信息,并且基于获得的第二信息和由用于检测对准标记的光学系统产生的对准标记的中心位置的测量误差来校正第一信息。

    Amide Compound
    83.
    发明申请
    Amide Compound 失效
    酰胺化合物

    公开(公告)号:US20080312226A1

    公开(公告)日:2008-12-18

    申请号:US11667821

    申请日:2005-11-17

    摘要: There is provided a FAAH inhibitor and a prophylactic or therapeutic agent for cerebrovascular disorders or sleep disorders comprising it. The prophylactic or therapeutic agent comprises a compound of the formula (I0): R1—C—R2—R3—R4 (I0)wherein Z is oxygen or sulfur; R1 is aryl which may be substituted, or a heterocyclic group which may be substituted; R1a is a hydrogen atom, a hydrocarbon group which may be substituted, hydroxyl, etc.; R2 is piperidin-1,4-diyl which may be substituted, or piperazin-1,4-diyl which may be substituted; R3 is a group formed by eliminating two hydrogen atoms from a 5-membered aromatic heterocyclic group having 1 to 3 heteroatoms selected from nitrogen, oxygen and sulfur, which may be further substituted, —CO—, etc.; and R4 is a hydrocarbon group which may be substituted, or a heterocyclic group which may be substituted; or a salt thereof.

    摘要翻译: 提供了FAAH抑制剂和包含其的脑血管障碍或睡眠障碍的预防或治疗剂。 预防或治疗剂包含式(I0)的化合物:其中Z是氧或硫的R1-C-R2-R3-R4(I0); R1可以被取代的芳基,或可被取代的杂环基; R1a为氢原子,可被取代的烃基,羟基等; R2是可被取代的哌啶-1,4-二基,或可被取代的哌嗪-1,4-二基; R3是通过从具有1至3个选自氮,氧和硫的杂原子的5元芳族杂环基中除去两个氢原子而形成的基团,其可进一步被-CO-等取代; R 4为可被取代的烃基,或可被取代的杂环基; 或其盐。

    SHAPE MEASURING APPARATUS, EXPOSURE APPARATUS, AND COMPUTER
    84.
    发明申请
    SHAPE MEASURING APPARATUS, EXPOSURE APPARATUS, AND COMPUTER 有权
    形状测量装置,曝光装置和计算机

    公开(公告)号:US20080285052A1

    公开(公告)日:2008-11-20

    申请号:US12032205

    申请日:2008-02-15

    IPC分类号: G01B11/24

    CPC分类号: G01B11/2441 G03F7/70641

    摘要: A shape measuring apparatus for measuring the shape of a measurement target surface includes an interferometer and computer. The interferometer senses interference light formed by measurement light from the measurement target surface and reference light by a photoelectric converter, while changing the light path length of the measurement light or the reference light. The computer Fourier-transforms a first interference signal sensed by the photoelectric converter to obtain a phase distribution and an amplitude distribution, shapes the amplitude distribution, inversely Fourier-transforms the phase distribution and the shaped amplitude distribution to obtain a second interference signal, and determines the shape of the measurement target surface based on the second interference signal.

    摘要翻译: 用于测量测量对象表面的形状的形状测量装置包括干涉仪和计算机。 在改变测量光或参考光的光路长度的同时,干涉仪通过光电转换器感测来自测量对象表面的测量光和参考光所形成的干涉光。 计算机对由光电转换器感测到的第一干涉信号进行傅立叶变换以获得相位分布和幅度分布,对幅度分布进行整形,对相位分布和形状振幅分布进行逆傅立叶变换,以获得第二干涉信号,并确定 基于第二干涉信号的测量对象表面的形状。

    Surface plasmon resonance sensor device
    85.
    发明授权
    Surface plasmon resonance sensor device 有权
    表面等离子体共振传感器装置

    公开(公告)号:US07408647B2

    公开(公告)日:2008-08-05

    申请号:US11610854

    申请日:2006-12-14

    IPC分类号: G01N21/00

    摘要: Provided is a surface plasmon resonance sensor device having excellent measurement accuracy. The device is equipped with an optical fiber 2,32 for introducing a light incident from one end thereof to the other end, a core exposed portion 3,33a formed to expose core 5,33 of the optical fiber 2,32, and a thin metal film 4,35 formed on the core exposed portion 3,33a and capable of exciting surface plasmon. The core exposed portion 3 is a first microsphere 3 disposed at the other end portion of the optical fiber 2 and the thin metal film 4 is formed on the surface of the microsphere 3. The thin metal film may be a first fine-metal-particle thin film 25 in which fine metal particles 24 have been distributed uniformly. The core exposed portion 33a is disposed in the midway of the optical fiber 32 and the thin metal film 35 is formed to cover therewith the entire surface of the core exposed portion 33a. The core exposed portion 33a is equipped with a second microsphere 36 formed integral with the core 33 and the thin metal film 35 is formed to cover the microsphere 36. The thin metal film 35 may be a second fine-metal-particle thin film 38 in which fine metal particles 37 have been distributed uniformly.

    摘要翻译: 提供了具有优异的测量精度的表面等离子体共振传感器装置。 该装置配备有用于将从其一端入射的光引入另一端的光纤2,32,形成为暴露光纤2,32的核心533的芯部暴露部3,33a,以及 形成在芯部暴露部分3,33a上并且能够激发表面等离子体激元的金属薄膜4,35。 芯部露出部3是设置在光纤2的另一端部的第一微球体3,在微球体3的表面形成有金属薄膜4。 金属薄膜可以是金属颗粒24均匀分布的第一细金属 - 微粒薄膜25。 芯部露出部分33a设置在光纤32的中间,薄金属膜35形成为覆盖芯部暴露部分33a的整个表面。 芯部暴露部分33a配备有与芯33一体形成的第二微球体36,并且形成薄金属膜35以覆盖微球体36。 薄金属膜35可以是金属颗粒37均匀分布的第二细金属 - 微粒薄膜38。

    Management system, apparatus, and method, exposure apparatus, and control method therefor
    86.
    发明授权
    Management system, apparatus, and method, exposure apparatus, and control method therefor 有权
    管理系统,装置和方法,曝光装置及其控制方法

    公开(公告)号:US07385700B2

    公开(公告)日:2008-06-10

    申请号:US11218538

    申请日:2005-09-06

    IPC分类号: G01B11/00 G06F19/00

    CPC分类号: G03F9/7092 G03F7/70633

    摘要: An exposure apparatus performs AGA measurement by using a predetermined sample shot group formed on a wafer, and decides an alignment parameter. The exposure apparatus executes wafer alignment processing and exposure processing by using the alignment parameter. The exposure apparatus notifies a central processing unit of AGA measurement results and the alignment parameter. An overlay inspection apparatus measures an actual exposure position on the exposed wafer, and notifies the central processing unit of the measurement result. The central processing unit optimizes alignment processing on the basis of the AGA measurement results, alignment parameter, and actually measured exposure position.

    摘要翻译: 曝光装置通过使用形成在晶片上的预定取样组进行AGA测量,并且确定对准参数。 曝光装置通过使用对准参数来执行晶片对准处理和曝光处理。 曝光装置向中央处理单元通知AGA测量结果和对准参数。 覆盖检查装置测量曝光的晶片上的实际曝光位置,并向中央处理单元通知测量结果。 中央处理单元根据AGA测量结果,对准参数和实际测量的曝光位置优化对准处理。

    Control System for Liquid Infusion Apparatus
    87.
    发明申请
    Control System for Liquid Infusion Apparatus 审中-公开
    液体输液器控制系统

    公开(公告)号:US20070219495A1

    公开(公告)日:2007-09-20

    申请号:US11686548

    申请日:2007-03-15

    IPC分类号: A61M37/00

    摘要: A control system for a liquid infusion apparatus comprises a plurality of liquid infusion devices, each having a common connector of liquid infusion device side for an electric power supply line and a communication line, a plurality of racks stacked one another, each for receiving each of the liquid infusion devices, a plurality of common connectors of rack side, each mounted on each of the racks a base unit, and a connector provided on the base unit so as to connect an electric power supply line and a communication line to the connectors of lack side. Each of the common connectors of rack side is connected to each of the common connectors of liquid infusion device side, when each of the liquid infusion devices is inserted into each of the respective racks.

    摘要翻译: 液体输注装置的控制系统包括多个液体输注装置,每个液体输注装置具有用于电力供给线和通信线的液体输注装置侧的公共连接器,彼此堆叠的多个机架,每个用于接收 液体输注装置,齿条侧的多个公共连接器,每个安装在每个机架上的基座单元,以及设置在基座单元上的连接器,以将电源线和通信线连接到 缺乏一面。 当每个液体输注装置插入每个相应的机架时,齿条侧的每个公共连接器连接到液体输注装置侧的每个公共连接器。

    Position detecting method and apparatus
    88.
    发明授权
    Position detecting method and apparatus 失效
    位置检测方法和装置

    公开(公告)号:US07229566B2

    公开(公告)日:2007-06-12

    申请号:US10664998

    申请日:2003-09-18

    IPC分类号: G01B11/00

    摘要: A two-dimensional image of an alignment mark 30 is acquired by an alignment scope 15 at step S61, and the two-dimensional image acquired at step S61 is converted to a light-intensity signal line by line at step S62. A selection as to whether each line signal is valid or unnecessary is made at step S63. The amount of positional deviation of the alignment mark 30 is calculated using only valid line signals at step S64.

    摘要翻译: 在步骤S61通过对准范围15获取对准标记30的二维图像,并且在步骤S62逐行地将在步骤S61获取的二维图像转换为光强度信号。 关于每个线路信号是有效还是不必要的选择在步骤S63进行。 在步骤S64,仅使用有效的行信号来计算对准标记30的位置偏差量。

    Superconducting magnet apparatus for MRI
    89.
    发明申请
    Superconducting magnet apparatus for MRI 失效
    MRI超导磁体设备

    公开(公告)号:US20060290351A1

    公开(公告)日:2006-12-28

    申请号:US11305010

    申请日:2005-12-19

    IPC分类号: G01V3/00

    CPC分类号: G01R33/3815 G01R33/3806

    摘要: In a superconducting magnets for MRI configured to generate a homogeneous magnetic field and a gradient magnetic field in a space between a top superconducting magnet and a bottom superconducting magnet, the bottom superconducting magnet is provided with a supporting member that supports a helium vessel, and the supporting member is fixed to a vacuum vessel of the bottom superconducting magnet at one end, and is fixed to the floor surface in the vicinity of the end fixed to the vacuum vessel. A high-quality MR image can be thus obtained by preventing direct transmission of oscillation of the gradient coils to the superconducting magnet and reducing oscillation of the gradient coils while achieving a reduction of the overall superconducting magnet in size.

    摘要翻译: 在用于MRI的超导磁​​体被配置为在顶部超导磁体和底部超导磁体之间的空间中产生均匀的磁场和梯度磁场,底部超导磁体设置有支撑氦容器的支撑构件,并且 支撑构件在一端固定到底部超导磁体的真空容器,并且固定到固定到真空容器的端部附近的地板表面。 因此可以通过防止梯形线圈的振荡直接传递到超导磁体并减小梯度线圈的振荡,同时实现整个超导磁体的尺寸的减小,从而可以获得高质量的MR图像。

    Position detecting device and position detecting method
    90.
    发明申请
    Position detecting device and position detecting method 失效
    位置检测装置和位置检测方法

    公开(公告)号:US20060241894A1

    公开(公告)日:2006-10-26

    申请号:US11474331

    申请日:2006-06-26

    IPC分类号: G01C17/00

    摘要: A position detection method for detecting the position of marks comprises the following steps: a step for detecting first information relating to the position of the mark by detecting light from the mark under first measurement conditions; a step for detecting second information relating to the position of the mark by detecting light from the mark under second measurement conditions which differ from the first measurement conditions; and a step for detecting the position of the mark based on the first and second information, thereby providing a high-precision position detecting method and device serving as an alignment or overlaying detection device in an exposure apparatuses used in manufacturing semiconductor devices, wherein position detection precision is not lost even in the event that the alignment marks are not symmetrical or there are irregularities in the non-symmetry of multiple alignment marks within the same wafer.

    摘要翻译: 用于检测标记位置的位置检测方法包括以下步骤:通过在第一测量条件下检测来自标记的光来检测与标记的位置有关的第一信息的步骤; 通过在与第一测量条件不同的第二测量条件下检测来自标记的光来检测与标记的位置有关的第二信息的步骤; 以及基于第一和第二信息来检测标记的位置的步骤,从而在用于制造半导体器件的曝光装置中提供用于对准或重叠检测装置的高精度位置检测方法和装置,其中位置检测 即使在对准标记不对称或在同一晶片内的多个对准标记的非对称性中存在不规则性的情况下,精度也不会降低。