摘要:
The present invention provides a tricyclic heterocyclic compound having a serotonin 5-HT2C receptor activation action and the like.A 5-HT2C receptor activator containing a compound represented by the formula (I): wherein each symbol is as defined in the specification, or a salt thereof or a prodrug thereof.
摘要:
A method for calculating a position of an image of an alignment mark formed on an object to be detected includes the steps of obtaining first information indicative of a center position in the alignment mark based on a detection signal, obtaining a waveform characteristic of the detection signal as second information, and correcting the first information based on the second information that has been obtained, and a measurement error of the center position of the alignment mark, which result from an optical system for detecting the alignment mark.
摘要:
There is provided a FAAH inhibitor and a prophylactic or therapeutic agent for cerebrovascular disorders or sleep disorders comprising it. The prophylactic or therapeutic agent comprises a compound of the formula (I0): R1—C—R2—R3—R4 (I0)wherein Z is oxygen or sulfur; R1 is aryl which may be substituted, or a heterocyclic group which may be substituted; R1a is a hydrogen atom, a hydrocarbon group which may be substituted, hydroxyl, etc.; R2 is piperidin-1,4-diyl which may be substituted, or piperazin-1,4-diyl which may be substituted; R3 is a group formed by eliminating two hydrogen atoms from a 5-membered aromatic heterocyclic group having 1 to 3 heteroatoms selected from nitrogen, oxygen and sulfur, which may be further substituted, —CO—, etc.; and R4 is a hydrocarbon group which may be substituted, or a heterocyclic group which may be substituted; or a salt thereof.
摘要翻译:提供了FAAH抑制剂和包含其的脑血管障碍或睡眠障碍的预防或治疗剂。 预防或治疗剂包含式(I0)的化合物:其中Z是氧或硫的R1-C-R2-R3-R4(I0); R1可以被取代的芳基,或可被取代的杂环基; R1a为氢原子,可被取代的烃基,羟基等; R2是可被取代的哌啶-1,4-二基,或可被取代的哌嗪-1,4-二基; R3是通过从具有1至3个选自氮,氧和硫的杂原子的5元芳族杂环基中除去两个氢原子而形成的基团,其可进一步被-CO-等取代; R 4为可被取代的烃基,或可被取代的杂环基; 或其盐。
摘要:
A shape measuring apparatus for measuring the shape of a measurement target surface includes an interferometer and computer. The interferometer senses interference light formed by measurement light from the measurement target surface and reference light by a photoelectric converter, while changing the light path length of the measurement light or the reference light. The computer Fourier-transforms a first interference signal sensed by the photoelectric converter to obtain a phase distribution and an amplitude distribution, shapes the amplitude distribution, inversely Fourier-transforms the phase distribution and the shaped amplitude distribution to obtain a second interference signal, and determines the shape of the measurement target surface based on the second interference signal.
摘要:
Provided is a surface plasmon resonance sensor device having excellent measurement accuracy. The device is equipped with an optical fiber 2,32 for introducing a light incident from one end thereof to the other end, a core exposed portion 3,33a formed to expose core 5,33 of the optical fiber 2,32, and a thin metal film 4,35 formed on the core exposed portion 3,33a and capable of exciting surface plasmon. The core exposed portion 3 is a first microsphere 3 disposed at the other end portion of the optical fiber 2 and the thin metal film 4 is formed on the surface of the microsphere 3. The thin metal film may be a first fine-metal-particle thin film 25 in which fine metal particles 24 have been distributed uniformly. The core exposed portion 33a is disposed in the midway of the optical fiber 32 and the thin metal film 35 is formed to cover therewith the entire surface of the core exposed portion 33a. The core exposed portion 33a is equipped with a second microsphere 36 formed integral with the core 33 and the thin metal film 35 is formed to cover the microsphere 36. The thin metal film 35 may be a second fine-metal-particle thin film 38 in which fine metal particles 37 have been distributed uniformly.
摘要:
An exposure apparatus performs AGA measurement by using a predetermined sample shot group formed on a wafer, and decides an alignment parameter. The exposure apparatus executes wafer alignment processing and exposure processing by using the alignment parameter. The exposure apparatus notifies a central processing unit of AGA measurement results and the alignment parameter. An overlay inspection apparatus measures an actual exposure position on the exposed wafer, and notifies the central processing unit of the measurement result. The central processing unit optimizes alignment processing on the basis of the AGA measurement results, alignment parameter, and actually measured exposure position.
摘要:
A control system for a liquid infusion apparatus comprises a plurality of liquid infusion devices, each having a common connector of liquid infusion device side for an electric power supply line and a communication line, a plurality of racks stacked one another, each for receiving each of the liquid infusion devices, a plurality of common connectors of rack side, each mounted on each of the racks a base unit, and a connector provided on the base unit so as to connect an electric power supply line and a communication line to the connectors of lack side. Each of the common connectors of rack side is connected to each of the common connectors of liquid infusion device side, when each of the liquid infusion devices is inserted into each of the respective racks.
摘要:
A two-dimensional image of an alignment mark 30 is acquired by an alignment scope 15 at step S61, and the two-dimensional image acquired at step S61 is converted to a light-intensity signal line by line at step S62. A selection as to whether each line signal is valid or unnecessary is made at step S63. The amount of positional deviation of the alignment mark 30 is calculated using only valid line signals at step S64.
摘要:
In a superconducting magnets for MRI configured to generate a homogeneous magnetic field and a gradient magnetic field in a space between a top superconducting magnet and a bottom superconducting magnet, the bottom superconducting magnet is provided with a supporting member that supports a helium vessel, and the supporting member is fixed to a vacuum vessel of the bottom superconducting magnet at one end, and is fixed to the floor surface in the vicinity of the end fixed to the vacuum vessel. A high-quality MR image can be thus obtained by preventing direct transmission of oscillation of the gradient coils to the superconducting magnet and reducing oscillation of the gradient coils while achieving a reduction of the overall superconducting magnet in size.
摘要:
A position detection method for detecting the position of marks comprises the following steps: a step for detecting first information relating to the position of the mark by detecting light from the mark under first measurement conditions; a step for detecting second information relating to the position of the mark by detecting light from the mark under second measurement conditions which differ from the first measurement conditions; and a step for detecting the position of the mark based on the first and second information, thereby providing a high-precision position detecting method and device serving as an alignment or overlaying detection device in an exposure apparatuses used in manufacturing semiconductor devices, wherein position detection precision is not lost even in the event that the alignment marks are not symmetrical or there are irregularities in the non-symmetry of multiple alignment marks within the same wafer.