公开(公告)号：US20130020499A1

公开(公告)日：2013-01-24

申请号：US13636038

申请日：2011-07-05

申请人： Hidenobu Kameda ,  Masato Moriya ,  Osamu Wakabayashi

发明人： Hidenobu Kameda ,  Masato Moriya ,  Osamu Wakabayashi

IPC分类号： G21K5/04 ,  F16L3/00 ,  H01S3/13

CPC分类号： H01S3/0401 ,  G02B7/008 ,  H01S3/005 ,  H01S3/2316 ,  H05G2/008 ,  Y10T137/6851

摘要： A window unit may include: a window configured to allow a laser beam to be transmitted therethrough; and a holder for holding the window at a periphery thereof, the holder being provided with a flow channel thereinside configured to allow a fluid to flow.

摘要翻译： 窗口单元可以包括：被配置为允许激光束透过其中的窗口; 以及用于在其周边保持窗口的保持器，所述保持器设置有配置成允许流体流动的内部的流动通道。

公开(公告)号：US08227778B2

公开(公告)日：2012-07-24

申请号：US12469176

申请日：2009-05-20

申请人： Masato Moriya ,  Osamu Wakabayashi ,  Georg Soumagne

发明人： Masato Moriya ,  Osamu Wakabayashi ,  Georg Soumagne

IPC分类号： G21K5/04

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70575 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

摘要： The exposure device is able to supply only EUV radiation to a mask, while eliminating radiation other than the EUV radiation. A multi layer made from a plurality of Mo/Si pair layers is provided upon the front surface of a mirror, and blazed grooves are formed in this multi layer. Radiation which is incident from a light source device is incident upon this mirror, and is reflected or diffracted. Since the reflected EUV radiation (including diffracted EUV radiation) and the radiation of other wavelengths are reflected or diffracted at different angles, accordingly their directions of progression are different. By eliminating the radiation of other wavelengths with an aperture and/or a dumper, it is possible to irradiate a mask only with EUV radiation of high purity.

摘要翻译： 曝光装置只能将EUV辐射提供给掩模，同时消除EUV辐射以外的辐射。 在反射镜的前表面上设置由多个Mo / Si对层制成的多层，并且在该多层中形成闪耀的凹槽。 从光源装置入射的辐射入射在该反射镜上并被反射或衍射。 由于反射的EUV辐射（包括衍射的EUV辐射）和其他波长的辐射在不同的角度被反射或衍射，因此它们的进展方向是不同的。 通过用孔和/或自卸车消除其它波长的辐射，可以仅用高纯度的EUV辐射照射掩模。

公开(公告)号：US20110309271A1

公开(公告)日：2011-12-22

申请号：US13160033

申请日：2011-06-14

申请人： Masato MORIYA ,  Osamu Wakabayashi

发明人： Masato MORIYA ,  Osamu Wakabayashi

IPC分类号： G21K5/00 ,  F21V9/06

CPC分类号： G21K1/10 ,  G03F7/70191 ,  H01J35/18

摘要： A spectral purity filter may include: a plurality of segments that each includes a mesh in which an array of apertures of an aperture size at or below a predetermined size is formed and which has electroconductivity; and a frame that supports the plurality of the segments at least at a periphery thereof.

摘要翻译： 光谱纯度滤光器可以包括：多个分段，每个分段包括一个网格，其中形成孔径大小为或小于预定尺寸的孔径阵列，并具有导电性; 以及至少在其周边支撑多个片段的框架。

公开(公告)号：US07792176B2

公开(公告)日：2010-09-07

申请号：US11985840

申请日：2007-11-16

申请人： Osamu Wakabayashi

发明人： Osamu Wakabayashi

IPC分类号： H01S3/22 ,  H01S3/223

CPC分类号： H01S3/2325 ,  H01S3/005 ,  H01S3/2251

摘要： A narrow-band laser device for exposure apparatus that allows to reduce damage to, and to hence extend the life of, optical elements such as chamber windows, output coupling mirrors or the like. A ring resonator is provided in an amplification stage laser of the narrow-band laser device for exposure apparatus that comprises an oscillation stage laser and an amplification stage laser. An OC, a high reflection mirror and a high reflection mirror are arranged to be offset, for instance, relative to a longitudinal direction axis of discharge electrodes. As a result, the beam width of laser light injected through the OC of the amplification stage laser becomes wider as the beam shifts inside the ring resonator, in each round trip within the ring resonator. The energy density of laser light in the optical elements of the amplification stage laser becomes reduced thereby, thus prolonging the life of the optical elements.

摘要翻译： 一种用于曝光装置的窄带激光装置，其允许减少诸如室窗，输出耦合镜等的光学元件的损坏并因此延长其使用寿命。 在用于包括振荡级激光器和放大级激光器的曝光装置的窄带激光装置的放大级激光器中设置环形谐振器。 OC，高反射镜和高反射镜被布置为例如相对于放电电极的纵向轴线偏移。 结果，在环形谐振器内的每个往返行程中，通过放大级激光器的OC注入的激光的光束宽度随着光束在环形谐振器内移动而变宽。 放大级激光器的光学元件中的激光的能量密度降低，从而延长了光学元件的寿命。

公开(公告)号：US07756183B2

公开(公告)日：2010-07-13

申请号：US11453519

申请日：2006-06-15

申请人： Osamu Wakabayashi ,  Takahito Kumazaki

发明人： Osamu Wakabayashi ,  Takahito Kumazaki

IPC分类号： H01S3/09 ,  H01S3/10

CPC分类号： H01S3/08009 ,  H01S3/08031 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/137 ,  H01S3/225 ,  H01S3/2258 ,  H01S3/2308

摘要： The control of the spectral purity width E95 is performed while imparting practically no effect to the control of a central wavelength, and the spectral purity width E95 is stabilized. A wavefront adjuster 32 is provided on an output side of the interior of an optical resonator, i.e., on an output coupler 31 side. Light generated in a laser chamber 10 is transmitted through the wavefront adjuster 32 from the laser chamber 10 side, and reaches the output coupler 31. In the wavefront adjuster 32, the distance between concave and convex lenses 33 and 34 is adjusted so that a desired spectral purity width E95 can be obtained. Then, when the light passes through the wavefront adjuster 32, the wavefront of the light is adjusted to a desired wavefront.

摘要翻译： 光谱纯度宽度E95的控制在对中心波长的控制实际上没有影响的同时进行，光谱纯度宽度E95稳定。 波前调整器32设置在光谐振器的内部的输出侧，即在输出耦合器31侧。 在激光室10中产生的光从激光室10侧透射通过波前调整器32，并到达输出耦合器31.在波前调整器32中，调节凹凸透镜33和34之间的距离，使得期望的 可以得到光谱纯度宽度E95。 然后，当光通过波前调整器32时，光的波前被调整到期望的波前。

公开(公告)号：US07382816B2

公开(公告)日：2008-06-03

申请号：US10568091

申请日：2004-08-09

申请人： Tatsuya Ariga ,  Osamu Wakabayashi ,  Kouji Kakizaki

发明人： Tatsuya Ariga ,  Osamu Wakabayashi ,  Kouji Kakizaki

IPC分类号： H01S3/22 ,  H01S3/223

CPC分类号： G03F7/70041 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/10007 ,  H01S3/104 ,  H01S3/1301 ,  H01S3/134

摘要： A charging voltage Vosc applied to a main capacitor C0 disposed in an oscillating high-voltage pulse generator 12 of an oscillating laser 100 is subject to constant control such that a pulse energy Posc of the oscillating laser 100 becomes a lower limit energy Es0 or more of an amplification saturation region. And, a charging voltage Vamp applied to a main capacitor C0 disposed in an amplifying high-voltage pulse generator 32 of an amplifying laser 300 is controlled, and pulse energy Pamp of the amplifying laser 300 is determined as target energy Patgt. Thus, the pulse energy of a two-stage laser is controlled to stabilize the pulse energy.

摘要翻译： 施加到设置在振荡激光器100的振荡高电压脉冲发生器12中的主电容器C 0的充电电压Vosc受到恒定的控制，使得振荡激光器100的脉冲能量Posc成为下限能量Es 0或 更多的是放大饱和区域。 并且，控制施加到放大激光器300的放大高压脉冲发生器32中的主电容器C 0的充电电压Vamp，将放大激光器300的脉冲能量Pamp确定为目标能量Patgt。 因此，控制两级激光器的脉冲能量以稳定脉冲能量。

公开(公告)号：US06721344B2

公开(公告)日：2004-04-13

申请号：US10152822

申请日：2002-05-23

申请人： Kiyoharu Nakao ,  Osamu Wakabayashi

发明人： Kiyoharu Nakao ,  Osamu Wakabayashi

IPC分类号： H01S322

CPC分类号： H01S3/10092 ,  H01S3/0818 ,  H01S3/2366

摘要： An injection locking type or MOPA type of laser device capable of always obtaining stable output energy and wavelength is provided. For this purpose, the laser device includes an oscillator (11A) for oscillating seed laser light (21A) with wavelength band-narrowed by a band-narrowing unit (30), an amplifier (11B) for amplifying the seed laser light and emitting the amplified laser light (21B), a wavelength monitor (34A) for detecting at least a wavelength characteristic of the seed laser light, and a laser controller (29) for performing adjustment oscillation to contain a wavelength characteristic within a predetermined allowable range, at a time of startup or when laser oscillation is suspended for a predetermined period of time or more.

摘要翻译： 提供了能够始终获得稳定的输出能量和波长的注入锁定型或MOPA型激光装置。 为此，激光装置包括振荡器（11A），用于振荡由带宽变窄单元（30）带宽波长的种子激光（21A），放大器（11B），用于放大种子激光并发射 放大激光（21B），用于检测种子激光的至少波长特性的波长监视器（34A），以及激光控制器（29），用于执行调节振荡以将波长特性包含在预定允许范围内， 启动时间或当激光振荡暂停预定时间或更长时间时。

公开(公告)号：USRE38372E1

公开(公告)日：2003-12-30

申请号：US08833251

申请日：1997-04-04

申请人： Osamu Wakabayashi ,  Masahiko Kowaka ,  Yukio Kobayashi

发明人： Osamu Wakabayashi ,  Masahiko Kowaka ,  Yukio Kobayashi

IPC分类号： H01S313

CPC分类号： G03F7/70566 ,  G01J9/0246 ,  G03F7/70575 ,  G03F7/70583 ,  H01S3/0014 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/1394 ,  H01S3/225

摘要： A narrow band excimer laser and a wavelength detecting apparatus are suitable for use as a light source of a reduction projection aligner of a semiconductor device manufacturing apparatus. In the excimer laser, the ruling direction and the beam expanding direction of a prism beam expander are made substantially coincide with each other, and a polarizing element causing selective oscillation of a linearly polarized light wave substantially parallel with the beam spreading direction of a prism beam expander is contained in a laser cavity. A window at the front or rear side of a laser chamber is disposed such that the window make a Brewster's angle with respect to the axis of the laser beam in a plane containing the beam expanding direction of the prism expander and the laser beam axis. An anti-reflection film which selectively prevents reflection of a polarized light component substantially parallel to the direction of beam expanding of a prism beam expander is coated on one surface of a prism that constitutes the prism beam expander. The wavelength detecting apparatus is constructed to input a reference light and a light to be detected upon the etalon. The light transmitting through the etalon is condensed to focus on a light detector for detecting the wavelength of the laser beam based on interference fringe detected by the light detector.

公开(公告)号：US06560269B1

公开(公告)日：2003-05-06

申请号：US09625969

申请日：2000-07-26

申请人： Kiwamu Takehisa ,  Tatsuya Ariga ,  Osamu Wakabayashi

发明人： Kiwamu Takehisa ,  Tatsuya Ariga ,  Osamu Wakabayashi

IPC分类号： H01S308

CPC分类号： H01S3/08 ,  H01S3/08004 ,  H01S3/2258

摘要： Fluorine laser device capable of obtaining laser light with strong monochromatic property and large power is provided. For this purpose, the fluorine laser device is in a fluorine laser device including a laser chamber (2) in which a laser medium including fluorine is contained and is excited to thereby oscillate laser light (11), a front slit (116) disposed in front of said laser chamber (2) and having a front opening (33) for transmitting the laser light (11), and a rear slit (117) disposed behind said laser chamber (2) and having a rear opening (34) for transmitting the laser light (11), at least one of the front slit (116) and the rear slit (117) is a slit (16; 17) in which a slit inclined plane (35) is formed on a surface at a laser chamber side to make one of the front opening (33) and the rear opening (34) convex.

摘要翻译： 提供能够获得具有强的单色性能和大功率的激光的氟激光装置。 为此，氟激光器件在氟激光器件中，包括激光室（2），其中包含氟的激光介质被包含并激发以激发激光（11），前狭缝（116）设置在 所述激光室（2）的前部并具有用于透射激光（11）的前开口（33）和设置在所述激光室（2）后面的后狭缝（117），并且具有用于传输的后开口 激光（11），前狭缝（116）和后狭缝（117）中的至少一个是在激光室的表面上形成有狭缝倾斜面（35）的狭缝（16; 17） 使前开口（33）和后开口（34）中的一个凸起。

公开(公告)号：US06553042B2

公开(公告)日：2003-04-22

申请号：US09727510

申请日：2000-12-04

申请人： Koji Shio ,  Toru Suzuki ,  Osamu Wakabayashi

发明人： Koji Shio ,  Toru Suzuki ,  Osamu Wakabayashi

IPC分类号： H01S310

CPC分类号： H01S3/13 ,  H01S3/1305 ,  H01S3/131 ,  H01S3/137 ,  H01S3/139 ,  H01S3/2258

摘要： In a laser apparatus, a central wavelength of vacuum ultraviolet laser beams whose bandwidth is narrowed can be maintained at a target wavelength in high precision. This laser apparatus includes a laser oscillator for generating a vacuum ultraviolet laser beam whose bandwidth is narrowed and a reference beam having a spectral distribution of a vacuum ultraviolet band to output both the vacuum ultraviolet laser beam and the reference beam; a wavelength meter for measuring a central wavelength of the vacuum ultraviolet laser beam whose bandwidth is narrowed by using at least one emission light contained in the reference beam as a reference; and a controller for controlling the laser oscillator based upon the central wavelength of the vacuum ultraviolet laser beam whose bandwidth is narrowed, which is measured by the wavelength meter, so as to thereby adjust the central wavelength of the vacuum ultraviolet laser beam whose bandwidth is narrowed to a target wavelength. As a result, this laser apparatus can output the vacuum ultraviolet laser beams whose bandwidth is narrowed and whose central wavelength is maintained at the target wavelength in high precision.

摘要翻译： 在激光装置中，能够将带宽变窄的真空紫外线激光束的中心波长高精度地维持在目标波长。 该激光装置包括用于产生带宽变窄的真空紫外激光束的激光振荡器和具有真空紫外线带的光谱分布的参考光束，以输出真空紫外激光束和参考光束; 用于通过使用包含在参考光束中的至少一个发射光作为参考来测量其带宽变窄的真空紫外激光束的中心波长的波长计; 以及控制器，用于基于由波长计测量的带宽变窄的真空紫外激光束的中心波长来控制激光振荡器，从而调节带宽变窄的真空紫外激光束的中心波长 到目标波长。 结果，该激光装置可以高精度地输出带宽变窄，中心波长保持在目标波长的真空紫外激光束。