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公开(公告)号:US11881498B2
公开(公告)日:2024-01-23
申请号:US17356208
申请日:2021-06-23
申请人: Aeluma, Inc.
发明人: Jonathan Klamkin
IPC分类号: H01L27/146 , H01L31/109 , H01L31/0352 , H01L31/0304
CPC分类号: H01L27/14645 , H01L27/14621 , H01L31/03046 , H01L31/035218 , H01L31/109
摘要: Techniques for realizing compound semiconductor (CS) optoelectronic devices on silicon (Si) substrates are disclosed. The integration platform is based on heteroepitaxy of CS materials and device structures on Si by direct heteroepitaxy on planar Si substrates or by selective area heteroepitaxy on dielectric patterned Si substrates. Following deposition of the CS device structures, device fabrication steps can be carried out using Si complimentary metal-oxide semiconductor (CMOS) fabrication techniques to enable large-volume manufacturing. The integration platform can enable manufacturing of optoelectronic devices including photodetector arrays for image sensors and vertical cavity surface emitting laser arrays. Such devices can be used in various applications including light detection and ranging (LIDAR) systems for automotive and robotic vehicles as well as mobile devices such as smart phones and tablets, and for other perception applications such as industrial vision, artificial intelligence (AI), augmented reality (AR) and virtual reality (VR).
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公开(公告)号:US20220413156A1
公开(公告)日:2022-12-29
申请号:US17356261
申请日:2021-06-23
申请人: Aeluma, Inc.
发明人: Jonathan Klamkin
IPC分类号: G01S17/931 , G01S17/933 , G01S7/48 , H01S5/183
摘要: Techniques for realizing compound semiconductor (CS) optoelectronic devices on silicon (Si) substrates for vehicle applications are disclosed. The integration platform is based on heteroepitaxy of CS materials and device structures on Si by direct heteroepitaxy on planar Si substrates or by selective area heteroepitaxy on dielectric patterned Si substrates. Following deposition of the CS device structures, device fabrication steps can be carried out using Si complimentary metal-oxide semiconductor (CMOS) fabrication techniques to enable large-volume manufacturing. The integration platform can enable manufacturing of optoelectronic devices including photodetector arrays for image sensors and vertical cavity surface emitting laser arrays. Such devices can be used in various applications including light detection and ranging (LIDAR) systems for vehicle apparatuses such as automobiles, boats, airplanes, and drones, and for other perception applications such as industrial vision, artificial intelligence (AI), augmented reality (AR) and virtual reality (VR).
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公开(公告)号:US11881490B2
公开(公告)日:2024-01-23
申请号:US18052097
申请日:2022-11-02
申请人: Aeluma, Inc.
发明人: Jonathan Klamkin
IPC分类号: H01L27/146 , G01S7/481 , H01L31/0304 , H01L31/0352 , H01L31/107
CPC分类号: H01L27/1461 , G01S7/4813 , G01S7/4816 , H01L27/14621 , H01L27/14627 , H01L27/14634 , H01L27/14645 , H01L27/14689 , H01L27/14694 , H01L31/03042 , H01L31/03046 , H01L31/035218 , H01L31/1075
摘要: Techniques for realizing compound semiconductor (CS) optoelectronic devices on silicon (Si) substrates are disclosed. The integration platform is based on heteroepitaxy of CS materials and device structures on Si by direct heteroepitaxy on planar Si substrates or by selective area heteroepitaxy on dielectric patterned Si substrates. Following deposition of the CS device structures, device fabrication steps can be carried out using Si complimentary metal-oxide semiconductor (CMOS) fabrication techniques to enable large-volume manufacturing. The integration platform can enable manufacturing of optoelectronic module devices including photodetector arrays for image sensors and vertical cavity surface emitting laser arrays. Such module devices can be used in various applications including light detection and ranging (LIDAR) systems for automotive and robotic vehicles as well as mobile devices such as smart phones and tablets, and for other perception applications such as industrial vision, artificial intelligence (AI), augmented reality (AR) and virtual reality (VR).
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公开(公告)号:US20220415950A1
公开(公告)日:2022-12-29
申请号:US17739971
申请日:2022-05-09
申请人: Aeluma, Inc.
发明人: Jonathan KLAMKIN
IPC分类号: H01L27/146 , H01L31/105 , H01L31/107 , G01S7/481 , G01S17/89
摘要: Techniques for realizing compound semiconductor (CS) optoelectronic devices on silicon (Si) substrates for mobile applications are disclosed. The integration platform is based on heteroepitaxy of CS materials and device structures on Si by direct heteroepitaxy on planar Si substrates or by selective area heteroepitaxy on dielectric patterned Si substrates. Following deposition of the CS device structures, device fabrication steps can be carried out using Si complimentary metal-oxide semiconductor (CMOS) fabrication techniques to enable large-volume manufacturing. The integration platform can enable manufacturing of optoelectronic devices including photodetector arrays for image sensors and vertical cavity surface emitting laser arrays. Such devices can be used in various applications including light detection and ranging (LIDAR) systems for mobile devices such as smart phones and tablets, and for other perception applications such as industrial vision, artificial intelligence (AI), augmented reality (AR) and virtual reality (VR).
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公开(公告)号:US20240162270A1
公开(公告)日:2024-05-16
申请号:US18409639
申请日:2024-01-10
申请人: Aeluma, Inc.
发明人: Jonathan KLAMKIN
IPC分类号: H01L27/146 , H01L31/0304 , H01L31/0352 , H01L31/109
CPC分类号: H01L27/14645 , H01L27/14621 , H01L31/03046 , H01L31/035218 , H01L31/109
摘要: Techniques for realizing compound semiconductor (CS) optoelectronic devices on silicon (Si) substrates are disclosed. The integration platform is based on heteroepitaxy of CS materials and device structures on Si by direct heteroepitaxy on planar Si substrates or by selective area heteroepitaxy on dielectric patterned Si substrates. Following deposition of the CS device structures, device fabrication steps can be carried out using Si complimentary metal-oxide semiconductor (CMOS) fabrication techniques to enable large-volume manufacturing. The integration platform can enable manufacturing of optoelectronic devices including photodetector arrays for image sensors and vertical cavity surface emitting laser arrays. Such devices can be used in various applications including light detection and ranging (LIDAR) systems for automotive and robotic vehicles as well as mobile devices such as smart phones and tablets, and for other perception applications such as industrial vision, artificial intelligence (AI), augmented reality (AR) and virtual reality (VR).
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公开(公告)号:US20230121546A1
公开(公告)日:2023-04-20
申请号:US18052097
申请日:2022-11-02
申请人: Aeluma, Inc.
发明人: Jonathan KLAMKIN
IPC分类号: H01L27/146 , G01S7/481
摘要: Techniques for realizing compound semiconductor (CS) optoelectronic devices on silicon (Si) substrates are disclosed. The integration platform is based on heteroepitaxy of CS materials and device structures on Si by direct heteroepitaxy on planar Si substrates or by selective area heteroepitaxy on dielectric patterned Si substrates. Following deposition of the CS device structures, device fabrication steps can be carried out using Si complimentary metal-oxide semiconductor (CMOS) fabrication techniques to enable large-volume manufacturing. The integration platform can enable manufacturing of optoelectronic module devices including photodetector arrays for image sensors and vertical cavity surface emitting laser arrays. Such module devices can be used in various applications including light detection and ranging (LIDAR) systems for automotive and robotic vehicles as well as mobile devices such as smart phones and tablets, and for other perception applications such as industrial vision, artificial intelligence (AI), augmented reality (AR) and virtual reality (VR).
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公开(公告)号:US20230010538A1
公开(公告)日:2023-01-12
申请号:US17356282
申请日:2021-06-23
申请人: Aeluma, Inc.
发明人: Jonathan Klamkin
IPC分类号: H01L27/146 , G01S7/481
摘要: Techniques for realizing compound semiconductor (CS) optoelectronic devices on silicon (Si) substrates are disclosed. The integration platform is based on heteroepitaxy of CS materials and device structures on Si by direct heteroepitaxy on planar Si substrates or by selective area heteroepitaxy on dielectric patterned Si substrates. Following deposition of the CS device structures, device fabrication steps can be carried out using Si complimentary metal-oxide semiconductor (CMOS) fabrication techniques to enable large-volume manufacturing. The integration platform can enable manufacturing of optoelectronic module devices including photodetector arrays for image sensors and vertical cavity surface emitting laser arrays. Such module devices can be used in various applications including light detection and ranging (LIDAR) systems for automotive and robotic vehicles as well as mobile devices such as smart phones and tablets, and for other perception applications such as industrial vision, artificial intelligence (AI), augmented reality (AR) and virtual reality (VR).
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公开(公告)号:US12107108B2
公开(公告)日:2024-10-01
申请号:US17739971
申请日:2022-05-09
申请人: Aeluma, Inc.
发明人: Jonathan Klamkin
IPC分类号: H01L27/146 , G01S7/481 , G01S7/4863 , G01S17/42 , G01S17/88 , G01S17/89 , H01L23/00 , H01L31/0304 , H01L31/103 , H01L31/105 , H01L31/107 , H01L31/02 , H01L31/0216 , H01L31/0232
CPC分类号: H01L27/14632 , G01S7/4814 , G01S7/4816 , G01S7/4863 , G01S17/42 , G01S17/88 , G01S17/89 , H01L27/14694 , H01L31/0304 , H01L31/103 , H01L31/105 , H01L31/1075 , G01S7/4815 , H01L24/08 , H01L27/14607 , H01L27/14634 , H01L27/14636 , H01L27/14645 , H01L27/14687 , H01L31/02019 , H01L31/02161 , H01L31/02162 , H01L31/02327 , H01L2224/08145
摘要: Techniques for realizing compound semiconductor (CS) optoelectronic devices on silicon (Si) substrates for mobile applications are disclosed. The integration platform is based on heteroepitaxy of CS materials and device structures on Si by direct heteroepitaxy on planar Si substrates or by selective area heteroepitaxy on dielectric patterned Si substrates. Following deposition of the CS device structures, device fabrication steps can be carried out using Si complimentary metal-oxide semiconductor (CMOS) fabrication techniques to enable large-volume manufacturing. The integration platform can enable manufacturing of optoelectronic devices including photodetector arrays for image sensors and vertical cavity surface emitting laser arrays. Such devices can be used in various applications including light detection and ranging (LIDAR) systems for mobile devices such as smart phones and tablets, and for other perception applications such as industrial vision, artificial intelligence (AI), augmented reality (AR) and virtual reality (VR).
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公开(公告)号:US20240162255A1
公开(公告)日:2024-05-16
申请号:US18408811
申请日:2024-01-10
申请人: Aeluma, Inc.
发明人: Jonathan KLAMKIN
IPC分类号: H01L27/146 , G01S7/481
CPC分类号: H01L27/1461 , G01S7/4813 , G01S7/4816 , H01L27/14621 , H01L27/14627 , H01L27/14634 , H01L27/14645 , H01L27/14689 , H01L27/14694 , H01L31/03042
摘要: Techniques for realizing compound semiconductor (CS) optoelectronic devices on silicon (Si) substrates are disclosed. The integration platform is based on heteroepitaxy of CS materials and device structures on Si by direct heteroepitaxy on planar Si substrates or by selective area heteroepitaxy on dielectric patterned Si substrates. Following deposition of the CS device structures, device fabrication steps can be carried out using Si complimentary metal-oxide semiconductor (CMOS) fabrication techniques to enable large-volume manufacturing. The integration platform can enable manufacturing of optoelectronic module devices including photodetector arrays for image sensors and vertical cavity surface emitting laser arrays. Such module devices can be used in various applications including light detection and ranging (LIDAR) systems for automotive and robotic vehicles as well as mobile devices such as smart phones and tablets, and for other perception applications such as industrial vision, artificial intelligence (AI), augmented reality (AR) and virtual reality (VR).
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公开(公告)号:US20220415955A1
公开(公告)日:2022-12-29
申请号:US17356208
申请日:2021-06-23
申请人: Aeluma, Inc.
发明人: Jonathan Klamkin
IPC分类号: H01L27/146 , H01L31/109 , H01L31/0304 , H01L31/0352
摘要: Techniques for realizing compound semiconductor (CS) optoelectronic devices on silicon (Si) substrates are disclosed. The integration platform is based on heteroepitaxy of CS materials and device structures on Si by direct heteroepitaxy on planar Si substrates or by selective area heteroepitaxy on dielectric patterned Si substrates. Following deposition of the CS device structures, device fabrication steps can be carried out using Si complimentary metal-oxide semiconductor (CMOS) fabrication techniques to enable large-volume manufacturing. The integration platform can enable manufacturing of optoelectronic devices including photodetector arrays for image sensors and vertical cavity surface emitting laser arrays. Such devices can be used in various applications including light detection and ranging (LIDAR) systems for automotive and robotic vehicles as well as mobile devices such as smart phones and tablets, and for other perception applications such as industrial vision, artificial intelligence (AI), augmented reality (AR) and virtual reality (VR).
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