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公开(公告)号:US20070252240A1
公开(公告)日:2007-11-01
申请号:US11596720
申请日:2005-05-18
申请人: Soren Andresen , Andrew Dzurak , Eric Gauja , Sean Hearne , Toby Hopf , David Jamieson , Mladen Mitic , Steven Prawer , Changyi Yang
发明人: Soren Andresen , Andrew Dzurak , Eric Gauja , Sean Hearne , Toby Hopf , David Jamieson , Mladen Mitic , Steven Prawer , Changyi Yang
IPC分类号: H01L29/00 , H01L21/265
CPC分类号: H01L21/26513 , H01L21/26566 , H01L21/2658 , H01L21/28114 , H01L29/42376 , H01L29/4238 , H01L29/66537 , H01L29/66583 , H01L29/7833 , H01L29/785
摘要: This invention concerns semiconductor devices of the general type comprising a counted number of dopant atoms (142) implanted in regions of a substrate (158) that are substantially intrinsic semiconductor. One or more doped surface regions (152) of the substrate (158) are metallised to form electrodes (150) and a counted number of dopant ions (142) are implanted in a region of the substantially intrinsic semiconductor.
摘要翻译: 本发明涉及一般类型的半导体器件,其包括注入在基本上是本征半导体的衬底(158)的区域中的数量的掺杂剂原子(142)。 衬底(158)的一个或多个掺杂表面区域(152)被金属化以形成电极(150),并且将计数的掺杂剂离子(142)注入基本上本征半导体的区域中。
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公开(公告)号:US07547648B2
公开(公告)日:2009-06-16
申请号:US10568559
申请日:2004-08-20
申请人: Frank J. Ruess , Lars Oberbeck , Michelle Yvonne Simmons , K. E. Johnson Goh , Alexander Rudolf Hamilton , Mladen Mitic , Rolf Brenner , Neil Jonathan Curson , Toby Hallam
发明人: Frank J. Ruess , Lars Oberbeck , Michelle Yvonne Simmons , K. E. Johnson Goh , Alexander Rudolf Hamilton , Mladen Mitic , Rolf Brenner , Neil Jonathan Curson , Toby Hallam
IPC分类号: H01L21/00
CPC分类号: H01L23/544 , B82Y10/00 , B82Y30/00 , G01Q80/00 , H01L29/66439 , H01L2223/54426 , H01L2223/54453 , H01L2924/0002 , Y10S438/975 , H01L2924/00
摘要: This invention concerns the fabrication of nanoscale and atomic scale devices. The method involves creating one or more registration markers. Using a SEM or optical microscope to form an image of the registration markers and the tip of a scanning tunnelling microscope (STM). Using the image to position and reposition the STM tip to pattern the device structure. Forming the active region of the device and then encapsulating it such that one or more of the registration markers are still visible to allow correct positioning of surface electrodes. The method can be used to form any number of device structures including quantum wires, single electron transistors, arrays or gate regions. The method can also be used to produce 3D devices by patterning subsequent layers with the STM and encapsulating in between.
摘要翻译: 本发明涉及纳米尺度和原子尺度装置的制造。 该方法涉及创建一个或多个注册标记。 使用SEM或光学显微镜形成对准标记和扫描隧道显微镜(STM)的尖端的图像。 使用图像定位和重新定位STM尖端以对设备结构进行图案化。 形成器件的有源区,然后封装,使得一个或多个配准标记物仍然可见,以允许表面电极的正确定位。 该方法可用于形成任何数量的器件结构,包括量子线,单电子晶体管,阵列或栅极区。 该方法还可以用于通过用STM构图后续层并封装在其间来产生3D器件。
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3.
公开(公告)号:US07097708B2
公开(公告)日:2006-08-29
申请号:US10484759
申请日:2002-08-20
申请人: Robert Graham Clark , Neil Jonathan Curson , Toby Hallam , Lars Oberbeck , Steven Richard Schofield , Michelle Yvonne Simmons
发明人: Robert Graham Clark , Neil Jonathan Curson , Toby Hallam , Lars Oberbeck , Steven Richard Schofield , Michelle Yvonne Simmons
IPC分类号: C30B25/12
CPC分类号: G06N99/002 , B82Y10/00 , B82Y30/00 , H01L21/18
摘要: This invention concerns nanoscale products, such as electronic devices fabricated to nanometer accuracy. It also concerns atomic scale products. These products may have an array of electrically active dopant atoms in a silicon surface, or an encapsulated layer of electrically active donor atoms. In a further aspect the invention concerns a method of fabricating such products. The methods include forming a preselected array of donor atoms incorporated into silicon. Encapsulation by growing silicon over a doped surface, after desorbing the passivating hydrogen. Also, using an STM to view donor atoms on the silicon surface during fabrication of a nanoscale device, and measuring the electrical activity of the donor atoms during fabrication of a nanoscale device. Such products and processes are useful in the fabrication of a quantum computer, but could have many other uses.
摘要翻译: 本发明涉及纳米级产品,例如以纳米精度制造的电子器件。 它也涉及原子级产品。 这些产品可以在硅表面或电活性供体原子的封装层中具有阵列的电活性掺杂剂原子。 在另一方面,本发明涉及一种制造这种产品的方法。 所述方法包括形成掺入硅中的供体原子的预选阵列。 在解吸钝化氢后,通过在掺杂表面上生长硅来封装。 此外,在制造纳米级器件期间使用STM来观察硅表面上的供体原子,并且在制造纳米尺度器件期间测量施主原子的电活性。 这样的产品和方法在量子计算机的制造中是有用的,但是可以具有许多其它用途。
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公开(公告)号:US20090309229A1
公开(公告)日:2009-12-17
申请号:US12157757
申请日:2008-06-13
CPC分类号: H01L29/7613 , B82Y10/00 , H01L29/122 , H01L2924/0002 , Y10S977/774 , H01L2924/00
摘要: A silicon integrated circuit device comprising a near intrinsic silicon substrate in which there are one or more ohmic contact regions. An insulating layer lies above the substrate, and on top of the insulating layer is a lower layer of one or more aluminium gates. The surface of each of the lower gates is oxidised to insulate them from an upper aluminium gate that extends over the lower gates.
摘要翻译: 一种硅集成电路器件,包括其中存在一个或多个欧姆接触区域的近本征硅衬底。 绝缘层位于衬底上方,绝缘层顶部是一个或多个铝门的下层。 每个下门的表面被氧化以将它们与在下门上延伸的上铝门绝缘。
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公开(公告)号:US07061008B2
公开(公告)日:2006-06-13
申请号:US10362821
申请日:2001-08-24
申请人: Robert Graham Clark , Andrew Steven Dzurak , Steven Richard Schofield , Michelle Yvonne Simmons , Jeremy Lloyd O'Brien
发明人: Robert Graham Clark , Andrew Steven Dzurak , Steven Richard Schofield , Michelle Yvonne Simmons , Jeremy Lloyd O'Brien
IPC分类号: H01L29/06 , H01L31/0328 , H01L31/0336 , H01L31/072 , H01L31/109
CPC分类号: G06N99/002 , G01Q80/00 , H01L21/306
摘要: Individual hydrogen atoms are desorbed from a hydrogen terminated layer on a silicon substrate, using an STM tip, to form a pattern of exposed regions. A single donor-bearing molecule (such as phosphorous atoms). The spins of the donor atoms may be used as qubits in a slid quantum computer.
摘要翻译: 使用STM尖端,将单个氢原子从硅衬底上的氢终止层解吸,形成暴露区域的图案。 单个供体分子(如磷原子)。 供体原子的自旋可以用作滑动量子计算机中的量子位。
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公开(公告)号:US07002166B2
公开(公告)日:2006-02-21
申请号:US10484647
申请日:2002-08-27
申请人: David Norman Jamieson , Steven Prawer , Andrew Steven Dzurak , Robert Graham Clark , Changyi Yang
发明人: David Norman Jamieson , Steven Prawer , Andrew Steven Dzurak , Robert Graham Clark , Changyi Yang
IPC分类号: H01L21/265 , H01L31/115 , H01J37/304 , G06N1/00 , G01T1/00
CPC分类号: H01J37/08 , B82Y10/00 , B82Y40/00 , G06N99/002 , H01J37/20 , H01J37/244 , H01J37/3171 , H01J37/3174 , H01J2237/08 , H01J2237/20228 , H01J2237/20292 , H01J2237/31703 , H01J2237/31711 , H01J2237/31713 , H01J2237/31755 , H01J2237/31788 , H01L21/265 , H01L21/26513
摘要: This invention concerns a method and system for single ion doping and machining by detecting the impact, penetration and stopping of single ions in a substrate. Such detection is essential for the successful implantation of a counted number of 31P ions into a semi-conductor substrate for construction of a Kane quantum computer. The invention particularly concerns the application of a potential across two electrodes on the surface of the substrate to create a field to separate and sweep out electron-hole pairs formed within the substrate. A detector is then used to detecting transient current in the electrodes, and so determine the arrival of a single ion in the substrate.
摘要翻译: 本发明涉及通过检测衬底中单一离子的冲击,穿透和停止来进行单离子掺杂和机械加工的方法和系统。 这种检测对于将数量为“31”的P离子成功地注入到用于构建Kane量子计算机的半导体衬底中是必不可少的。 本发明特别涉及在衬底的表面上跨两个电极施加电位以产生分离和扫除在衬底内形成的电子 - 空穴对的场。 然后使用检测器来检测电极中的瞬态电流,并且因此确定单个离子到达衬底中。
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公开(公告)号:US07755078B2
公开(公告)日:2010-07-13
申请号:US12157757
申请日:2008-06-13
IPC分类号: H01L31/00
CPC分类号: H01L29/7613 , B82Y10/00 , H01L29/122 , H01L2924/0002 , Y10S977/774 , H01L2924/00
摘要: A silicon integrated circuit device comprising a near intrinsic silicon substrate in which there are one or more ohmic contact regions. An insulating layer lies above the substrate, and on top of the insulating layer is a lower layer of one or more aluminium gates. The surface of each of the lower gates is oxidised to insulate them from an upper aluminium gate that extends over the lower gates.
摘要翻译: 一种硅集成电路器件,包括其中存在一个或多个欧姆接触区域的近本征硅衬底。 绝缘层位于衬底上方,绝缘层顶部是一个或多个铝门的下层。 每个下门的表面被氧化以将它们与在下门上延伸的上铝门绝缘。
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公开(公告)号:US07719736B2
公开(公告)日:2010-05-18
申请号:US10577799
申请日:2004-10-27
CPC分类号: G06N99/002 , B82Y10/00 , H04L9/0858 , H04L2209/805
摘要: In the field of optical quantum information processing, manipulation of single photon qubits in frequency modes employs a frequency beamsplitter employs an asymmetric two-path interferometer, reversible down to the quantum limit. A first partially transmitting mirror splits photons into first and second paths. A time delay element introduces a differential time delay into the second path. And a second partially transmitting mirror mixes the two paths again to form two outputs. A half-wave plate utilizes two of the beam splitters.
摘要翻译: 在光量子信息处理领域中,频率模式中单光子量子位的操纵采用频率分束器,采用非对称双路干涉仪,可逆向量子极限。 第一部分透射镜将光子分解成第一和第二路径。 时间延迟元件将差分时间延迟引入第二路径。 并且第二部分透射镜再次混合两个路径以形成两个输出。 半波片使用两个分束器。
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9.
公开(公告)号:US07479652B2
公开(公告)日:2009-01-20
申请号:US10567990
申请日:2004-08-10
申请人: Andrew D. Greentree , Alexander Rudolf Hamilton , Frederick Green , Lloyd Christopher Leonard Hollenberg
发明人: Andrew D. Greentree , Alexander Rudolf Hamilton , Frederick Green , Lloyd Christopher Leonard Hollenberg
IPC分类号: H01L29/06
CPC分类号: G06N99/002 , B82Y10/00
摘要: This invention concerns quantum computers in which the qubits are closed systems, in that the particle or particles are confined within the structure. A “site” can be produced by any method of confining an electron or other quantum particle, such as a dopant atom, a quantum dot, a cooper pair box, or any combination of these. In particular the invention concerns a closed three-site quantum particle system. The state in the third site is weakly coupled by coherent tunneling to the first and second states, so that the third state is able to map out the populations of the first and second states as its energy is scanned with respect to the first and second states. In second and third aspects it concerns a readout method for a closed three-state quantum particle system.
摘要翻译: 本发明涉及其中量子位是封闭系统的量子计算机,其中颗粒或颗粒被限制在结构内。 可以通过限制电子或其他量子粒子,例如掺杂剂原子,量子点,铜对盒或这些的任何组合的任何方法来产生“位点”。 特别地,本发明涉及封闭的三位置量子粒子系统。 第三站点中的状态通过相干隧道到第一和第二状态而弱耦合,使得第三状态能够映射第一和第二状态的群体,因为其能量相对于第一和第二状态被扫描 。 在第二和第三方面,它涉及封闭的三态量子粒子系统的读出方法。
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公开(公告)号:US08580674B2
公开(公告)日:2013-11-12
申请号:US12866324
申请日:2008-12-09
申请人: Michelle Yvonne Simmons , Andreas Fuhrer , Martin Fuechsle , Bent Weber , Thilo Curd Gerhard Reusch , Wilson Pok , Frank Ruess
发明人: Michelle Yvonne Simmons , Andreas Fuhrer , Martin Fuechsle , Bent Weber , Thilo Curd Gerhard Reusch , Wilson Pok , Frank Ruess
IPC分类号: H01L21/4763
CPC分类号: H01L23/544 , B82B3/0019 , B82Y10/00 , H01L29/66439 , H01L2924/0002 , H01L2924/00
摘要: This invention concerns the fabrication of nano to atomic scale devices, that is electronic devices fabricated down to atomic accuracy. The fabrication process uses either an SEM or a STM tip to pattern regions on a semiconductor substrate. Then, forming electrically active parts of the device at those regions. Encapsulating the formed device. Using a SEM or optical microscope to align locations for electrically conducting elements on the surface of the encapsulating semiconductor with respective active parts of the device encapsulated below the surface. Forming electrically conducting elements on the surface at the aligned locations. And, electrically connecting electrically conducting elements on the surface with aligned parts of the device encapsulated below the surface to allow electrical connectivity and tunability of the device. In further aspects the invention concerns the devices themselves.
摘要翻译: 本发明涉及纳米到原子尺度装置的制造,即以原子精度制造的电子装置。 制造工艺使用SEM或STM尖端来对半导体衬底上的区域进行图案化。 然后,在那些区域形成器件的电活性部分。 封装形成的装置。 使用SEM或光学显微镜将包封半导体表面上的导电元件的位置与封装在表面下方的器件的相应有效部分对准。 在对准位置的表面上形成导电元件。 并且,将表面上的导电元件电连接到封装在表面下方的器件的对准部分,以允许器件的电连接和可调谐性。 在另外的方面,本发明涉及装置本身。
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