公开(公告)号：US5633747A

公开(公告)日：1997-05-27

申请号：US361135

申请日：1994-12-21

申请人： Mehrdad Nikoonahad

发明人： Mehrdad Nikoonahad

IPC分类号： G01B11/30 ,  G01N21/956 ,  G02B26/10 ,  G02F1/11 ,  G03F7/20 ,  H01L21/66 ,  G02F1/33

CPC分类号： G03F7/70641 ,  G01N21/95623 ,  G02F1/113

摘要： An apparatus for both deflecting a beam of light illuminating a spot on a surface and varying the size of the spot, electronically, without changing any system components. The apparatus includes an acousto-optic deflector driven with a linear FM signal produced by a chirp signal generator. The linear FM signal is characterized with a dispersion rate, and the chirp signal generator includes a chirp dispersion selector to vary the dispersion rate. A beam of collimated light passes through the acousto-optic deflector and appropriate focusing optics image the beam onto a spot in a nominal focal plane. The chirp dispersion selector sets the dispersion rate in accord to a nominal rate, resulting in the beam illuminating a spot in the focal plane. Generally, the focal plane coincides with a wafer surface, of the type having periodic and non-periodic features on it. The spot size may be varied from that of a diffraction limited spot to a spot whose maximum size is system dependent. The spot size varies as a result of changing the dispersion rate of the chirp signal. The spot size may vary as it is scanned, or may remain fixed during the inspection of a wafer. In this manner, inspection by periodic feature comparison may be implemented when it proves advantageous. Alternatively, a larger spot may be obtained when periodic feature comparison would provide no benefit, and spatial filtering would achieve an enhanced signal/background.

摘要翻译： 一种用于在不改变任何系统部件的情况下电子地偏转照射光斑的光束并且改变光斑的尺寸的装置。 该装置包括由线性调频信号发生器产生的线性FM信号驱动的声光偏转器。 线性FM信号的特征在于色散速率，并且啁啾信号发生器包括用于改变色散速率的啁啾色散选择器。 准直光束通过声光偏转器并且适当的聚焦光学器件将光束成像到标称焦平面上的光斑上。 啁啾色散选择器将色散速率设置为符合标称速率，导致光束照射焦平面中的光点。 通常，焦平面与其上具有周期性和非周期特征的晶片表面重合。 斑点尺寸可以从衍射限制斑点的尺寸变化到最大尺寸是系统依赖的斑点。 斑点尺寸由于改变啁啾信号的色散速率而变化。 斑点尺寸可能随扫描而变化，或者在晶片检查期间可能保持固定。 以这种方式，当证明有利时，可以实施周期性特征比较的检查。 或者，当周期性特征比较不提供任何益处时，可以获得更大的斑点，并且空间滤波将实现增强的信号/背景。

公开(公告)号：US5608526A

公开(公告)日：1997-03-04

申请号：US375353

申请日：1995-01-19

申请人： Timothy R. Piwonka-Corle ,  Karen F. Scoffone ,  Xing Chen ,  Lloyd J. Lacomb, Jr. ,  Jean-Louis Stehle ,  Dorian Zahorski ,  Jean-Pierre Rey

发明人： Timothy R. Piwonka-Corle ,  Karen F. Scoffone ,  Xing Chen ,  Lloyd J. Lacomb, Jr. ,  Jean-Louis Stehle ,  Dorian Zahorski ,  Jean-Pierre Rey

IPC分类号： G01N21/21

CPC分类号： G01N21/211 ,  G01N2021/213

摘要： A method and system for spectroscopic ellipsometry employing reflective optics to measure a small region of a sample by reflecting radiation (preferably broadband UV, visible, and near infrared radiation) from the region. The system preferably has an autofocus assembly and a processor programmed to determine from the measurements the thickness and/or complex refractive index of a thin film on the sample. Preferably, only reflective optics are employed along the optical path between the polarizer and analyzer, a sample beam reflects with low incidence angle from each component of the reflective optics, the beam is reflectively focused to a small, compact spot on the sample at a range of high incidence angles, and an incidence angle selection element is provided for selecting for measurement only radiation reflected from the sample at a single, selected angle (or narrow range of angles). The focusing mirror preferably has an elliptical shape,to reduce off-axis aberrations in the focused beam. Some embodiments include both a spectrophotometer and an ellipsometer integrated together as a single instrument. In such instrument, the spectrophotometer and ellipsometer share a radiation source, and radiation from the source can be focused by either the spectrophotometer or the ellipsometer to the same focal point on a sample. Preferred embodiments of the ellipsometer employ a rotating, minimal-length Rochon prism as a polarizer, and include a spectrometer with an intensified photodiode array to measure reflected radiation from the sample, and a reference channel (in addition to a sample channel which detects radiation reflected from the sample).

摘要翻译： 使用反射光学器件的光谱椭偏仪的方法和系统通过从该区域反射辐射（优选宽带UV，可见光和近红外辐射）来测量样品的小区域。 该系统优选地具有自动对焦组件和被编程用于根据测量结果确定样品上薄膜的厚度和/或复合折射率的处理器。 优选地，沿着偏振器和分析器之间的光路仅采用反射光学元件，样品光束以反射光学器件的每个分量以低入射角反射，光束被反射聚焦到样品上的小的紧密斑点 并且提供入射角选择元件用于仅选择仅以单个选定角度（或窄范围的角度）从样品反射的辐射。 聚焦镜优选具有椭圆形状，以减少聚焦光束中的离轴像差。 一些实施例包括作为单个仪器集成在一起的分光光度计和椭偏仪。 在这种仪器中，分光光度计和椭偏仪共享一个辐射源，来自源的辐射可以通过分光光度计或椭偏仪聚焦到样品上的同一焦点。 椭偏仪的优选实施例采用旋转的，最小长度的Rochon棱镜作为偏振器，并且包括具有增强的光电二极管阵列的光谱仪，以测量来自样品的反射辐射，以及参考通道（除了检测辐射的样品通道 从样品）。

公开(公告)号：US5276498A

公开(公告)日：1994-01-04

申请号：US882047

申请日：1992-05-12

申请人： Lee K. Galbraith ,  John L. Vaught ,  Ralph C. Wolf ,  Brian Leslie ,  Armand P. Neukermans

发明人： Lee K. Galbraith ,  John L. Vaught ,  Ralph C. Wolf ,  Brian Leslie ,  Armand P. Neukermans

IPC分类号： H01L21/66 ,  G01N21/956 ,  G02B27/46 ,  G02F1/1343 ,  G01N21/00

CPC分类号： G02F1/134309 ,  G01N21/95623 ,  G02B27/46 ,  G01N2201/067

摘要： An inspection apparatus for a light diffracting surface employs a planar array of individually addressable light valves for use as a spatial filter in an imaged Fourier plane of a diffraction pattern, with valves having a stripe geometry corresponding to positions of members of the diffraction pattern, blocking light from those members. The remaining valve stripes, i.e. those not blocking light from diffraction order members, are open for transmission of light. Light directed onto the surface, such as a semiconductor wafer, forms elongated curved diffraction orders from repetitive patterns of circuit features. The curved diffraction orders are transformed to linear orders by a Fourier transform lens. The linear diffraction orders from repetitive patterns of circuit features are blocked, while light from non-repetitive features, such as dirt particles or defects is allowed to pass through the light valves to a detector. Patterns of stripes can be recorded corresponding to the repetitive features of different integrated circuits. Different filters may be rapidly switched electronically in synchronization with a beam scanning a patterned surface inspecting different light diffracting patterns in different positions, allowing scattered or diffracted light from non-repetitive features to pass through the filter to a detector. A logical AND combination of two filters may be used so that two regions may be inspected in a single scan of the beam.

摘要翻译： 用于光衍射表面的检查装置采用独立寻址光阀的平面阵列，用作衍射图案的成像傅立叶平面中的空间滤光器，其中具有对应于衍射图案的部件的位置的条形几何形状的阀 来自这些成员的光。 剩余的阀条，即不阻挡来自衍射级构件的光的那些条纹是透光的。 指向表面的光，例如半导体晶片，从电路特征的重复图案形成细长的弯曲衍射级。 通过傅里叶变换透镜将弯曲的衍射级变换成线性阶数。 来自电路特征的重复图案的线性衍射顺序被阻止，而来自非重复特征的光（例如污物颗粒或缺陷）允许通过光阀到达检测器。 可以根据不同集成电路的重复特征对条纹进行记录。 不同的滤波器可以与扫描图案化表面的光束同步地电子快速地切换，以在不同位置检查不同的光衍射图案，允许来自非重复特征的散射或衍射光通过滤光器到检测器。 可以使用两个滤波器的逻辑AND组合，使得可以在波束的单次扫描中检查两个区域。

公开(公告)号：US5264912A

公开(公告)日：1993-11-23

申请号：US832379

申请日：1992-02-07

申请人： John L. Vaught ,  Michael E. Fein ,  Armand P. Neukermans

发明人： John L. Vaught ,  Michael E. Fein ,  Armand P. Neukermans

IPC分类号： H01L21/66 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  G02B27/46 ,  G01N21/88

CPC分类号： G01N21/94 ,  G01N21/95623 ,  G02B27/46 ,  G01N21/9501

摘要： An apparatus used to inspect patterned wafers and other substrates with periodic features for the presence of particles, defects and other aperiodic features in which a spatial filter placed in the Fourier plane is used in combination with either broadband illumination, angularly diverse illumination or both. In contrast to prior devices that direct light from a single monochromatic source through a pinhole aperture stop, embodiments are describes that illuminate a patterned substrate using (1) a single monochromatic source with a slit-shaped aperture stop for angularly diverse illumination, (2) a single broadband source with a pinhole aperture stop for broadband illumination, (3) a single broadband source with a slit-shaped aperture stop for both broadband and angularly diverse illumination, or (4) multiple sources with an aperture stop for each source for at least angularly diverse illumination. The spatial filters for these illumination systems are characterized by opaque tracks in an otherwise transmissive filter for blocking the elongated bands produced by diffraction from the periodic features on the illuminates substrate. The filter may be made photographically by exposing high contrast film placed in or near the Fourier plane to the diffracted light from a defect and particle frame substrate having only periodic features. Light scattered from the aperiodic features is able to substantially pass through the filter and be imaged onto, a CCD array, vidicon camera or TDI sensor.

摘要翻译： 用于检查具有周期性特征的图案化晶片和其它基板用于存在颗粒，缺陷和其他非周期性特征的装置，其中放置在傅立叶平面中的空间滤波器与宽带照明，角度不同的照明或两者结合使用。 与通过针孔孔径光阑引导来自单个单色源的光的现有装置相比，描述了使用（1）具有狭缝形孔径光阑的单个单色光源来照射图案化的衬底，用于角度不同的照明，（2） 单宽带光源，具有用于宽带照明的针孔孔径光阑，（3）单宽带光源，具有狭缝形孔径光阑，适用于宽带和角度不同的照明，或（4）多个源，每个光源的孔径光阑在 最小角度多样的照明。 用于这些照明系统的空间滤波器的特征在于在另外透射的滤光器中的不透明光道，用于阻挡由照明基板上的周期特征衍射产生的细长带。 可以通过将放置在傅立叶平面中或其附近的高对比度胶片与来自仅具有周期特征的缺陷和颗粒框架基板的衍射光曝光来进行过滤。 从非周期特征散射的光能够基本上通过滤光片并被成像到CCD阵列，摄像机或TDI传感器上。

公开(公告)号：US5026437A

公开(公告)日：1991-06-25

申请号：US467976

申请日：1990-01-22

申请人： Armand P. Neukermans ,  Josef Berger

发明人： Armand P. Neukermans ,  Josef Berger

IPC分类号： H01J37/28 ,  G01B7/34 ,  G01N37/00 ,  G01Q60/00 ,  G01Q70/06 ,  G01Q70/10 ,  G01Q70/14 ,  G01Q70/16 ,  H01L21/266 ,  H01L21/306 ,  H01L21/66

CPC分类号： G01Q70/16 ,  B82Y35/00 ,  G01Q70/10 ,  G01Q70/14 ,  H01L21/30604 ,  H01L21/30608 ,  Y10S438/924

摘要： A method for fabricating a microtip, cantilevered from a base and having a controllably high aspect ratio, for use in microprobe microscopy to probe variations in materials at the atomic level. A two-layer semiconductor material structure is provided, one layer being n type and the other layer being p type. A thin pencil of ions of n type is implanted through the n type layer into the p type layer, through a small aperture in a mask layer that overlies the n type layer. The p type material is then etched away, leaving the n type ion profile and the n type layer as a cantilevered microtip. The n type semiconductor layer may be replaced by a layer of any material that resists etching by the selected etchant.

摘要翻译： 用于制造从底部悬臂并具有可控高的纵横比的微尖端的方法，用于微探针显微镜以探测原子水平的材料变化。 提供两层半导体材料结构，一层为n型，另一层为p型。 n型的一小笔离子通过n型层通过覆盖n型层的掩模层中的小孔注入p型层。 然后将p型材料蚀刻掉，留下n型离子轮廓和n型层作为悬臂微尖端。 n型半导体层可以被抵抗所选蚀刻剂的蚀刻的任何材料的层所代替。

公开(公告)号：US4965484A

公开(公告)日：1990-10-23

申请号：US322080

申请日：1989-03-10

申请人： Michael E. Fein

发明人： Michael E. Fein

IPC分类号： H01J61/52

CPC分类号： H01J61/52

摘要： An end-viewed vapor discharge lamp having a differential temperature control structure that removes heat more effectively from a base end of the lamp than from the light emitting output end of the lamp. The lamp envelope which contains an excitable vapor, such as mercury, includes a small bore capillary tube with a window at one end. A large bore extension contiguous with the capillary tube and a parallel second tube contain electrodes for providing a discharge in the capillary tube. A thermally conductive shell surrounds and is spaced apart from sides of the envelope and is partly filled with a thermally conductive material around the base end of the envelope. The output end around the capillary tube is free of this material. Heat conduction is better at the base end so that the capillary tube runs hotter, inhibiting condensation of vapor and giving a stable light output. An optional heater pad may be provided around the shell for maintaining an optimal temperature for maximum light output.

摘要翻译： 一种具有比从灯的发光输出端更高效地从灯的基端去除热量的差分温度控制结构的端视图的蒸气放电灯。 包含诸如汞的可激发蒸汽的灯管包括在一端具有窗口的小孔毛细管。 与毛细管相邻的大孔延伸和平行的第二管包含用于在毛细管中提供放电的电极。 导热壳围绕并且与封套的侧面间隔开，并且部分地填充有围绕着封套基端的导热材料。 毛细管周围的输出端没有这种材料。 热传导在基端更好，使毛细管运行更热，抑制蒸气冷凝并给出稳定的光输出。 可以在壳体周围设置可选的加热器垫，以保持用于最大光输出的最佳温度。

公开(公告)号：US4899055A

公开(公告)日：1990-02-06

申请号：US193902

申请日：1988-05-12

申请人： Arnold Adams

发明人： Arnold Adams

IPC分类号： G01B11/06

CPC分类号： G01B11/0633

摘要： A method of measuring thin film thickness, especially on semiconductor substrates, in which the substrate is illuminated with ultraviolet light of a fixed wavelength corresponding to a persistent spectral line and the amount of light reflected from the substrate is detected and measured. The ultraviolet light preferably has a wavelength in the range from 240 nm to 300 nm, and the 253.6 nm spectral line of mercury is considered best. Comparing the measured amount of light from the substrate to a known amount of light detected from a standard calibration substrate with known reflectivity, the reflectivity of the test substrate is computed. The thickness of a thin film on the substrate is determined from the computed reflectivity using Fresnel's equation or a lookup table derived from the same.

摘要翻译： 一种测量薄膜厚度的方法，特别是在半导体衬底上，其中用与持久光谱线对应的固定波长的紫外光照射衬底并检测并测量从衬底反射的光量。 紫外线的波长优选为240nm〜300nm，253.6nm的汞线被认为是最佳的。 将来自基板的测量光量与从具有已知反射率的标准校准基板检测到的已知量的光进行比较，计算测试基板的反射率。 使用菲涅耳方程或从其导出的查找表，根据计算出的反射率确定衬底上薄膜的厚度。

公开(公告)号：US4898471A

公开(公告)日：1990-02-06

申请号：US248309

申请日：1988-09-19

申请人： John L. Vaught ,  Armand P. Neukermans ,  Herman F. Keldermann ,  Franklin R. Koenig

发明人： John L. Vaught ,  Armand P. Neukermans ,  Herman F. Keldermann ,  Franklin R. Koenig

IPC分类号： G01N21/94 ,  G01N21/956

CPC分类号： G01N21/94 ,  G01N2021/95615 ,  G01N2021/95676 ,  G01N21/95607 ,  G01N2201/112

摘要： A particle detection on a periodic patterned surface is achieved in a method and apparatus using a single light beam scanning at a shallow angle over the surface. The surface contains a plurality of identical die with streets between die. The beam scans parallel to a street direction, while a light collection system collects light scattered from the surface with a constant solid angle. The position of the collection system as well as the polarization of the light beam and collected scattered light may be arranged to maximize the particle signal compared to the pattern signal. A detector produces an electrical signal corresponding to the intensity of scattered light that is colelcted. A processor constructs templates from the electrical signal corresponding to individual die and compares the templates to identify particles. A reference template is constantly updated so that comparisons are between adjacent die. In one embodiment, the templates are made up of registered positions where the signal crosses a threshold, and the comparison is between corresponding positions to eliminate periodic pattern features, leaving only positions representing particles.

摘要翻译： 在使用在表面上以浅角度扫描的单个光束的方法和装置中实现周期性图案化表面上的粒子检测。 表面包含多个相同的模具，在模具之间具有街道。 光束平行于街道方向扫描，而光采集系统以恒定立体角收集从表面散射的光。 收集系统的位置以及光束和收集的散射光的偏振可以被布置成与图案信号相比最大化粒子信号。 检测器产生对应于被烧焦的散射光的强度的电信号。 处理器从对应于各个管芯的电信号构建模板，并比较模板以识别粒子。 参考模板不断更新，以便相邻模具之间进行比较。 在一个实施例中，模板由信号跨越阈值的注册位置组成，并且在相应位置之间进行比较以消除周期性图案特征，仅留下表示粒子的位置。

公开(公告)号：US4844617A

公开(公告)日：1989-07-04

申请号：US146046

申请日：1988-01-20

申请人： Herman F. Kelderman ,  Michael E. Fein ,  Alan E. Loh ,  Arnold Adams ,  Armand P. Neukermans

发明人： Herman F. Kelderman ,  Michael E. Fein ,  Alan E. Loh ,  Arnold Adams ,  Armand P. Neukermans

IPC分类号： G01B9/04 ,  G01J3/02 ,  G01J3/18 ,  G01J3/28 ,  G02B21/00

CPC分类号： G01B9/04 ,  G01J3/02 ,  G01J3/0229 ,  G01J3/0243 ,  G01J3/0248 ,  G02B21/006 ,  G01J3/18 ,  G01J3/2803

摘要： A confocal measuring microscope including a spectrometer and autofocus system sharing common optical elements in which the intensity of light entering the spectrometer from a particular spot on a workpiece is used to determine a focus condition for the same spot. The microscope includes at least one light source, an illumination field stop, and a microscope objective that images the stop onto a workpiece supported by a movable platform. The objective also forms an image of the illuminated portion of the object. An aperture in a second stop and intersecting the image plane passes light from part of the image to the spectrometer, while viewing optics are used to view the image. In one embodiment, a detector is placed at the zero order position, while in another embodiment a laser is placed at the zero order position. In the later embodiment an integrator circuit connected to the detector array replaces the zero order detector for measuring the total intensity of light entering the spectrometer. A best focus condition occurs when the total intensity is a maximum for a positive confocal configuration, i.e. where source and detector are on opposite sides of their respective field stops from said workpiece, and a minimum for a negative confocal configuration, i.e. where the source and workpiece are on the same side of a reflective illumination field stop with aperture. The movable platform may be scanned axially to achieve and maintain object focus as the object is scanned transversely.

摘要翻译： 共焦测量显微镜包括分光光度计和自动聚焦系统，共享共同的光学元件，其中使用从工件上的特定光点进入光谱仪的光的强度来确定同一光斑的聚焦条件。 显微镜包括至少一个光源，照明场停止器和将停止点图像到由可移动平台支撑的工件上的显微镜物镜。 该目的也形成对象的被照亮部分的图像。 在第二个停止点和与图像平面相交的孔将光从图像的一部分传递到光谱仪，而观察光学元件用于观看图像。 在一个实施例中，检测器被放置在零级位置，而在另一个实施例中，激光被放置在零级位置。 在后面的实施例中，连接到检测器阵列的积分器电路取代了用于测量进入光谱仪的光的总强度的零级检测器。 当总强度为正共焦配置的最大值时，即源和检测器位于其与所述工件相应的场停止位置的相对侧上，并且对于共焦焦配置为最小，即源和 工件位于具有孔径的反射照明场停止的同一侧。 当物体被横向扫描时，可移动平台可被轴向地扫描以实现和维持物体焦点。

公开(公告)号：US4601576A

公开(公告)日：1986-07-22

申请号：US559909

申请日：1983-12-09

申请人： Lee K. Galbraith

发明人： Lee K. Galbraith

IPC分类号： G01N21/88 ,  G01J1/02 ,  G01N21/84 ,  G01N21/894 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  G01N21/00

CPC分类号： G01J1/04 ,  G01J1/0422 ,  G01J1/0455 ,  G01N21/894 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/474 ,  G01N2201/064 ,  G01N2201/112

摘要： A two-stage light collector, including a first stage which admits a scanning beam and a second stage which is optically connected to the first stage and has a light detector therein. The first stage has a shape which re-images diffusely scattered radiation from a target on which the radiation impinges. The first stage directs light toward an entrance aperture in the second stage which indirectly reflects light toward the detector associated with the second stage.

摘要翻译： 两级光收集器，包括允许扫描光束的第一级和与第一级光学连接且在其中具有光检测器的第二级。 第一阶段具有从放射线照射的靶的重散射散射的形状。 第一阶段将光引导到第二阶段中的入口孔，其将光朝向与第二阶段相关联的检测器间接反射。