摘要:
[Object] To provide a resin composition with excellent mold releasability and blocking resistance.[Solution] A resin composition containing a 4-methyl-1-pentene polymer includes 0.01 to 10 parts by mass of a 4-methyl-1-pentene polymer (B) per 100 parts by mass of at least one resin (A) selected from the group consisting of thermoplastic resins and thermosetting resins, wherein the 4-methyl-1-pentene polymer (B) has (B1) an intrinsic viscosity [η] of 0.01 or more but less than 0.50 dl/g measured at 135° C. in a decalin solvent.
摘要翻译:提供具有优异的脱模性和抗粘连性的树脂组合物。 [解决方案]含有4-甲基-1-戊烯聚合物的树脂组合物,相对于所选择的至少一种树脂(A),相对于每100质量份的所述4-甲基-1-戊烯类聚合物(B),含有0.01〜10质量份的4-甲基-1-戊烯类聚合物 由热塑性树脂和热固性树脂组成的组合物,其中4-甲基-1-戊烯聚合物(B)的特性粘度[ηe]为135°时测得的0.01或更大但小于0.50dl / g C.在十氢化萘溶剂中。
摘要:
Disclosed is a polishing slurry which enables to suppress damages to an under layer while securing an adequate polishing rate. The polishing slurry contains a resin (A) having an amide group and an organic resin (B).
摘要:
The present invention provides a material that is less likely to cause flex cracking, has high scratch resistance, and is suitable for a protective layer for a thermosensitive material. A thermosensitive recording material according to the present invention includes a base, a thermosensitive recording layer formed on the base, and a protective layer formed on the thermosensitive recording layer, wherein the protective layer is formed from a mixture that contains an emulsion (a) containing particles formed of a hydrophobic polymer (1) and a hydrophilic polymer (2); and a non-crosslinking urea compound (b). Preferably, the hydrophobic polymer (1) contains an acrylonitrile-derived constitutional unit. Preferably, the non-crosslinking urea compound (b) is urea or a urea derivative.
摘要:
A heat-sensitive recording material includes a heat-sensitive recording layer on a support which layer produces a color upon heating, and a protective layer on the heat-sensitive recording layer. The protective layer is obtained from a composition (A) based on an emulsion of a copolymer resin (a). The copolymer resin (a) includes a vinyl monomer component having a carboxyl group, and a vinyl monomer component copolymerizable with the vinyl monomer component. The copolymer resin (a) contains 1 to 10 parts by weight of the vinyl monomer component having a carboxyl group. The copolymer resin has a SP value (solubility parameter) of not less than 9.5 (cal/cm3)1/2 and a glass transition temperature (Tg) of 20 to 130° C. The emulsion of the copolymer resin (a) has a minimum film-forming temperature (MFT) of more than 5° C. The emulsion for heat-sensitive recording material provides high durability, in particular water resistance, antiblocking properties in water-wetted state and chemical resistance, and has significantly improved storage stability.
摘要翻译:热敏记录材料包括在加热时该层产生颜色的载体上的热敏记录层和热敏记录层上的保护层。 保护层由基于共聚物树脂(a)的乳液的组合物(A)获得。 共聚物树脂(a)包括具有羧基的乙烯基单体组分和可与乙烯基单体组分共聚的乙烯基单体组分。 共聚物树脂(a)含有1〜10重量份的具有羧基的乙烯基单体组分。 共聚物树脂的SP值(溶解度参数)不小于9.5(cal / cm 3)1/2,玻璃化转变温度(Tg)为20-130℃。共聚物树脂(a)的乳液具有 最低成膜温度(MFT)超过5℃。用于热敏记录材料的乳液提供高耐久性,特别是耐水性,防水性和耐化学性的防粘连性,并且显着提高了储存稳定性。
摘要:
Disclosed is a polishing slurry which enables to suppress damages to an under layer while securing an adequate polishing rate. The polishing slurry contains a resin (A) having an amide group and an organic resin (B).
摘要:
Resin compositions of the invention contain an olefin polymer wax having higher heat resistance than achieved heretofore, high compatibility with resins and excellent mold-releasing properties.A resin composition (X) of the invention is obtained by blending a resin (A) having a melting point Tm of not less than 200° C. and an olefin polymer wax component (B), the olefin polymer wax component (B) including a cyclic olefin polymer wax (B-1) having structural units (a) and (b) described below, the cyclic olefin polymer wax (B-1) containing the structural units (b) at 0.05 to 50 mol % based on all the structural units in the polymer; (a) units derived from ethylene (b) units derived from a cyclic olefin.
摘要:
A heat-sensitive recording material includes a heat-sensitive recording layer on a support which layer produces a color upon heating, and a protective layer on the heat-sensitive recording layer. The protective layer is obtained from a composition (A) based on an emulsion of a copolymer resin (a). The copolymer resin (a) includes a vinyl monomer component having a carboxyl group, and a vinyl monomer component copolymerizable with the vinyl monomer component. The copolymer resin (a) contains 1 to 10 parts by weight of the vinyl monomer component having a carboxyl group. The copolymer resin has a SP value (solubility parameter) of not less than 9.5 (cal/cm3)1/2 and a glass transition temperature (Tg) of 20 to 130° C. The emulsion of the copolymer resin (a) has a minimum film-forming temperature (MFT) of more than 5° C. The emulsion for heat-sensitive recording material provides high durability, in particular water resistance, antiblocking properties in water-wetted state and chemical resistance, and has significantly improved storage stability.
摘要翻译:热敏记录材料包括在加热时该层产生颜色的载体上的热敏记录层和热敏记录层上的保护层。 保护层由基于共聚物树脂(a)的乳液的组合物(A)获得。 共聚物树脂(a)包括具有羧基的乙烯基单体组分和可与乙烯基单体组分共聚的乙烯基单体组分。 共聚物树脂(a)含有1〜10重量份的具有羧基的乙烯基单体组分。 共聚物树脂的SP值(溶解度参数)不小于9.5(cal / cm 3)1/2,玻璃化转变温度(Tg)为20-130℃。共聚物树脂(a)的乳液具有 最低成膜温度(MFT)超过5℃。用于热敏记录材料的乳液提供高耐久性,特别是耐水性,防水性和耐化学性的防粘连性,并且显着提高了储存稳定性。
摘要:
A protective material for a heat sensitive paper, which is an emulsion including water, a water soluble polymer (A), and a hydrophobic polymer (B), at least one of (A) and (B) containing a structural unit derived from a monomer (C) having a sulfonic acid group or a salt thereof. The protective material can provide a higher level of durability (e.g., water resistance, plasticizer resistance, alcohol resistance) against various materials, and can ensure good running stability, as compared with the conventional protective material.
摘要:
The aqueous paste for an electrochemical cell of the present invention comprises an aqueous dispersion for an electrochemical cell that comprises an olefin copolymer (a); an active material; and a conductive assistant, wherein the olefin copolymer (a) has a weight average molecular weight of not less than 50,000 and is at least one kind selected from a random propylene copolymer (a-1) containing 50% by weight to less than 85% by weight of a structural unit derived from propylene; an acid-modified random propylene copolymer (a-2) obtained by modifying the copolymer (a-1) with an acid; and an ethylene-(meth) acrylic acid copolymer (a-3) containing 5% by weight to less than 25% by weight of a structural unit derived from (meth) acrylic acid.
摘要:
Disclosed is a polishing composition containing not less than 1 wt % of a water-soluble resin, which is obtained by polymerizing a vinyl monomer containing an amino group and/or an amide group, based on the total weight of the polishing composition.