METHOD AND APPARATUS FOR INSPECTING SCRIBES IN SOLAR MODULES
    3.
    发明申请
    METHOD AND APPARATUS FOR INSPECTING SCRIBES IN SOLAR MODULES 审中-公开
    用于检查太阳能模块中的筛选的方法和装置

    公开(公告)号:US20100330711A1

    公开(公告)日:2010-12-30

    申请号:US12492989

    申请日:2009-06-26

    申请人: Asaf Schlezinger

    发明人: Asaf Schlezinger

    IPC分类号: H01L21/66 G01N21/88

    摘要: Embodiments of the present invention generally relate to a method and apparatus for inspecting and analyzing the spacing of isolation trenches scribed in a solar module during the fabrication process. In one embodiment, images of the scribed trenches are captured and analyzed at various points in the fabrication process. The results may then be used either manually or in an automated fashion to diagnose, alter, and tune upstream processes for improved scribe spacing on subsequently processed solar modules.

    摘要翻译: 本发明的实施例一般涉及一种用于检查和分析在制造过程中在太阳能模块中刻划的隔离沟的间隔的方法和装置。 在一个实施例中,在制造过程中的各个点捕获和分析划线沟槽的图像。 然后可以手动或以自动方式将结果用于诊断,改变和调整上游过程,以改善随后处理的太阳能模块上的划痕间距。

    Process and Apparatus for Measuring the Crystal Fraction of Crystalline Silicon Casted Mono Wafers
    4.
    发明申请
    Process and Apparatus for Measuring the Crystal Fraction of Crystalline Silicon Casted Mono Wafers 有权
    用于测量晶体硅铸造单晶硅晶体分数的方法和装置

    公开(公告)号:US20130242287A1

    公开(公告)日:2013-09-19

    申请号:US13421194

    申请日:2012-03-15

    IPC分类号: G01N21/59 G01N21/55

    CPC分类号: G01N21/59

    摘要: Provided are methods and apparatus for determining the crystal fraction of a casted-mono silicon wafer. A light source is directed at the wafer and the transmission or reflection is measured by a detector. An image of the wafer is generated by a processor and the crystal fraction is calculated from the generated image. The crystal fraction is correlated to the efficiency of the solar cell produced, allowing for the rejection of inferior wafers prior to processing.

    摘要翻译: 提供了用于确定铸造单晶硅晶片的晶体分数的方法和装置。 光源指向晶片,透射或反射由检测器测量。 由处理器生成晶片的图像,并根据所生成的图像计算晶体分数。 晶体分数与所制造的太阳能电池的效率相关,允许在处理之前排出劣质晶片。

    METROLOGY AND INSPECTION SUITE FOR A SOLAR PRODUCTION LINE
    5.
    发明申请
    METROLOGY AND INSPECTION SUITE FOR A SOLAR PRODUCTION LINE 审中-公开
    太阳能生产线的计量和检验套件

    公开(公告)号:US20100197051A1

    公开(公告)日:2010-08-05

    申请号:US12698559

    申请日:2010-02-02

    IPC分类号: H01L31/18 H01L21/66 G06F17/00

    摘要: Embodiments of the present invention generally relate to a system used to form solar cell devices using processing modules adapted to perform one or more processes in the formation of the solar cell devices. In one embodiment, the system is adapted to form thin film solar cell devices by accepting a large unprocessed substrate and performing multiple deposition, material removal, cleaning, sectioning, bonding, and various inspection and testing processes to form multiple complete, functional, and tested solar cell devices that can then be shipped to an end user for installation in a desired location to generate electricity. In one embodiment, the system provides inspection of solar cell devices at various levels of formation, while collecting and using metrology data to diagnose, tune, or improve production line processes during the manufacture of solar cell devices.

    摘要翻译: 本发明的实施例一般涉及使用适于在太阳能电池器件的形成中执行一个或多个工艺的处理模块来形成太阳能电池器件的系统。 在一个实施例中,该系统适于通过接受大的未处理衬底并执行多次沉积,材料去除,清洁,切片,结合以及各种检查和测试过程来形成薄膜太阳能电池器件,以形成多个完整,功能和测试 然后太阳能电池装置可以运送到最终用户以安装在期望的位置以发电。 在一个实施例中,系统提供在各种形成水平的太阳能电池装置的检查,同时收集和使用计量数据来诊断,调整或改进在制造太阳能电池装置期间的生产线工艺。

    HIGH EFFICIENCY MULTI WAVELENGTH LINE LIGHT SOURCE
    6.
    发明申请
    HIGH EFFICIENCY MULTI WAVELENGTH LINE LIGHT SOURCE 审中-公开
    高效率多波长线路光源

    公开(公告)号:US20100195096A1

    公开(公告)日:2010-08-05

    申请号:US12575224

    申请日:2009-10-07

    申请人: Asaf Schlezinger

    发明人: Asaf Schlezinger

    IPC分类号: G01N21/88 H04N5/335

    摘要: Embodiments of the present invention provide apparatus and method for inspecting a substrate. Particularly, embodiments of the present invention provide apparatus and method for detecting pinholes in one or more light absorbing films deposited on a substrate. One embodiment of the present invention provides an inspection station comprising an illumination assembly having a first light source providing light of wavelengths in a first spectrum and a second light source providing light of wavelengths in a second spectrum, wherein light in the first spectrum and second spectrum can be absorbed by light absorbing films on the substrate.

    摘要翻译: 本发明的实施例提供了用于检查基板的装置和方法。 特别地,本发明的实施例提供了用于检测沉积在基板上的一个或多个光吸收膜中的针孔的装置和方法。 本发明的一个实施例提供了一种检查站,其包括照明组件,其具有提供第一光谱波长的光的第一光源和提供第二光谱中的波长的光的第二光源,其中第一光谱和第二光谱中的光 可以被基板上的光吸收膜吸收。

    Process and apparatus for measuring the crystal fraction of crystalline silicon casted mono wafers
    8.
    发明授权
    Process and apparatus for measuring the crystal fraction of crystalline silicon casted mono wafers 有权
    用于测量晶体硅铸造单晶片的晶体分数的方法和装置

    公开(公告)号:US08902428B2

    公开(公告)日:2014-12-02

    申请号:US13421194

    申请日:2012-03-15

    IPC分类号: G01N21/55

    CPC分类号: G01N21/59

    摘要: Provided are methods and apparatus for determining the crystal fraction of a casted-mono silicon wafer. A light source is directed at the wafer and the transmission or reflection is measured by a detector. An image of the wafer is generated by a processor and the crystal fraction is calculated from the generated image. The crystal fraction is correlated to the efficiency of the solar cell produced, allowing for the rejection of inferior wafers prior to processing.

    摘要翻译: 提供了用于确定铸造单晶硅晶片的晶体分数的方法和装置。 光源指向晶片,透射或反射由检测器测量。 由处理器生成晶片的图像,并根据所生成的图像计算晶体分数。 晶体分数与所制造的太阳能电池的效率相关,允许在处理之前排出劣质晶片。

    Method and apparatus for residue detection in the edge deleted area of a substrate
    9.
    发明授权
    Method and apparatus for residue detection in the edge deleted area of a substrate 失效
    在基板的边缘缺失区域中进行残留物检测的方法和装置

    公开(公告)号:US08111390B2

    公开(公告)日:2012-02-07

    申请号:US12425806

    申请日:2009-04-17

    IPC分类号: G01N21/00

    摘要: Apparatus and methods for detecting residue on a glass substrate and method of use are disclosed. The apparatus comprises a substrate support, a sensor, a controller and a peripheral device in communication with the controller. The apparatus measures the height or thickness of a main surface and an edge delete surface of a substrate to determine if film residue is present on the edge delete surface.

    摘要翻译: 公开了一种用于检测玻璃基板上的残留物的方法和方法。 该装置包括与控制器通信的基板支撑件,传感器,控制器和外围设备。 该装置测量衬底的主表面和边缘删除表面的高度或厚度,以确定边缘删除表面上是否存在膜残留物。

    Method and Apparatus for Residue Detection in the Edge Deleted Area of a Substrate
    10.
    发明申请
    Method and Apparatus for Residue Detection in the Edge Deleted Area of a Substrate 失效
    底物边缘残留检测方法与装置

    公开(公告)号:US20100265497A1

    公开(公告)日:2010-10-21

    申请号:US12425806

    申请日:2009-04-17

    IPC分类号: G01N21/94 G01N21/958

    摘要: Apparatus and methods for detecting residue on a glass substrate and method of use are disclosed. The apparatus comprises a substrate support, a sensor, a controller and a peripheral device in communication with the controller. The apparatus measures the height or thickness of a main surface and an edge delete surface of a substrate to determine if film residue is present on the edge delete surface.

    摘要翻译: 公开了一种用于检测玻璃基板上的残留物的方法和方法。 该装置包括与控制器通信的基板支撑件,传感器,控制器和外围设备。 该装置测量衬底的主表面和边缘删除表面的高度或厚度,以确定边缘删除表面上是否存在膜残留物。