公开(公告)号：US20120114906A1

公开(公告)日：2012-05-10

申请号：US13381151

申请日：2010-07-07

申请人： Jae-won Yoo ,  Byung-uk Kim ,  Un-yong Kim ,  Eun-jin Kwak

发明人： Jae-won Yoo ,  Byung-uk Kim ,  Un-yong Kim ,  Eun-jin Kwak

IPC分类号： B32B3/30 ,  B05D7/02 ,  B29C41/42 ,  B05D3/10 ,  C08L83/00 ,  B29C41/00

CPC分类号： B29C39/006 ,  B29C33/3857 ,  B29C33/40 ,  B29C33/424 ,  B29C33/56 ,  B29C59/14 ,  B29C59/142 ,  C08G18/672 ,  C08G18/6775 ,  C08L75/16 ,  Y10T428/24479 ,  C08G18/61

摘要： There are provided a fluorine-containing photocurable resin composition and a method of preparing a mold comprising the same and more particularly, a photocurable resin composition having chemical resistance, mechanical properties and high transmittance, etc. as well as being easily wetted with and released from thermosetting or photocurable resins for pattern formation regardless of additional surface treatment, as opposed to the existing polymer resin materials used for resin molds, and a method of preparing a resin mold using the same.

摘要翻译： 提供含氟光固化性树脂组合物及其制备方法，特别是具有耐化学性，机械性能，高透光性等的光固化性树脂组合物，并且易于润湿和脱离 与用于树脂模具的现有聚合物树脂材料相反的用于图案形成的热固性或光固化树脂，而不管附加的表面处理，以及使用其制备树脂模具的方法。

公开(公告)号：US08173729B2

公开(公告)日：2012-05-08

申请号：US12714837

申请日：2010-03-01

申请人： Hyoc-min Youn ,  Byung-uk Kim ,  Ki-hyuk Koo ,  Tae-hoon Yeo ,  Joo-pyo Yun ,  Hong-dae Shin ,  Sang Hoon Lee ,  Dong-myung Kim ,  Su-youn Choi ,  Jin Sun Kim ,  Chang-Min Woo ,  Hong-Suk Kim

发明人： Hyoc-min Youn ,  Byung-uk Kim ,  Ki-hyuk Koo ,  Tae-hoon Yeo ,  Joo-pyo Yun ,  Hong-dae Shin ,  Sang Hoon Lee ,  Dong-myung Kim ,  Su-youn Choi ,  Jin Sun Kim ,  Chang-Min Woo ,  Hong-Suk Kim

IPC分类号： C08K5/3447 ,  C08K5/3492 ,  C08K5/3435

CPC分类号： G03F7/031 ,  G02F1/133345

摘要： The present invention relates to a photosensitive resin composition, particularly to a photosensitive resin composition for forming an interlayer organic insulating film for TFT-LCD, comprising 0.01 to 20 wt % of UV stabilizer or radical scavenger. The photosensitive resin composition of the present invention can be used for forming an interlayer organic insulating film for TFT-LCD to improve active unfilled area upon over exposure in liquid crystal photo-alignment process, can easily control resolution of pattern, and is particularly suitable for forming a planarization layer of an interlayer organic insulating film.

摘要翻译： 本发明涉及一种感光性树脂组合物，特别涉及用于形成TFT-LCD用层间有机绝缘膜的感光性树脂组合物，其含有0.01〜20重量％的UV稳定剂或自由基清除剂。 本发明的感光性树脂组合物可用于形成用于TFT-LCD的层间有机绝缘膜，以在液晶光取向过程中过度曝光时改善活性未填充区域，可以容易地控制图案的分辨率，并且特别适用于 形成层间有机绝缘膜的平坦化层。

公开(公告)号：US08163095B2

公开(公告)日：2012-04-24

申请号：US13101973

申请日：2011-05-05

申请人： Ji Sun Lee ,  Hong Sick Park ,  Jong Hyun Choung ,  Sun Young Hong ,  Bong Kyun Kim ,  Byeong Jin Lee ,  Byung Uk Kim ,  Jong Hyun Jeong ,  Suk II Yoon ,  Seong Bae Kim ,  Sung Gun Shin ,  Soon Beom Huh ,  Se Hwan Jung ,  Doo Young Jang

发明人： Ji Sun Lee ,  Hong Sick Park ,  Jong Hyun Choung ,  Sun Young Hong ,  Bong Kyun Kim ,  Byeong Jin Lee ,  Byung Uk Kim ,  Jong Hyun Jeong ,  Suk II Yoon ,  Seong Bae Kim ,  Sung Gun Shin ,  Soon Beom Huh ,  Se Hwan Jung ,  Doo Young Jang

IPC分类号： C11D7/50

CPC分类号： G03F7/425

摘要： The present invention provides a stripping composition and a stripping method capable of easily stripping a color resist or an organic insulating film formed on a substrate to reuse the substrate when defects are found during a process of forming the color filter or organic insulating film on the substrate. In one embodiment, the stripping composition includes about 0.5 to about 45 wt % of hydroxide compound, about 10 to about 89 wt % of alkyleneglycolalkylether compound, about 5 to about 45 wt % of alkanolamine compound, and about 0.01 to about 5 wt % of inorganic salt compound. Advantageously, the stripping process can be performed without damaging a thin film transistor of a bottom substrate while removing the color resist or organic insulating film.

摘要翻译： 本发明提供了一种剥离组合物和剥离方法，其能够在形成基板上的滤色器或有机绝缘膜的过程中发现缺陷时容易地剥离形成在基板上的着色抗蚀剂或有机绝缘膜，以重新使用基板 。 在一个实施方案中，汽提组合物包含约0.5至约45重量％的氢氧化物化合物，约10至约89重量％的亚烷基二醇烷基醚化合物，约5至约45重量％的烷醇胺化合物和约0.01至约5重量％的 无机盐化合物。 有利地，可以在不损坏底部基板的薄膜晶体管的同时进行剥离处理，同时移除彩色抗蚀剂或有机绝缘膜。

公开(公告)号：US20110224335A1

公开(公告)日：2011-09-15

申请号：US13090895

申请日：2011-04-20

申请人： Sung-Hee Kim ,  Soon-Sung Yoo ,  Jin-Wuk Kim ,  Byung-Geol Kim ,  Byung-Uk Kim ,  Ki-Beom Lee ,  Byong-Hoo Kim ,  Seung-Hyup Shin ,  Jun-Young Song ,  Myoung-Soo Lee

发明人： Sung-Hee Kim ,  Soon-Sung Yoo ,  Jin-Wuk Kim ,  Byung-Geol Kim ,  Byung-Uk Kim ,  Ki-Beom Lee ,  Byong-Hoo Kim ,  Seung-Hyup Shin ,  Jun-Young Song ,  Myoung-Soo Lee

IPC分类号： C09D11/10

CPC分类号： C09D11/02 ,  B82Y10/00 ,  B82Y40/00 ,  C09D11/033 ,  G03F7/0002

摘要： Disclosed are an ink composition and a method for fabricating a liquid crystal display (LCD) device using the same, wherein in forming patterns of the LCD device using an imprint lithography and a roll printing, an ink composition with high thermal resistance, consisting of polymer resin and additive both endurable even at a high temperature is used to form fine patterns with constantly maintaining pattern linewidths and line intervals, the ink composition consisting of 5-45% by weight of polymer resin, 5-45% by weight of additive added to retain thermal stability, and 50-90% by weight of organic solvent, wherein the ink composition is endurable even at a high temperature of 90-250° C.

摘要翻译： 公开了一种使用其制造液晶显示（LCD）装置的油墨组合物和方法，其中在使用压印光刻和辊印刷形成LCD装置的图案时，具有由聚合物组成的高耐热性的油墨组合物 即使在高温下也能耐久的树脂和添加剂被用于形成精细图案，并且不断地保持图案线宽和线间隔，油墨组合物由5-45重量％的聚合物树脂组成，5-45重量％的添加剂添加到 保持热稳定性和50-90重量％的有机溶剂，其中油墨组合物即使在90-250℃的高温下也是耐久的。

公开(公告)号：US07968507B2

公开(公告)日：2011-06-28

申请号：US12214658

申请日：2008-06-20

申请人： Ji Sun Lee ,  Hong Sick Park ,  Jong Hyun Choung ,  Sun Young Hong ,  Bong Kyun Kim ,  Byeong Jin Lee ,  Byung Uk Kim ,  Jong Hyun Jeong ,  Suk Il Yoon ,  Seong Bae Kim ,  Sung Gun Shin ,  Soon Beom Huh ,  Se Hwan Jung ,  Doo Young Jang

发明人： Ji Sun Lee ,  Hong Sick Park ,  Jong Hyun Choung ,  Sun Young Hong ,  Bong Kyun Kim ,  Byeong Jin Lee ,  Byung Uk Kim ,  Jong Hyun Jeong ,  Suk Il Yoon ,  Seong Bae Kim ,  Sung Gun Shin ,  Soon Beom Huh ,  Se Hwan Jung ,  Doo Young Jang

IPC分类号： C11D7/06

CPC分类号： G03F7/425

摘要： The present invention provides a stripping composition and a stripping method capable of easily stripping a color resist or an organic insulating film formed on a substrate to reuse the substrate when defects are found during a process of forming the color filter or organic insulating film on the substrate. In one embodiment, the stripping composition includes about 0.5 to about 45 wt % of hydroxide compound, about 10 to about 89 wt % of alkyleneglycolalkylether compound, about 5 to about 45 wt % of alkanolamine compound, and about 0.01 to about 5 wt % of inorganic salt compound. Advantageously, the stripping process can be performed without damaging a thin film transistor of a bottom substrate while removing the color resist or organic insulating film.

摘要翻译： 本发明提供了一种剥离组合物和剥离方法，其能够在形成基板上的滤色器或有机绝缘膜的过程中发现缺陷时容易地剥离形成在基板上的着色抗蚀剂或有机绝缘膜，以重新使用基板 。 在一个实施方案中，汽提组合物包含约0.5至约45重量％的氢氧化物化合物，约10至约89重量％的亚烷基二醇烷基醚化合物，约5至约45重量％的烷醇胺化合物和约0.01至约5重量％的 无机盐化合物。 有利地，可以在不损坏底部基板的薄膜晶体管的同时进行剥离处理，同时移除彩色抗蚀剂或有机绝缘膜。

公开(公告)号：US07879961B2

公开(公告)日：2011-02-01

申请号：US11670700

申请日：2007-02-02

申请人： Dong-Ki Lee ,  Byung-Uk Kim ,  Hyoc-Min Youn

发明人： Dong-Ki Lee ,  Byung-Uk Kim ,  Hyoc-Min Youn

IPC分类号： C08F4/04

CPC分类号： C08F220/06 ,  C08F212/08 ,  C08F220/18 ,  C08F220/28 ,  C08F220/32 ,  C08F220/40 ,  G02F1/136227 ,  H01L27/3244 ,  Y10T428/31855

摘要： Disclosed herein is a resin composition for an organic insulating layer, a method of manufacturing the same, and a display panel including an insulating layer formed using the resin composition. The resin composition for an organic insulating layer is produced by polymerizing about 5 to about 35 wt % of an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride, or a mixture of the unsaturated carboxylic acid and the unsaturated carboxylic acid anhydride, about 5 to about 40 wt % of a styrene compound, about 5 to about 40 wt % of an epoxy compound, about 0.1 to about 10 wt % of an isobornyl compound, and about 20 to about 40 wt % of a dicyclopentadiene compound, based on the total weight of unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, styrene compound, isobornyl compound, and dicyclopentadiene compound.

摘要翻译： 本发明公开了一种有机绝缘层用树脂组合物及其制造方法以及使用该树脂组合物形成的绝缘层的显示面板。 用于有机绝缘层的树脂组合物通过将约5至约35重量％的不饱和羧酸，不饱和羧酸酐或不饱和羧酸和不饱和羧酸酐的混合物聚合为约5至约 40重量％的苯乙烯化合物，约5至约40重量％的环氧化合物，约0.1至约10重量％的异冰片基化合物和约20至约40重量％的二环戊二烯化合物，基于总重量 的不饱和羧酸，不饱和羧酸酐，苯乙烯化合物，异冰片基化合物和二环戊二烯化合物。

公开(公告)号：US07799509B2

公开(公告)日：2010-09-21

申请号：US11445846

申请日：2006-06-02

申请人： Hi-Kuk Lee ,  Dong-Ki Lee ,  Jae-Sung Kim ,  Byung-Uk Kim ,  Hyoc-Min Youn ,  Ki-Hyuk Koo ,  Joo-Pyo Yun ,  Sang-Gak Choi

发明人： Hi-Kuk Lee ,  Dong-Ki Lee ,  Jae-Sung Kim ,  Byung-Uk Kim ,  Hyoc-Min Youn ,  Ki-Hyuk Koo ,  Joo-Pyo Yun ,  Sang-Gak Choi

IPC分类号： G03F7/30 ,  G03F7/023

CPC分类号： G03F7/0233 ,  G02F1/133707 ,  G02F1/133711 ,  G03F7/40

摘要： A photosensitive resin composition for an organic layer pattern includes about 100 parts by weight of an acryl-based copolymer and about 5 to about 100 parts by weight of a 1,2-quinonediazide compound. The acryl-based copolymer is prepared by copolymerizing about 5 to about 60 percent by weight of an isobonyl carboxylate-based compound based on a total weight of the acryl-based copolymer, about 10 to about 30 percent by weight of an unsaturated compound carrying an epoxy group, about 20 to about 40 percent by weight of an olefin-based unsaturated compound, and about 10 to about 40 percent by weight of one selected from unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, and a mixture thereof. Methods of manufacturing a TFT substrate and a common electrode substrate using the photosensitive resin composition are also provided. Advantageously, the organic layer pattern may have a mountain structure having an improved local flatness without concave and convex structures.

摘要翻译： 用于有机层图案的感光性树脂组合物包括约100重量份的丙烯酸类共聚物和约5至约100重量份的1,2-醌二叠氮化合物。 基于丙烯酸类的共聚物通过基于丙烯酸类共聚物的总重量共聚约5至约60重量％的基于羧酸异冰片的化合物来制备，约10至约30重量％的不饱和化合物携带 约20至约40重量％的烯烃基不饱和化合物，和约10至约40重量％的选自不饱和羧酸，不饱和羧酸酐及其混合物的一种。 还提供了使用该感光性树脂组合物制造TFT基板和公共电极基板的方法。 有利地，有机层图案可以具有具有改进的局部平坦度而没有凹凸结构的山体结构。

公开(公告)号：US07378230B2

公开(公告)日：2008-05-27

申请号：US10750845

申请日：2004-01-05

申请人： Sung-Chul Kang ,  Jin-Ho Ju ,  You-Kyoung Lee ,  Dong-Ki Lee ,  Hyo-Youl Kim ,  Hoon Kang ,  Seung-Uk Lee ,  Byung-Uk Kim

发明人： Sung-Chul Kang ,  Jin-Ho Ju ,  You-Kyoung Lee ,  Dong-Ki Lee ,  Hyo-Youl Kim ,  Hoon Kang ,  Seung-Uk Lee ,  Byung-Uk Kim

IPC分类号： G03F7/32 ,  G03F7/023

CPC分类号： G03F7/0236 ,  G03F7/0048

摘要： The present invention relates to a photoresist composition for an MMN (multi-micro nozzle) head coater, more particularly to a photoresist composition comprising a novolak resin with a molecular weight ranging from 2000 to 12,000, a diazide photoactive compound, an organic solvent, and a Si-based surfactant for use in liquid crystal display circuits.The photoresist composition for liquid crystal display circuits of the present invention solves the stain problem, which occurs in MMN head coaters used for large-scale substrate glass, and improves coating characteristics, so that it can be utilized industrially and is expected to significantly improve productivity.

摘要翻译： 本发明涉及一种用于MMN（多微喷嘴）喷涂机的光致抗蚀剂组合物，更具体地说涉及一种光致抗蚀剂组合物，其包含分子量范围为2000-12,000的酚醛清漆树脂，二叠氮光敏化合物，有机溶剂和 用于液晶显示电路的Si基表面活性剂。 本发明的液晶显示电路用光致抗蚀剂组合物解决了用于大规模基板玻璃的MMN头涂布机中发生的污渍问题，并且改善了涂布特性，从而可以在工业上得到利用并且预期显着提高生产率 。

公开(公告)号：US20070048662A1

公开(公告)日：2007-03-01

申请号：US11508079

申请日：2006-08-22

申请人： Jeong-Min Park ,  Hi-Kuk Lee ,  Hyoc-Min Youn ,  Ki-Hyuk Koo ,  Byung-Uk Kim

发明人： Jeong-Min Park ,  Hi-Kuk Lee ,  Hyoc-Min Youn ,  Ki-Hyuk Koo ,  Byung-Uk Kim

IPC分类号： G03C1/00

CPC分类号： G03F7/0382 ,  G03F7/105 ,  H01L21/32139 ,  H01L29/66765 ,  H01L29/78669 ,  Y10S430/106 ,  Y10S430/114

摘要： A photoresist composition includes about 10 to about 70% by weight of a binder resin including a phenol-based polymer, about 0.5 to about 10% by weight of a photo-acid generator, about 1 to about 20% by weight of a cross-linker, about 0.1 to about 5% by weight of a dye and about 10 to about 80% by weight of a solvent. The photoresist composition may be applied to, for example, a method of manufacturing a TFT substrate.

摘要翻译： 光致抗蚀剂组合物包括约10至约70重量％的包含酚类聚合物的粘合剂树脂，约0.5至约10重量％的光酸产生剂，约1至约20重量％的交联剂， 接头，约0.1至约5重量％的染料和约10至约80重量％的溶剂。 光致抗蚀剂组合物可以应用于例如制造TFT基板的方法。

公开(公告)号：US07101650B2

公开(公告)日：2006-09-05

申请号：US10486991

申请日：2002-08-20

申请人： Byung-Uk Kim ,  Joon-Yeon Cho ,  Kyong-Il Kwon ,  Soo-Jung Park ,  Jae-Won Yoo

发明人： Byung-Uk Kim ,  Joon-Yeon Cho ,  Kyong-Il Kwon ,  Soo-Jung Park ,  Jae-Won Yoo

IPC分类号： G03F7/023

CPC分类号： G03F7/027 ,  G03F7/023 ,  G03F7/038

摘要： The present invention relates to a photosensitive resin composition for use as a photoresist, and more particularly, to a photosensitive resin composition for a photoresist comprising an acrylate copolymer obtained by selectively using specific compounds or controlling the ratio of unreacted monomers, and a 1,2-quinonediazide compound, which is excellent in several performance factors such as dielectric characteristics, flatness, transparency, developing performance, residual film rate, chemical resistance, and heat resistance, as well as sensitivity and resolution, and in particular it facilitates easy pattern formation into interlayer dielectrics, and it can be used as a photoresist in an LCD manufacturing process due to its excellent transmissivity even when prepared as a thick film.

摘要翻译： 本发明涉及用作光致抗蚀剂的感光性树脂组合物，更具体地说，涉及通过选择性地使用特定化合物或控制未反应单体的比例而获得的含有丙烯酸酯共聚物的光致抗蚀剂用感光性树脂组合物， 醌二叠氮化合物，其介电特性，平坦度，透明性，显影性能，残留膜率，耐化学性和耐热性等几个性能因素以及灵敏度和分辨率均优异，特别是易于形成图形 层间电介质，并且由于其甚至在制备为厚膜时具有优异的透射率，因此其可用作LCD制造工艺中的光致抗蚀剂。