Semiconductor device and fabrication method thereof
    3.
    发明授权
    Semiconductor device and fabrication method thereof 有权
    半导体器件及其制造方法

    公开(公告)号:US08603911B2

    公开(公告)日:2013-12-10

    申请号:US13105338

    申请日:2011-05-11

    Abstract: A semiconductor structure includes a chip, a plurality of metal posts disposed in the chip and a buffer layer disposed on the chip. The chip includes a silicon-based layer having opposite first and second surfaces, and a build-up structure formed on the first surface of the silicon-based layer consisting of at least a metal layer and a low-k dielectric layer alternatively stacked on one another. Each of the metal posts is disposed in the silicon-based layer with one end thereof electrically connected with the metal layer while the other end is exposed from the second surface of the silicon-based layer. The buffer layer is disposed on the build-up structure. By positioning the low-k dielectric layer far from the second surface that is used for connecting to an external electronic component, the present invention reduces the overall thermal stress.

    Abstract translation: 半导体结构包括芯片,设置在芯片中的多个金属柱和设置在芯片上的缓冲层。 该芯片包括具有相对的第一和第二表面的硅基层,以及形成在硅基层的第一表面上的堆积结构,该硅基层至少由至少一层金属层和低k电介质层组成, 另一个。 每个金属柱设置在硅基层中,其一端与金属层电连接,而另一端从硅基层的第二表面露出。 缓冲层设置在积聚结构上。 通过将低k电介质层定位成远离用于连接到外部电子部件的第二表面,本发明降低了总的热应力。

    SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF
    4.
    发明申请
    SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF 有权
    半导体器件及其制造方法

    公开(公告)号:US20120223425A1

    公开(公告)日:2012-09-06

    申请号:US13105338

    申请日:2011-05-11

    Abstract: A semiconductor structure includes a chip, a plurality of metal posts disposed in the chip and a buffer layer disposed on the chip. The chip includes a silicon-based layer having opposite first and second surfaces, and a build-up structure formed on the first surface of the silicon-based layer consisting of at least a metal layer and a low-k dielectric layer alternatively stacked on one another. Each of the metal posts is disposed in the silicon-based layer with one end thereof electrically connected with the metal layer while the other end is exposed from the second surface of the silicon-based layer. The buffer layer is disposed on the build-up structure. By positioning the low-k dielectric layer far from the second surface that is used for connecting to an external electronic component, the present invention reduces the overall thermal stress.

    Abstract translation: 半导体结构包括芯片,设置在芯片中的多个金属柱和设置在芯片上的缓冲层。 该芯片包括具有相对的第一和第二表面的硅基层,以及形成在硅基层的第一表面上的堆积结构,该硅基层至少由至少一层金属层和低k电介质层组成, 另一个。 每个金属柱设置在硅基层中,其一端与金属层电连接,而另一端从硅基层的第二表面露出。 缓冲层设置在积聚结构上。 通过将低k电介质层定位成远离用于连接到外部电子部件的第二表面,本发明降低了总的热应力。

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