THIN FILM SOLAR FABRICATION PROCESS, DEPOSITION METHOD FOR TCO LAYER, AND SOLAR CELL PRECURSOR LAYER STACK
    8.
    发明申请
    THIN FILM SOLAR FABRICATION PROCESS, DEPOSITION METHOD FOR TCO LAYER, AND SOLAR CELL PRECURSOR LAYER STACK 审中-公开
    薄膜太阳能制造工艺,TCO层沉积方法和太阳能电池前层堆叠

    公开(公告)号:US20120031479A1

    公开(公告)日:2012-02-09

    申请号:US12854469

    申请日:2010-08-11

    IPC分类号: H01L31/0216 H01L31/0236

    摘要: Methods and devices for manufacturing a TCO layer of a thin film solar cell over a transparent substrate are described. Thereby, a first ZnO-containing layer is puttered with a sputtering method selected from the group consisting of: DC-sputtering, MF-sputtering, pulsed-sputtering, and combinations thereof, over the substrate with a first set of deposition parameters, a second ZnO-containing layer is puttered with a sputtering method selected from the group consisting of: DC-sputtering, MF-sputtering, pulsed-sputtering, and combinations thereof, over the first ZnO-containing layer with a second set of deposition parameters, at least one of the deposition parameters of the second set of deposition parameters is different from the corresponding parameter of the first set of deposition parameters; and the second ZnO-containing layer is textured.

    摘要翻译: 描述了在透明基板上制造薄膜太阳能电池的TCO层的方法和装置。 由此,利用第一组沉积参数在衬底上用溅射法选择第一含ZnO层,其中所述溅射方法选自DC溅射,MF溅射,脉冲溅射及其组合,第二组 至少含有ZnO层的溅镀方法是选自以下的溅射方法:DC溅射,MF溅射,脉冲溅射及其组合在第一种含ZnO层上,具有第二组沉积参数 第二组沉积参数的沉积参数之一与第一组沉积参数的相应参数不同; 并且第二含ZnO层被织构化。