Optical device with enhanced mechanical stability operating in the extreme ultraviolet and lithography mask comprising such a device
    1.
    发明授权
    Optical device with enhanced mechanical stability operating in the extreme ultraviolet and lithography mask comprising such a device 失效
    具有增强的机械稳定性的光学装置在包括这种装置的极紫外和光刻掩模中工作

    公开(公告)号:US07012753B2

    公开(公告)日:2006-03-14

    申请号:US10803059

    申请日:2004-03-18

    申请人: Etienne Quesnel

    发明人: Etienne Quesnel

    IPC分类号: G02B1/10

    摘要: An optical device reflecting a range of wavelengths comprised between 10 nm and 20 nm comprises alternate superposed first and second layers. The first layers are made of metal or metallic compound and the second layers are formed by an amorphous silicon compound chosen from a-Si—Hx, a-Si—CHx, a-Si—Cx, a-Si—OHx, a-Si—Fx, a-Si—FHx, a-Si—Nx, a-Si—NHx, x being comprised between 0.01 and 0.3. The use of second layers of amorphous silicon compound enables the mechanical stresses of the optical device to be stabilized up to at least 200° C. The optical device is preferably used as reflector for a lithography mask in the extreme ultraviolet (EUV).

    摘要翻译: 反映10nm和20nm之间的波长范围的光学装置包括交替重叠的第一和第二层。 第一层由金属或金属化合物制成,第二层由选自a-Si-H x,a-Si-CH x x的非晶硅化合物形成, ,a-Si-C x x,a-Si-OH x,a-Si-F x x,a-Si-F H

    Light absorbing coating with high absorption capacity
    2.
    发明授权
    Light absorbing coating with high absorption capacity 失效
    吸光率高的吸光涂层

    公开(公告)号:US06335142B1

    公开(公告)日:2002-01-01

    申请号:US09192368

    申请日:1998-11-16

    IPC分类号: G03C177

    摘要: Light absorbing coating with high absorption capacity. This coating comprises at least one thin optically discontinuous metal layer (8), absorbent within a determined spectral range in the visible-near infrared range, and at least one dielectric layer (10) transparent within this range and formed on the thin layer. Application to imagery.

    摘要翻译: 具有高吸收能力的吸光涂层。该涂层包括至少一个薄的光学不连续金属层(8),在可见光近红外范围内的确定的光谱范围内的吸收剂,以及在该范围内透明的至少一个介电层(10) 并形成在薄层上。 应用于图像。

    Optical detection structure for a plasmon resonance sensor
    3.
    发明授权
    Optical detection structure for a plasmon resonance sensor 有权
    等离子体共振传感器的光学检测结构

    公开(公告)号:US08031341B2

    公开(公告)日:2011-10-04

    申请号:US12447317

    申请日:2007-10-31

    IPC分类号: G01N21/55

    CPC分类号: G01N21/553

    摘要: The invention relates to a plasmon resonance optical detection device including a stack of layers comprising: a metal layer based on a noble metal that will generate said plasmon, a layer of dielectric material, at least one first semiconductor bond layer placed between said metal layer and said dielectric layer, said semiconductor layer covering a face of the metal layer.

    摘要翻译: 本发明涉及一种等离子体共振光学检测装置,其包括一叠层,包括:基于贵金属的金属层,其将产生所述等离子体激元,介电材料层,至少一个第一半导体接合层,位于所述金属层和 所述介电层,所述半导体层覆盖金属层的表面。

    DEVICE FOR PRODUCING NANOPARTICLES AT HIGH EFFICIENCY, USE OF SAID DEVICE AND METHOD OF DEPOSITING NANOPARTICLES
    6.
    发明申请
    DEVICE FOR PRODUCING NANOPARTICLES AT HIGH EFFICIENCY, USE OF SAID DEVICE AND METHOD OF DEPOSITING NANOPARTICLES 审中-公开
    用于高效生产纳米颗粒的装置,使用所述装置和沉积纳米颗粒的方法

    公开(公告)号:US20140001031A1

    公开(公告)日:2014-01-02

    申请号:US14002588

    申请日:2012-02-27

    IPC分类号: C23C14/35

    摘要: The nanoparticle production device includes a target provided with a nanoparticle source surface, and a magnetron generating a first magnetic field, the target being mounted on the magnetron and the first magnetic field forming field lines at the level of the nanoparticle source surface. The device further includes balancing means of the first magnetic field at the level of the target, arranged to close fleeing field lines of the first magnetic field and to keep said lines closed at the level of said nanoparticle source surface, said balancing means being distinct from the magnetron.

    摘要翻译: 纳米粒子生产装置包括具有纳米颗粒源表面的靶和产生第一磁场的磁控管,靶被安装在磁控管上,并且在纳米颗粒源表面的水平上安装第一磁场形成场线。 该装置还包括在目标水平处的第一磁场的平衡装置,被布置成闭合第一磁场的逃离场线并且使所述线路保持在所述纳米颗粒源表面的水平处,所述平衡装置不同于 磁控管。

    Adjustable mask blank structure for an EUV phase-shift mask
    7.
    发明授权
    Adjustable mask blank structure for an EUV phase-shift mask 有权
    EUV相移掩模的可调掩模空白结构

    公开(公告)号:US07927765B2

    公开(公告)日:2011-04-19

    申请号:US11911884

    申请日:2006-04-24

    申请人: Etienne Quesnel

    发明人: Etienne Quesnel

    IPC分类号: G03F1/00

    摘要: The invention concerns a process for forming an optical component comprising: a—formation of a multi-layer stack (32, 34) with an adjustment layer (30) made of a metal-semiconductor mix formed in or on the stack, b—etching a part of the multi-layer stack, including at least a part of the adjustment layer, c—an annealing step to contract the adjustment layer within less than 1 nm.

    摘要翻译: 本发明涉及一种用于形成光学部件的方法,包括:通过形成由层叠中或其上形成的金属 - 半导体混合物制成的调整层(30,34)形成多层堆叠(b),b蚀刻 所述多层堆叠的一部分包括所述调整层的至少一部分,c-在小于1nm内收缩所述调整层的退火步骤。

    Device for cleaning the surface of a component
    8.
    发明申请
    Device for cleaning the surface of a component 审中-公开
    用于清洁部件表面的装置

    公开(公告)号:US20060154495A1

    公开(公告)日:2006-07-13

    申请号:US10516277

    申请日:2003-06-12

    IPC分类号: B08B3/12 H01L21/324 B08B6/00

    CPC分类号: B08B7/0042

    摘要: A detached particle capture means by laser (4) allows them to be attracted and prevented from dropping back better than a traditional blow-off flushing means would. Various categories of attractive forces may be implemented. It will also be possible to use a particle destruction means, like a second high-power laser above the worked surface (3).

    摘要翻译: 通过激光(4)的分离的颗粒捕获装置允许它们被吸引和防止比传统的吹扫冲洗装置更好地落下。 可以实现各种类型的吸引力。 也可以使用颗粒破坏装置,如在加工表面(3)上方的第二大功率激光器。

    Adjustable Mask Blank Structure for an Euv Phase-Shift Mask
    9.
    发明申请
    Adjustable Mask Blank Structure for an Euv Phase-Shift Mask 有权
    用于Euv相移掩模的可调掩模空白结构

    公开(公告)号:US20090130569A1

    公开(公告)日:2009-05-21

    申请号:US11911884

    申请日:2006-04-24

    申请人: Etienne Quesnel

    发明人: Etienne Quesnel

    IPC分类号: G21K5/00 G03F1/00 G03C5/00

    摘要: The invention concerns a process for forming an optical component comprising: a—formation of a multi-layer stack (32, 34) with an adjustment layer (30) made of a metal-semiconductor mix formed in or on the stack, b—etching a part of the multi-layer stack, including at least a part of the adjustment layer, c—an annealing step to contract the adjustment layer within less than 1 nm.

    摘要翻译: 本发明涉及一种用于形成光学部件的方法,包括:通过形成由层叠中或其上形成的金属 - 半导体混合物制成的调整层(30,34)形成多层堆叠(b),b蚀刻 所述多层堆叠的一部分包括所述调整层的至少一部分,c-在小于1nm内收缩所述调整层的退火步骤。

    Nanocomposite Material And Its Use In Optoelectronics
    10.
    发明申请
    Nanocomposite Material And Its Use In Optoelectronics 审中-公开
    纳米复合材料及其在光电子学中的应用

    公开(公告)号:US20130207070A1

    公开(公告)日:2013-08-15

    申请号:US13702635

    申请日:2011-06-07

    申请人: Etienne Quesnel

    发明人: Etienne Quesnel

    IPC分类号: H01L29/15 H01L21/02

    摘要: Material comprising a matrix made of semiconducting or insulating, transparent material in which core/shell type nanoparticles are dispersed, the core of which consists of a semiconductor and the shell of which is formed from a material chosen from the oxides TiO2 and/or CeO2. These nanocomposite materials may especially be used as optoelectronic absorbers.

    摘要翻译: 材料包括由半导体或绝缘透明材料制成的基体,其中核/壳型纳米颗粒分散在其中,其核心由半导体构成,其外壳由选自氧化物TiO 2和/或CeO 2的材料形成。 这些纳米复合材料可以特别用作光电子吸收体。