公开(公告)号：US20080191176A1

公开(公告)日：2008-08-14

申请号：US11666761

申请日：2005-10-31

申请人： Norio Tobori ,  Hideo Komatsu ,  Kotaro Tanaka ,  Kazuaki Uchiyama

发明人： Norio Tobori ,  Hideo Komatsu ,  Kotaro Tanaka ,  Kazuaki Uchiyama

IPC分类号： H01B1/00

CPC分类号： C08J3/226 ,  B82Y30/00 ,  C08J2377/00 ,  C08J2477/00 ,  C08K3/04 ,  C08K3/041 ,  C08L25/04 ,  C08L25/08 ,  C08L77/02 ,  C08L77/06

摘要： The present invention is to provide a conductive masterbatch using a polyamide resin, the conductive masterbatch that has an excellent kneadability/manufacturability and formability and an excellent dispersibility of conductive fillers such as a carbon black, and shows stable conductivity even when a large amount of such conductive fillers are contained therein, and a resin composition containing the conductive masterbatch. That is, the present invention is to provide the conductive masterbatch, which includes at least a conductive filler selected from carbon blacks and carbon nanotubes, a polyamide resin, and a copolymer which contains at least a vinyl monomer having a functional group reactive with the polyamide resin and a styrene as monomer units, and in which the content of the conductive filler is in the range of 10% by mass to 40% by mass, and the resin composition containing the conductive masterbatch.

摘要翻译： 本发明提供一种使用聚酰胺树脂的导电母料，具有优异的捏合/制造性和成形性的导电母料以及诸如炭黑的导电填料的优异分散性，并且即使当大量这样的导电母料 含有导电性填料，含有导电性母料的树脂组合物。 也就是说，本发明提供一种导电母料，其包括至少一种选自碳黑和碳纳米管的导电填料，聚酰胺树脂和至少含有具有与聚酰胺反应的官能团的乙烯基单体的共聚物 树脂和苯乙烯作为单体单元，其中导电填料的含量在10质量％至40质量％的范围内，和含有导电母料的树脂组合物。

公开(公告)号：US5127987A

公开(公告)日：1992-07-07

申请号：US607314

申请日：1990-10-31

申请人： Sadayuki Okudaira ,  Hideo Komatsu ,  Osamu Matsumoto ,  Motoichi Kanazawa

发明人： Sadayuki Okudaira ,  Hideo Komatsu ,  Osamu Matsumoto ,  Motoichi Kanazawa

IPC分类号： C23C16/50 ,  C23F4/00 ,  G03F7/36 ,  H01L21/302 ,  H01L21/3065

CPC分类号： G03F7/36 ,  Y10S438/907

摘要： A plurality of resist membranes are formed on a membrane of goods to be etched. The top resist is patterned by light beam, laser beam, X-rays, or electron beams. The wafer is transferred to a first unit into which discharging gas is introduced and plasma is generated in order to dry-etch the multilayer resists. The multilayer is transferred to a second unit in vacuum environment. In the second unit, the membrane of the wafer is dry-etched in a predetermined depth. The wafer then is transferred to a third unit in vacuum atmosphere so as to remove part of the resist depending a mask pattern and treat the resist by plasma.

公开(公告)号：US4531009A

公开(公告)日：1985-07-23

申请号：US537393

申请日：1983-09-12

申请人： Toshihide Inoue ,  Hideo Komatsu

发明人： Toshihide Inoue ,  Hideo Komatsu

IPC分类号： C07C51/363 ,  C07C69/76

CPC分类号： C07C51/363

摘要： A process for producing an .alpha.,.omega.-bis(2-chlorophenoxy)alkane-4,4'-dicarboxylic acid or its ester, that has a high Young's modulus and that is useful as a material for polyesters capable to form self-extinguishing fibers and films. Thus .alpha.,.omega.-bis(2-chlorophenoxy)alkane-4,4'-dicarboxylic acid or its ester is obtained by reacting .alpha.,.omega.-bis(phenoxy)alkane-4,4'-dicarboxylic acid or its ester with chlorine in the presence of a solvent selected from the group consisting of lower fatty acid having 2 to 6 carbon atoms, hydrocarbon chloride having 1 to 8 carbon atoms, and carbon chloride having 1 to 2 carbon atoms, in high yield.

摘要翻译： PCT No.PCT / JP83 / 00024 Sec。 371日期1983年9月12日 102（e）1983年9月12日日期PCT提交1983年1月28日PCT公布。 公开号WO83 / 02609 日期：1983年8月4日。一种制备具有高杨氏模量并可用作聚酯材料的α，ω-双（2-氯苯氧基）烷烃-4,4'-二羧酸或其酯的方法 能够形成自熄灭的纤维和薄膜。 因此，通过使α，ω-双（苯氧基）烷烃-4,4'-二羧酸或其酯与氯反应获得α，ω-双（2-氯苯氧基）烷烃-4,4'-二羧酸或其酯 存在选自碳原子数2〜6的低级脂肪酸，碳原子数1〜8的氯化烃，碳原子数1〜2的碳酰氯的溶剂，高产率。

公开(公告)号：US4352974A

公开(公告)日：1982-10-05

申请号：US173364

申请日：1980-07-29

申请人： Tatsumi Mizutani ,  Norio Kanai ,  Kunio Harada ,  Hideo Komatsu ,  Shinya Iida

发明人： Tatsumi Mizutani ,  Norio Kanai ,  Kunio Harada ,  Hideo Komatsu ,  Shinya Iida

IPC分类号： B23K10/00 ,  C30B33/00 ,  H01J37/32 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/3215 ,  B23K9/00 ,  C23F1/02

CPC分类号： H01L21/3065 ,  B23K10/00 ,  C30B33/00 ,  H01J37/3244 ,  H01L21/32155

摘要： A plasma etcher wherein the provision of a gas outlet directly in an etching chamber is avoided and wherein a subchamber having a sufficient capacity is connected to the etching chamber through a joint part, the gas outlet being provided in this subchamber. With the apparatus, the distribution of etching rates in plasma etching becomes uniform.

摘要翻译： 一种等离子体蚀刻器，其中避免了直接在蚀刻室中提供气体出口，并且其中具有足够容量的子室通过接头部分连接到蚀刻室，气体出口设置在该子室中。 利用该装置，等离子体蚀刻中的蚀刻速率的分布变得均匀。

公开(公告)号：US07914708B2

公开(公告)日：2011-03-29

申请号：US11666761

申请日：2005-10-31

申请人： Norio Tobori ,  Hideo Komatsu ,  Kotaro Tanaka ,  Kazuaki Uchiyama

发明人： Norio Tobori ,  Hideo Komatsu ,  Kotaro Tanaka ,  Kazuaki Uchiyama

IPC分类号： H01B1/06

CPC分类号： C08J3/226 ,  B82Y30/00 ,  C08J2377/00 ,  C08J2477/00 ,  C08K3/04 ,  C08K3/041 ,  C08L25/04 ,  C08L25/08 ,  C08L77/02 ,  C08L77/06

摘要： The present invention is to provide a conductive masterbatch using a polyamide resin, the conductive masterbatch that has an excellent kneadability/manufacturability and formability and an excellent dispersibility of conductive fillers such as a carbon black, and shows stable conductivity even when a large amount of such conductive fillers are contained therein, and a resin composition containing the conductive masterbatch. That is, the present invention is to provide the conductive masterbatch, which includes at least a conductive filler selected from carbon blacks and carbon nanotubes, a polyamide resin, and a copolymer which contains at least a vinyl monomer having a functional group reactive with the polyamide resin and a styrene as monomer units, and in which the content of the conductive filler is in the range of 10% by mass to 40% by mass, and the resin composition containing the conductive masterbatch.

摘要翻译： 本发明提供一种使用聚酰胺树脂的导电母料，具有优异的捏合/制造性和成形性的导电母料以及诸如炭黑的导电填料的优异分散性，并且即使当大量这样的导电母料 含有导电性填料，含有导电性母料的树脂组合物。 也就是说，本发明提供一种导电母料，其包括至少一种选自碳黑和碳纳米管的导电填料，聚酰胺树脂和至少含有具有与聚酰胺反应的官能团的乙烯基单体的共聚物 树脂和苯乙烯作为单体单元，其中导电填料的含量在10质量％至40质量％的范围内，和含有导电母料的树脂组合物。

公开(公告)号：US5876647A

公开(公告)日：1999-03-02

申请号：US722232

申请日：1996-10-19

申请人： Masayuki Makise ,  Michio Narita ,  Seiji Maeno ,  Hideo Komatsu

发明人： Masayuki Makise ,  Michio Narita ,  Seiji Maeno ,  Hideo Komatsu

IPC分类号： B29C47/00 ,  C08J3/20 ,  C08J3/22 ,  C04B35/00

CPC分类号： C08J3/201 ,  B29C47/0004 ,  C08J3/226 ,  B29C47/0009 ,  B29K2067/00 ,  B29K2069/00 ,  B29K2075/00 ,  B29K2079/085 ,  B29K2105/16 ,  B29K2707/04 ,  B29K2995/0005

摘要： A method for preparing a conductive thermoplastic resin composition or an electric conductor includes the step of kneading (a) conductive resin master batch pellets of conductive carbon black and a thermoplastic resin in which the conductive carbon black accounts for 5 to 50% by weight relative to the total amount 100 parts by weight of the conductive carbon black and the thermoplastic resin, (b) a thermoplastic resin in a weight ratio: (a+b)/(a) ranging from 1.01 to 1.5. This method permits the production of a conductive carbon black-containing conductive resin composition and an electric conductor which show stable conductivity even within a high resistance region (having a surface resistivity ranging from 10.sup.6 to 10.sup.16 .OMEGA.), wherein the control of the conductivity is difficult.

摘要翻译： PCT No.PCT / JP95 / 00194 Sec。 371日期1996年10月9日第 102（e）日期1996年10月9日PCT提交1995年2月13日PCT公布。 第WO95 / 29050号公报 日期：1995年11月2日制造导电性热塑性树脂组合物或电导体的方法包括：（a）导电性炭黑的导电性树脂母料和导电性炭黑的导电性树脂母料粒料混合5〜50 相对于导电性炭黑和热塑性树脂100重量份的总量的重量％，（b）重量比为（a + b）/（a）的热塑性树脂为1.01〜1.5。 该方法允许生产含导电性炭黑的导电树脂组合物和电导体，即使在高电阻区域（表面电阻率范围为106〜1016欧姆）的情况下也能显示出稳定的导电性，其中导电性的控制困难 。

公开(公告)号：US4412119A

公开(公告)日：1983-10-25

申请号：US260813

申请日：1981-05-05

申请人： Hideo Komatsu ,  Shinya Iida ,  Tatsumi Mizutani ,  Kazuyoshi Ueki

发明人： Hideo Komatsu ,  Shinya Iida ,  Tatsumi Mizutani ,  Kazuyoshi Ueki

IPC分类号： H01L21/302 ,  C23F4/00 ,  H01L21/3065 ,  H01L21/311 ,  H01L21/3213 ,  H01L21/306

CPC分类号： H01L21/32136 ,  C23F4/00 ,  H01L21/3065 ,  H01L21/31116 ,  H01L21/32137

摘要： A dry-etching method for working SiO.sub.2, phospho-silicate glass, Si, Mo, W, Cr, TiW, Si.sub.3 N.sub.4 or the like by the use of a glow discharge plasma involves the steps of introducing He, Ar, N.sub.2, O.sub.2 or a mixed gas thereof into a reaction chamber from the outside; and effecting the plasma discharge in the reaction chamber so that a reactive gas is liberated from a high molecular resin material arranged in the reaction chamber and containing fluorine atoms. The dry-etching method requires and uses no expensive gas containing a fluorocarbon, but has sufficient etching rate and selectivity.

摘要翻译： 通过使用辉光放电等离子体，对SiO 2，磷硅酸盐玻璃，Si，Mo，W，Cr，TiW，Si 3 N 4等进行加工的干式蚀刻方法包括引入He，Ar，N 2，O 2或 其混合气体从外部进入反应室; 并且在反应室中进行等离子体放电，使得反应气体从布置在反应室中的含有氟原子的高分子树脂材料释放出来。 干蚀刻方法需要并且不使用含有碳氟化合物的昂贵的气体，但是具有足够的蚀刻速率和选择性。

公开(公告)号：US4308089A

公开(公告)日：1981-12-29

申请号：US148283

申请日：1980-05-09

申请人： Shinya Iida ,  Kazuyoshi Ueki ,  Tatsumi Mizutani ,  Hideo Komatsu ,  Kado Hirobe

发明人： Shinya Iida ,  Kazuyoshi Ueki ,  Tatsumi Mizutani ,  Hideo Komatsu ,  Kado Hirobe

IPC分类号： C23F4/00 ,  C23F15/00 ,  H01L21/02 ,  H01L21/3205 ,  H01L21/321 ,  H01L21/3213 ,  H01L23/52 ,  C23F1/02 ,  C23C15/00 ,  C23G1/02

CPC分类号： H01L21/02071 ,  C23F4/00 ,  H01L21/321

摘要： Disclosed is a method for preventing corrosion of Al and Al alloys processed by the dry-etching method, which comprises (i) the step of sputtering Al or Al alloy in an ammonia-containing atmosphere and (ii) the step of washing the sputtered Al or Al alloy with an alkaline aqueous solution and then with water after termination of the step (i).According to this method, corrosion of Al or Al alloy by halogen element-containing substances stuck to Al or Al alloy during the dry-etching treatment can be effectively prevented.

摘要翻译： 本发明公开了一种防腐蚀方法，该方法包括：（i）在含氨气氛中溅射Al或Al合金的步骤，以及（ii）将溅射的Al 或Al合金与碱性水溶液反应，然后在步骤（i）终止后与水合并。 根据该方法，可以有效地防止在干法蚀刻处理中在Al或Al合金上粘附含卤素元素的Al或Al合金的腐蚀。

公开(公告)号：US4289188A

公开(公告)日：1981-09-15

申请号：US150939

申请日：1980-05-19

申请人： Tatsumi Mizutani ,  Kazuyoshi Ueki ,  Shinya Iida ,  Hideo Komatsu

发明人： Tatsumi Mizutani ,  Kazuyoshi Ueki ,  Shinya Iida ,  Hideo Komatsu

IPC分类号： C23F4/00 ,  H01J37/32 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/306 ,  C23F1/00

CPC分类号： H01L21/32136 ,  C23F4/00 ,  H01J37/32935 ,  H01L21/02019

摘要： Method and apparatus for monitoring a dry etching process using gas plasma, wherein a ratio of a spectrum intensity which varies depending on the process of the etching process to a spectrum intensity which is independent of the process of the etching process is determined and a resulting signal intensity is monitored. The completion of the etching process can be exactly determined irrespective of variation of the etching conditions.

摘要翻译： 用于使用气体等离子体监测干蚀刻工艺的方法和装置，其中确定根据蚀刻工艺的过程而变化的光谱强度与不同于蚀刻工艺的工艺的光谱强度的比率，并且得到所得到的信号 监测强度。 蚀刻工艺的完成可以精确地确定，而与蚀刻条件的变化无关。

公开(公告)号：US4267013A

公开(公告)日：1981-05-12

申请号：US45744

申请日：1979-06-05

申请人： Shinya Iida ,  Kazuyoshi Ueki ,  Hideo Komatsu ,  Tatsumi Mitzutani

发明人： Shinya Iida ,  Kazuyoshi Ueki ,  Hideo Komatsu ,  Tatsumi Mitzutani

IPC分类号： C09K13/10 ,  C23F4/00 ,  H01L21/02 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/3213 ,  C23F1/00 ,  C23F1/02

CPC分类号： H01L21/02071 ,  C09K13/10 ,  C23F4/00

摘要： A method for dry-etching Al and Al alloys is disclosed, which comprises producing plasma discharges with a mixed gas comprising boron trichloride and freon and/or oxygen incorporated therein and patterning Al or an Al alloy by the produced discharges. In this dry etching method, the etch rate of Al or an Al alloy can be remarkably improved over the etch rate attainable according to the conventional techniques, and the difference of the etch rate between Al or an Al alloy and other material can be remarkably increased.

摘要翻译： 公开了一种用于干法蚀刻Al和Al合金的方法，其包括用包含三氯化硼和氟利昂和/或氧气的混合气体产生等离子体放电，并通过产生的放电图案化Al或Al合金。 在这种干蚀刻方法中，Al或Al合金的蚀刻速率可以比根据常规技术可获得的蚀刻速率显着提高，Al或Al合金与其它材料之间的蚀刻速率差可以显着增加 。