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17 条记录 (耗时 0.015 秒)

    Gas diffusion plate for use in ICP etcher
    1.
    发明授权
    Gas diffusion plate for use in ICP etcher 有权
    用于ICP蚀刻机的气体扩散板

    公开(公告)号：US07156950B2

    公开(公告)日：2007-01-02

    申请号：US10348550

    申请日：2003-01-21

    申请人： Hong-Seub Kim ,  Bu-Jin Ko

    发明人： Hong-Seub Kim ,  Bu-Jin Ko

    IPC分类号： C23F1/10 ,  H01L21/306 ,  C23C16/507

    CPC分类号： H01L21/6715 ,  H01J37/321 ,  H01J37/3244

    摘要： A gas diffusion plate supplying process gases into a chamber of an ICP (inductively coupled plasma) etcher is provided in the present invention. The gas diffusion plate includes a porous plate comprised of a plurality of balls and formed by compressing and curing the plurality of balls, the porous plate having a circular planar shape; a plurality of gas flow grooves formed on an upper surface of the porous plate; and a gas distribution plate having a plurality of gas-feed holes at the bottom thereof and a plurality of gas-feed passages in the side portion thereof, the gas distribution plate surrounding lower and side portions of the porous plate.

    摘要翻译： 在本发明中提供了向ICP（电感耦合等离子体）蚀刻器的腔室供给处理气体的气体扩散板。 气体扩散板包括由多个球构成的多孔板，并且通过压缩和固化多个球而形成，多孔板具有圆形平面形状; 形成在所述多孔板的上表面上的多个气流槽; 以及气体分配板，其底部具有多个气体供给孔，并且在其侧部具有多个气体供给通道，所述气体分配板围绕所述多孔板的下部和侧部。

    Apparatus for generating inductively coupled plasma
    2.
    发明授权
    Apparatus for generating inductively coupled plasma 有权
    用于产生电感耦合等离子体的装置

    公开(公告)号：US06685800B2

    公开(公告)日：2004-02-03

    申请号：US10003195

    申请日：2001-11-14

    申请人： Hong Seub Kim ,  Gi Chung Kwon ,  Sun Seok Han ,  Choong Won Lee ,  Sung Weon Lee ,  Hong Sik Byun

    发明人： Hong Seub Kim ,  Gi Chung Kwon ,  Sun Seok Han ,  Choong Won Lee ,  Sung Weon Lee ,  Hong Sik Byun

    IPC分类号： C23C1600

    CPC分类号： H01J37/32522 ,  H01J37/321

    摘要： Disclosed is an apparatus for generating ICP, which has a heater having a hot wire as a heating source for heating elements in a chamber and inner wall of the chamber and also efficiently transfers heat of the heater through a heat transferring gas to the elements in the chamber and the inner wall of the chamber. According to the present invention, the elements in the chamber and the inner wall of the chamber can be heated up to a temperature of about 200° C., thereby reducing the adhesion of the by-product served as the source generating the undesirable particles. In addition, since the hot wire having a longer life span than the halogen lamp is used as heat radiating means, the life span of the apparatus is also increased.

    摘要翻译： 公开了一种用于产生ICP的装置，其具有加热器，该加热器具有热丝作为加热室，用于加热腔室中的元件和腔室的内壁，并且还通过传热气体将加热器的热量有效地传递到 室和室的内壁。 根据本发明，室中的元件和室的内壁可被加热至约200℃的温度，从而降低了作为产生不期望的颗粒的源的副产物的粘附。 此外，由于使用寿命比卤素灯长的热丝作为散热装置，因此装置的使用寿命也增加。

    PLASMA GENERATING APPARATUS
    3.
    发明申请
    PLASMA GENERATING APPARATUS 审中-公开
    等离子体发生装置

    公开(公告)号：US20080168945A1

    公开(公告)日：2008-07-17

    申请号：US11697678

    申请日：2007-04-06

    申请人： Hong-Seub Kim

    发明人： Hong-Seub Kim

    IPC分类号： H05H1/00 ,  C23C16/00 ,  H01L21/306

    CPC分类号： H05H1/46 ,  H01J37/32082 ,  H01J37/32091 ,  H01J37/321 ,  H01J37/32733 ,  H01L21/67069 ,  H01L21/6833

    摘要： Provided is a plasma generating apparatus. The plasma generating apparatus includes a vacuum chamber, an ElectroStatic Chuck (ESC), an antenna unit, and an antenna cover. The vacuum chamber has a hollow interior and is sealed at a top. The ESC disposed at an internal center of the vacuum chamber receives an external bias Radio Frequency (RF). The antenna unit covers and seals the through-hole of an insulating vacuum plate. The antenna cover covers a top of the antenna unit and has a gas injection port.

    摘要翻译： 提供了一种等离子体产生装置。 等离子体发生装置包括真空室，静电卡盘（ESC），天线单元和天线罩。 真空室具有中空的内部并且在顶部被密封。 设置在真空室的内部中心的ESC接收外部偏置射频（RF）。 天线单元覆盖并密封绝缘真空板的通孔。 天线盖覆盖天线单元的顶部并且具有气体注入端口。

    Impedance matching circuit for inductively coupled plasma source
    4.
    发明授权
    Impedance matching circuit for inductively coupled plasma source 失效
    用于电感耦合等离子体源的阻抗匹配电路

    公开(公告)号：US06770836B2

    公开(公告)日：2004-08-03

    申请号：US10100983

    申请日：2002-03-19

    申请人： Gi-Chung Kwon ,  Hong-Sik Byun ,  Sung-Weon Lee ,  Hong-Seub Kim ,  Sun-Seok Han ,  Bu-Jin Ko ,  Joung-Sik Kim

    发明人： Gi-Chung Kwon ,  Hong-Sik Byun ,  Sung-Weon Lee ,  Hong-Seub Kim ,  Sun-Seok Han ,  Bu-Jin Ko ,  Joung-Sik Kim

    IPC分类号： B23K1000

    CPC分类号： H01J37/321 ,  H01J37/32183 ,  H05H1/46

    摘要： An impedance matching circuit for a plasma source includes: a first network including: a first coil; and a RF power supply applying a first voltage to the first coil; and a second network including; a second coil grounded having a second voltage, the second voltage being lower than the first voltage; first and second reactive elements, one end portion of the first and second reactive elements being connected to each end portion of the second coil, respectively; and a load connected to the other end portions of the first and second reactive elements, phases at two end portions of the load being different from each other.

    摘要翻译： 一种用于等离子体源的阻抗匹配电路包括：第一网络，包括：第一线圈; 以及向所述第一线圈施加第一电压的RF电源; 和第二网络; 接地的第二线圈具有第二电压，第二电压低于第一电压; 第一和第二无功元件，第一和第二无功元件的一个端部分别连接到第二线圈的每个端部; 以及连接到第一和第二无功元件的另一端部的负载，负载的两个端部处的相位彼此不同。

    PLASMA GENERATING APPARATUS
    5.
    发明申请
    PLASMA GENERATING APPARATUS 有权
    等离子体发生装置

    公开(公告)号：US20100237777A1

    公开(公告)日：2010-09-23

    申请号：US12599799

    申请日：2008-04-18

    申请人： Hong-Seub Kim ,  Hyeon-Dong Shin

    发明人： Hong-Seub Kim ,  Hyeon-Dong Shin

    IPC分类号： H01J65/04

    CPC分类号： H01J37/321 ,  H01J37/32082 ,  H01J37/32091

    摘要： Provided is a plasma generating apparatus. The apparatus includes a vacuum chamber, an ElectroStatic Chuck (ESC), an antenna holder. The vacuum chamber has a hollow interior and is sealed at its top a by a vacuum plate that has a through-hole at its center. The ESC is disposed at an internal center of the vacuum chamber. The antenna unit is disposed within the vacuum chamber under the vacuum plate. The antenna cover covers and is coupled to a top of the antenna unit and receives and forwards an external source RF to the antenna unit. The cover holder is caught by an upper surface of the vacuum plate and suspends and holds the antenna unit.

    摘要翻译： 提供了一种等离子体产生装置。 该装置包括一个真空室，一个静电卡盘（ESC），一个天线座。 真空室具有中空的内部，并通过在其中心具有通孔的真空板在其顶部a密封。 ESC设置在真空室的内部中心。 天线单元设置在真空室下的真空室内。 天线盖覆盖并耦合到天线单元的顶部，并接收并转发外部源RF到天线单元。 盖保持器被真空板的上表面卡住并悬挂并保持天线单元。

    Parallel resonance whirl antenna
    7.
    发明授权
    Parallel resonance whirl antenna 有权

    公开(公告)号：US06653988B2

    公开(公告)日：2003-11-25

    申请号：US10185676

    申请日：2002-06-27

    申请人： Gi Chung Kwon ,  Hong Sik Byun ,  Sung Weon Lee ,  Hong Seub Kim ,  Sun Seok Han ,  Bu Jin Ko ,  Joung Sik Kim

    发明人： Gi Chung Kwon ,  Hong Sik Byun ,  Sung Weon Lee ,  Hong Seub Kim ,  Sun Seok Han ,  Bu Jin Ko ,  Joung Sik Kim

    IPC分类号： H01Q136

    CPC分类号： H01Q21/24 ,  H01Q1/38 ,  H01Q9/27 ,  H01Q21/20

    摘要： Disclosed is a parallel resonance antenna comprising: a whirl antenna having a plurality of antenna units installed two-dimensionally and radially around a central point, each of the antenna units having a ground point at a predetermined position thereof, portions outside the ground points respectively being bent in a same direction, the antenna units having a same size and direction, angles between the antenna units at the central point being all the same; a central conductive line connected to the central point to be normal to the whirl antenna, for being supplied with an RF power; a metal plate installed over and apart from the whirl antenna, the metal plate being connected with end portions of the antenna units, and having a penetration hole through which the central conductive line passes without contacting with the metal plate; and a variable resonance capacitor installed in series between the central conductive line and the metal plate. According to a parallel resonance antenna, the geometrical structure enables to obtain a uniform plasma. Since the antenna has a small inductance, impedance matching is easy even at the VHF band. Also, at the resonance point, since the potential of the inner portions (Z1, Z2, Z3 and Z4) of the ground points of the antenna units is low, it becomes possible to decrease a non-desired sputtering phenomenon.

    Plasma generating apparatus having antenna with impedance controller
    8.
    发明授权
    Plasma generating apparatus having antenna with impedance controller 有权
    具有带有阻抗控制器的天线的等离子体发生装置

    公开(公告)号：US08181597B2

    公开(公告)日：2012-05-22

    申请号：US12599799

    申请日：2008-04-18

    申请人： Hong-Seub Kim ,  Hyeon-Dong Shin

    发明人： Hong-Seub Kim ,  Hyeon-Dong Shin

    IPC分类号： H01L21/3065 ,  C23C16/00

    CPC分类号： H01J37/321 ,  H01J37/32082 ,  H01J37/32091

    摘要： Provided is a plasma generating apparatus. The apparatus includes a vacuum chamber, an ElectroStatic Chuck (ESC), an antenna holder. The vacuum chamber has a hollow interior and is sealed at its top by a vacuum plate that has a through-hole at its center. The ESC is disposed at an internal center of the vacuum chamber. The antenna unit is disposed within the vacuum chamber under the vacuum plate. The antenna cover covers and is coupled to a top of the antenna unit and receives and forwards an external source RF to the antenna unit. The cover holder is caught by an upper surface of the vacuum plate and suspends and holds the antenna unit.

    摘要翻译： 提供了一种等离子体产生装置。 该装置包括一个真空室，一个静电卡盘（ESC），一个天线座。 真空室具有中空的内部，并通过在其中心具有通孔的真空板在其顶部被密封。 ESC设置在真空室的内部中心。 天线单元设置在真空室下的真空室内。 天线盖覆盖并耦合到天线单元的顶部，并接收并转发外部源RF到天线单元。 盖保持器被真空板的上表面卡住并悬挂并保持天线单元。

    PLASMA GENERATING APPARATUS
    9.
    发明申请
    PLASMA GENERATING APPARATUS 审中-公开
    等离子体发生装置

    公开(公告)号：US20110284164A1

    公开(公告)日：2011-11-24

    申请号：US13192235

    申请日：2011-07-27

    申请人： Hong-Seub KIM

    发明人： Hong-Seub KIM

    IPC分类号： H01L21/3065 ,  C23C16/505

    CPC分类号： H05H1/46 ,  H01J37/32082 ,  H01J37/32091 ,  H01J37/321 ,  H01J37/32733 ,  H01L21/67069 ,  H01L21/6833

    摘要： Provided is a plasma generating apparatus. The plasma generating apparatus includes a vacuum chamber, an ElectroStatic Chuck (ESC), an antenna unit, and an antenna cover. The vacuum chamber has a hollow interior and is sealed at a top. The ESC disposed at an internal center of the vacuum chamber receives an external bias Radio Frequency (RF). The antenna unit covers and seals the through-hole of an insulating vacuum plate. The antenna cover covers a top of the antenna unit and has a gas injection port.

    摘要翻译： 提供了一种等离子体产生装置。 等离子体发生装置包括真空室，静电卡盘（ESC），天线单元和天线罩。 真空室具有中空的内部并且在顶部被密封。 设置在真空室的内部中心的ESC接收外部偏置射频（RF）。 天线单元覆盖并密封绝缘真空板的通孔。 天线盖覆盖天线单元的顶部并且具有气体注入端口。