Arrangement of optoelectronic components
    1.
    发明授权
    Arrangement of optoelectronic components 有权
    光电组件的布置

    公开(公告)号:US08638565B2

    公开(公告)日:2014-01-28

    申请号:US12442414

    申请日:2007-09-21

    摘要: A method for producing an arrangement of optoelectronic components (10) is specified, comprising the following steps: producing at least two fixing regions (2) on a first connection carrier (1); introducing solder material (3) into the fixing regions (2); applying a second connection carrier (4) to the fixing regions (2); and soldering the second connection carrier (4) onto the first connection carrier (1) with the solder material (3) in the fixing regions (2).

    摘要翻译: 规定了用于制造光电子部件(10)的布置的方法,包括以下步骤:在第一连接载体(1)上产生至少两个固定区域(2); 将焊料材料(3)引入固定区域(2)中; 将第二连接载体(4)施加到所述固定区域(2)上; 以及在所述固定区域(2)中用所述焊料材料(3)将所述第二连接载体(4)焊接到所述第一连接载体(1)上。

    Method for Producing an Arrangement of Optoelectronic Components, and Arrangement of Optoelectronic Components
    5.
    发明申请
    Method for Producing an Arrangement of Optoelectronic Components, and Arrangement of Optoelectronic Components 有权
    制造光电元件布置方法及光电元件布置

    公开(公告)号:US20100079964A1

    公开(公告)日:2010-04-01

    申请号:US12442414

    申请日:2007-09-21

    IPC分类号: H05K7/00 H05K3/30

    摘要: A method for producing an arrangement of optoelectronic components (10) is specified, comprising the following steps: producing at least two fixing regions (2) on a first connection carrier (1); introducing solder material (3) into the fixing regions (2); applying a second connection carrier (4) to the fixing regions (2); and soldering the second connection carrier (4) onto the first connection carrier (1) with the solder material (3) in the fixing regions (2).

    摘要翻译: 规定了用于制造光电子部件(10)的布置的方法,包括以下步骤:在第一连接载体(1)上产生至少两个固定区域(2); 将焊料材料(3)引入固定区域(2)中; 将第二连接载体(4)施加到所述固定区域(2)上; 以及在所述固定区域(2)中用所述焊料材料(3)将所述第二连接载体(4)焊接到所述第一连接载体(1)上。

    Method for automatically providing data for the focus monitoring of a lithographic process
    8.
    发明授权
    Method for automatically providing data for the focus monitoring of a lithographic process 有权
    用于自动提供用于光刻工艺的焦点监控的数据的方法

    公开(公告)号:US07277160B2

    公开(公告)日:2007-10-02

    申请号:US11057331

    申请日:2005-02-11

    申请人: Markus Kirsch

    发明人: Markus Kirsch

    IPC分类号: G03B27/32 G03B27/52 G03B27/42

    CPC分类号: G03F7/70641

    摘要: A method for automatically providing data for the focus monitoring of a lithographic exposure process is disclosed. Firstly, the file for a wafer is generated, which holds at least the information of the size of the wafer, the position of a plurality of measurement pattern, the order in which the measurement patterns are captured and registered, and the alignment of the measurement pattern. Secondly, this information is stored in a master grid. Thirdly, images are acquired of the pattern of each position stored in the master grid of the generated file, wherein the image acquisition is carried out according to the order as stored. Finally, names are assigned to the acquired images.

    摘要翻译: 公开了一种用于自动提供用于光刻曝光过程的焦点监视的数据的方法。 首先,生成用于晶片的文件,其至少保持晶片尺寸的信息,多个测量图案的位置,捕获和记录测量图案的顺序以及测量的对准 模式。 其次,该信息存储在主网格中。 第三,获取存储在生成文件的主网格中的每个位置的图案的图像,其中根据存储的顺序执行图像采集。 最后,将名称分配给所获取的图像。

    Method for automatically providing data for the focus monitoring of a lithographic process
    9.
    发明申请
    Method for automatically providing data for the focus monitoring of a lithographic process 有权
    用于自动提供用于光刻工艺的焦点监控的数据的方法

    公开(公告)号:US20060181693A1

    公开(公告)日:2006-08-17

    申请号:US11057331

    申请日:2005-02-11

    申请人: Markus Kirsch

    发明人: Markus Kirsch

    IPC分类号: G03B27/32

    CPC分类号: G03F7/70641

    摘要: A method for automatically providing data for the focus monitoring of a lithographic exposure process is disclosed. Firstly, the file for a wafer is generated, which holds at least the information of the size of the wafer, the position of a plurality of measurement pattern, the order in which the measurement patterns are captured and registered, and the alignment of the measurement pattern. Secondly, this information is stored in a master grid. Thirdly, images are acquired of the pattern of each position stored in the master grid of the generated file, wherein the image acquisition is carried out according to the order as stored. Finally, names are assigned to the acquired images.

    摘要翻译: 公开了一种用于自动提供用于光刻曝光过程的焦点监视的数据的方法。 首先,生成用于晶片的文件,其至少保持晶片尺寸的信息,多个测量图案的位置,捕获和记录测量图案的顺序以及测量的对准 模式。 其次,该信息存储在主网格中。 第三,获取存储在生成文件的主网格中的每个位置的图案的图像,其中根据存储的顺序执行图像采集。 最后,将名称分配给所获取的图像。