公开(公告)号：US20110229010A1

公开(公告)日：2011-09-22

申请号：US13130600

申请日：2009-11-28

申请人： Michael Arnz ,  Dirk Beyer ,  Wolfgang Harnisch ,  Thomas Scheruebl

发明人： Michael Arnz ,  Dirk Beyer ,  Wolfgang Harnisch ,  Thomas Scheruebl

IPC分类号： G06K9/00

CPC分类号： G03F7/70633 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/84 ,  G03F7/70616 ,  H01J37/3174

摘要： A method for measuring the relative local position error of one of the sections of an object that is exposed section by section, in particular of a lithography mask or of a wafer, is provided, each exposed section having a plurality of measurement marks, wherein a) a region of the object which is larger than the one section is imaged in magnified fashion and is detected as an image, b) position errors of the measurement marks contained in the detected image are determined on the basis of the detected image, c) corrected position errors are derived by position error components which are caused by the magnified imaging and detection being extracted from the determined position errors of the measurement marks, d) the relative local position error of the one section is derived on the basis of the corrected position errors of the measurement marks.

摘要翻译： 提供了一种用于测量逐段暴露的物体的一个部分（特别是光刻掩模或晶片）的相对局部位置误差的方法，每个暴露部分具有多个测量标记，其中 ）以放大的方式成像大于该部分的对象的区域，并且被检测为图像，b）基于检测到的图像确定检测图像中包含的测量标记的位置误差，c） 校正位置误差是通过由放大的成像和检测引起的位置误差分量从确定的测量标记的位置误差中提取导出的，d）基于校正位置导出一个部分的相对局部位置误差 测量标记的误差。

公开(公告)号：US08731273B2

公开(公告)日：2014-05-20

申请号：US13130600

申请日：2009-11-28

申请人： Michael Arnz ,  Dirk Beyer ,  Wolfgang Harnisch ,  Thomas Scheruebl

发明人： Michael Arnz ,  Dirk Beyer ,  Wolfgang Harnisch ,  Thomas Scheruebl

IPC分类号： G06K9/40 ,  G01N21/00

CPC分类号： G03F7/70633 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/84 ,  G03F7/70616 ,  H01J37/3174

摘要： A method for measuring the relative local position error of one of the sections of an object that is exposed section by section, in particular of a lithography mask or of a wafer, is provided, each exposed section having a plurality of measurement marks, wherein a) a region of the object which is larger than the one section is imaged in magnified fashion and is detected as an image, b) position errors of the measurement marks contained in the detected image are determined on the basis of the detected image, c) corrected position errors are derived by position error components which are caused by the magnified imaging and detection being extracted from the determined position errors of the measurement marks, d) the relative local position error of the one section is derived on the basis of the corrected position errors of the measurement marks.

摘要翻译： 提供了一种用于测量逐段暴露的物体的一个部分（特别是光刻掩模或晶片）的相对局部位置误差的方法，每个暴露部分具有多个测量标记，其中 ）以放大的方式成像大于该部分的对象的区域，并且被检测为图像，b）基于检测到的图像确定检测图像中包含的测量标记的位置误差，c） 校正位置误差是通过由放大的成像和检测引起的位置误差分量从确定的测量标记的位置误差中提取导出的，d）基于校正位置导出一个部分的相对局部位置误差 测量标记的误差。

公开(公告)号：US07525115B2

公开(公告)日：2009-04-28

申请号：US10554048

申请日：2004-04-20

申请人： Hans-Juergen Dobschal ,  Wolfgang Harnisch ,  Thomas Scheruebl ,  Nobert Rosenkranz ,  Ralph Semmler

发明人： Hans-Juergen Dobschal ,  Wolfgang Harnisch ,  Thomas Scheruebl ,  Nobert Rosenkranz ,  Ralph Semmler

IPC分类号： G01N23/04 ,  G01N21/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G01N21/956 ,  G03F1/24 ,  G03F1/84

摘要： Apparatus for inspecting objects especially masks in microlithography that are disposed in a vacuum chamber. The apparatus includes a converter for converting illuminating radiation emitted from the object into a radiation of a higher wavelength. A sensor for recording images is disposed outside the vacuum chamber and arranged as an optical interface from the vacuum chamber to the sensor of the converter or at least one part of an image lens is arranged as a window in the vacuum chamber.

摘要翻译： 用于检查物体的装置，特别是在微光刻中的掩模，其设置在真空室中。 该装置包括用于将从物体发射的照射辐射转换成更高波长的辐射的转换器。 用于记录图像的传感器设置在真空室的外部并且被布置为从真空室到转换器的传感器的光学界面，或者将图像透镜的至少一部分布置成在真空室中的窗口。

公开(公告)号：USRE44216E1

公开(公告)日：2013-05-14

申请号：US12604821

申请日：2009-10-23

申请人： Michael Totzeck ,  Heiko Feldmann ,  Toralf Gruner ,  Karl-Heinz Schuster ,  Joern Greif-Wuestenbecker ,  Thomas Scheruebl ,  Wolfgang Harnisch ,  Norbert Rosenkranz ,  Ulrich Matejka

发明人： Michael Totzeck ,  Heiko Feldmann ,  Toralf Gruner ,  Karl-Heinz Schuster ,  Joern Greif-Wuestenbecker ,  Thomas Scheruebl ,  Wolfgang Harnisch ,  Norbert Rosenkranz ,  Ulrich Matejka

IPC分类号： G02B23/00

CPC分类号： G03F7/70566 ,  G02B5/3025 ,  G02B21/0016 ,  G03F7/70666 ,  Y10S359/90

摘要： An optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The microscope imaging system for emulating high-aperture imaging systems comprises imaging optics, a detector and an evaluating unit, wherein polarizing optical elements are selectively arranged in the illumination beam path for generating different polarization states of the illumination beam and/or in the imaging beam path for selecting different polarization components of the imaging beam, an optical element with a polarization-dependent intensity attenuation function can be introduced into the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing.

摘要翻译： 用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。 用于模拟高光圈成像系统的显微镜成像系统包括成像光学器件，检测器和评估单元，其中偏振光学元件选择性地布置在照明光束路径中，用于产生照明光束和/或成像光束的不同偏振状态 用于选择成像光束的不同偏振分量的路径，具有偏振相关强度衰减功能的光学元件可以被引入到成像光束路径中，掩模和/或采样的图像被检测器接收用于不同偏振光束分量， 被传送到评估单元进行进一步处理。

公开(公告)号：US20060262306A1

公开(公告)日：2006-11-23

申请号：US10554048

申请日：2004-04-20

申请人： Hans-Juergen Dobschal ,  Wolfgang Harnisch ,  Thomas Scheruebl ,  Nobert Rosenkranz ,  Ralph Semmler

发明人： Hans-Juergen Dobschal ,  Wolfgang Harnisch ,  Thomas Scheruebl ,  Nobert Rosenkranz ,  Ralph Semmler

IPC分类号： G01N21/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G01N21/956 ,  G03F1/24 ,  G03F1/84

摘要： Apparatus for inspecting objects especially masks in microlithography that are disposed in a vacuum chamber. The apparatus includes a converter for converting illuminating radiation emitted from the object into a radiation of a higher wavelength. A sensor for recording images is disposed outside the vacuum chamber and arranged as an optical interface from the vacuum chamber to the sensor of the converter or at least one part of an image lens is arranged as a window in the vacuum chamber.

公开(公告)号：US07286284B2

公开(公告)日：2007-10-23

申请号：US10917626

申请日：2004-08-13

申请人： Michael Totzeck ,  Heiko Feldmann ,  Toralf Gruner ,  Karl-Heinz Schuster ,  Joern Greif-Wuestenbecker ,  Thomas Scheruebl ,  Wolfgang Harnisch ,  Norbert Rosenkranz ,  Ulrich Stroessner

发明人： Michael Totzeck ,  Heiko Feldmann ,  Toralf Gruner ,  Karl-Heinz Schuster ,  Joern Greif-Wuestenbecker ,  Thomas Scheruebl ,  Wolfgang Harnisch ,  Norbert Rosenkranz ,  Ulrich Stroessner

IPC分类号： G02B23/00

CPC分类号： G03F7/70566 ,  G02B5/3025 ,  G02B21/0016 ,  G03F7/70666 ,  Y10S359/90

摘要： An optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The microscope imaging system for emulating high-aperture imaging systems comprises imaging optics, a detector and an evaluating unit, wherein polarizing optical elements are selectively arranged in the illumination beam path for generating different polarization states of the illumination beam and/or in the imaging beam path for selecting different polarization components of the imaging beam, an optical element with a polarization-dependent intensity attenuation function can be introduced into the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing.

摘要翻译： 用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。 用于模拟高光圈成像系统的显微镜成像系统包括成像光学器件，检测器和评估单元，其中偏振光学元件选择性地布置在照明光束路径中，用于产生照明光束和/或成像光束的不同偏振状态 用于选择成像光束的不同偏振分量的路径，具有偏振相关强度衰减功能的光学元件可以被引入到成像光束路径中，掩模和/或采样的图像被检测器接收用于不同偏振光束分量， 被传送到评估单元进行进一步处理。

公开(公告)号：US20060028706A1

公开(公告)日：2006-02-09

申请号：US11174489

申请日：2005-07-06

申请人： Michael Totzeck ,  Heiko Feldman ,  Toralf Gruner ,  Karl-Heinz Schuster ,  Joern Greif-Wuestenbecker ,  Ulrich Stroessner ,  Thomas Scheruebl ,  Wolfgang Harnisch

发明人： Michael Totzeck ,  Heiko Feldman ,  Toralf Gruner ,  Karl-Heinz Schuster ,  Joern Greif-Wuestenbecker ,  Ulrich Stroessner ,  Thomas Scheruebl ,  Wolfgang Harnisch

IPC分类号： G02B26/00

CPC分类号： G03F7/70108 ,  G02B5/3041 ,  G02B5/3091 ,  G02B27/286 ,  G02B27/288 ,  G03F7/70566

摘要： A polarizer device, for converting an entry light beam into an exit light beam with a defined spatial distribution of polarization states, has an angle varying input device for receiving the entry light beam and for generating a first light beam with a predeterminable first angular distribution of light rays; an angle-selectively active polarization influencing device for receiving the first light beam and for converting the first light beam into a second light beam according to a defined angle function of the polarization state variation; and an angle varying output device for receiving the second light beam and for generating the exit light beam with a second angular distribution from the second light beam. In particular, polarization states with a radial or tangential polarization can be provided cost-effectively in this way.

摘要翻译： 一种用于将入射光束转换成具有限定的偏振状态空间分布的出射光束的偏振器装置具有角度变化输入装置，用于接收入射光束并用于产生具有可预先确定的第一角度分布的第一光束 光线 角度选择性有源极化影响装置，用于接收第一光束并根据偏光状态变化的限定角函数将第一光束转换成第二光束; 以及角度变化的输出装置，用于接收第二光束并用于从第二光束产生具有第二角度分布的出射光束。 特别地，可以以这种方式成本有效地提供具有径向或切向极化的极化状态。

公开(公告)号：US20060012873A1

公开(公告)日：2006-01-19

申请号：US10917626

申请日：2004-08-13

申请人： Michael Totzeck ,  Heiko Feldmann ,  Toralf Grunder ,  Karl-Heinz Schuster ,  Joern Greif-Wuestenbecker ,  Thomas Scheruebl ,  Wolfgang Harnisch ,  Norbert Rosenkranz ,  Ulrich Stroessner

发明人： Michael Totzeck ,  Heiko Feldmann ,  Toralf Grunder ,  Karl-Heinz Schuster ,  Joern Greif-Wuestenbecker ,  Thomas Scheruebl ,  Wolfgang Harnisch ,  Norbert Rosenkranz ,  Ulrich Stroessner

IPC分类号： G02B21/06

CPC分类号： G03F7/70566 ,  G02B5/3025 ,  G02B21/0016 ,  G03F7/70666 ,  Y10S359/90

摘要： The present invention is directed to an optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The microscope imaging system for emulating high-aperture imaging systems comprises imaging optics, a detector and an evaluating unit, wherein polarizing optical elements are selectively arranged in the illumination beam path for generating different polarization states of the illumination beam and/or in the imaging beam path for selecting different polarization components of the imaging beam, an optical element with a polarization-dependent intensity attenuation function can be introduced into the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing. With the proposed solution, it is possible in particular to examine lithography masks for defects by means of inspection microscopes in spite of increasingly smaller structures and increasingly higher image-side numerical apertures of the imaging systems. Realistic images of the scanner systems can be generated by emulating the occurring vector effects.

摘要翻译： 本发明涉及一种用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。 用于模拟高光圈成像系统的显微镜成像系统包括成像光学器件，检测器和评估单元，其中偏振光学元件选择性地布置在照明光束路径中，用于产生照明光束和/或成像光束的不同偏振状态 用于选择成像光束的不同偏振分量的路径，具有偏振相关强度衰减功能的光学元件可以被引入到成像光束路径中，掩模和/或采样的图像被检测器接收用于不同偏振光束分量， 被传送到评估单元进行进一步处理。 利用所提出的解决方案，尽管越来越小的结构和成像系统的图像侧数值孔径越来越高，但是可以通过检查显微镜检查用于缺陷的光刻掩模。 可以通过模拟出现的矢量效应来生成扫描仪系统的现实图像。

公开(公告)号：US08264535B2

公开(公告)日：2012-09-11

申请号：US12597247

申请日：2008-07-11

申请人： Oliver Kienzle ,  Rigo Richter ,  Norbert Rosenkranz ,  Yuji Kobiyama ,  Thomas Scheruebl

发明人： Oliver Kienzle ,  Rigo Richter ,  Norbert Rosenkranz ,  Yuji Kobiyama ,  Thomas Scheruebl

IPC分类号： H04N7/18

CPC分类号： G03F1/72 ,  G03F1/30

摘要： The invention relates to a method for analyzing a group of at least two masks for photolithography, wherein each of the masks comprises a substructure of a total structure, which is to be introduced in a layer of the wafer in the lithographic process, and the total structure is introduced in the layer of the wafer by introducing the substructures in sequence. In this method, a first aerial image of a first one of the at least two masks is recorded, digitized and stored in a data structure. Then, a second aerial image of a second one of the at least two masks is recorded, digitized and stored in a data structure. A combination image is generated from the data of the first and second aerial images, which combination image is represented and/or evaluated.

摘要翻译： 本发明涉及一种用于分析用于光刻的一组至少两个掩模的方法，其中每个掩模包括总结构的子结构，其将在光刻工艺中被引入晶片的层中，并且总共 通过依次引入子结构，在晶片层中引入结构。 在该方法中，将至少两个掩模中的第一个的第一空间图像记录，数字化并存储在数据结构中。 然后，将至少两个掩模中的第二个的第二个空间图像记录，数字化并存储在数据结构中。 从第一和第二空间图像的数据生成组合图像，该组合图像被表示和/或评估。

公开(公告)号：US06307690B1

公开(公告)日：2001-10-23

申请号：US09509272

申请日：2000-03-24

申请人： Norbert Czarnetzki ,  Thomas Scheruebl ,  Manfred Matthae

发明人： Norbert Czarnetzki ,  Thomas Scheruebl ,  Manfred Matthae

IPC分类号： G02B504

CPC分类号： G02B27/144 ,  G02B21/082

摘要： A microscope with incident light input coupling, wherein the light provided for the incident illumination is directed onto the partially reflecting layer of a beam splitter cube and is directed from there through the objective onto the specimen, while the light reflected and/or emitted by the specimen travels back to the partially reflecting layer and passes through the latter into the imaging beam path. In a microscope of this type, the beam splitter cube is provided with a negative spherical curvature at its outer surface facing the objective. Further, instead of the conventional tube lens, there is a combination formed of a converging lens and a diverging lens, wherein the surface curvatures of the converging lens and the diverging lens and the negative spherical curvature effected at the beam splitter cube are adapted to one another in such a way that the back-reflections of the incident illumination in the intermediate image plane are limited to a minimum.

摘要翻译： 具有入射光输入耦合的显微镜，其中为入射照明提供的光被引导到分束器立方体的部分反射层上，并且从那里通过物镜被引导到样本上，而被反射和/或发射的光 样品返回到部分反射层，并通过后者进入成像光束路径。 在这种类型的显微镜中，分束器立方体在其面向物镜的外表面处具有负的球形曲率。 此外，代替常规管透镜，存在由会聚透镜和发散透镜形成的组合，其中会聚透镜和发散透镜的表面曲率和在分束器立方体处实现的负球面曲率适合于一个 另一种方式是将中间像平面中的入射照明的背反射限制到最小。